CN101204860A - Aluminum foil belt of compound metal and preparation method and uses - Google Patents
Aluminum foil belt of compound metal and preparation method and uses Download PDFInfo
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- CN101204860A CN101204860A CNA2007101152266A CN200710115226A CN101204860A CN 101204860 A CN101204860 A CN 101204860A CN A2007101152266 A CNA2007101152266 A CN A2007101152266A CN 200710115226 A CN200710115226 A CN 200710115226A CN 101204860 A CN101204860 A CN 101204860A
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Abstract
The invention provides an aluminum foil belt of complex metal, a preparation method and application thereof. The preparation method for the aluminum foil belt of complex metal comprises the following steps: a. the aluminum foil belt is processed by plasma treatment in mixed gas of nitrogen, argon, argon and hydrogen or argon and oxygen, and gas pressure is controlled at 1.0*10<-1>- 4*10<3>Pa; b. the aluminum foil belt after a plasma treatment is sputtered with a layer of single metal or alloy mental under the protection of the argon in vacuum, or is sputtered with a layer or multilayer of a plurality of single metals or alloy metals, and vacuity is controlled at 6*10<-1>-9*10<-4>Pa; c. substrate which is sputtered is continuously electroplated with 1 to 3 types of metal coating by applying conventional electroplating technique; then product is obtained after cleaning and parching. The product can be used for vector copper foil, flexible copper clad laminate, stamping hardware, li-battery negative current collector, conductive adhesive tape, heat-transfer materials, electronic circuit and electromagnetic shielding materials.
Description
Technical field:
The present invention relates to the aluminium foil strip of composition metal on the foil of aluminium or band, relate to the preparation method of this aluminium foil strip simultaneously, in addition, also relate to the purposes of the aluminium foil strip of this composition metal.
Technical background:
Because China's rapid development of economy, the consumption figure annual amplification of Chinese copper is 15% in the period of 2000-2005, has become copper country of consumption the biggest in the world so far.But since at the beginning of 2006, because rising steadily of copper valency forces the terminal use to seek the substitute of metallic copper one after another.In electronic device field, numerous equipment that need charging, (as on the table and laptop computer) its handware of using of charging shell, and part requires the tray for disc of the video disc player (as DVD etc.) of good heat dissipation effect all to come punching out with the Copper Foil of 0.2mm, the effect that it can play heat radiation, electromagnetic shielding and can weld.As it is alternative to adopt aluminium foil to bring, and outstanding defective is to weld, thereby, long-term by one, be left out always.
Summary of the invention:
One of purpose of the present invention provide a kind of more frivolous than Copper Foil band, possess the aluminium foil strip of the lower-cost composition metal of solderability again; Two of purpose provides the preparation method of the aluminium foil strip of this composition metal; Three of purpose provides the purposes of the aluminium foil strip of this composition metal.
One of purpose of the present invention can realize by following technical measures:
Tow sides or one of them face in aluminium foil strip matrix appearance are attached with the coat of metal.
One of purpose of the present invention also can realize by following technical measures:
The described coat of metal is a kind of monometallic coating of one deck or alloying metal coating; Also can be one or more layers several coats of metal or alloying metal coating; The thickness of coating of the described coat of metal is the 50-5000 dust.
Two of purpose of the present invention can realize by following technical measures:
The preparation method of the aluminium foil strip of this composition metal carries out as follows:
A. aluminium foil strip is carried out plasma treatment under the mist of nitrogen, argon gas, argon gas and hydrogen, argon gas and oxygen, the control gas pressure is 1.0 * 10
-1-4 * 10
3Pa;
B. will be through aluminium foil strip a kind of monometallic of vacuum sputtering one deck or alloying metal under argon shield of plasma treatment, but also one or more layers several monometallics or alloying metal of sputter, and control vacuum is 6 * 10
-1-9 * 10
-4Pa;
C. on the good base material of sputter, adopting the conventional electroplating technology continuous electroplating 1-3 kind coat of metal, and after clean, oven dry, product.
Two of purpose of the present invention also can realize by following technical measures:
Monometallic described in the b operation or alloying metal are meant copper, nickel, gold, silver, tin, corronil, nichrome and stainless steel;
The aluminium foil translational speed is 0.5m/min-50m/min in the b operation;
The coat of metal described in the c operation is meant copper, nickel, tin, iron, zinc or chromium monometallic coating and zinc-nickel, zinc cobalt, zinc-iron, zinc titanium, zinc-nickel iron, copper zinc, copper tin, slicker solder, slicker solder copper, Cu-Sn-Zn or the nickel-phosphorus alloy coat of metal.
Three of purpose of the present invention can realize by following technical measures:
With the aluminium foil strip of this composition metal as carrier copper foil, the application of flexibility coat copper plate, punching press handware, cathode of lithium battery collector, conductive tape, heat-transfer matcrial, electronic circuit and electromagnetic shielding material.
Preparation method of the present invention comprises and the aluminium foil strip matrix surface is carried out metals such as vacuum copper facing, nickel, gold, silver, tin, corronil, nichrome and stainless steel (the vacuum plating comprises vacuum evaporation, ion plating and sputter plating), change the electrode potential of aluminium, continuous more compound copper facing or other bondable metal layer.
Concrete scheme is as follows:
1, selects hard attitude (H18), half-hard state (H24), soft attitude aluminium foil strip such as (0), thickness 0.003-1mm for use; Width 10-1600mm.
2, above-mentioned aluminium foil strip is carried out plasma treatment under the mist of mist, argon gas and the oxygen of argon gas, argon gas and hydrogen, nitrogen, can adopt pure gas or mist, gas pressure is 1.0 * 10
-1-4 * 10
3Pa.Do like this and can clear up, and can activate its surface, strengthen adhesion the aluminium foil strip surface.
3, vacuum sputtering copper facing, nickel, gold, silver, tin, corronil, nichrome and stainless steel etc. under argon shield then, but a kind of monometallic of sputter one deck or alloying metal, but several metal or alloy of also sputter multilayer.Vacuum 6 * 10
-1-9 * 10
-4Pa, matrix translational speed 0.5m/min-50m/min, this moment material the above-mentioned coat of metal of surface attachment one deck, if the electrode potential that solves aluminium of deciding like this is very negative, the defective that can't in the aqueous solution, electroplate.
4, on the good base material of sputter, adopt continuous electroplating to thicken technology, plate 1-3 kind metal level continuously, can utilize the technology of existing plating monometallic and plating alloy metal to electroplate as required, wherein copper, nickel, tin, iron, zinc, chromium are monometallic commonly used, zinc-nickel, zinc cobalt, zinc-iron, zinc titanium, zinc-nickel iron, copper zinc, copper tin, slicker solder, slicker solder copper, Cu-Sn-Zn, nickel phosphorus are alloy layer commonly used, order is not done special qualification, and formed above-mentioned metallic diaphragm on the surface that vacuum-coating is arranged this moment; After this through cleaning, dry the aluminium foil strip that promptly forms based on the composition metal of aluminium.
The present invention has the following advantages:
1. weight/power ratio is lighter, thinner mutually with existing Copper Foil band, and cost is cheaper, and the density of copper cover aluminum only is 37～40% of fine copper, and its length is 2.5～2.7 times of equivalent weight fine copper.The development need that adapts to modern electronic technology more.Be applicable to fields such as punching press handware, cathode of lithium battery collector, conductive tape, heat-transfer matcrial, electronic circuit.
2. compare with aluminium foil strip and have better electric conductivity, when the above high frequency of 5MHz, identical with pure copper wire; Its DC conductivity is 65.0%IACS.
3. the foil of copper cover aluminum has with the same solderability of fine copper, and does not need to do particular processing again, has solved the defective that single aluminium foil strip can't be welded.
4. thickness is even, must not smear adhesive on base material, and binding site does not produce bubble, and performance is more stable.
The present invention is in conjunction with the aluminium foil strip of composition metal and the characteristics of Copper Foil band, can substitute part Copper Foil band through processing and be used for industry, both reduced product cost, saved copper resource in short supply again greatly, in addition because density is low, can effectively reduce the weight of follow-up device, meet the development need of electronic product, have important social meaning and considerable economic.
Description of drawings:
Fig. 1 is the utility model is attached with the coat of metal at the aluminium foil strip tow sides a structural representation;
Fig. 2 is the utility model is attached with the coat of metal at one of them face of aluminium foil strip a structural representation.
Wherein: 1-aluminium foil strip matrix, the 2-coat of metal.
The specific embodiment:
Below in conjunction with embodiment the present invention is further specified again, but be not limited thereto.
Embodiment 1:
The two-sided copper facing of aluminium foil strip of hard attitude (H18) composition metal.
(1) selects hard attitude (H18) aluminium foil strip, thickness 0.006 mm, width 1000mm, length 1000m for use.
(2) carry out continuumpiston in vacuum and handle, gas pressure is 1.0 * 10
-1Pa, gases used is argon gas.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) will sputter copper facing in vacuum chamber, 216 ℃ of temperature, vacuum 6 * 10
-1Pa carries out double-faced sputter.Aluminium foil strip translational speed 0.5m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place on the banded plating line copperizing continuously then, adjust electric current 1000A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was the aluminium foil strip of two-sided copper-plated composition metal, and wherein the thickness of coating of a coat of metal is 50 dusts.
Embodiment 2:
The aluminium foil strip copper facing of hard attitude (H18) composition metal.
(1) selects hard attitude (H18) aluminium foil strip, thickness 0.006mm, width 1000mm, length 1000m for use.
(2) carry out plasma treatment under argon gas and hydrogen gas mixture, gas pressure is 4 * 10
3Pa.Different is the mist that adopts argon gas and hydrogen.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) will sputter copper facing in vacuum chamber, 200 ℃ of temperature, vacuum 9 * 10
-4Pa carries out double-faced sputter.Aluminium foil strip translational speed 50m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place continuous then nickel plating evanohm, silver on the banded plating line, adjust electric current 1000A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was the aluminium foil strip of two-sided copper facing composition metal, and wherein the thickness of coating of a coat of metal is 5000 dusts.。
Embodiment 3:
The aluminium foil strip nickel plated copper alloy of half-hard state (H24) composition metal.
(1) selects half-hard state (H24) aluminium foil strip, thickness 0.006mm, width 1000mm, length 1000m for use.
(2) carry out plasma treatment under argon gas, gas pressure is 4 * 10
2Pa.
(3), place to unreel indoor and traction is fixed through deflector roll, cold roller sputtering chamber, deflector roll, to Scroll with this material clot.This moment, sputtering target material was positioned at the single face of aluminium foil strip.
(4) will sputter copper facing in vacuum chamber, 116 ℃ of temperature, vacuum 10 * 10
-3Pa.Aluminium foil strip translational speed 50m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place on the banded plating line copperizing continuously nickel alloy then, adjust electric current 1000A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, products obtained therefrom was the aluminium foil strip of single face copper facing, corronil composition metal, and the thickness of coating of the coat of metal is 2500 dusts.
Embodiment 4:
Polypropylene screen protection nickel plating adds copper, and different is that matrix is that single face covers polypropylene screen.
(1) selects soft attitude (0) aluminium foil strip, thickness 0.009mm, width 1100mm, length 1000m for use.
(2) single face with aluminium foil strip is covering the last layer organic film on the laminating machine continuously.
(3) carry out plasma treatment under argon gas, gas pressure is 2Pa.
(3) this material clot is placed unreel indoor and traction is fixed sputter copper facing in vacuum chamber, 116 ℃ of temperature, vacuum 10 * 10 through deflector roll, sputtering chamber, deflector roll, to Scroll
-2Pa carries out sputter in the one side of overlay film not.Aluminium foil strip translational speed 30m/min, sputtering voltage 600V, electric current 14-15A.
(4) semi-finished product that vacuum is plated place continuous then nickel plating, copper on the banded plating line, adjust electric current 1000A, voltage 8V, speed 30m/h.
(5) with above-mentioned material flushing, oven dry, clot, throw off organic film, products obtained therefrom is the aluminium foil strip of single face nickel plating, copper composite metal, and the thickness of coating of the coat of metal is 500 dusts.Just because the protection of organic film, the one side of Dian Duing can not avoided the danger that is damaged by corrosion in electrolyte.
Embodiment 5:
The aluminium foil strip of hard attitude (H18) composition metal is zinc-plated zinc-plated.
(1) selects hard attitude (H18) aluminium foil strip, thickness 0.006mm, width 1000mm, length 1000m for use.
(2) carry out plasma treatment under argon gas, gas pressure is 20Pa.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) will sputter copper facing in vacuum chamber, 216 ℃ of temperature, vacuum 9 * 10
-4Pa carries out double-faced sputter.Aluminium foil strip translational speed 0.5m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place continuous zinc coating then, stainless steel on the banded plating line, adjust electric current 1000A, voltage 8V, speed 30m/h; Continuous tin plating is adjusted electric current 500A, voltage 3-8V, speed 30m/h then; Different is outside copper layer plating one deck tin layer again.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was the aluminium foil strip of double side zinc coating, stainless steel, zinc-plated composition metal, and wherein the thickness of coating of a coat of metal is 3000 dusts.
Embodiment 6:
The aluminium foil strip plating monel metal of hard attitude (H18) composition metal adds copper.
(1) selects hard attitude (H18) aluminium foil strip for use, thickness 0.006mm, width 1000mm, length 1000m, the target of selecting for use 400 type monel metals to make.
(2) plasma treatment: carry out plasma treatment under argon gas, gas pressure is 300Pa.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) vacuum plating monel metal: with aluminium foil strip sputter monel metal in vacuum chamber, temperature 60-216 ℃, vacuum 9 * 10
-2Pa carries out double-faced sputter.Aluminium foil strip translational speed 15m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place on the banded plating line copperizing continuously then, adjust electric current 1000A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was the metallic foil of aluminium, monel metal, copper three-layer weave structure, and wherein the thickness of coating of a coat of metal is 1000 dusts.。
Embodiment 7:
Aluminium foil strip chromium plating, the copper facing of half-hard state (H24) composition metal add dilval.
(1) selects half-hard state (H24) aluminium foil strip, thickness 0.006mm, width 1000mm, length 1000m for use.
(2) carry out plasma treatment under argon gas, gas pressure is 2000Pa.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) with aluminium foil strip sputter copper facing in vacuum chamber, temperature 60-216 ℃, vacuum 6 * 10
-1Pa carries out double-faced sputter.Aluminium foil strip translational speed 40m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place continuous then ferro-nickel alloy, copper on the banded plating line, adjust electric current 1000A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was the three-decker of chromium, dilval, copper, and wherein the thickness of coating of a coat of metal is 4000 dusts, had realized the function combination of conduction, magnetic conduction.
Embodiment 8:
The aluminium foil strip chromium plating of half-hard state (H24) composition metal adds nickel and adds copper alloy.
(1) selects half-hard state (H24) aluminium foil strip, thickness 0.006mm, width 1000mm, length 1000m for use.
(2) carry out plasma treatment under argon gas, gas pressure is 1000Pa.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber chromium plating district, nickel plating district, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) with aluminium foil strip sputter copper facing in vacuum chamber, temperature 60-216 ℃, vacuum 9 * 10
-4Pa carries out double-faced sputter.Aluminium foil strip translational speed 20m/min, sputtering voltage 600V, electric current 14-15A.
(5) semi-finished product that vacuum is plated place on the banded plating line then chromium plating continuously to add nickel to add copper alloy, adjust electric current 1000 A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was the multilayer layer structure of multilayer corrosion-resistance multilayer alloy, and wherein the thickness of coating of a coat of metal is 800 dusts, had realized conduction, the combination of corrosion resistant function.
Embodiment 9:
The aluminium foil strip plating stainless steel of half-hard state (H24) composition metal adds copper.
(1) selects half-hard state (H24) aluminium foil strip, thickness 0.006mm, width 1000mm, length 1000m for use.
(2) carry out plasma treatment under argon gas, gas pressure is 500Pa.
(3) with this material clot, place unreel indoor and traction through deflector roll, sputtering chamber, deflector roll, fix to Scroll, the target of sputtering chamber is evenly distributed in the two sides of aluminium foil strip.
(4) with aluminium foil strip sputter plating stainless steel in vacuum chamber, temperature 60-216 ℃, vacuum 8 * 10
-2Pa carries out double-faced sputter.Aluminium foil strip translational speed 8m/min, sputtering voltage 600V, electric current 14-15A.Different is to adopt vacuum plating stainless steel.
(5) semi-finished product that vacuum is plated place on the banded plating line copperizing continuously then, adjust electric current 1000A, voltage 8V, speed 30m/h.
(6) with above-mentioned material flushing, oven dry, clot.This moment, product was three structures layer by layer of stainless steel, copper, and wherein the thickness of coating of a coat of metal is 2000 dusts.Conduction, the combination of corrosion resistant function have been realized.
Claims (9)
1. the aluminium foil strip of a composition metal is characterized in that the tow sides of aluminium foil strip matrix (1) appearance or one of them face are attached with the coat of metal (2).
2. the aluminium foil strip of composition metal according to claim 1 is characterized in that the described coat of metal (2) is a kind of monometallic coating of one deck or alloying metal coating.
3. the aluminium foil strip of composition metal according to claim 1 is characterized in that the described coat of metal (2) is one or more layers several coats of metal or alloying metal coating.
4. the aluminium foil strip of composition metal according to claim 1, the thickness of coating that it is characterized in that the described coat of metal (2) is the 50-5000 dust.
5. the preparation method of the aluminium foil strip of the described composition metal of claim 1 is characterized in that this method carries out as follows:
A. aluminium foil strip is carried out plasma treatment under the mist of nitrogen, argon gas, argon gas and hydrogen, argon gas and oxygen, the control gas pressure is 1.0 * 10
-1-4 * 10
3Pa;
B. will be through aluminium foil strip a kind of monometallic of vacuum sputtering one deck or alloying metal under argon shield of plasma treatment, but also one or more layers several monometallics or alloying metal of sputter, and control vacuum is 6 * 10
-1-9 * 10
-4Pa;
C. on the good base material of sputter, adopting the conventional electroplating technology continuous electroplating 1-3 kind coat of metal, and after clean, oven dry, product.
6. the preparation method of the aluminium foil strip of composition metal according to claim 6 is characterized in that monometallic described in the b operation or alloying metal are meant copper, nickel, gold, silver, tin, corronil, nichrome and stainless steel.
7. the preparation method of the aluminium foil strip of composition metal according to claim 6 is characterized in that the aluminium foil strip translational speed is 0.5m/min-50m/min in the b operation.
8. the preparation method of the aluminium foil strip of composition metal according to claim 6 is characterized in that the coat of metal described in the c operation is meant copper, nickel, tin, iron, zinc or chromium monometallic coating and zinc-nickel, zinc cobalt, zinc-iron, zinc titanium, zinc-nickel iron, copper zinc, copper tin, slicker solder, slicker solder copper, Cu-Sn-Zn or the nickel-phosphorus alloy coat of metal.
9. the aluminium foil strip of the described composition metal of claim 1 is as carrier copper foil, the application of flexibility coat copper plate, punching press handware, cathode of lithium battery collector, conductive tape, heat-transfer matcrial, electronic circuit and electromagnetic shielding material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101152266A CN101204860A (en) | 2007-12-12 | 2007-12-12 | Aluminum foil belt of compound metal and preparation method and uses |
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|---|---|---|---|
| CNA2007101152266A CN101204860A (en) | 2007-12-12 | 2007-12-12 | Aluminum foil belt of compound metal and preparation method and uses |
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