CN101203354A - 平移旋转二自由度载物台装置及采用该装置的三自由度载物台装置 - Google Patents

平移旋转二自由度载物台装置及采用该装置的三自由度载物台装置 Download PDF

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Publication number
CN101203354A
CN101203354A CNA2006800220414A CN200680022041A CN101203354A CN 101203354 A CN101203354 A CN 101203354A CN A2006800220414 A CNA2006800220414 A CN A2006800220414A CN 200680022041 A CN200680022041 A CN 200680022041A CN 101203354 A CN101203354 A CN 101203354A
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China
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translation
aforementioned
degree
freedom
turning
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Pending
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CNA2006800220414A
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English (en)
Chinese (zh)
Inventor
小宫刚彦
大须贺俊之
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Yaskawa Electric Corp
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Yaskawa Electric Corp
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Publication of CN101203354A publication Critical patent/CN101203354A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Environmental & Geological Engineering (AREA)
  • Machine Tool Units (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Machine Tool Positioning Apparatuses (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
CNA2006800220414A 2005-06-30 2006-06-19 平移旋转二自由度载物台装置及采用该装置的三自由度载物台装置 Pending CN101203354A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005192131 2005-06-30
JP192131/2005 2005-06-30

Publications (1)

Publication Number Publication Date
CN101203354A true CN101203354A (zh) 2008-06-18

Family

ID=37604286

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2006800220414A Pending CN101203354A (zh) 2005-06-30 2006-06-19 平移旋转二自由度载物台装置及采用该装置的三自由度载物台装置

Country Status (5)

Country Link
JP (1) JP4826584B2 (ja)
KR (1) KR20080002864A (ja)
CN (1) CN101203354A (ja)
TW (1) TW200707622A (ja)
WO (1) WO2007004413A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010006466A1 (zh) * 2008-07-16 2010-01-21 北京航空航天大学 非对称直线驱动的平动加转动进给功能部件
CN101750885B (zh) * 2010-01-06 2011-12-14 天津大学 二自由度精密定位工作台
CN101770166B (zh) * 2010-01-06 2011-12-28 天津大学 一种用于纳米压印光刻系统的两平动精密定位工作台
CN102998899A (zh) * 2012-12-05 2013-03-27 天津大学 二自由度纳米定位平台
CN110361397A (zh) * 2018-04-09 2019-10-22 Hb技术有限公司 可进行侧双夹持器驱动方式的θ轴对齐的AOI检测设备

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112193371A (zh) * 2020-10-09 2021-01-08 九江精密测试技术研究所 一种船用三自由度位移平台

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06294B2 (ja) * 1986-09-03 1994-01-05 新明和工業株式会社 位置決め装置
JP2675307B2 (ja) * 1987-08-28 1997-11-12 株式会社日立製作所 プリアライナー装置
JPH02202031A (ja) * 1989-01-31 1990-08-10 Nippon Seiko Kk 回動テーブル装置
JP2523978B2 (ja) * 1990-10-04 1996-08-14 松下電器産業株式会社 位置決めテ―ブル
JP3607449B2 (ja) * 1997-03-14 2005-01-05 株式会社東芝 画像処理アライメント装置
JPH11245128A (ja) * 1998-02-26 1999-09-14 Thk Co Ltd ２軸平行・１軸旋回運動案内機構およびこれを用いた２軸平行・１軸旋回テーブル装置
JPH11300558A (ja) * 1998-04-15 1999-11-02 Thk Co Ltd 移動テーブル装置
JP3733808B2 (ja) * 1999-10-26 2006-01-11 松下電器産業株式会社 ＸＹθ３軸移動テーブル
JP2002228411A (ja) * 2001-02-05 2002-08-14 Hitachi Kokusai Electric Inc 二次元測定装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010006466A1 (zh) * 2008-07-16 2010-01-21 北京航空航天大学 非对称直线驱动的平动加转动进给功能部件
CN101750885B (zh) * 2010-01-06 2011-12-14 天津大学 二自由度精密定位工作台
CN101770166B (zh) * 2010-01-06 2011-12-28 天津大学 一种用于纳米压印光刻系统的两平动精密定位工作台
CN102998899A (zh) * 2012-12-05 2013-03-27 天津大学 二自由度纳米定位平台
CN102998899B (zh) * 2012-12-05 2014-09-17 天津大学 二自由度纳米定位平台
CN110361397A (zh) * 2018-04-09 2019-10-22 Hb技术有限公司 可进行侧双夹持器驱动方式的θ轴对齐的AOI检测设备
CN110361397B (zh) * 2018-04-09 2021-11-30 Hb技术有限公司 可进行侧双夹持器驱动方式的θ轴对齐的AOI检测设备

Also Published As

Publication number Publication date
JPWO2007004413A1 (ja) 2009-01-22
JP4826584B2 (ja) 2011-11-30
KR20080002864A (ko) 2008-01-04
TWI302723B (ja) 2008-11-01
TW200707622A (en) 2007-02-16
WO2007004413A1 (ja) 2007-01-11

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Application publication date: 20080618