TW200707622A - Translating/turning 2-degree-of-freedom stage device and 3-degree-of-freedom stage device using the same - Google Patents
Translating/turning 2-degree-of-freedom stage device and 3-degree-of-freedom stage device using the sameInfo
- Publication number
- TW200707622A TW200707622A TW095123411A TW95123411A TW200707622A TW 200707622 A TW200707622 A TW 200707622A TW 095123411 A TW095123411 A TW 095123411A TW 95123411 A TW95123411 A TW 95123411A TW 200707622 A TW200707622 A TW 200707622A
- Authority
- TW
- Taiwan
- Prior art keywords
- translating
- turning
- degree
- stage device
- freedom
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Environmental & Geological Engineering (AREA)
- Machine Tool Units (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Machine Tool Positioning Apparatuses (AREA)
- Machine Tool Sensing Apparatuses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005192131 | 2005-06-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200707622A true TW200707622A (en) | 2007-02-16 |
TWI302723B TWI302723B (ja) | 2008-11-01 |
Family
ID=37604286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095123411A TW200707622A (en) | 2005-06-30 | 2006-06-28 | Translating/turning 2-degree-of-freedom stage device and 3-degree-of-freedom stage device using the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4826584B2 (ja) |
KR (1) | KR20080002864A (ja) |
CN (1) | CN101203354A (ja) |
TW (1) | TW200707622A (ja) |
WO (1) | WO2007004413A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2465450A (en) * | 2008-07-16 | 2010-05-26 | Univ Beihang | A translation and rotation feeding component of asymmetric and linear driving |
CN101750885B (zh) * | 2010-01-06 | 2011-12-14 | 天津大学 | 二自由度精密定位工作台 |
CN101770166B (zh) * | 2010-01-06 | 2011-12-28 | 天津大学 | 一种用于纳米压印光刻系统的两平动精密定位工作台 |
CN102998899B (zh) * | 2012-12-05 | 2014-09-17 | 天津大学 | 二自由度纳米定位平台 |
KR102052135B1 (ko) * | 2018-04-09 | 2019-12-04 | 주식회사 에이치비테크놀러지 | 사이드 듀얼 그립퍼 구동방식의 θ축 얼라인 조정이 가능한 AOI 검사 장비 |
CN112193371A (zh) * | 2020-10-09 | 2021-01-08 | 九江精密测试技术研究所 | 一种船用三自由度位移平台 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06294B2 (ja) * | 1986-09-03 | 1994-01-05 | 新明和工業株式会社 | 位置決め装置 |
JP2675307B2 (ja) * | 1987-08-28 | 1997-11-12 | 株式会社日立製作所 | プリアライナー装置 |
JPH02202031A (ja) * | 1989-01-31 | 1990-08-10 | Nippon Seiko Kk | 回動テーブル装置 |
JP2523978B2 (ja) * | 1990-10-04 | 1996-08-14 | 松下電器産業株式会社 | 位置決めテ―ブル |
JP3607449B2 (ja) * | 1997-03-14 | 2005-01-05 | 株式会社東芝 | 画像処理アライメント装置 |
JPH11245128A (ja) * | 1998-02-26 | 1999-09-14 | Thk Co Ltd | 2軸平行・1軸旋回運動案内機構およびこれを用いた2軸平行・1軸旋回テーブル装置 |
JPH11300558A (ja) * | 1998-04-15 | 1999-11-02 | Thk Co Ltd | 移動テーブル装置 |
JP3733808B2 (ja) * | 1999-10-26 | 2006-01-11 | 松下電器産業株式会社 | XYθ3軸移動テーブル |
JP2002228411A (ja) * | 2001-02-05 | 2002-08-14 | Hitachi Kokusai Electric Inc | 二次元測定装置 |
-
2006
- 2006-06-19 JP JP2007523400A patent/JP4826584B2/ja not_active Expired - Fee Related
- 2006-06-19 KR KR1020077024407A patent/KR20080002864A/ko active Search and Examination
- 2006-06-19 WO PCT/JP2006/312230 patent/WO2007004413A1/ja active Application Filing
- 2006-06-19 CN CNA2006800220414A patent/CN101203354A/zh active Pending
- 2006-06-28 TW TW095123411A patent/TW200707622A/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPWO2007004413A1 (ja) | 2009-01-22 |
JP4826584B2 (ja) | 2011-11-30 |
KR20080002864A (ko) | 2008-01-04 |
TWI302723B (ja) | 2008-11-01 |
WO2007004413A1 (ja) | 2007-01-11 |
CN101203354A (zh) | 2008-06-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |