CN101152919B - Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device - Google Patents
Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device Download PDFInfo
- Publication number
- CN101152919B CN101152919B CN2007101630075A CN200710163007A CN101152919B CN 101152919 B CN101152919 B CN 101152919B CN 2007101630075 A CN2007101630075 A CN 2007101630075A CN 200710163007 A CN200710163007 A CN 200710163007A CN 101152919 B CN101152919 B CN 101152919B
- Authority
- CN
- China
- Prior art keywords
- mask
- photomask
- box
- holding member
- shell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Library & Information Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to a mask casing (1) which can movably accept a light mask (10) and a mask box (100), and is provided with a mask holding component (4) and a box holding component (5). When the light mask (10) is gotten out from the mask box (100), the light mask (10) is gotten out in the original state in the mask box (100).
Description
Technical field
The present invention relates to a kind of manufacture method that is used for mask shell, mask box, pattern trasscription mehod method and the read out instrument of photomask (below be also referred to as mask), particularly relate to and a kind ofly in the Fabrication procedure of display panels (LCDP) or plasma display (PDP) etc., using, transport large-scale photomask and when using photomask, be convenient to the exposure device dismounting, and the manufacture method of mask shell, mask box, pattern trasscription mehod method and the read out instrument of the particle pollution can suppress dismounting time the or breakage etc.
Background technology
In recent years, in the Fabrication procedure of read out instruments such as LCDP or PDP, the method that the increase of panel face number reduces as manufacturing cost, by vague generalization, panel is increasing with the size of mother substrate.Meanwhile, in the Fabrication procedure of read out instruments such as LCDP or PDP, the photomask that uses in the pattern trasscription mehod is also increasing.In addition, the photomask of above-mentioned maximization when being transported to mask user there from mask maker, is not hit when transporting in order to protect, and is fixed on the transportation of mask shell (mask case) in-to-in state to place.
As be used to transport, the mask shell of mask such as keeping photomask, develop the mask shell of various structures.
For example, open in the 2005-173556 communique the spy, the technology of a kind of large-scale precision laminar (partly) goods with airtight container disclosed, this airtight container, constitute by main part and cover body part with perimeter flange portion against each other, be used for placing large-scale precision laminar (partly) goods, it is characterized in that in inside: main part and cover body part respectively by the reinforcing that is provided with the thermoplastic resin thin slice with the vacuum of rib or press empty formed body to constitute.
This can not apply unsuitable stress, safety and keep the air tight state by laminar to large-scale precision (partly) goods, places support than weight-saving large-scale precision laminar (partly) goods airtight container, transports.
In addition, make the mask maker of masks such as photomask, under the mask that will make etc. was captured in state in the above-mentioned mask shell, the mask user was given in delivery.
On the other hand, the mask user uses the photomask of paying from mask maker, and the pattern trasscription mehod of expectation to by on the transcription, is made read out instrument etc.In this Fabrication procedure, the mask user is transported to exposure machine (for example mask adjusting to a line instrument) with the state that photomask is captured in the special mask box (mask cassette), and the photomask after maybe will using is transported to miscellaneous equipment from exposure machine.In addition, large-scale exposure device transports in device inside photomask is arranged on the state in the special mask box.
Above-mentioned special mask box corresponding to exposure device etc., uses the mask box of various structures.
For example, the spy opens in the 2000-19720 communique, a kind of technology of substrate-replacing apparatus is disclosed, the technology of this substrate-replacing apparatus is used in the Fabrication procedure of liquid crystal display cells or semiconductor element, and (being referred to as mask) such as mask, netting twine or glass substrates of exposure device or testing fixture etc. given in exchange automatically.In addition, put down in writing a kind of dustproof mask box of using in the document, it is using in the mask exchange process of exposure device etc., the management code that assembling can read.
This mask box by the mask lid and with the state mounting mask of location, the flat mask box dish of essentially rectangular constitutes.
In addition, the aforesaid substrate switch possesses the mask conveyer, and this mask conveyer maintains the mask state that takes out from mask box, moves to exposure device, on the lift-launch platform of the substantially planar of exposure device, carries mask.
But as mentioned above, mask maker delivers goods mask to the mask user masks such as photomask are captured in the state in the mask shell.Therefore, the mask user at first will take out mask in order to use the mask of paying from mask shell, change in the special-purpose mask box after, use.
But, maximization along with Liquid Crystal Display (LCD) (LCD), flat-panel monitor (FPD), plasma panel telltale (PDP), thin film transistor base plate (TFT), color filter (CF) etc., use for example about 500mm * 750mm or above this large-scale photomask in it is made more and more, the tendency of maximization is more remarkable.And if the operation of and photomask that weight big large-scale with the staff execution, then operator's load is big.
Especially, the mask user essential carries out following operation as mentioned above, promptly receive and form the photomask of desired pattern from mask maker, from transportation with the mask shell with its taking-up, change in the mask box that exposure device uses.This is considering that above-mentioned large-scale photomask is very exquisite goods, must or damagedly extremely note and large-scale more when then being difficult to situation such as processing more the problem that the burden that exists the operator to bear is excessive to contact.
Summary of the invention
In view of the above problems, the object of the present invention is to provide the manufacture method of a kind of mask shell, mask box, pattern trasscription mehod method and read out instrument, can carry out easily that mask is changed to operation the mask box from mask shell.
To achieve these goals, mask shell of the present invention, can place photomask and mask box with transporting, this mask box uses in the device (for example manufacturing installation and/or testing fixture etc.) that the described photomask of lift-launch uses, and the described photomask of mounting uses, wherein: when from described mask shell, taking out described photomask, taken out by the state of mounting in described mask box with described photomask.
In view of the above, mask user's operator for example need not to change to from the mask that mask maker sentences the state delivery that is captured in the mask shell operation of exposure device etc., so in the load that alleviates the operator significantly, the operation raising.
In addition, can reduce changing to the danger of by mistake damaging mask in the operation significantly, can carry out operation safely.
And if mask maximizes, then also imagination imports special-purpose processing equipment etc., carries out the above-mentioned operation that changes to safely, even and do not import this processing equipment etc., also can carry out safely and change to operation.
In addition, in the present invention,, comprise photomask (photo mask), netting twine (reticle), photomask half-blank (photo mask blank), glass substrate etc. as mask.
In addition, as manufacturing installation, comprise exposure device, mask generator, substrate-replacing apparatus, mask conveyer of electronics package manufacturing usefulness etc.
Have, so-called " mounting " also comprises the state support with the location, or places with the state of location except that mounting only again, keep, or place with the state that keeps etc.Therefore, be arranged in the mask box with various structures, also be contained in " mounting ".In addition, for example mask maker also can remain on mask under the state in the mask box and place, place with the state that this mask box is remained in the mask shell, this mask shell is delivered goods to the mask user, the mask user takes out mask to each mask box from mask shell, directly offer exposure device etc.
In addition, so-called mask box, be meant in manufacturing installation and/or the testing fixture use, the box of mounting photomask at least, for example have for state to be equipped on device or to take out and the mask box dish or the removable mask that use carry platform etc. with the above-mentioned mask box of mounting.Comprise the parts that are assigned to exposure device etc. or constitute appurtenances.
In addition, mask shell of the present invention preferably possesses: the mask holding member that keeps described photomask; The box holding member that keeps described mask box; Be provided with the housing body of described mask holding member and box holding member; And, be assemblied on this housing body detachable and cover the case lid of described photomask.
In view of the above, can not produce damage or particle pollution ground in mask, with the fully enclosed state, held stationary places mask and mask box.Thus, even if aloft or under the situation of transportation such as land mask, also can suppress mask at mask box internal vibration, breakage or because of friction produces particle, and then the pattern that exquisiteness is formed causes problems such as damage.
In addition, mask shell of the present invention preferably supporting described photomask with the non-contacting state of described mask box, when taking out described photomask, makes described mask box move along prescribed direction, then described photomask by mounting in described mask box.
In view of the above, because the mask holding member can keep the mask with the mask box contactless state, so can prevent problems such as mask box and mask friction generation particle more reliably.
Preferably have the mask anchor, be used to support this photomask when placing described photomask, make described mask box when prescribed direction moves, this mask anchor guiding should be moved.Have, this mask anchor preferably connects the part of mask box, supports mask again.
In view of the above, but simplified construction realizes that the cost of making original cost descends, and simultaneously, when from mask shell taking-up mask box, can easily make the mask mounting in mask box.
In addition, described mask holding member also can keep the described photomask of mounting in the state of described mask box.
In view of the above, by removing the hold mode that is realized by the mask holding member, mask is set in the mask box, so can easily carry out operation.
In addition, to achieve these goals, mask box of the present invention is in device, for example manufacturing installation and/or testing fixture etc. that the lift-launch photomask uses, the mounting photomask uses, wherein, possess through hole or peristome, be used for when placing described photomask and mask box in mask shell, allow in order to keep or to support photomask and the maintenance or the holding components that are arranged in the mask shell arrive described photomask.
Like this, the present invention also comprises mask box, even if under this mask box is captured in state in the mask shell, also can keep or support mask reliably.
To achieve these goals, mask box of the present invention, to place in the mask shell that places described photomask with the non-contacting state of photomask, and, when from described mask shell, taking out described photomask, taken out with the state of described photomask mounting in described mask box, preferably possess the face of being directed, when taking out described photomask, made described mask box move the guide member guiding of usefulness along prescribed direction.
Like this, the present invention is also effective as mask box, owing to need not to carry out mask is changed to operation in the mask box, thus can be in the load that alleviates the operator significantly, the operation raising.In addition, can prevent more reliably that the friction of mask box and mask from producing problems such as particle.
In addition, preferred described guide member is supporting the mask anchor of described photomask with the non-contacting state of described mask box, and, the described face that is directed, be formed in the described mask box, the hole surface of through hole that described mask anchor connects.
In view of the above, but simplified construction, the cost decline that can realize making original cost.
To achieve these goals, pattern trasscription mehod method of the present invention has the operation of taking out this photomask from the mask shell that is used for transporting photomask; The described photomask that is positioned in the described mask box with use and carries, utilize exposure device to carry out the exposure process of pattern trasscription mehod, in this method: when from described mask shell, taking out described photomask, taken out by the state of mounting in described mask box with described photomask.
Like this, the present invention is also effective as the pattern trasscription mehod method, need not to carry out mask is changed to operation in the mask box, thus can be in the load that alleviates the operator significantly, the operation raising.
To achieve these goals, the manufacture method of read out instrument of the present invention has the operation of taking out this photomask from the mask shell that is used for transporting photomask; The described photomask that is positioned in the described mask box with use and carries, utilize the exposure process that by transcription carried out pattern trasscription mehod of exposure device to using in the read out instrument, in this method: when from described mask shell, taking out described photomask, taken out by the state of mounting in described mask box with described photomask.
Like this, the present invention also comprises the manufacture method of read out instrument, need not to carry out mask is changed to operation in the mask box, thus can be in the load that alleviates the operator significantly, the operation raising.
As read out instrument, Liquid Crystal Display (LCD), flat-panel monitor, plasma panel telltale etc. are for example arranged.
To achieve these goals, the mask shell that places photomask of the present invention, it is characterized in that: possess holding member, it keeps the position relation of horizontal direction of the mask box of photomask and the described photomask of mounting, simultaneously, mask shell is fixed described photomask and mask box, described holding member relatively, keep the position relationship of described horizontal direction, dismantled and assembled described photomask and described mask box.
To achieve these goals, photomask method to set up of the present invention, utilization implements to make or check the device of the processing of usefulness to photomask, at the assigned position of implementing described processing photomask is set, comprise as the next stage: photomask is positioned on the mask box, and fixed light mask and mask box are with respect to the position relation of the bottom surface direction of mask box; Keep described position relation, and assigned position fixed light mask and mask box in mask shell; With the mask shell that places mask box be transported to described device near; Keep the position relation of described horizontal direction and, from mask shell, take out photomask and mask box photomask is positioned in the state on the mask box; With implementing the assigned position of described processing, photomask be positioned on the mask box be provided with.
As mentioned above, according to the present invention, the mask user by the mask from receiving from the mask builder, frees from mask shell changes to huge load the mask box.Especially surpassing in the large-scale mask of about 300mm on one side the advantage that the present invention can realize lightening the load, safety is big.In addition, can obtain adhering to or careless breakage can reduce this outstanding effect significantly toward the particle of the mask of mask box when changing to.
Description of drawings
Fig. 1 is the scheme drawing of mask confined state of the mask shell of explanation first embodiment of the invention, (a) expression section drawing, (b) expression A-A section drawing.
Fig. 2 is the mask holding member of mask shell of explanation first embodiment of the invention and the signal enlarged drawing of box holding member, (a) expression lateral plan, (b) expression planar view.
Fig. 3 represents to illustrate the schematic section that takes off the mask state of the mask shell of first embodiment of the invention.
Fig. 4 is the scheme drawing of mask confined state of the mask shell of explanation second embodiment of the invention, (a) expression section drawing, (b) expression B-B section drawing.
Fig. 5 is the mask holding member of mask shell of explanation second embodiment of the invention and the signal enlarged drawing of box holding member, (a) expression lateral plan, (b) expression planar view.
Fig. 6 represents to illustrate the schematic section that takes off the mask state of the mask shell of second embodiment of the invention.
The specific embodiment
Fig. 1 is the scheme drawing of mask confined state of the mask shell of explanation first embodiment of the invention, (a) expression section drawing, (b) expression A-A section drawing.
In addition, Fig. 2 is the mask holding member of mask shell of explanation first embodiment of the invention and the signal enlarged drawing of box holding member, (a) expression lateral plan, (b) expression planar view.
Among Fig. 1,2, mask shell 1 is made of housing body 2, case lid 3, mask holding member 4 and box holding member 5, can transport and place photomask 10 and mask box 100 (also comprising transportation).
In addition, though in the present embodiment, what use as mask is the large-scale photomask 10 of read out instrument manufacturing usefulness, is not limited to photomask 10.
＜housing body 〉
In addition, housing body 2 is provided with the assembly support 22 of the circumference of mounting mask box 100 at 8 places.In the present embodiment, dispose assembly support 22 respectively, but be not limited to this configuration, for example, also can adopt different configurations corresponding to the shape or the size of photomask 10 at two places on rectangular light mask 10 each limit.
In addition, assembly support 22 is established mask anchor 23 in the end nipple of photomask 10 sides.
This mask anchor 23 is pins of the shape that attenuates of top ends, connects the through hole 102 of mask box 100, photomask 10 is supported the state (contactless state) that floats for from mask box 100.In addition, mask anchor 23 embeds in the through holes 102, when along removing direction (with reference to Fig. 3) when lifting mask box 100, and the direction ground channelling mask box 100 that do not misplace.By using mask anchor 23 as holding components, can allow structure simplify, can realize that the cost of making original cost descends.
In addition, the material of assembly support 22 and mask anchor 23 uses metal usually, but the part that for example also can contact with photomask 10 at mask box 100 is installed the buffer unit (not shown) that is made of materials such as resins.
Though not shown, the resin board that housing body 2 is reinforced by aluminium chassis by circumference constitutes, become vertical attitude with the principal plane of the mask that places, in the both sides, bottom a pair of Caster is set, and, top and bottom assembling handle in both sides.In addition, housing body 2 utilizes screw or ratchet, buckle lock etc. to link parts, assembling shell lid 3.Have, housing body 2 is utilized sealing elements such as O type circle with case lid 3, links with the fully enclosed state again.
＜case lid 〉
Case lid 3, be disassembled and assembled freely be assemblied in lid on the housing body 2.This case lid 3 is the rectangular box shape of covering shell main body 2, is made of rectangular-shaped upper plate and the side plate that is darted on the upper plate circumference.
In addition, although not shown, the resin board that case lid 3 is reinforced by aluminium chassis by circumference constitutes, and in the both sides, bottom a pair of Caster is set, and, top and bottom assembling handle in both sides.
＜mask holding member 〉
Mask holding member 4 is the parts that keep photomask 10, can be fixed on the housing body 2 with freely adjusting the position.This mask holding member 4 possess mounting stubborn on assembly support 22 connect portion 44, with hook-shaped from twist mounting surface 41 and the positioning salient 42 that the portion that connects 44 prominent top ends of establishing form and be darted at twist connect portion 44 below and the guide portion 45 chimeric with guide groove 221.
Mounting surface 41 with the end face butt of photomask 10, when mask box 1 is erected into the mask principal plane when vertical, is positioned at the loading that the mounting surface 41 of downside is born photomask 10.In addition, positioning salient 42 has the inclined-plane that broadens towards the direction of photomask 10.This inclined-plane clamping photomask 10 forms, and carries out the location (with the meet at right angles location of direction, the surface of photomask 10) of photomask 10.
Twist and to meet portion 44, wear the hole that screw 43 connects, insert screw 43 in this hole and be screwed into and place with moving freely in trundle places trundle 46 in the ditch 222.Thus, mask holding member 4 on being fastened to assembly support 22 in, unclamp screw 43, can move along direction of slip thus.In addition, the height and position of mounting surface 41 and positioning salient 42 is corresponding to the height and position that is supported in the photomask 10 on the mask anchor 23, so by mask holding member 4 is moved along the direction of photomask 10, stubborn connecing can easily keep photomask 10.
＜box holding member 〉
Twist and connect the hole that portion 54 is equipped with screw 53 perforations, the screw 53 that inserts in this hole is screwed in the trundle 56, and this trundle 56 places in trundle with can move freely and places in the ditch 222.Thus, box holding member 5 on being fastened to assembly support 22 in, unclamp screw 53, can move along direction of slip thus.In addition, because the height and position of mounting surface 51 is corresponding to the height and position that is positioned in the mask box 100 on the assembly support 22, so by box holding member 5 is moved along the direction of mask box 100, stubborn connecing can easily keep mask box 100.
＜mask box 〉
In addition, in the mask box 100 of present embodiment, by mounting photomask 10, and then, utilize locating dowel pin 101 location, thereby photomask 10 is set, but the mode that is provided with is not limited to this formation.
In addition, the material of mask box 100, mask holding member 4 and box holding member 5 uses metal usually, but for example also can assemble the buffer unit (not shown) that is made of materials such as resins in the part that contacts with mask box 100 or photomask 10.
The action of the mask shell 1 of above-mentioned formation is described.
At first, mask shell 1 places photomask 10 and mask box 100 under the state shown in Fig. 1 (a).In addition, mask shell 1 transports with the state of erectting when betransporteding usually.
Then, with reference to accompanying drawing the action of taking out photomask 10 from mask shell 1 is described.
Fig. 3 represents to illustrate schematic section mask shell, that take off the mask state of first embodiment of the invention.
Among Fig. 3, mask user's mask shell 1 is given in delivery, at first is placed with mask principal plane level, from the state of Fig. 1 (a), takes off case lid 3.Then, unclamp each screw 43 and screw 53, move mask holding member 4 and box holding member 5, up to the position of the mask box 100 that does not disturb and take out upward along direction of slip.
Then, mask box 100 is raised to removing direction (directly over to) by the operator.At this moment because mask anchor 23 channelling mask boxes 100, up to mask box 100 and photomask 10 butts and pin 101 location that are positioned, thus can not produce unusual the impact to photomask 10, can make mask box 100 successfully with photomask 10 butts.That is, the operator is according to the guiding of locating dowel pin 101, and only by slowly raising mask box 1 00, photomask 10 just can place on the mask box 100 in the state download by locating dowel pin 101 location.Thus, when photomask 10 takes out, be set at state in the mask box 100 with photomask 10 from mask shell 1, photomask 10 is removed.
In addition, the photomask 10 that is arranged in the mask box 100 uses in exposure device etc., for example, in the time will arrive next certainly and make day, by returning above-mentioned steps, can easily and safely photomask 10 be captured in the mask shell 1.Promptly, the operator is if descend the mask box 100 that is provided with photomask 10, make mask anchor 23 run through through hole 102, then since mask anchor 23 along under to channelling mask box 100, so photomask 10 is not produced unusual the impact, can float from mask box 100, make mask box 100 successfully mounting on assembly support 22.That is, the operator only needs the guiding according to locating dowel pin 101, slowly descends by making mask box 100, supports photomask 10 with regard to available mask anchor 23, and, make mask box 100 mountings on assembly support 22.
As mentioned above, mask shell 1 according to present embodiment, mask user's operator, owing to need not to carry out for example will sentence and place the photomask 10 of receiving in the state of mask shell 1 from mask maker, change to the operation (changing to operation) in the mask box 100 of exposure device etc. owing to can carry out as easy as rolling off a log and safely, so alleviate operator's load significantly, simultaneously, operation also is improved.
In addition, can reduce changing to the danger of by mistake damaging mask 10 in the operation significantly, carry out operation safely.
In addition, by mask holding member 4 and box holding member 5 are set, can keep photomask 10 and mask box 100 reliably, even if so aloft or under the situation of transportation such as land photomask 10, also can avoid photomask 10 breakages or because of friction produces a large amount of particles, and then the pattern that exquisiteness is formed causes problems such as damage.
Have again, because mask shell 1 is provided with mask anchor 23, with the state that floats from mask box 100, in other words, support photomask 10 with the non-contacting state of mask box, and, along prescribed direction channelling mask box 100, so photomask 10 does not contact with mask box 100 in transporting.Thus, can prevent reliably further that mask box 100 and photomask 10 frictions from producing problems such as particle.As mentioned above, can in transporting, utilize mask shell directly to be maintained fixed photomask, and keep with minimal area of contact, simultaneously, when taking out photomask, utilize the action of from mask shell, taking out mask box, can realize automatically photomask being arranged on the form in the mask box.Thus, the operator reduces significantly by take out photomask from mask shell, can make the operation that is provided with and so in mask box.And, because from mask shell, take out photomask, toward mask shell when placing photomask, photomask is subjected to mask box protection all the time, so can suppress scar or damaged generation significantly.Such scheme especially has remarkable result above in the large-scale mask of 1000mm on one side.
[second embodiment of mask shell]
Fig. 4 is the scheme drawing of mask confined state of the mask shell of explanation second embodiment of the invention, (a) expression section drawing, (b) expression B-B section drawing.
In addition, Fig. 5 is the mask holding member of mask shell of explanation second embodiment of the invention and the signal enlarged drawing of box holding member, (a) expression lateral plan, (b) expression planar view.
Among Fig. 4,5, the mask shell 1a of second embodiment compares with the mask shell 1 of first embodiment, and mask box 100a has the structure that places photomask 10 with the state of location, and meanwhile, mask holding member 4a, box holding member 5a and structure are different.Other inscape is basic the same with first embodiment.
Therefore, among Fig. 4, Fig. 5, to Fig. 1, the additional same-sign of 2 the same component parts, omit its detailed description.
＜mask box 〉
In addition, mask box 100a on the position corresponding to mask holding member 4a, forms peristome 115.Thus, among the mask box 100a, in order to keep the photomask 10 of mounting on mounting surface 111, mask holding member 4a can move.
＜mask holding member 〉
Mask holding member 4a is the parts that keep photomask 10, can be fixed on the housing body 2 with freely adjusting the position.Because this mask holding member 4a, the height and position that makes mounting surface 41 and positioning salient 42 is corresponding to the height and position that is captured in the photomask 10 among the mask box 100a, so by utilizing peristome 115, mask holding member 4a is moved along the direction of photomask 10, stubborn connecing, thus can easily keep photomask 10.
＜box holding member 〉
The action of the mask shell 1a of above-mentioned formation is described.
At first, mask shell 1a places photomask 10 and mask box 100a under the state shown in Fig. 4 (a).
Then, with reference to accompanying drawing the action of taking out photomask 10 from mask shell 1a is described.
Fig. 6 represents to illustrate schematic section mask shell, that take off the mask state of second embodiment of the invention.
Among Fig. 6, delivery gives mask user's mask shell 1a at first by horizontal positioned, from the state of Fig. 4 (a), takes off case lid 3.Then, unclamp each screw 43, move mask holding member 4a, up to the position of not disturbing with the mask box 100a that takes out upward along direction of slip.By this action, remove the hold mode of mask holding member 4a, so can be under by the state of locating surface 112 location photomasks 10 with its mounting in mask box 100a.
Afterwards, unclamp each screw 53, move box holding member 5a, up to the position of not disturbing with the mask box 100a that takes out upward along direction of slip.Utilize this action, remove the hold mode of box holding member 5a, place photomask 10 in mask box 100a so can from mask shell 1a, take out easily and safely with positioning states.
In addition, the photomask 10 that is arranged among the mask box 100a uses in exposure device etc., for example, when keeping is made day to next, by returning above-mentioned steps, can easily and safely photomask 10 be captured among the mask shell 1a.That is, the operator with mounting the mask box 100a mounting of photomask 10 on assembly support 22, (, positioning element (not shown) can be set also in order to determine this mounting position.Then, keep mask box 100a, afterwards, keep photomask 10 by mask holding member 4a, thereby can safely and easily photomask 10 be captured among the mask shell 1a by box holding member 5a.
As mentioned above, according to the mask shell 1a of present embodiment, can obtain the effect much the same with mask shell 1, have again, because by removing the hold mode that is realized by mask holding member 4a, photomask 10 is set among the mask box 100a, so can easily carry out operation.
[embodiment of mask box]
In addition, the present invention is also effective as mask box.Mask box of the present invention is the structure much the same with above-mentioned mask box 100, it is structure with the face of being directed (hole surface of the through hole 102 shown in Fig. 2 (a)), it is used to make mask box 100 to move mask anchor 23 guiding of usefulness along prescribed direction when taking out photomask 10.
Like this, the present invention is also effective as mask box 100, owing to need not photomask 10 is changed to operation in the mask box 100, so alleviate operator's load significantly, simultaneously, the operation raising.In addition, can prevent more reliably that mask box 100 and photomask 10 frictions from producing problems such as particle.
[embodiment of pattern trasscription mehod method]
In addition, the present invention is also effective as the pattern trasscription mehod method.Pattern trasscription mehod method of the present invention has the operation of taking out photomask 10 from the mask shell 1 that is used for transporting photomask 10; The described mask 10 that is positioned in the described mask box 100 with use and carries, utilize exposure device to carry out the exposure process of pattern trasscription mehod, in this method, when taking out photomask 10 from mask shell 1, the state that is set at mask box 100 with photomask 10 takes out.
Like this, the present invention is also effective as the pattern trasscription mehod method, owing to need not photomask 10 is changed to operation in the mask box 100, so alleviate operator's load significantly, simultaneously, the operation raising.
[embodiment of the manufacture method of read out instrument]
In addition, the present invention is also effective as the manufacture method of read out instrument.The manufacture method of read out instrument of the present invention has the operation of taking out photomask 10 from the mask shell 1 that is used for transporting photomask 10; The described mask 10 that is positioned in the described mask box 100 with use and carries, utilize that the exposure device pattern trasscription mehod uses in the read out instrument by the exposure process on the transcription, in this method, when taking out mask 10 from mask shell 1, the state that is set in the mask box 100 with photomask 10 takes out.
Like this, the present invention is also effective as the manufacture method of read out instrument, need not photomask 10 is changed to operation in the mask box 100, thus alleviate operator's load significantly, simultaneously, the operation raising.
Preferred forms more than is shown, come the manufacture method of mask shell of the present invention, mask box, pattern trasscription mehod method and read out instrument is illustrated, but the manufacture method of mask shell of the present invention, mask box, pattern trasscription mehod method and read out instrument is not limited to above-mentioned embodiment, can carry out various changes certainly within the scope of the invention and implement.
For example, also can be configured to mask holding member and box holding member one links.
The present invention also applicable to the mask shell that is used for the keeping mask, is particularly useful for the large-scale mask that uses in the Fabrication procedurees such as LCDP or PDP.
Claims (5)
1. a mask shell can place photomask and mask box with transporting, and this mask box uses in carrying the device that described photomask uses, and the described photomask of mounting uses, wherein:
This mask shell possesses:
To allow described photomask and the described mask box be the mask holding member that non-contacting state keeps described photomask;
The box holding member that keeps described mask box;
Be provided with the housing body of described mask holding member and box holding member; And,
Be assemblied on this housing body detachable and cover the case lid of described photomask,
When from described mask shell, taking out described photomask, described mask box is moved along prescribed direction after, allow described photomask by mounting in described mask box.
2. mask shell according to claim 1 is characterized in that:
Have the mask anchor, be used to support this photomask when placing described photomask, make described mask box when prescribed direction moves, this mask anchor guiding should be moved.
3. a mask box is captured in the described mask shell of claim 1, and the mounting photomask uses in the device that the lift-launch photomask uses, and it is characterized in that:
Possess through hole or peristome, be used for when placing described photomask and described mask box in described mask shell, allow in order to keep or to support described photomask and the holding member or the holding components that are arranged in the described mask shell arrive described photomask.
4. mask box according to claim 3 is characterized in that,
Described mask box is to be placed in the mask shell with mask anchor of supporting described photomask when placing described photomask with the non-contacting state of photomask, and, when from described mask shell, taking out described photomask, take out described mask box with described photomask mounting in the state of described mask box
Possess the face of being directed, this is directed face and is made of the surface of described through hole, when taking out described photomask, is made described mask box move the guide member guiding that is made of described mask anchor of usefulness along prescribed direction.
5. pattern trasscription mehod method has:
The mask that takes out this photomask from the mask shell that is used for transporting photomask takes out operation; With
The mask box that is used for carrying described photomask in exposure device carries described photomask, utilizes described exposure device to carry out the exposure process of pattern trasscription mehod,
Wherein, described mask shell possesses:
To allow described photomask and the described mask box be the mask holding member that non-contacting state keeps described photomask;
The box holding member that keeps described mask box;
Be provided with the housing body of described mask holding member and described box holding member; And,
Be assemblied on this housing body detachable and cover the case lid of described photomask,
Described mask takes out in the operation,
The described mask holding member that is provided with on the described housing body and the hold mode of described box holding member are removed, from the described mask shell that has placed described photomask and mask box, described mask box is moved along prescribed direction, thereby taken out by the state of mounting in described mask box with described photomask.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006-269609 | 2006-09-29 | ||
| JP2006269609 | 2006-09-29 | ||
| JP2006269609A JP4855885B2 (en) | 2006-09-29 | 2006-09-29 | Mask case, mask cassette, pattern transfer method, and display device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101152919A CN101152919A (en) | 2008-04-02 |
| CN101152919B true CN101152919B (en) | 2013-07-31 |
Family
ID=39254845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101630075A Expired - Fee Related CN101152919B (en) | 2006-09-29 | 2007-09-28 | Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4855885B2 (en) |
| KR (1) | KR101094502B1 (en) |
| CN (1) | CN101152919B (en) |
| TW (1) | TW200821235A (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5052106B2 (en) * | 2006-11-22 | 2012-10-17 | 旭化成イーマテリアルズ株式会社 | How to store the pellicle |
| KR101121176B1 (en) * | 2008-04-23 | 2012-03-23 | 피엠씨글로벌 주식회사 | Structure of photomask case |
| JP5149207B2 (en) * | 2009-01-13 | 2013-02-20 | 株式会社荏原製作所 | Board mounting device |
| KR101067818B1 (en) * | 2009-08-14 | 2011-09-27 | (주)아이콘 | A tray clamp device |
| JP2011203309A (en) * | 2010-03-24 | 2011-10-13 | Shin-Etsu Chemical Co Ltd | Pellicle storage container and truck for conveying pellicle storage container |
| JP5586559B2 (en) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | Pellicle container |
| KR101962505B1 (en) * | 2012-05-11 | 2019-03-26 | 가부시키가이샤 니콘 | Substrate case, substrate conveyance case, case cover, substrate conveyance system, and method for conveying substrate |
| JP2014218328A (en) * | 2013-05-08 | 2014-11-20 | 新東エスプレシジョン株式会社 | Metal mask sheet supply system |
| JP6418421B2 (en) * | 2015-01-26 | 2018-11-07 | 株式会社ニコン | Mask case, storage device, transport device, exposure device, and device manufacturing method |
| TWI658532B (en) * | 2017-08-09 | 2019-05-01 | 明安國際企業股份有限公司 | Substrate receiving box |
| US11104496B2 (en) * | 2019-08-16 | 2021-08-31 | Gudeng Precision Industrial Co., Ltd. | Non-sealed reticle storage device |
| KR20220116265A (en) * | 2019-12-24 | 2022-08-22 | 엔테그리스, 아이엔씨. | Reticle Pod with Retention Through Base Plate |
| TWI779505B (en) * | 2020-05-14 | 2022-10-01 | 台灣積體電路製造股份有限公司 | Reticle pod and method for preventing reticle contamination |
| TWI760062B (en) * | 2020-05-14 | 2022-04-01 | 家登精密工業股份有限公司 | Reticle pod provided with holding pins and method for holding reticle |
| US11703754B2 (en) | 2020-05-14 | 2023-07-18 | Taiwan Semiconductor Manufacturing Company Ltd. | Particle prevention method in reticle pod |
| US11874596B2 (en) * | 2020-09-30 | 2024-01-16 | Gudeng Precision Industrial Co., Ltd | Workpiece container system |
| JP7313498B1 (en) | 2022-02-18 | 2023-07-24 | 株式会社協同 | Photomask storage case and photomask cushion member for photomask storage case |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03188446A (en) | 1989-09-05 | 1991-08-16 | Konica Corp | Cassette feeding device |
| KR100383260B1 (en) | 2001-03-08 | 2003-05-09 | 삼성전자주식회사 | Reticle Sending Apparatus with Fork Arm having Reticle Position Sensing Ability |
| JP2005032886A (en) * | 2003-07-10 | 2005-02-03 | Nikon Corp | Mask frame and method and device for exposure |
| JP4581681B2 (en) * | 2004-12-27 | 2010-11-17 | 株式会社ニコン | Reticle protection apparatus and exposure apparatus |
-
2006
- 2006-09-29 JP JP2006269609A patent/JP4855885B2/en not_active Expired - Fee Related
-
2007
- 2007-09-12 TW TW096134036A patent/TW200821235A/en unknown
- 2007-09-28 CN CN2007101630075A patent/CN101152919B/en not_active Expired - Fee Related
- 2007-09-28 KR KR1020070097765A patent/KR101094502B1/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080029876A (en) | 2008-04-03 |
| TW200821235A (en) | 2008-05-16 |
| TWI356797B (en) | 2012-01-21 |
| KR101094502B1 (en) | 2011-12-19 |
| JP4855885B2 (en) | 2012-01-18 |
| JP2008087811A (en) | 2008-04-17 |
| CN101152919A (en) | 2008-04-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101152919B (en) | Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device | |
| KR101212889B1 (en) | Cassette for loading Glasses | |
| KR20070008192A (en) | Transfer system for manufacturing plat panel display | |
| TW200809299A (en) | Apparatus for manufacturing bonded substrate | |
| KR20040012517A (en) | Display substrate accommodating tray and apparatus and method for removing the display substrate | |
| KR20100085901A (en) | Mask case, transfer apparatus, exposure apparatus, mask transfer method and device manufacturing method | |
| JP2002154648A (en) | Substrate cassette | |
| KR101232610B1 (en) | Substrate processing apparatus | |
| KR20120012693A (en) | Tilt apparatus for a tray | |
| JP2000353739A (en) | Pallet for trasferring glass substrate | |
| KR20090057901A (en) | Substrate assembling system | |
| KR20130003055A (en) | Raticle pod | |
| JP4638755B2 (en) | Exposure apparatus and exposure method | |
| CN217655862U (en) | Wafer loading device and calibration device thereof | |
| CN101013270B (en) | Photomask substrate container unit, photomask substrate transportation and exposal method | |
| CN101165546B (en) | Substrate detecting device | |
| KR101042629B1 (en) | Cleaning cassette and cassette storage system having the same | |
| JP2012220617A (en) | Proximity exposure device, and mask conveyance method of proximity exposure device | |
| JP4794471B2 (en) | Exposure apparatus and method for exchanging top plate of negative pressure chamber of exposure apparatus | |
| JP2012203151A (en) | Film substrate exposure device and film substrate exposure method | |
| JP2009071117A (en) | Substrate carriage, and method of receiving, carrying and loading substrate by using the same | |
| JP2010182965A (en) | Cassette | |
| KR20060044996A (en) | Transporting device | |
| CN217102929U (en) | Liquid medicine barrel carrying device | |
| CN201689279U (en) | Motherboard storage device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: Japan Tokyo 160-8347 Shinjuku Shinjuku six chome 10 No. 1 Patentee after: HOYA Corporation Address before: Tokyo, Japan, Japan Patentee before: HOYA Corporation |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130731 Termination date: 20170928 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |