CN101135743B - Optical filter and camera device - Google Patents
Optical filter and camera device Download PDFInfo
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- CN101135743B CN101135743B CN2007101471238A CN200710147123A CN101135743B CN 101135743 B CN101135743 B CN 101135743B CN 2007101471238 A CN2007101471238 A CN 2007101471238A CN 200710147123 A CN200710147123 A CN 200710147123A CN 101135743 B CN101135743 B CN 101135743B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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Abstract
The present invention can reduce the spectral reflectance in the entire visible light wavelength area and reduce the bad influence to the image from generating twinkling or double image. An areflexia periodic time layer is formed on a substrate by a plurality of micro concave-convex periodic time constructors and ND films are formed on other surfaces of the substrate by vacuum evaporation method to improve reflect prevent function. In the lights irradiated into an ND light filter, the spectral reflectance on the boundary of atmosphere and the ND film and the boundary of the ND film and the substrate is restrained to low by the MgF2 of the overlapped ND film. The reflectivity on the boundary of the substrate and the atmosphere is reduced by the areflexia periodic time layer.
Description
Technical field
The present invention relates to use optical filter, and the camera head with iris apparatus of this optical filter.
Background technology
In the optical device of in the past video camera etc., be provided for controlling the light quantity iris apparatus of the incident light quantity that gets into solid-state imager.This light quantity iris apparatus is controlled as and when the body that is taken brightens, becomes littler aperture.In addition, on this light quantity iris apparatus, dispose ND (Neutral Density) light filter, can prevent that also aperture openings from excessively diminishing, and prevents shaking phenomenon and optical diffraction phenomenon under the situation of the bright body that is taken even seek.
About this ND light filter; Except light filter with single density, known for example also have open flat 6-265971 communique or special the spy and open light filter disclosed in the 2004-205951 communique, that have the part of transparent part and transmissivity continuity or phasic Chang.
On the other hand, the high sensitivityization of the solid-state imager of the optical device of video camera etc. becomes more meticulous progressive with height.Therefore, if the spectral reflectance that is configured in the whole visible wavelength region of the ND light filter on the light quantity iris apparatus is high, afterimage or flicker (flare) etc. take place easily in photographic picture then.Thereby, in order to reduce this afterimage or flicker, importantly reduce the spectral reflectance of ND light filter.
In order to reduce the spectral reflectance of ND light filter, the known method that has vacuum vapour deposition utilized etc. on the ND film, to form antireflection film.In addition, known have on the face that does not form the ND film method of carrying out the film forming of AR (Anti-Reflection) coating as antireflection film.But, under the situation that forms the antireflection film of forming by the monofilm of substrate surface,, beyond this wavelength, can not reduce though reflectivity can reduce under certain wavelengths.Thereby, open like the spy that flat 8-075902 communique, spy are opened flat 10-133253 communique, the spy opens shown in the 2003-344612 communique, known have a for example range upon range of SiO
2, MgF
2, Nb
2O
5, TiO
2, Ta
2O
5, ZrO
2, Al
2O
3Etc. the different multiclass film of refractive index, suppress the reflectivity of any wavelength region may.
But, in the iris apparatus of the optical device that is used for video camera etc., use under the situation of ND light filter of above-mentioned that kind, stay following problem.
Promptly; When the light of image pickup optical system that has passed through to comprise the iris apparatus of camera forms images on the surface of solid-state imager; Sometimes its a part of light reflects back light coil apparatus one side on the surface of the surface of solid-state imager or the lens between iris apparatus and the imaging apparatus.If afterimage or flicker then take place inciding solid-state imager once more after the reflection again on the ND light filter in this reflected light.
In order to prevent these problems, generally be with the ND filter configuration on iris apparatus, make the ND face applied antireflection film be in solid-state imager one side.But, can not prevent that above-mentioned reflected light from seeing through the ND film of ND light filter, the substrate that sees through light filter reflects on the interface of an opposite side, once more towards the situation of solid-state imager.In addition, when forming under the situation of ND film, can not prevent that above-mentioned reflected light from reflecting on the interface that is formed at ND film and substrate on the opposite side of solid-state imager in the substrate both sides.
And then, on the ND light filter, have transparent region sometimes.At this moment,, the reflection of transparent region used transparent reflection to prevent under the situation of multilayer film in preventing, because the material that has a best refractive index as multilayer film is limited, so be difficult to realize best combination sometimes.In addition, must additionally antireflection film be formed multilayer, increase during worker with the ND film.
Summary of the invention
The object of the present invention is to provide a kind of spectral reflectance that not only is reduced on the filter surface; But also reduce the spectral reflectance of substrate on the interface of an opposite side that sees through light filter, reduced the dysgenic optical filter that flicker or afterimage etc. take place to image.
In addition, even a kind of optical filter that under the situation that has transparent region on the light filter, also has reflection preventing effect easily is provided.
And then the iris apparatus that provides a kind of use to have this optical filter has reduced the camera head to the adverse effect of image such as flicker or afterimage has taken place.
In order to solve the above problems; According to the 1st aspect of the present invention; Optical filter be on transparency carrier at least a portion laminated the light filter of film; It is characterized in that: at least a portion of the face of a side opposite with the face that is formed with above-mentioned film at least, form and be arranged with the no reflection events cycle layer that the reflection that prevents reflection of light prevents tectosome, above-mentioned reflection prevents that tectosome from being being spaced of also short cycle of the light wavelength of the object that prevents of reflection to liken to.
In addition, according to a second aspect of the invention, it is characterized in that camera head possesses: the imaging apparatus that the body image that is taken is carried out light-to-current inversion; The aperture parts of the light quantity in the above-mentioned imaging apparatus are incided in adjusting; Optical filter; Be be configured on the formed peristome of said aperture parts, transparency carrier at least towards the light filter of a side laminated film of above-mentioned imaging apparatus; On at least a portion of the face of a side opposite with the face that is formed with above-mentioned film at least, form and be arranged with the no reflection events cycle layer that the reflection that prevents reflection of light prevents tectosome, above-mentioned reflection prevents that tectosome from being being spaced of also short cycle of the light wavelength of the object that prevents of reflection to liken to.
In (with reference to accompanying drawing) description about embodiment below, that further feature of the present invention will become will be more obvious.
Description of drawings
Fig. 1 is the pie graph of image pickup optical system.
Fig. 2 is the film pie graph of ND film.
Fig. 3 is the pie graph of chamber.
Fig. 4 is the stereographic map of micro concavo-convex periodic structure.
Fig. 5 is the stereographic map of the micro concavo-convex periodic structure of variation.
Fig. 6 is the synoptic diagram of micro concavo-convex periodical configuration.
Fig. 7 is the synoptic diagram of the micro concavo-convex periodical configuration of variation.
Fig. 8 A, B are the key diagrams of the arrangement example of micro concavo-convex periodic structure.
Fig. 9 is the sectional view with ND light filter of micro concavo-convex periodic structure.
Figure 10 is the sectional view of ND light filter with other micro concavo-convex periodic structure.
Figure 11 is the curve map of the spectral reflectance of ND light filter.
Figure 12 has been to use the exploded perspective view of the light quantity iris apparatus of ND light filter.
Figure 13 is the planimetric map of the ND light filter of the 2nd embodiment.
Figure 14 is the sectional view of deposition jig.
Figure 15 is the planimetric map of the 2 density ND light filters of the 3rd embodiment.
Figure 16 is the outboard profile of the 2 density ND light filters of the 3rd embodiment.
Figure 17 is the planimetric map of the level ND light filter of the 4th embodiment.
Figure 18 is the outboard profile of the level ND light filter of the 4th embodiment.
Figure 19 is the key diagram that forms the micro concavo-convex periodical configuration with hot press.
Figure 20 is the sectional view of deposition jig.
Figure 21 is the film pie graph of ND film.
Figure 22 A, B are the diagrammatic cross-sections of ND light filter.
Figure 23 is the diagrammatic cross-section of the ND light filter of the 6th embodiment.
Figure 24 is the key diagram that forms the micro concavo-convex periodical configuration with hot press.
Figure 25 is the diagrammatic cross-section of the ND light filter of the 7th embodiment.
Figure 26 is the sectional view of deposition jig.
Figure 27 is the planimetric map that is formed with the transparency carrier of ND film.
Embodiment
Below, specify the present invention in accordance with the embodiments illustrated.
(the 1st embodiment)
Fig. 1 representes the pie graph of image pickup optical system (camera head).Series arrangement has lens 1; Light quantity iris apparatus 2; Lens 3～5, optical low-pass filter 6, have CCD etc. the body image that is taken is carried out the solid-state imager 7 of light-to-current inversion.In light quantity iris apparatus 2, on aperture blades back up pad 8, a pair of aperture blades 9a, 9b can be installed versatilely.On aperture blades 9a, be bonded with and be used for carry out the ND light filter 10 of dim light through the light quantity of the almost diamond shaped aperture portion that forms by aperture blades 9a, 9b.
But under the situation of the low ND light filter 10 of visible transmission density (concentration), the trend that increases along with density step-down reflectivity is strong, because this catoptrical effect, the possibility that the harmful effect of afterimage or flicker etc. takes place uprises.
Say on the experience, if density roughly smaller or equal to 1.0, when being scaled transmissivity for more than or equal to 10% ND light filter 10, the harmful effect that causes because of reflection then takes place sometimes.And then, if density, is scaled transmissivity smaller or equal to 0.5 approximately more than or equal to 31.6%, the trend that is significantly increased of its possibility then.And the relational expression of density (D) and transmissivity (T) is D=Log
10(1/T).This be the substrate that sees through light filter with the interface of the air of an opposite side on the catoptrical influence of reflecting big.
According to such reason, in the ND light filter 10 of density, except the ND film, need some first-class reflection of the back side that antireflection film be formed on the ND film be suppressed unit mostly smaller or equal to 1.0 density.
Fig. 2 representes the film pie graph of the ND film of ND light filter 10.Range upon range of Al in the 1st, 3,5,7,9 layer on transparent plastic substrate 11 alternately as dielectric layer
2O
3Film 12, range upon range of TixOy film 13 in the 2nd, 4,6,8,10 layer as metal oxide.And then formed on 11th layer and formed MgF as antireflection film as top layer
2The ND film 15 that the total of film 14 is 11 layers.
This ND film 15 takes into full account the linearity of the spectral transmission in visible wavelength region, because of the membrane stress that in substrate 11, uses plastic base to worry, be provided with as the problem of the hologenetic thermal stress of film formation process etc.Though the design load of the film thickness of each layer etc. is different, also can be with Al
2O
3Several layers or whole Al arbitrarily of film 12
2O
3Film 12 is replaced into SiO
2Film.Then, be mutual range upon range of SiO even constitute
2Film or Al
2O
3Film 12 and TixOy film 13 also can be made the ND film 15 with roughly same optical characteristics.
The MgF on top layer
2Film 14 is with optical film thickness n * d (n: refractive index, d: the physics film thickness), form the thickness of λ/4 as λ=540nm.The MgF on this top layer
2Film 14 is that the reflectivity with 15 of ND films is reduced to the antireflection film that purpose constitutes, selective refraction rate n in the wavelength of visible light zone smaller or equal to 1.5.In the present embodiment, though in antireflection film, used MgF
2 Film 14, but because be reduced to fundamental purpose with reflectivity, so so long as the little material of refractive index get final product, even for example using SiO
2Under the situation of film etc., also can make roughly same ND film 15.
As substrate 11 in the present embodiment, from being processed into the reason use transparent plastic materials such as processability of arbitrary shape.Specifically; Use thermotolerance, flexibility; And then on cost as the excellent resinoid Arton of ENB (norbornene) (JSR company products) of baseplate material, the thickness of the part of the no reflection events periodic structure of explaining after selecting to comprise not is the film of 200 μ m.
And, in substrate 11, selected Arton (JSR company product) in the present embodiment, but be not limited thereto, also can use other the norbornene resin of Zeonex Zeonor (Japanese ZEON company produces, trade name) etc.And then, also can use various plastic bases such as PMMA beyond the norbornene resin, polycarbonate, PET, PEN, PC, PO polyimide based resin.
Fig. 3 representes to be used to form the pie graph of the chamber in the vacuum evaporation plating machine of ND portion zone (ND film) 15 of this ND light filter 10.Vapor deposition source 132, rotatable vapor deposition umbrella 133 are set in chamber 131, on this vapor deposition umbrella 133, dispose mask that on the film forming position, is provided with peristome and the substrate fixture 134 that is provided with the synthetic resin substrate.Being fixed on substrate and this vapor deposition umbrella 133 on the vapor deposition umbrella 133 together rotates and carries out film forming.The vapor deposition face in the formation ND portion of ND light filter 10 zone 15 is installed on the vapor deposition umbrella 133 with surface and the vapor deposition source 132 opposed modes of ND light filter 10, and substrate fixture 134 is that center and this vapor deposition umbrella 133 together rotate and carry out film forming with the Z axle.
On the other hand, prevent one of tectosome, the known SWS that is called as " Moth eye " (the long grid of wavelet) with the periodical configuration of also lacking than light wavelength as reflection.Along with the raising of the Micrometer-Nanometer Processing Technology of in the manufacturing of semiconductor or MEMS (Micro Electro Mechanical System), using, can make above-mentioned SWS.For example, seeming during the eyes of the moth that detects by an unaided eye to feel that the phenomenon of deceiving enlightened reflection and be suppressed, is because suppress the cause of surface reflection with SWS.This point was found through the reflectivity of the sag and swell of lip-deep hundreds of nm units of the eyes that are formed on moth is measured by C.G.Bernhard in 1967.This SWS is almost all being transmitted in the material as 0 diffraction light of light intensity of incident, can produce the diffraction light beyond 0 time hardly, can be generated as arbitrary shape.
Fig. 4 representes the stereographic map as the conical micro concavo-convex periodic structure 21 of one of SWS, and the characteristic of using above-mentioned SWS is that purpose generates from the teeth outwards to reduce Fresnel reflection.In addition, replace micro concavo-convex periodic structure 21, also can use the micro concavo-convex periodic structure 22 of the pyramid type of that kind as shown in Figure 5.
Stereographic map when the no reflection events cycle layer (micro concavo-convex periodical configuration) 23 that Fig. 6 representes to have the micro concavo-convex periodic structure that is formed by moth eyes (Moth eye) structure is formed on the face of wanting inhibitory reflex of substrate 11.Be arranged to micro concavo-convex periodical configuration 23 on the surface of the substrate 11 in ND light filter 10 with the jut 21 that uniformly-spaced disposes the numerous cone shape that forms by this transparent plastic material.
The spacing of supposing 21 of each juts is a, and the diameter of the bottom of jut 21 is b, highly is c.The section of jut 21 is with respect to height c, along with from the top of structure towards bottommost, volume increases gradually, corresponding with it effective refractive index also distributes towards bottommost from the top of jut 21 continuously.Therefore, the substrate 11 from air layer towards ND light filter 10 has on the jut 21 of the cone shape that level and smooth effective refractive index distributes, and light because there is not rapid refringence, arrives substrate 11 so light reflects hardly under the situation of top incident.
And if the minimal wave length of hypothesis in wanting to obtain the wavelength region may of reflection preventing effect is λ, the refractive index that the material of jut 21 has is ns, and then the value as spacing a can obtain reflection preventing effect through satisfying following formula.
a≤λ/ns
In addition, diameter b is represented the size of the bottom surface of jut 21, and the decision reflection prevents the filling rate of element thus, it is desirable to this value and is about 5/10ths～10 of spacing a.
And it is about about 1.0 that the aspect ratio through height c and spacing a is set to, and can obtain reflection preventing effect.Through spacing a, diameter b, height c are set best, the reflection that can improve desirable wavelength X prevents efficient like this.
And; In an embodiment; The micro concavo-convex periodical configuration of being made up of the jut 21 of many cone shapes 23 has been described, but also can has been pyramid shape, perhaps also can be arranged to the micro concavo-convex periodical configuration of forming by the recess 24 of the anti-cone shape of that kind shown in Figure 7 23.Thus, the distribution of smooth connection can be the optical index manual work of medium before the light incident and the medium after the incident be arranged to, also reflection can be reduced.
For the making of the micro concavo-convex periodic structure 21,22,24 that prevents tectosome as these reflections, make with the outgoing method of forming in the present embodiment.The outgoing method of forming is such method; Promptly; In the portion of the chamber of the pattern that constitutes by former and formpiston (cavity) with screw propeller with at a high speed, high pressure fill fusion plastic material, carry out chilling and from pattern, take out, obtain having the moulding article of desirable shape.As other method, photopolymerization (polymerization) method of the film that is utilized in the pressing mold that formed well-regulated micro concavo-convex pattern on the surface, has implemented the optical polymerism resin is arranged.In addition, can utilize pressure sintering, this method is that heating is formed with the mould of micro concavo-convex pattern and by being pressed on the base material under than the high temperature of the glass branchpoint of the plastic material that becomes base material.
In the present embodiment, adopt the no reflection events cycle layer 23 of the micro concavo-convex periodic structure 21 of cone shape with that kind shown in Figure 4.Considering the purposes of ND light filter 10, is purpose with the reflectivity that reduces the visible wavelength region till λ=400～700nm roughly, is designed to height 250nm, cycle 220nm, and the ratio (aspect ratio) in height and cycle is more than or equal to 1.
Under the situation of micro concavo-convex periodic structure 21 shown in Figure 4; Its arrangement can be considered in hexagonal array shown in the square arrangement shown in Fig. 8 A or Fig. 8 B etc.; But because the material of the substrate 11 of hexagonal array to expose face few, so we can say that reflection preventing effect is high.But in the present embodiment, the situation from the making of micro concavo-convex periodic structure 21 is considered, uses the square arrangement shown in Fig. 8 A.
Fig. 9 representes the sectional view of ND light filter 10 in the present embodiment, on substrate 11, forms the no reflection events cycle layer 23 of above-mentioned that kind, on the another side of substrate 11, forms ND film 15 with vacuum vapour deposition.Then, becoming to form on any field of diaphragm area the ND film 15 that density is 0.6 single density type, also can improve reflection and prevent function.In addition, ND light filter 10 that kind shown in figure 10 also can form no reflection events cycle layer 23 on the two sides of substrate 11.And, in the present embodiment,, be configured to make the face of formation ND film 15 of substrate 11 mutually opposed with imaging apparatus 7 when ND light filter 10 is assembled under the situation in the camera head shown in Figure 1.
In the present embodiment,, be not limited to this, under the situation that generates the optical filter beyond the ND light filter 10, as long as replace ND film 15 range upon range of films shown in Figure 2 as purpose though form ND film 15 on the whole.
The curve map of the spectral reflectance of the visible wavelength region that the ND film of the ND light filter 10 that Figure 11 representes to have made is 15, spectral reflectance becomes smaller or equal to 0.5% in whole visible wavelength region.For example, with during the ND light filter of present embodiment 10 the same films constitute, if relatively there is not the ND light filter of no reflection events cycle layer 23, then the spectral reflectance in the visible wavelength region of 15 of ND films is to the maximum about 3%.Like this, reflectivity reduces significantly in possessing the ND light filter 10 that the no reflection events of present embodiment cycle layer 23 is arranged.
MgF with range upon range of ND film 15
2 Film 14 will be in the light in inciding ND light filter 10, the border of atmosphere and ND film 15, and the borderline spectral reflectance of ND film 15 and substrate 11 suppresses lowly.Then, the border of substrate 11 and atmosphere, promptly the reflectivity on the outgoing plane of light leans on the effect of no reflection events cycle layer 23 and reduces.
And; Though present embodiment will form the face side of ND film 15 and be arranged to incident one side of light (side of the light incident of reflection on imaging apparatus 7); The face that will be formed with no reflection events cycle layer 23 is arranged to penetrate a side, even but the face that will be formed with no reflection events cycle layer 23 also can access same effect as incident one side.Even in appearance, fold or crackle etc. can not take place, can access good ND light filter 10.
Figure 12 has represented to use the stereographic map of the light quantity iris apparatus of the ND light filter 10 with this specific character, and ND light filter 10 utilizes moving of aperture drive division 31 and aperture blades 9a, 9b one to coexist and freely come in and go out in the aperture base plate peristome 32.
In addition, though in the present embodiment ND light filter 21 is sticked on the aperture blades 9a, also can move independently with aperture blades.
Through with in this light quantity iris apparatus camera head that is adapted to video camera or digital still camera etc. as shown in Figure 1, can reduce afterimage or glimmer this harmful effect that causes by the reflected light of ND light filter 10.
Shown in present embodiment, on the face of the opposite side through no reflection events cycle layer 23 being formed on ND film 15, can be reduced in the reflection on whole, can reduce afterimage or glimmer this harmful effect that causes by the reflected light of ND light filter 10.
In addition, the general because spectral reflectance of no reflection events cycle layer 23 is than the MgF as antireflection film that is formed on the ND light filter 10
2The spectral reflectance of film 14 is also low, so install through no reflection events cycle layer 23 1 side direction solid-state imager 7 with opposite in the past, also can access further good spectral reflectance characteristic.
(the 2nd embodiment)
In the 2nd to the 4th embodiment of following explanation, ND light filter 10 possesses hyalomere zone 211, ND portion zone 212.ND portion zone 212 possesses the films formation the same with the ND portion zone of in the 1st embodiment, explaining 15.
Figure 13 representes the planimetric map of ND light filter 10, and ND light filter 10 contains hyalomere zone 211, form the ND film and make the ND portion zone 212 of optical attenuation with the ratio of regulation.Therefore, when the ND light filter 10 in the present embodiment is installed under the situation on the light quantity iris apparatus 2 shown in Figure 1, the hyalomere of ND light filter 10 zone 211 is positioned at the part in aperture openings portion zone under open state, on the perhaps whole zone.
Then, follow and the light quantity of the body that is taken correspondingly drives peristome and is little aperture state, according to this driving, ND zone 212 enters in the aperture openings portion, can reduce light quantity gradually according to this inlet.
The ND film in the 1st embodiment, explain of vapor deposition not on the hyalomere of the ND of present embodiment light filter 10 zone 211, and the micro concavo-convex periodical configuration 23 of the spacing of also lacking than visible wavelength like formation explaining among the 1st embodiment in its surface.This micro concavo-convex periodical configuration has reflection and prevents structure as explaining, can reflect hardly so incide the lip-deep light in hyalomere zone 211.
As the method that forms this well-regulated micro concavo-convex periodical configuration 23, can be utilized in the method for recording and narrating among the embodiment 1, but utilize light polymerization method in the present embodiment.In order on the hyalomere zone 211 of ND light filter 10, to form micro concavo-convex periodical configuration 23, on the position that becomes hyalomere zone 211, use the gravure coating method, as the optical polymerism resin, the epoxies uv-hardening resin of the about 40 μ m of applied thickness.On the part that has applied this epoxies uv-hardening resin, place the pressing mold of counter-rotating shape with micro concavo-convex periodic pattern; Substrate is closely contacted with pressing mold; Through from substrate one side irradiation high-pressure sodium lamp, make the epoxies uv-hardening resin carry out photopolymerization and harden.Thereafter, separately substrate and pressing mold, the reflection that obtains on the hyalomere zone 211 of ND light filter 10, being formed with desirable micro concavo-convex periodical configuration 23 prevents the zone.
And then, use and above-mentioned the same method, the back side of the hyalomere regional 211 that is formed with micro concavo-convex periodical configuration 23 is from the teeth outwards also formed micro concavo-convex periodical configuration 23.Then, the two sides for the position in the ND portion zone 212 that becomes the substrate that on hyalomere zone 211, has formed micro concavo-convex periodical configuration 23 forms the ND film with vacuum vapour deposition.The film forming of this ND film uses the vacuum evaporation plating machine the same with the 1st embodiment shown in Figure 3 to carry out.
Figure 14 representes the stereographic map of substrate fixture 134, for example disposes the stationary fixture 241 of not shown magnet and places plastic base of being made up of the transparent PET film of the thickness 100 μ m that implement vapor deposition 11 and the mask sheet of being made up of magnetic material 243 above that in proper order.243 of mask sheet should implement on the ND portion zone 212 of vapor-deposited film peristome 244 to be set; Make its tight contact through stationary fixture 241 and mask sheet 243 being adsorbed wait; Prevent vapor-deposited film thus attached on the hyalomere zone 211, only on ND zone 212, adhere to the vapor-deposited film of regulation.
The ND film 15 that forms with above-mentioned method is the uniform single density film of density on the position that becomes ND zone 212, and specifically density is about 0.35 for single face separately, and promptly the density the during film forming of two sides is 0.7.
In addition, for relatively, prepare on the position in the hyalomere zone 211 that becomes ND light filter 10, not form the substrate 11 of micro concavo-convex periodical configuration 23, likewise the two sides to the position that becomes ND portion zone 212 has formed ND film 15.
Then; The ND light filter 10 with hyalomere zone 211 and ND portion zone 212 that in above-mentioned method, make is installed in respectively on the aperture blades 9a of light quantity iris apparatus of that kind shown in Figure 12, carry with the camera head of the same in the past Fig. 1 that kind on and carried out picture appraisal.
As shown in table 1, for the ND light filter 10 that on hyalomere zone 211, is formed with micro concavo-convex periodical configuration 23, confirmed that the influence of afterimage reduces, suppress the deterioration of image quality.On the other hand, the ND light filter 10 on hyalomere zone 211, not forming micro concavo-convex periodical configuration 23 can not fully reduce the influence of afterimage, and can not fully suppress the deterioration of image quality.
Table 1
Micro concavo-convex periodical configuration image quality
Have zero
Do not have *
(the 3rd embodiment)
Figure 15 is the planimetric map of the ND light filter 10 among the 3rd embodiment, and Figure 16 representes outboard profile, on ND portion zone 212, forms ND film 15a, the 15b with 2 kinds of different density of transmission light quantity.Use the two sides in the hyalomere zone 211 of the plastic base 11 pair ND light filters 10 the same to form the micro concavo-convex periodical configuration of forming by the epoxies uv-hardening resin 23 with the 2nd embodiment.
Evaporation coating method as this ND film 15; At first to the ND film 15a of 11 layers of formation of whole the vapor deposition that kind shown in Figure 2 in the ND portion zone 212 of a side single face; Make density become 0.35, then, on the opposing party's the face only on the regional A in ND portion zone 212; Use is provided with the ND film 15a of 11 layers of formation of mask sheet 243 vapor depositions of peristome 244, makes density become 0.35.And then, only on the area B in ND zone 212, use the ND film 15b of the 11 layers of formation of mask sheet 243 vapor depositions that are provided with peristome 244, make density become 1.05.
It is about 0.7 that the ND light filter 10 of control after the film forming makes that in ND zone 212 density of regional A becomes, and the density of area B becomes about 1.4.
In addition,, prepare on the position in the hyalomere zone 211 that becomes ND light filter 10, not form the substrate 11 of micro concavo-convex periodical configuration 23, likewise ND portion zone 212 is formed ND film 15a, the 15b with 2 kinds of different density areas for relatively.
The ND light filter 10 with hyalomere zone 211 and ND portion zone 212 that in above-mentioned method, make is the same with the 2nd embodiment to be installed on the aperture blades 9a of light quantity iris apparatus shown in Figure 12, carry with the camera head of the same in the past Fig. 1 that kind on and carried out the evaluation of image.
As shown in table 2, for the ND light filter 10 that on hyalomere zone 211, is formed with micro concavo-convex periodical configuration 23, confirmed that the influence of afterimage reduces, suppress the deterioration of image quality.On the other hand, the ND light filter 10 on hyalomere zone 211, not forming micro concavo-convex periodical configuration 23 can not fully reduce the influence of afterimage, and can not fully suppress the deterioration of image quality.
Table 2
Micro concavo-convex periodical configuration image quality
Have zero
Do not have *
(the 4th embodiment)
Figure 17 representes the planimetric map of the ND light filter 10 among the 4th embodiment, and Figure 18 representes outboard profile, on ND portion zone 212, forms the ND film 15c with level (gradation) density that visible transmission density gradually changes.At first, use the method the same on the two sides in the hyalomere zone 211 of ND light filter 10, to form the micro concavo-convex periodical configuration of forming by the epoxies uv-hardening resin 23 with the 2nd and the 3rd embodiment.
Then, to the two sides in the ND of ND light filter 10 zone 212, form with vacuum vapour deposition and to have visible transmission density and order ground from changing to the ND film 15c of big level density for a short time.ND film 15c with this level density uses has the mask that can regulate with the shutter of mask face angulation.Then, through with the part of mask, use the method for film forming level Density Distribution on substrate 11 and form vapor deposition face Protective film material.
Specifically, density is about 0.2～0.6, and promptly the transmissivity order is respectively formed on the two sides of substrate 11 to about 63～25% ND film 15c that change, and the density after the film forming of two sides is about 0.4～1.2, and promptly the transmissivity order changes to about 40～6.3%.But, the MgF on top layer
2Film does not use mask, and (n: refractive index, d: the physics film thickness) (vapor deposition is carried out in λ=500～600nm) for λ/4 with optical film thickness n * d on the whole zone in ND zone 212.
In addition,, prepare on the position in the hyalomere zone 211 that becomes ND light filter 10, not form the substrate 11 of micro concavo-convex periodical configuration 23, likewise ND portion zone 212 is formed the ND film 15c with level density for relatively.
The ND light filter 10 with hyalomere zone 211 and ND portion zone 212 that in above-mentioned method, make is the same with the 2nd and the 3rd embodiment to be installed on the aperture blades 9a of light quantity iris apparatus shown in Figure 12, carry with the camera head of the same in the past Fig. 1 that kind on and carried out the evaluation of image.
As shown in table 3, for the ND light filter 10 that on hyalomere zone 211, is formed with micro concavo-convex periodical configuration 23, the influence of afterimage reduces, and can suppress the deterioration of image quality.On the other hand, the ND light filter 10 on hyalomere zone 211, not forming micro concavo-convex periodical configuration 23 can not fully reduce the influence of afterimage, and can not fully suppress the deterioration of image quality.
Table 3
Micro concavo-convex periodical configuration image quality
Have zero
Do not have *
In present embodiment 4, in hyalomere zone 211 and ND portion zone 212, can be reduced in the reflected light that takes place on the surface of ND light filter portion 10 with above-mentioned method, its result can remove afterimage well.
Like this through micro concavo-convex periodical configuration 23 being formed on the hyalomere zone 211 beyond the face that is formed with ND film 15; Can suppress to arrive the parasitic light of the solid-state imager 7 of Fig. 1, can reduce afterimage or glimmer this harmful effect that causes by the reflected light of ND light filter 10.
In addition; Because generally make the spectral reflectance of micro concavo-convex periodical configuration 23 also lower than the spectral reflectance that is formed on the antireflection film on the ND light filter 10; So through with on the contrary micro concavo-convex periodical configuration 23 1 side direction solid-state imager 7 in the past and installed, can also obtain further good spectral reflectance characteristic.
(the 5th embodiment)
In the 5th to the 7th following embodiment, the ND light filter 10 that under ND film 15, has micro concavo-convex periodical configuration 23 is described.
Method as forming micro concavo-convex periodical configuration 23 can be utilized in the whole bag of tricks of putting down in writing in the above embodiments, but utilize pressure sintering in the present embodiment.In the present embodiment; Use shown in figure 19 is formed with the patrix 342 and the counterdie 343 with smooth face with the micro concavo-convex cycle ditch 341 of micro concavo-convex periodical configuration 23 negative shape, through hot pressing micro concavo-convex cycle ditch 341 is transferred on the transparency carrier 11.The micro concavo-convex cycle ditch 341 of this patrix 342 for example can be drawn formation resist pattern with the electronics line drawing on the mould base material, with reactive ion etching base material is carried out etching and form it.
On micro concavo-convex periodical configuration 23 form ND film thereafter.Figure 20 representes the sectional view of deposition jig 134, on this deposition jig 134, fixes transparency carrier 11 via pin etc. and forms mask 352 with the vapor deposition pattern.
Use vacuum evaporation plating machine shown in Figure 3 and this deposition jig, ground the same vapor deposition ND film on transparency carrier 11 with the 1st embodiment.
Figure 21 representes with the film pie graph as the ND film 71 of the inorganic hard film of density 1.0 (transmissivity 10%) of above-mentioned method after film forming on the micro concavo-convex periodical configuration 23.On the micro concavo-convex periodical configuration 23 on the transparency carrier 11, the range upon range of Al that is used to reduce reflectivity in the 1st, 3,5 layer alternately as antireflection film
2O
3Film 72; The range upon range of TiOx film 73 that is used to reduce transmissivity in the 2nd, 4,6 layer as light absorbing zone.And then, in order to improve reflection preventing effect, i.e. vapor deposition optical film thickness n * d (n: refractive index, d: the physics film thickness) be the λ/4 (SiO as low-index material of λ=500～600nm) on the 7th layer on top layer
2Film 74 is arranged to the ND film 71 of 7 layers of formation.And, replace SiO
2Film 74 can use MgF
2Film.
Can use transparent dielectric as antireflection film, except Al
2O
3Can use SiO outside the film 72
2, SiO, MgF
2, ZrO
2, TiO
2Deng.In addition, can use the material of characteristic, except TiOx film 73, can use metal, alloy, the oxide of Ti, Ni, Cr, NiCr, NiFe, Nb etc. with the wavelength that absorbs visible wavelength region as light absorbing zone.
On the vapor-deposited film in this ND film 71 the concavo-convex of micro concavo-convex periodical configuration 23 is transferred to about the 2nd～3 layer, but level and smooth gradually thereafter.Thereby, which floor of micro concavo-convex periodical configuration 23 to be boundary surface near, can expect the reflection preventing effect same with micro concavo-convex periodical configuration 23.In addition, thus the characteristic as ND film 71 is not had special influence.
And then, shown in Figure 22 A, go up overleaf as antireflection film 75 and form the λ/4 (SiO of λ=540nm)
2Monofilm, shown in Figure 22 B, go back vapor deposition ND film 71 on overleaf.Then, go up overleaf after the film forming completion, from vacuum evaporation plating machine, take out transparency carrier 11, a plurality of ND light filters 10 that are formed on the transparency carrier 11 are carried out each shape of punch process formation.
The ND light filter of making like this 10 is installed on the aperture blades of light quantity iris apparatus and has carried out the evaluation of photographed images.As shown in table 4, for the ND light filter 10 that on transparency carrier 11, has formed micro concavo-convex periodical configuration 23, reflectivity also reduces, and does not find afterimage, but has recognized afterimage for the ND light filter that does not form micro concavo-convex periodical configuration 23.
Table 4
Micro concavo-convex periodical configuration afterimage maximum reflectivity (λ=400～700nm)
Whether have 2%
Do not have 6%
(the 6th embodiment)
In the 6th embodiment, on the micro concavo-convex periodical configuration 23 on the two sides that is arranged on transparency carrier shown in Figure 23 11, make the ND light filter 10 that is formed with ND film 71.In transparency carrier 11,, use patrix 342, the counterdie 343 ' of the micro concavo-convex cycle that all the is formed with ditch 341 of that kind shown in Figure 24 with the PET resin film of embodiment 5 the same used thickness 100 μ m.Through the hot pressing under the condition of the temperature the same, pressure, the micro concavo-convex cycle ditch 341 of patrix 342, counterdie 343 ' is transferred on the two sides of transparency carrier 11 with embodiment 5.
With above-mentioned method, through using the transparency carrier 11 that on the two sides, is formed with micro concavo-convex periodical configuration 23, on micro concavo-convex periodical configuration 23, on the two sides, form the ND film 71 of density 0.3 respectively, formed the ND light filter 10 of density 0.6 (transmissivity 25%).And the film build method of the ND film 71 in the present embodiment 6 is the same with embodiment 5.
The ND light filter of making like this 10 is installed on the aperture blades of light quantity iris apparatus and has carried out the evaluation of photographed images.As shown in table 5, for the ND light filter 10 that on transparent plastic substrate 11, has formed micro concavo-convex periodical configuration 23, reflectivity also diminishes, and does not find afterimage, but sees slight afterimage for the ND light filter that does not form micro concavo-convex periodical configuration 23.
Table 5
Micro concavo-convex periodical configuration afterimage maximum reflectivity (λ=400～700nm)
Whether have 1%
(slightly) 4% do not arranged
(the 7th embodiment)
In the 7th embodiment; With the step the same with embodiment 5 after having formed micro concavo-convex periodical configuration 23 on the transparency carrier 11, such formation conduct shown in figure 25 has the ND film 83 of inorganic hard film of uniform density portion 81, the level density portion 82 of density 1.0 (transmissivity 10%) on this micro concavo-convex periodical configuration 23.
Shown in figure 26; The interval that on deposition jig 134, separates regulation with transparency carrier 11 is provided with the vapor deposition pattern and forms with mask 352; When in vacuum evaporation plating machine, carrying out vapor deposition; Deposition jig 134 is a center rotation film forming on one side with the Z axle on one side shown in arrow in chamber shown in Figure 3 131, shown in figure 27ly can form the ND film 83 with level Density Distribution.
This ND film 83 has the film thickness level density portion 82 of attenuation gradually, and the film thickness of each layer is different because of the position in this level density portion 82.Generally, have the film that has suppressed reflection with uniform density portion 81 and constitute,, become big position so reflection takes place because change at level density portion 82 media thicknesses even have the ND light filter 10 of this level density portion 82.This is because utilize the catoptrical interference of each layer; The cause of comprehensive inhibitory reflex; In present embodiment 7; Come inhibitory reflex because make the refractive index at the interface of each layer have obliquity, so the increase of the reflectivity that can suppress to cause by the position with the lip-deep micro concavo-convex periodical configuration 23 that is formed on transparency carrier 11.
In addition, on the back side of the transparency carrier 11 of range upon range of ND film 83, as the antireflection film 75 vapor deposition λ/4 (SiO of λ=540nm)
2Monofilm and film forming.Behind the antireflection film 75 that forms the back side, from vacuum evaporation plating machine, take out transparency carrier 11, a plurality of ND light filters 10 that are formed on the transparency carrier 11 are carried out each shape of profile punch process formation.
The ND light filter of making like this 10 is installed on the aperture blades of light quantity iris apparatus and has carried out the evaluation of photographed images.Table 6 expression should be estimated, and for the ND light filter 10 that on transparency carrier 11, has formed micro concavo-convex periodical configuration 23, reflectivity also diminishes, and does not see afterimage, but has seen afterimage for the ND light filter that does not form micro concavo-convex periodical configuration 23.
Table 6
Micro concavo-convex periodical configuration afterimage maximum reflectivity (λ=400～700nm)
Whether have 4%
Do not have 15%
The exemplary embodiment of above reference has been described the present invention, but should be understood that the present invention is not limited to disclosed exemplary embodiment.The scope of appending claims should be given the wideest explanation, with modification and equivalent structure and the function that comprises that all are such.
Claims (9)
1. optical filter, at least a portion laminated on the transparent resin film substrate film, it is characterized in that:
On the top layer of stacked above-mentioned film, form the antireflection film that prevents the light reflection; Perhaps; Formation prevents the antireflection film of light reflection and on this antireflection film, forms to be arranged with the areflexia cycle layer that reflection prevents tectosome; On at least a portion of the face of a side opposite, form and be arranged with the areflexia cycle layer that the reflection that prevents the light reflection prevents tectosome with the face that is formed with above-mentioned film at least; With liken to be the object that prevents of reflection light wavelength also the above-mentioned reflection that is spaced in short cycle prevent tectosome
On the lip-deep above-mentioned no reflection events cycle layer of above-mentioned transparent resin film substrate, formed the inorganic hard film.
2. optical filter according to claim 1 is characterized in that:
Above-mentioned inorganic hard film is the ND film of the visible optical transmission of restriction.
3. optical filter according to claim 2 is characterized in that:
The maximal value of the density of above-mentioned ND film is made as smaller or equal to 1.0 in visible wavelength region.
4. camera head is characterized in that possessing:
The body image that is taken is carried out the imaging apparatus of light-to-current inversion;
The aperture parts of the light quantity of above-mentioned imaging apparatus are incided in adjusting;
Optical filter; Be to be configured on the peristome of said aperture parts formation; The transparent resin film substrate at least towards a side laminated of above-mentioned imaging apparatus the light filter of film; On the top layer of range upon range of above-mentioned film, form the antireflection film that prevents the light reflection; Perhaps; Formation prevents the antireflection film of light reflection and on this antireflection film, forms to be arranged with the no reflection events cycle layer that reflection prevents tectosome, at least a portion of the face of a side opposite, form and be arranged with the no reflection events cycle layer that the reflection that prevents the light reflection prevents tectosome with the face that has formed above-mentioned film at least, with liken to be the object that prevents of reflection light wavelength also the above-mentioned reflection that is spaced in short cycle prevent tectosome.
5. camera head according to claim 4 is characterized in that:
Above-mentioned light filter is the ND light filter.
6. camera head according to claim 5 is characterized in that:
The maximal value of the density of above-mentioned ND light filter is made as smaller or equal to 1.0 in visible wavelength region.
7. camera head according to claim 4 is characterized in that:
Above-mentioned light filter possesses: have the hyalomere zone of uniform transmissivity and make the ND portion of optical attenuation regional with the ratio of stipulating; On above-mentioned hyalomere zone, form above-mentioned no reflection events cycle layer.
8. camera head according to claim 7 is characterized in that:
Above-mentioned no reflection events cycle layer is formed on the single face or two sides in above-mentioned hyalomere zone.
9. camera head according to claim 4 is characterized in that:
On the surface of above-mentioned transparency carrier, form no reflection events cycle layer, on this no reflection events cycle layer, formed the inorganic hard film.
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006233039A JP5016872B2 (en) | 2006-08-30 | 2006-08-30 | Optical filter |
| JP2006-233039 | 2006-08-30 | ||
| JP2006233039 | 2006-08-30 | ||
| JP2006245343 | 2006-09-11 | ||
| JP2006245343A JP2008065227A (en) | 2006-09-11 | 2006-09-11 | Nd filter |
| JP2006-245343 | 2006-09-11 | ||
| JP2006-257198 | 2006-09-22 | ||
| JP2006257198 | 2006-09-22 | ||
| JP2006257198A JP4988282B2 (en) | 2006-09-22 | 2006-09-22 | Optical filter |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210195796.1A Division CN102692662B (en) | 2006-08-30 | 2007-08-30 | Optical filter and image pickup apparatus |
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| Publication Number | Publication Date |
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| CN101135743A CN101135743A (en) | 2008-03-05 |
| CN101135743B true CN101135743B (en) | 2012-08-01 |
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| CN2007101471238A Active CN101135743B (en) | 2006-08-30 | 2007-08-30 | Optical filter and camera device |
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| JP2008065227A (en) * | 2006-09-11 | 2008-03-21 | Canon Electronics Inc | Nd filter |
| RU2451311C2 (en) * | 2008-07-16 | 2012-05-20 | Сони Корпорейшн | Optical element |
| JP5600396B2 (en) * | 2009-04-23 | 2014-10-01 | キヤノン電子株式会社 | Optical filter |
| JP2011002759A (en) * | 2009-06-22 | 2011-01-06 | Dnp Fine Chemicals Co Ltd | Antireflection film |
| DE102010000878B4 (en) * | 2010-01-14 | 2022-04-28 | Robert Bosch Gmbh | Micromechanical component, optical device, manufacturing method for a micromechanical component and manufacturing method for an optical device |
| JP6053352B2 (en) * | 2011-06-29 | 2016-12-27 | キヤノン電子株式会社 | Optical filter, optical device, and optical filter manufacturing method. |
| JP5543515B2 (en) * | 2012-03-26 | 2014-07-09 | キヤノン電子株式会社 | camera |
| JP5885595B2 (en) | 2012-06-12 | 2016-03-15 | キヤノン株式会社 | Antireflection film, and optical element, optical system, and optical apparatus having the same |
| JP2014010217A (en) * | 2012-06-28 | 2014-01-20 | Dainippon Printing Co Ltd | Antireflective laminate |
| JP6162947B2 (en) * | 2012-11-16 | 2017-07-12 | キヤノン電子株式会社 | Optical filter, optical device, electronic device |
| JP6336806B2 (en) * | 2014-04-09 | 2018-06-06 | キヤノン電子株式会社 | ND filter, light quantity diaphragm device, and imaging device |
| US20180267210A1 (en) * | 2015-02-03 | 2018-09-20 | Sony Corporation | Anti-reflection film, optical component, optical device, and method of producing anti-reflection film |
| JP6761231B2 (en) * | 2015-08-28 | 2020-09-23 | キヤノン電子株式会社 | Antireflection microstructures, optical filters, optics, and methods for manufacturing antireflection microstructures |
| TWI616697B (en) * | 2016-10-13 | 2018-03-01 | 大立光電股份有限公司 | Annular optical element, imaging lens assembly, imaging apparatus and electronic device |
| EP3537399B1 (en) * | 2018-03-05 | 2021-03-31 | Ricoh Company, Ltd. | Imaging optical system, imaging system, and imaging apparatus |
| FR3102565B1 (en) * | 2019-10-24 | 2024-01-05 | Hydromecanique & Frottement | Optical device with surface texturing |
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| JP2008058438A (en) | 2008-03-13 |
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