CN101126152B - 柱状磁控溅射器 - Google Patents
柱状磁控溅射器 Download PDFInfo
- Publication number
- CN101126152B CN101126152B CN2006100622274A CN200610062227A CN101126152B CN 101126152 B CN101126152 B CN 101126152B CN 2006100622274 A CN2006100622274 A CN 2006100622274A CN 200610062227 A CN200610062227 A CN 200610062227A CN 101126152 B CN101126152 B CN 101126152B
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- CN
- China
- Prior art keywords
- magnet steel
- target
- magnetron sputtering
- shielding case
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 38
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 88
- 239000010959 steel Substances 0.000 claims abstract description 88
- 230000002708 enhancing effect Effects 0.000 claims description 17
- 238000009826 distribution Methods 0.000 claims description 15
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 15
- 238000007789 sealing Methods 0.000 claims description 12
- 239000011324 bead Substances 0.000 claims description 3
- 238000005728 strengthening Methods 0.000 abstract description 4
- 230000003628 erosive effect Effects 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 17
- 238000005530 etching Methods 0.000 description 13
- 230000000694 effects Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000002826 coolant Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000009434 installation Methods 0.000 description 4
- 239000011553 magnetic fluid Substances 0.000 description 4
- 230000007812 deficiency Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2006100622274A CN101126152B (zh) | 2006-08-18 | 2006-08-18 | 柱状磁控溅射器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2006100622274A CN101126152B (zh) | 2006-08-18 | 2006-08-18 | 柱状磁控溅射器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101126152A CN101126152A (zh) | 2008-02-20 |
CN101126152B true CN101126152B (zh) | 2010-04-21 |
Family
ID=39094284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006100622274A Active CN101126152B (zh) | 2006-08-18 | 2006-08-18 | 柱状磁控溅射器 |
Country Status (1)
Country | Link |
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CN (1) | CN101126152B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5461264B2 (ja) * | 2010-03-25 | 2014-04-02 | キヤノンアネルバ株式会社 | マグネトロンスパッタリング装置、及び、スパッタリング方法 |
CN102296274B (zh) * | 2011-08-18 | 2013-11-27 | 北京镨玛泰克真空科技有限公司 | 用于阴极弧金属离子源的屏蔽装置 |
CN103184421A (zh) * | 2011-12-30 | 2013-07-03 | 鸿富锦精密工业(深圳)有限公司 | 真空溅射靶磁芯 |
CN105543791A (zh) * | 2015-12-08 | 2016-05-04 | 北京大学深圳研究生院 | 金属等离子体源及应用 |
CN106595161A (zh) * | 2016-10-24 | 2017-04-26 | 杨瑞鹏 | 一种新型pvd旋转靶制造用冷却背管 |
CN106906447A (zh) * | 2016-12-27 | 2017-06-30 | 王开安 | 磁控溅射镀膜源及其装置与方法 |
CN113445013B (zh) * | 2021-06-28 | 2022-06-03 | 哈尔滨工业大学 | 旋翼轴承内圈内壁高功率磁控溅射薄膜沉积装置及方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6488824B1 (en) * | 1998-11-06 | 2002-12-03 | Raycom Technologies, Inc. | Sputtering apparatus and process for high rate coatings |
CN1611631A (zh) * | 2003-10-28 | 2005-05-04 | 柯尼卡美能达精密光学株式会社 | 溅射装置 |
-
2006
- 2006-08-18 CN CN2006100622274A patent/CN101126152B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6488824B1 (en) * | 1998-11-06 | 2002-12-03 | Raycom Technologies, Inc. | Sputtering apparatus and process for high rate coatings |
CN1611631A (zh) * | 2003-10-28 | 2005-05-04 | 柯尼卡美能达精密光学株式会社 | 溅射装置 |
Also Published As
Publication number | Publication date |
---|---|
CN101126152A (zh) | 2008-02-20 |
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C06 | Publication | ||
PB01 | Publication | ||
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20080220 Assignee: Anhui Hao Wei photoelectric intelligent Science and Technology Ltd. Assignor: Shenzhen Haowei Vacuum Photoelectron Holding Co., Ltd. Contract record no.: 2015340000014 Denomination of invention: Column-shape magnetron sputtering equipment Granted publication date: 20100421 License type: Exclusive License Record date: 20150305 |
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LICC | Enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model | ||
CP03 | Change of name, title or address |
Address after: 518000 Guangdong Province, Shenzhen high tech Zone of Nanshan District City, the first floor of the building D Howell District, third floor Patentee after: Shenzhen Howell Technology Group Limited by Share Ltd Address before: 518054, Shenzhen, Guangdong province Nanshan District Shennan Avenue high-tech industrial village W1A district on the first floor Patentee before: Shenzhen Haowei Vacuum Photoelectron Holding Co., Ltd. |
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TR01 | Transfer of patent right |
Effective date of registration: 20201116 Address after: Area D, 4th floor, Howe building, No.8, Langshan No.2 Road, Xili street, Nanshan District, Shenzhen City, Guangdong Province Patentee after: Haowei Xingke film window (Shenzhen) Co.,Ltd. Address before: 518000 Guangdong Province, Shenzhen high tech Zone of Nanshan District City, the first floor of the building D Howell District, third floor Patentee before: Shenzhen Howell Technology Group Limited by Share Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220421 Address after: 518000 Guangdong, Shenzhen, Nanshan District Xili street, Technology north 2 Road, Howe tower Patentee after: SHENZHEN HIVAC DISPLAY TECHNOLOGY CO.,LTD. Address before: 518000 area D, 4th floor, Haowei building, No.8, Langshan 2nd Road, Xili street, Nanshan District, Shenzhen City, Guangdong Province Patentee before: Haowei Xingke film window (Shenzhen) Co.,Ltd. |
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