CN101122747A - Slit coating apparatus - Google Patents

Slit coating apparatus Download PDF

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Publication number
CN101122747A
CN101122747A CNA2007100976038A CN200710097603A CN101122747A CN 101122747 A CN101122747 A CN 101122747A CN A2007100976038 A CNA2007100976038 A CN A2007100976038A CN 200710097603 A CN200710097603 A CN 200710097603A CN 101122747 A CN101122747 A CN 101122747A
Authority
CN
China
Prior art keywords
pressurizing block
guide groove
coating apparatus
slit coating
nozzle body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA2007100976038A
Other languages
Chinese (zh)
Other versions
CN101122747B (en
Inventor
吴相泽
金健佑
李宰一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd.
DMS Co Ltd
Original Assignee
Display Manufacturing Services Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Display Manufacturing Services Co Ltd filed Critical Display Manufacturing Services Co Ltd
Publication of CN101122747A publication Critical patent/CN101122747A/en
Application granted granted Critical
Publication of CN101122747B publication Critical patent/CN101122747B/en
Active legal-status Critical Current
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/30Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
    • B05B1/3033Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages the control being effected by relative coaxial longitudinal movement of the controlling element and the spray head
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)

Abstract

The invention discloses a slit coating apparatus, which is used for processing a coating work of the emulsion such as a photoresist for the photo panel printing art to a base board for the panel display by a slit coating way and improves the cut gap regulation property of the nozzle. The apparatus comprises: a working table for processing a coating work to the base board on the working table surface; a nozzle body with a slit outlet, which is fixed at one side of the working table; a press block clamped in a guide groove at one side of the nozzle body outlet opening; a face contacting portion formed on the surface of one side of the press block and generating an up-and-down contact pressure in the guide groove by moving the press block; a regulation portion screw-jointed with the press block and generating the pressure at the face contacting portion by driving the press block to shift forward or backward along the inclination direction of the face contacting portion so as to make the one side of the outlet bent and deformed and move closed to the other side or to the reversed direction.

Description

Slit coating apparatus
Technical field
The present invention relates to a kind of slit coating apparatus, particularly relate to a kind of be applicable to by the slit coating mode flat-panel monitor with substrate on the coating operation of sensitization liquid such as coating photolithographic techniques etc., and be easy to adjust the gap, nozzle edge, thereby improve the slit coating apparatus of coating quality.
Background technology
Usually, flat-panel monitor, mainly carries out in the lithoprinting mode in the operation of substrate surface formation predetermined pattern with in the manufacturing process of substrate.
Described lithoprinting mode is included in substrate surface and applies series of processes such as photoactive substances such as certain thickness photoresist and the exposure that applicator surface is carried out, development, etching.
Especially, above-mentioned working procedure of coating is extensive use of the applying device with slit outlet, and described applying device is equipped with the lash adjusting device that can adjust nozzle discharge opening gap.This lash adjusting device, the general screw rod of adjusting the gap that spues by the degree of tightness power of bolt that adopts is adjusted mode, and utilizes the spue oil pressure adjustment mode etc. in gap of hydrodynamic pressure adjustment.
And above-mentioned employing oil pressure is adjusted the adjusting gear of mode, though be easy to adjust the gap that spues, it costs an arm and a leg, and after after a while, hydrodynamic pressure changes easily, therefore need adjust hydrodynamic pressure at any time, can't obtain gratifying operational stability.
In addition, above-mentioned employing screw rod is adjusted the adjusting gear of mode, side at nozzle, on the position, at least one place of discharge opening incision direction, the bolt that connects the gap that spues is installed, and come the adjusting play with the pitch of bolt by screwing bolt, therefore described structure is difficult to tens microns (μ m) following gap is finely tuned.
And after the adjusting play, in the operation process of applying device, owing to shaken influence with pressure, the solid state of twisting of bolt changes easily, the gap can occur and adjust error.Therefore, this pitch of bolt of utilizing comes the mode of direct adjusting play can't obtain gratifying operability and operational stability.
Particularly, these two kinds of the problems referred to above that the adjustment mode is had will become the main cause that produces too much bad product and reduce work efficiency and production efficiency.
Summary of the invention
The present invention considers the problems referred to above and proposes that its purpose is to provide a kind of slit coating apparatus, and this device is adjusted the discharge opening gap by pass on the mode of power with surface contact pressure, thereby improves operability and operational stability.
For achieving the above object, the invention provides a kind of slit coating apparatus, it comprises: worktable, carry out the coating operation to coating of substrates sensitization liquid on its work top; Nozzle body, it has slit outlet, and is fixed on a side of described work top; Pressurizing block, it is sandwiched the guide groove inboard, and described guide groove is formed on a side of described nozzle body discharge opening; The face contact site, it is formed at a side surface of pressurizing block, and with the lopsidedness state of contact of described guide groove inside surface under, in described guide groove, produce the contact pressure of above-below direction by mobile pressurizing block; The adjustment part, itself and described pressurizing block are spirally connected, and by making described pressurizing block advance or retreat, produce pressure at described contact site along the vergence direction of described contact site, thereby make described discharge opening lateral curvature distortion and to opposite side near or move in the other direction to it.
Adopt the present invention, when being used to make the photolithography process of flat display substrate, can adjust the gap that spues of nozzle simply.
Especially, when adjusting the discharge opening gap, the present invention can adopt indirect power delivery mode to adjust.That is, when coming mobile pressurizing block by adjustment parts such as bolts, the surface contact pressure that surface of contact produced by pressurizing block and guide groove produces and transmits adjustment pressure.Therefore easy operating not only, and can finely tune the gap, can also prevent because vibrations and impact etc. are former thereby cause the gap to adjust the variation of state, thus the operability of can further improve and operational stability etc.
Description of drawings
Fig. 1 is the one-piece construction synoptic diagram of slit coating apparatus of the present invention.
Fig. 2 is the structural representation of nozzle body shown in Figure 1.
Fig. 3 is the structural representation of pressurizing block shown in Figure 2 and guide groove.
Fig. 4 is the bonding state synoptic diagram of pressurizing block shown in Figure 3 and guide groove.
Fig. 5 is in order to the synoptic diagram of shown in Figure 2 contact site effect to be described.
Fig. 6 is a synoptic diagram of adjusting mode in order to the gap that spues of explanation slit coating apparatus of the present invention.
The accompanying drawing sign:
2: nozzle body 4: pressurizing block
6: guide groove 8: dip plane
10: adjustment part 12: carriage
G: substrate W: sensitization liquid
N: discharge opening
Embodiment
Below, with reference to description of drawings the preferred embodiments of the present invention, and in can implementing the scope of the embodiment of the invention, the those skilled in the art describes.Because embodiments of the invention can be implemented in a variety of forms, therefore claim scope of the present invention is not limited to following embodiment.
Fig. 1 is the one-piece construction synoptic diagram of slit coating apparatus of the present invention, symbol 2 expression nozzle bodies among the figure.
Nozzle body 2 is rectangular parallelepiped, to be suitable for carrying out conventional slit coating, and be fixed on as shown in Figure 1 on the brace table M1 that is arranged at conveying device M one side, so that in process, carry out the coating operation of sensitization liquid W such as photoresist by described conveying device M conveying flat base plate for displaying G (being designated hereinafter simply as " substrate ").
Described nozzle body 2 has the elongated cuts of the sensitization liquid W that is used to spue, i.e. slit outlet N, and the metal material of its useful life longevity and excellent corrosion resistance is made.
Described discharge opening N receives sensitization liquid W from the supply pipe L that is connected described nozzle body 2 one sides.And described supply pipe L is connected with the accumulator tank T that stores sensitization liquid W, so that obtain sensitization liquid W from described accumulator tank T.
As shown in Figure 2, the end of described discharge opening N is formed with the gap N1 that spues, and for the sensitization liquid W that can evenly spue, the gap width equalization of whole slit-shaped discharge opening N.
Described nozzle body 2 is regulated the discharge-amount of sensitization liquid W by adjusting the described width that spues gap N1.
The described gap N1 that spues can be that methods such as etching and processing or Laser Processing form by retrofit.
In addition, be provided with the pressurizing block 4 that is used for adjusting the described gap N1 width that spues on described nozzle body 2, described pressurizing block 4 is clipped in the guide groove 6 that is formed at nozzle body 2 one sides.
As shown in Figure 3, it is block that described pressurizing block 4 is, and be clipped in the described guide groove 6, and on a plurality of positions of cutting direction along the described gap N1 that spues at least one pressurizing block can be installed.Described pressurizing block is made by the metal material of permanance and excellent in abrasion resistance.
As shown in Figure 2, can be in the side of gap N1 that spues, separate along the incision direction of described discharge opening and to form one or more guide groove 6.The size of described guide groove 6 is suitable for clamping pressurizing block 4, and the outer opening of one side direction.
In addition, a side of described pressurizing block 4 is formed with the face contact site, and described contact site has the dip plane.The present invention gap N1 that can spue by the surface contact pressure adjustment that produces at described contact site.
For this reason, as shown in Figure 2, present embodiment forms dip plane 8 on described pressurizing block 4, and described dip plane 8 contacts with the upper surface F face of described guide groove 6 obliquely, when described pressurizing block 4 moves, by described dip plane 8 transfer surface contact pressures, to adjust the described gap N1 that spues.
As shown in Figure 4, when described pressurizing block 4 under the state that the upper face F of described dip plane 8 and described guide groove 6 joins, when the peristome of described guide groove 6 moves, produce surface contact pressure, and when mobile, do not produce contact pressure in the other direction.
And as shown in Figure 5, the adjustment pressure Q that is produced by the surface contact pressure of described dip plane 8 is to the above-below direction transmission of described guide groove 6.
That is, the adjustment pressure Q that is produced makes the bent distortion of described nozzle body 2 one lateral bendings, thereby makes the side direction opposite side of the described gap N1 that spues close or mobile to it in the other direction.
Be provided with adjustment part 10 on described nozzle body 2, it is at the described guide groove 6 inner face contact positions of adjusting described pressurizing block 4.Described adjustment part 10 changes the position of described pressurizing block 4 by the adhesion of bolt.
For this reason, in the present embodiment, as shown in Figure 2, the conventional bolt that is made of threaded shank B1 and nut B2 is used in described adjustment part 10, and described threaded shank B1 and described pressurizing block 4 are spirally connected by diagramatic way, and pressurizing block 4 is moved along the axis of described threaded shank B1, thereby change the position of described pressurizing block 4 by screwing described nut B2.
The metal bolts of excellent in abrasion resistance can be used in described adjustment part 10, and the outer cylinder of described threaded shank B1 is formed with right-hand thread or left-hand thread.
And the nut B2 of hexangle type or four jiaos of types can be used in described adjustment part 10, or the plain bolt of multiangular inner groovy shape, so that screw with various tools such as wrench or screwdrivers.
As shown in Figure 2, described adjustment part 10 is fixedly installed on the carriage 12, and is hung on the nozzle body 2 by described carriage 12 holders.As shown in the figure, described carriage 12 has horizontal part V1 and vertical portion V2.Described horizontal part V1 is inserted in the described guide groove 6 and uses bolt, and it is suitable for supporting the bottom surface of described pressurizing block 4.Described vertical portion V2 contacts with a side of described nozzle body 2, and hides the peristome of described guide groove 6, and after the threaded shank B1 of described adjustment part 10 ran through described vertical portion V2, described nut B2 then held in the palm the outside that hangs over carriage 12, as shown in the figure.
The metal material of carriage 12 useful life longevities and excellent in abrasion resistance is made.Described carriage 12 is held adjustment part 10, so that it can stably be operated on described nozzle body 2.
Described adjustment part 10 can change the position of pressurizing block 4 in described guide groove 6 by screwing described nut B2 in the other direction to a certain direction or its, therefore, can suitably adjust the adjustment pressure Q that described dip plane 8 is produced.
As mentioned above, the slit coating apparatus that the embodiment of the invention is related as shown in Figure 6, by screwing described adjustment part 10, changes the position of described pressurizing block 4, and by this operation, makes the bent distortion of a certain lateral bending of above-mentioned discharge opening N.The present invention can adjust the compressed gap N1 of nozzle simply by this indirect adjustment mode.
As mentioned above, this indirect adjustment mode of utilizing pressurizing block 4, with the pitch of utilizing bolt in the past, by elasticity bolt the direct adjustment mode that spues gap turn narrow or broaden is compared, can control the pressure that is used for the adjusting play easily, and can finely tune the gap, thereby further improve operability and operational stability.
In addition, under the controlled state of gap N1 that spues, the upper surface of pressurizing block 4 and bottom surface be squeezed and produce desire with described pressurizing block 4 along the dip plane 8 power that move to the direction of removing contact force, and under the effect of this power the described adjustment part 10 of tension.That is, this structure can prevent to greatest extent that described adjustment part 10 from being shaken or impact etc. is former thereby rotate to a certain direction after adjustment spues gap N1, to keep the adjustment state of the gap N1 that spues.
Therefore, as shown in Figure 1, during to substrate G coating sensitization liquid W, can require to utilize described adjustment part 10, suitably adjust the gap N1 that spues according to coating.

Claims (5)

1. a slit coating apparatus is characterized in that, comprising:
Worktable carries out the light sensitive liquid coating operation to substrate on its work top;
Nozzle body, it has slit outlet, and is fixed on a side of described work top;
Pressurizing block, it is sandwiched the guide groove inboard, and described guide groove is formed on a side of described nozzle body discharge opening;
The face contact site, it is formed at a side surface of pressurizing block, and with the lopsidedness state of contact of described guide groove inside surface under, in described guide groove, produce the contact pressure of above-below direction by mobile pressurizing block;
The adjustment part, itself and described pressurizing block are spirally connected, and by making described pressurizing block advance or retreat, produce pressure at described contact site along the vergence direction of described contact site, thereby make described discharge opening the bent distortion of a lateral bending and to opposite side near or move in the other direction to it.
2. slit coating apparatus according to claim 1 is characterized in that:
Described contact site be formed obliquely on described pressurizing block or below, perhaps upper and lower surface.
3. slit coating apparatus according to claim 1 is characterized in that:
On at least one position of cutting direction along described discharge opening, a pressurizing block or at least two pressurizing block that are spaced apart are set.
4. slit coating apparatus according to claim 1 is characterized in that:
Described applying device further comprises the carriage that is used to set off the adjustment part, and when moving forward and backward pressurizing block, described carriage is held and fixing adjustment part, makes it keep suspension status on specific direction in described nozzle body.
5. slit coating apparatus according to claim 1 is characterized in that:
Described guide groove is formed on along discharge opening and cuts on the position, at least one place of direction.
CN2007100976038A 2006-08-09 2007-04-20 Slit coating apparatus Active CN101122747B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020060075121 2006-08-09
KR10-2006-0075121 2006-08-09
KR1020060075121A KR100756563B1 (en) 2006-08-09 2006-08-09 Slit coating apparatus

Publications (2)

Publication Number Publication Date
CN101122747A true CN101122747A (en) 2008-02-13
CN101122747B CN101122747B (en) 2010-08-11

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Application Number Title Priority Date Filing Date
CN2007100976038A Active CN101122747B (en) 2006-08-09 2007-04-20 Slit coating apparatus

Country Status (3)

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KR (1) KR100756563B1 (en)
CN (1) CN101122747B (en)
TW (1) TWI322715B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115518828A (en) * 2021-06-24 2022-12-27 株式会社斯库林集团 Slit nozzle, method for adjusting slit nozzle, and substrate processing apparatus
WO2023237452A1 (en) * 2022-06-08 2023-12-14 Carl Zeiss Smt Gmbh Component for a projection exposure apparatus for semiconductor lithography and projection exposure apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100969358B1 (en) * 2008-06-30 2010-07-09 주식회사 디엠에스 Slit nozzle
KR100987184B1 (en) 2008-08-22 2010-10-11 주식회사 디엠에스 Slit nozzle
JP7054810B2 (en) * 2019-04-01 2022-04-15 パナソニックIpマネジメント株式会社 Inkjet head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100619399B1 (en) * 2004-06-03 2006-09-08 동부일렉트로닉스 주식회사 Apparatus for coating substrate with resist materials

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115518828A (en) * 2021-06-24 2022-12-27 株式会社斯库林集团 Slit nozzle, method for adjusting slit nozzle, and substrate processing apparatus
WO2023237452A1 (en) * 2022-06-08 2023-12-14 Carl Zeiss Smt Gmbh Component for a projection exposure apparatus for semiconductor lithography and projection exposure apparatus

Also Published As

Publication number Publication date
TW200808461A (en) 2008-02-16
KR100756563B1 (en) 2007-09-07
TWI322715B (en) 2010-04-01
CN101122747B (en) 2010-08-11

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ASS Succession or assignment of patent right

Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD.

Effective date: 20140227

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20140227

Address after: Gyeonggi Do, South Korea

Patentee after: Display Production Service Co., Ltd.

Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd

Address before: Gyeonggi Do, South Korea

Patentee before: Display Production Service Co., Ltd.

CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province

Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd.

Patentee after: DMS Co.,Ltd.

Address before: Gyeonggi Do, South Korea

Patentee before: DMS Co.,Ltd.

Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd.