CN101103247A - Method for aligning micro-apertures of parts using laser difflection patern and system using the same - Google Patents
Method for aligning micro-apertures of parts using laser difflection patern and system using the same Download PDFInfo
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- CN101103247A CN101103247A CNA2005800315782A CN200580031578A CN101103247A CN 101103247 A CN101103247 A CN 101103247A CN A2005800315782 A CNA2005800315782 A CN A2005800315782A CN 200580031578 A CN200580031578 A CN 200580031578A CN 101103247 A CN101103247 A CN 101103247A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
- G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
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Abstract
Provided is a method for aligning apertures using a laser. The apertures are vertically aligned by producing diffraction patterns using beams of the laser.
Description
Technical field
The present invention relates to a kind of method of utilizing laser diffraction pattern (diffraction pattern) calibration micropore, relating more specifically to a kind of being used for will accurately be aligned in the method and system on the common axis such as the hole (being similar to very little various pin holes) of the parts of electronic lens at micro-electron beam equipment, the a plurality of quadrilaterals in the described micro-electron beam equipment or the central authorities of circular film have pore, thereby by analyzing the interference fringe that is produced by the laser beam of passing these holes described diaphragm multilayer are calibrated.
Background technology
Traditionally, the electronic lens in the micro-electron beam equipment (being that the centre of several microns diaphragm forms several microns circular holes to the hundreds of micron wherein) multilayer calibration at thickness.For this calibration, use equipment such as high power optical microscope or calibrating device.
Yet this method has a problem, that is: calibration accuracy is determined by the resolution of microscope or calibrating device, is difficult to check final calibration, and will use expensive equipment.
In order to address this problem, the applicant has found a kind of method of utilizing the laser calibration hole, and wherein said hole is formed on a plurality of parts place, and utilizes the diffractogram that laser beam produced that passes these holes to come these holes of vertical calibration.This method is filed an application and is given a patent application number 2001-0040196 as scheduled to Korea S Department of Intellectual Property.By this existing method, can utilize based on wave optics, accurate linear stage etc. and the diffractogram that when waiting phase laser beam to pass the hole of given shape, produces, based on the simple relatively punctulate diaphragm of technology multilayer calibration tool.
Yet there is a shortcoming in existing method, that is: because the diffractogram that produces by the typical laser beam of passing the hole is calibrated the hole of various sizes, so precision reduction when hole small-sized.In addition, when each parts were provided with a plurality of hole, promptly when each lens of micro-column were multilayer type such as chip type (wafer type), the hole of each parts should vertical calibration.In this case, when another row hole was calibrated in calibration one row hole then, common axis was departed from owing to vibration waits in previous calibrated hole.As a result, existence should be calibrated the problem in previous calibrated hole once more.In addition, the existing calibration steps that utilizes laser-beam diffraction figure does not have special problem when and these holes similar to the sectional dimension of laser beam are similar each other in the size of lens opening to be calibrated, but at lens opening to be calibrated various (that is, differing from one another) thus the time exist and can not accurately produce the problem that diffractogram can not accurately be calibrated.
In addition, for the analysis of diffractogram, may be difficult to carry out Accurate Analysis by the visual analyzing of bore hole or CCD (charge-coupled device (CCD)) camera.This be because be difficult to eliminate between individuality the vision difference or to the subjective judgement of pattern, thereby may produce error to accurate calibration.
In addition, there is a problem in this method, that is: because need time for reading when producing in enormous quantities, so be difficult to carry out High-efficient Production.
Summary of the invention
Technical matters
One object of the present invention is to provide a kind of method and system that is used to calibrate the hole of lens etc., wherein according to the size focussed laser beam in the hole of lens etc., gives birth to diffractogram thereby assemble real estate more in mode more accurately.
Another object of the present invention is to provide a kind of method and system that is used to calibrate the hole of a plurality of lens etc., wherein calibrate two or more holes, thereby other hole is calibrated together.
It is a kind of analyzing the method for diffractogram with compare simple more mode by bore hole or CCD camera that another purpose of the present invention is to provide, and a kind of method that is used for calibration hole.
Technical scheme
A kind ofly be used to utilize at least one laser instrument to calibrate the method for micropore according to of the present invention, this method may further comprise the steps:
Parts with one or more holes (hereinafter referred to as " first parts ") in a plurality of parts are fixed on first platform, thereby make laser beam can pass described hole;
Described laser beam is focused on the described hole of described first parts;
Utilize described laser beam that primary calibration is carried out in the described hole of described first parts, thereby the laser beam that makes focusing can be passed the described hole of described first parts, to produce the first accurate diffractogram according to the shape in the described hole of described first parts on screen or imageing sensor, described screen or imageing sensor and described first parts are spaced a predetermined distance from; And
With another parts in described a plurality of parts (hereinafter referred to as " second parts ") with more than one hole be arranged in described first parts above or below, and utilize second secondary calibration to be carried out in the described hole of described second parts by described laser beam, thereby make described laser beam can pass the described hole of described second parts, on described screen, produce the second accurate diffractogram with shape according to the described hole of described second parts.
In addition, a kind of wherein each parts all is formed with at least one datum hole according to the method that is used to calibrate a plurality of parts of the present invention, the method is characterized in that, the method for the micropore by being used for calibrator unit is calibrated described a plurality of parts.
In addition, a kind of according to the system that is used to calibrate the hole of a plurality of parts of the present invention, this system comprises:
At least one laser instrument; At least one condenser lens, described condenser lens are used for the light beam from described laser instrument emission and beam split is focused on; First, this first parts (hereinafter referred to as " first parts ") that are used for fixing adjustably described a plurality of parts, thus make the laser beam that is focused on by described condenser lens pass the hole that is used to calibrate of described first parts; Second, this second another parts (hereinafter referred to as " second parts ") that are used for fixing adjustably described a plurality of parts, thus make the laser beam in the described hole of passing described first parts pass the hole that is used to calibrate of described second parts; And at least one screen or imageing sensor, the laser beam of passing the described hole of described second parts is incident upon on described screen or the imageing sensor.
It is identical with the instruction of korean patent application No.2001-0040196 to utilize laser beam to carry out calibration principle, thereby by reference it is incorporated into this.
As shown in Figure 1, be used to utilize the present invention of laser beam alignment micropore to utilize principle of interference.Specifically, the interference fringe that is produced by the light of the first micropore a that passes primary diaphragm ml is in each distance y from central authorities to m destructive interference striped
mThe place brightens by means of constructive interference.Thereby, when utilizing ccd image sensor or screen to measure interference fringe, when on the screen of the monitor (not shown) that is connected to imageing sensor or screen, observing, can find out the position of the interference fringe that produces by accurate constructive interference and destructive interference.As shown in Figure 1, provide y by following equation
m: y
m=s/a * m * λ, wherein a is the diameter in hole, and s is the distance between target membrane and the screen, and m is a natural number, and the how many times destructive interference takes place in its expression, and λ is a Wavelength of Laser, and it is as optical source wavelength.
Under this state, the secondary diaphragm m2 that will have the micropore b that is used for optical correction is plugged between the primary diaphragm m1 and screen (CCD) with micropore a, and with CCD partition distance s.In this case, when the calibration out of true of micropore, change in the brightest position corresponding to m=0.In addition, similar with the micropore that is used for optical correction, first and second lenticules are aligned on the straight line.Thereby a plurality of diaphragms can be aligned on the straight line.
In addition, when obtain in advance between optical maser wavelength and diaphragm and the ccd sensor definite apart from the time, can be from the position y of the interference fringe that records at monitor
mCalculate the definite diameter of electronic lens with respect to each diaphragm.
Beneficial effect
As mentioned above, the method and system that is used for calibrating by focussed laser beam micropore according to the present invention can easily be calibrated described micropore at short notice.
The method and system that is used to calibrate micropore according to the present invention can easily be calibrated the parts with a plurality of micropores at short notice.
Description of drawings
Fig. 1 is the synoptic diagram that ultimate principle of the present invention is shown.
The schematically illustrated structure that is used to use equipment of the present invention of Fig. 2.
Fig. 3 schematically illustrated according to the present invention the example of calibration hole.
Fig. 4 is the top view as the detecting device that is used to check laser diffraction pattern according to another embodiment of the present invention.
The schematically illustrated example of utilizing the detecting device calibration hole of Fig. 4 of Fig. 5.
Embodiment
Hereinafter describe exemplary embodiment of the present invention with reference to the accompanying drawings in detail.
The schematically illustrated structure that is used to use equipment of the present invention of Fig. 2.Be divided into two light beams 22 and 23 from laser instrument 20 emitted light beams 21 by optical splitter 30.In Fig. 2, first light beam 22 is propagated under the constant situation in path, and propagate in other hole but second light beam 23 is reflected by mirror 40 towards parts 1 and 2.First light beam 22 and second light beam 23 focus on by condenser lens 60 and 60a respectively, pass the calibration hole of first parts 1 and second parts 2, and are incident upon on the screen 10., it is adjusted to by first and second focused beams diffractogram is incident upon on the screen 10 along the hole that X-Y-θ direction moves first parts 1 by platform 80.After the hole of first parts 1 is calibrated, second parts 2 are fixed and adjusted to the platform 70 that comprises chuck and lens support 71, thereby adjust the calibration hole of second parts 2 along X-Y-Z-θ direction, feasible laser beam of passing the hole of first parts 1 is passed the hole of second parts 2, so that diffractogram is incident upon on the screen.Condenser lens 60 and 60a are fixed by XYZ platform 50 and 50a respectively, and light beam 22 and 23 are focused on the calibration hole of first parts.Thereby variable adjustment is carried out in this focusing by platform 50 and 50a.These can focus on according to the size or the distance adjustment of calibration hole.
Fig. 3 is the concept map that the example of two holes of each parts in three laminated members being calibrated according to the present invention is shown.In Fig. 3,, when as among Fig. 2, using optical splitter, can use single laser instrument though show two laser instruments.With the hole count of each laminated member condenser lens is set pro rata.The laser beam that is focused lens focus is passed the hole of three laminated members respectively, thereby produces diffractogram on screen.
Fig. 2 and Fig. 3 show the example by two laser beam alignments, two row holes.Can alternatively in Fig. 2, can a laser beam be divided into three or more light beams, perhaps can as among Fig. 3, use a plurality of laser instruments by optical splitter.Thereby can calibrate more hole simultaneously.If calibrator unit is equipped with a hole, then can under situation, use laser instrument without optical splitter.
In Fig. 3, the hole of parts can not be equal to each other.Preferably, at first calibrate parts, calibrate other parts then thereon with minimum aperture.If the appointment calibration sequence is then at first calibrated the outmost parts with minimum aperture, and used as calibration reference.In addition, can be by changing focusing distance by means of adjustment condenser lenses such as platforms.If thereby the Kongzui of intermediate member is little, just focuses on based on interstitial hole, adjusts then.According to the present invention, focus on and be intended to make as much as possible laser beam to pass the hole of parts, just can make maximum laser beam pass all calibration holes.When according to circumstances changing focusing, can more accurately calibrate.In order to change this focusing, can to install the automatic interchanger that is used for various condenser lenses and making its robotization, the platform that perhaps is used for condenser lens can be adjusted automatically.Thereby can promptly calibrate.
In addition, according to the present invention, the hole of each parts is two or more.For example, the lens of micro-column are made for the multilayer type of similar chip type, thereby each lens jacket has a plurality of holes.When these lens should be calibrated, perhaps when each parts to be calibrated have a plurality of datum hole that is used to calibrate, can be by based on the calibration in three or more holes and more accurately calibrate lens or parts.In this case, though each diffractogram exists to a certain degree skew or deflection such as distortion, when this deflection is constant, and in the time can compensating each common axis, can finish calibration by analyzing diffractogram by another part.When some holes in the lens of micro-column are deflected, can easily compensate the deflection that departs from each common axis to a certain extent by the control deflector.In the time should compensating deflection, advantageously calibrate three holes, cause calibrating out of true because calibrate two holes.Specifically, although two holes have different deflection, when determining deflection, may be not easy to compensate deflection based on two holes.By contrast, when determining deflection, can determine deflection with accurate way more based on three or more holes.In this case, the preferred hole that distributes and be used to calibrate widely.
In addition, can store the diffractogram that produces on the screen.In this case, monitoring diffractograms such as the monitor by being connected to screen, and diffractogram is stored in is connected in monitor inside or the outside register.As the example of the using method of the diffractogram of being stored, the pre-if diffractogram of storage of contrast to be determining levels of collimation, thereby adjusts and calibrate the platform that is used for calibrator unit etc. automatically.Automatically calibrator unit thus.
In addition, the hole of parts has the different shape such as circle, polygon, ellipse or the like, and can produce diffractogram, and institute is porose all can calibrate according to the present invention.
Described the present invention, but the invention is not restricted to specific embodiment about specific embodiment.
In Fig. 2 and Fig. 3, only use a laser instrument, and use optical splitter 30 and mirror 40.Laser beam can be become two or more by optical splitter 30 beam split.When using two or more optical splitters, laser beam can be become more a plurality of to calibrate two or more holes simultaneously by beam split.Yet, when using two laser instruments or using optical fiber, do not need optical splitter and mirror, perhaps can use independent optical splitter to separate optical fiber.In other words, in all sorts of ways in order to use two or more laser beam, can to make in the present invention.Those skilled in the art can revise or change the example of using the laser instrument identical with required laser beam quantity in every way, perhaps the example that the laser beam beam split is used.
Fig. 4 is the top view that illustrates as the detecting device that is used to check laser diffraction pattern according to another embodiment of the present invention, and this detecting device is used for determining more easily the shape of diffractogram.
The detecting device of Fig. 4 can change into the amount of laser beam of irradiation another amount such as voltage or electric current.As typical case, be provided with photodiode, it can change into light quantity the voltage or the magnitude of current.
The present invention is based on such principle, that is, when between the hole, accurately calibrating, produce the laser-beam diffraction figure of concentric circles.In other words, the present invention is suitable for determining more easily offering the shape of the diffractogram of detecting device, rather than the shape by the examine diffractogram.
Thereby, the detecting device 200 of Fig. 4 has x axle boundary line 220a and y axle boundary line 220b, they are based on dividing whole zone in the hole to be calibrated 210 of central authorities (for example lens opening), and mark off four zones 231,232,233 and 234 by x axle boundary line 220a and y axle boundary line 220b.When the laser beam of passing hole to be calibrated is positioned at the central authorities of detecting device 200 and produces the diffractogram that is made of complete concentric circles, can measure current value or magnitude of voltage in the same manner for each zone.Therefore, when does not calibrate in the hole of parts to be calibrated, can not produce complete concentric circles.As a result, current value or magnitude of voltage are regional and different according to each.In this case, by utilizing different value location and calibrating hole to be calibrated once more.In order to calibrate parts to be calibrated, can use the value that records with respect to each zone in every way.For example, described value is suitable for being equal to each other, and perhaps for each zone, does not have difference between these values.
In order to use the detecting device of Fig. 4, preferably after calibration in advance, use laser beam and detecting device.And the central authorities at the detecting device of Fig. 4 form hole 210, but this is optional.In other words, as long as can accurately obtain with respect to each regional data.Can be by the laser beam pattern on the zone 231,232,233 and 234 that is radiated at detecting device by amount of beam analysis with corresponding amplifier of detecting device or controller (determining) irradiation according to selected detecting device.
The schematically illustrated example of utilizing the detecting device calibration hole of Fig. 4 of Fig. 5.Laser beam 390 is passed parts to be calibrated 310 and produce a pattern 351 on detecting device 320, and laser beam 390 is passed the hole 321 of detecting device and produce secondary pattern 361 on screen 360 then.
In Fig. 4 and Fig. 5, when only checking a pattern by detecting device, the hole 210 or 321 of detecting device is optional.Yet in the time should checking the secondary pattern of passing detecting device in addition, the similar hole, hole of formation and parts to be calibrated is to observe secondary pattern.In this case, can adjust and inspection device and laser beam between calibration.In other words, thereby change the path of laser beam when going wrong, can easily find this problem by secondary pattern when the position of detecting device during operation.In addition, during calibration between initialization detecting device and laser instrument, can easily calibrate.In addition, can whether have any foreign matter in the inspection hole, and whether the structure in hole is different.
Industrial applicability
By the method and system according to the hole be used to utilizing the laser calibration parts of the present invention, can With with the hole of mode calibrator unit accurately and fast.
Claims (12)
1. method that is used to calibrate the hole of a plurality of parts, this method may further comprise the steps:
The parts hereinafter referred to as " first parts " with more than one hole in described a plurality of parts are fixed on first platform, thereby make the light beam of at least one laser instrument can pass described hole;
Described laser beam is focused on the described hole of described first parts;
Utilize described laser beam that primary calibration is carried out in the described hole of described first parts, thereby the laser beam that makes focusing can be passed the described hole of described first parts, produce the first accurate diffractogram with the shape according to the described hole of described first parts on screen or imageing sensor, described screen or imageing sensor and described first parts are spaced a predetermined distance from; And
With in described a plurality of parts have more than one hole hereinafter referred to as another arrangements of components of " second parts " above or below described first parts, and utilize second secondary calibration to be carried out in the described hole of described second parts by described laser beam, thereby make described laser beam can pass the described hole of described second parts, on described screen, produce the second accurate diffractogram with shape according to the described hole of described second parts.
2. method according to claim 1, it is characterized in that, after described secondary calibration step, by repeating the step identical and repeating the number of times identical and calibrate described other parts with the quantity of other parts for the treatment of other calibration with described secondary calibration step.
3. method according to claim 1 and 2 is characterized in that, at least two holes of each in described first parts and second parts are by repeating said steps or be calibrated simultaneously.
4. according to each described method in the claim 1 to 3, it is characterized in that, determine the calibration in the described hole of parts by the shape calibration of utilizing at least one laser beam detector to analyze the diffractogram on the described screen.
5. according to each described method in the claim 1 to 3, it is characterized in that, this method is further comprising the steps of: utilize charge-coupled device (CCD), monitor and register sensing and write down described first diffractogram of described first parts, and will compare except the diffractogram of described first parts of other diffractograms of the described a plurality of parts described first parts and precedence record.
6. according to each described method in the claim 1 to 5, it is characterized in that, this method is further comprising the steps of: the distance between each parts in described laser instrument and the described a plurality of parts is preset as preset distance, and according to the size in the hole of each calibrator unit of location test of the interference fringe of each diffractogram.
7. method that is used to calibrate a plurality of parts, each parts in described a plurality of parts all are formed with at least one datum hole, the method is characterized in that, by calibrating described a plurality of parts according to each described method in the claim 1 to 6.
8. method according to claim 7 is characterized in that, described datum hole is two.
9. system that is used to calibrate the hole of a plurality of parts, this system comprises:
At least one laser instrument;
At least one condenser lens, described condenser lens are used for the light beam from described laser instrument emission and beam split is focused on;
First, this first parts that are used for fixing adjustably described a plurality of parts hereinafter referred to as " first parts ", thus make the laser beam that is focused on by described condenser lens pass the hole that is used to calibrate of described first parts;
Second, this second another parts that are used for fixing adjustably described a plurality of parts hereinafter referred to as " second parts ", thus make the laser beam in the described hole of passing described first parts pass the hole that is used to calibrate of described second parts; And
At least one screen or imageing sensor, the laser beam of passing the described hole of described second parts is incident upon on described screen or the imageing sensor.
10. system according to claim 9 is characterized in that, this system also comprises:
At least one optical splitter, described optical splitter is used for according to the quantity in the hole of described a plurality of each parts of parts the light beam that sends from described laser instrument being carried out beam split, and described condenser lens is used for will being focused on by the light beam of described optical splitter beam split according to the quantity of beam split light beam
Wherein, described first and described second is adjusted to and allows described beam split light beam to pass the hole that is used to calibrate.
11., it is characterized in that this system also comprises corresponding described of the parts of quantity and needs calibration according to claim 9 or 10 described systems, the described hole of a wherein three or more parts is calibrated.
12., it is characterized in that described imageing sensor is as laser beam detector, to determine the calibration in the described hole of parts by the shape of analyzing described diffractogram according to each described system in the claim 9 to 11.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20040079718 | 2004-09-20 | ||
| KR1020040079718 | 2004-09-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101103247A true CN101103247A (en) | 2008-01-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2005800315782A Pending CN101103247A (en) | 2004-09-20 | 2005-09-20 | Method for aligning micro-apertures of parts using laser difflection patern and system using the same |
Country Status (3)
| Country | Link |
|---|---|
| KR (2) | KR20090091214A (en) |
| CN (1) | CN101103247A (en) |
| WO (1) | WO2006033544A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114061491A (en) * | 2021-11-30 | 2022-02-18 | 北京理工大学珠海学院 | Method for observing micropore defect by laser |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102322825B (en) * | 2011-06-02 | 2013-02-20 | 南京航空航天大学 | Optical measuring system and method for coaxiality of extra-long-hole part |
| CN102645171B (en) * | 2012-05-14 | 2014-06-25 | 厦门理工学院 | Device and method for measuring size and roundness of tiny round hole at same time |
| KR101437058B1 (en) * | 2013-01-31 | 2014-09-05 | 한국항공우주연구원 | Apparatus for the concentricity adjustment and method for concentricity adjustment using the same |
| GB201604940D0 (en) * | 2016-03-23 | 2016-05-04 | Stfc Science & Technology | Laser-chain alignment |
| KR102056920B1 (en) * | 2017-10-31 | 2020-01-22 | 한국생산기술연구원 | Diffraction Alignment System for TDLAS of Simultaneous Measurement of Multicomponent Gas |
| WO2019045138A1 (en) | 2017-08-30 | 2019-03-07 | 한국생산기술연구원 | Alignment system for tdlas for simultaneously measuring multicomponent gas |
| KR102056794B1 (en) | 2017-10-31 | 2019-12-18 | 한국생산기술연구원 | Alignment System for TDLAS of Simultaneous Measurement of Multicomponent Gas using Micro Optical Passage |
| KR102056799B1 (en) | 2017-10-31 | 2019-12-18 | 한국생산기술연구원 | Automatic Alignment System for TDLAS of Simultaneous Measurement of Multicomponent Gas |
| KR102401179B1 (en) | 2017-12-12 | 2022-05-24 | 삼성전자주식회사 | Aperture system of electron beam apparatus, electron beam exposure apparatus, and electron beam exposure apparatus system |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6255542A (en) * | 1985-09-04 | 1987-03-11 | Mitsubishi Electric Corp | Optical system inspecting device |
| JP2000294485A (en) * | 1999-04-02 | 2000-10-20 | Nikon Corp | Method for regulating electric charged particle beam projection aligner |
| KR100474141B1 (en) * | 2001-07-06 | 2005-03-08 | 전자빔기술센터 주식회사 | Method for aligning apertures of parts using laser and method for aligning parts using the same |
-
2005
- 2005-09-20 CN CNA2005800315782A patent/CN101103247A/en active Pending
- 2005-09-20 WO PCT/KR2005/003112 patent/WO2006033544A1/en active Application Filing
- 2005-09-20 KR KR1020097013909A patent/KR20090091214A/en not_active Application Discontinuation
- 2005-09-20 KR KR1020077005727A patent/KR20070052789A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114061491A (en) * | 2021-11-30 | 2022-02-18 | 北京理工大学珠海学院 | Method for observing micropore defect by laser |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090091214A (en) | 2009-08-26 |
| KR20070052789A (en) | 2007-05-22 |
| WO2006033544A1 (en) | 2006-03-30 |
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