CN101030047A - Anticorrdant stripping waste liquor regeneration method and device - Google Patents
Anticorrdant stripping waste liquor regeneration method and device Download PDFInfo
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- CN101030047A CN101030047A CNA2007100861621A CN200710086162A CN101030047A CN 101030047 A CN101030047 A CN 101030047A CN A2007100861621 A CNA2007100861621 A CN A2007100861621A CN 200710086162 A CN200710086162 A CN 200710086162A CN 101030047 A CN101030047 A CN 101030047A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Extraction Or Liquid Replacement (AREA)
Abstract
The invention provides a recycling method and a recycling device of a resist stripper scrapped liquid, especially suitable for economical recycling a resist stripper scrapped liquid which is generated when in a stripping process using a stripper scrapped liquid containing various special amine compounds and when using various resists and stripper scrapped liquid. The recycling device is suitable for being used in the recycling method. The resist stripper scrapped liquid recycling method of the invention is a method for recycling a resist stripper scrapped liquid containing water, resists, amine compounds and an organic solvent, the method is characterized by containing: (a) an acid adding process in which an acid is reacted with the amine compounds of the resist stripper scrapped liquid so that the amine compounds is formed as amine-acid coumpounds which would not be distilled when distilling the organic solvent; and (b) a process for distilling the reaction products obtained in the process (a) to obtain the organic solvent.
Description
Technical field
The present invention relates to resist stripping waste liquor regeneration method and regenerating unit, be particularly related to following resist stripping waste liquor regeneration method and regenerating unit, described renovation process is the method that the resist stripping waste liquor that contains water, resist, amines, organic solvent is regenerated, and this method is particularly suitable for the resist stripping waste liquor that better economy ground produced when use being contained the stripping process of stripper of various special amines and when using various resists and stripper and regenerates.
Background technology
In order to make display device such as integrated circuit (IC), high density integrated circuit having (LSI), superelevation integrated circuit semiconductor elements such as (VLSI) and liquid crystal display cells, to implement multistage photoetch operation and resist stripping process repeatedly, produce a large amount of resist stripping waste liquors thus.Particularly owing to the maximization rapidly of display base plate areas such as liquid crystal display cells, the consumption of stripper increases significantly, has further proposed the requirement that utilizes again for stripping waste liquor.
After the resist stripping process uses the stripper waste liquid contain resist, moisture, various organic amine compound and organic solvent.Usually adopted the method for burning disposal as the method for this stripper waste liquid being carried out waste treatment in the past, but because this method is released to incineration gases in the atmosphere, not only environment there is harmful effect, and the composition that can utilize again in the stripper waste liquid also goes out of use, so be not preferred aspect economy, thereby carried out a large amount of research for the regeneration of stripping waste liquor.
In addition, recently, owing in semiconductor and display manufacturing process, further require precision and characterization, so carry out being suitable for most the sectionalization of the photoresist of each operation more, for the composition of employed anticorrosive additive stripping liquid controlling in each stripping process, the kind and the content of in use various organic amines and organic solvent also are segmented.
As the example that regeneration resist stripping waste liquor is attempted, in the following patent documentation 1 (korean patent application 10-2002-0075235 number), a kind of regenerating unit of resist stripping waste liquor is disclosed, the regenerating unit of this resist stripping waste liquor is the regenerating unit that the resist stripping waste liquor that contains alkanolamine, organic solvent and resist is regenerated, and this regenerating unit has membrane separation device, concentration is adjusted jar, alkanolamine feed unit, organic solvent feed unit; It is 100～1500 film that described membrane separation device has molecular cut off, uses above-mentioned film that above-mentioned resist stripping waste liquor is separated into concentrate and sees through liquid; Described concentration is adjusted the above-mentioned liquid that sees through of jar storage, is used for adjusting the above-mentioned alkanolamine of liquid and the concentration of organic solvent of seeing through; Described alkanolamine feed unit is used for adjusting a jar supply alkanolamine to above-mentioned concentration; Described organic solvent feed unit is used for adjusting a jar supply organic solvent to above-mentioned concentration.Said method is that the alkanolamine that utilizes in the resist stripping waste liquor to be contained and organic solvent see through nanometer film and resist does not see through the character of nanometer film and method that stripper is regenerated.
Approach by other has carried out various trials to the regeneration of resist stripping waste liquor in addition, but because disposable separation organic solvent and various amines, so be unsuitable for the stripping waste liquor that is produced in the various photoresists that are segmented that use special amines and the stripping process is regenerated, and when in semiconductor and display manufacturing process, using multiple resist and stripper, because what adopt in the existing anticorrosive additive stripping liquid controlling renovation process is that organic solvent and various amines are carried out disposable mode of separating, thereby its utilization is restricted, and further requirement can be removed the resist in the resist stripping waste liquor, moisture and organic amine compound and the method for only economically organic solvent being regenerated.
[patent documentation 1] korean patent application 10-2002-0075235 number
Summary of the invention
In order to solve above-mentioned prior art problems, the objective of the invention is to, a kind of resist stripping waste liquor regeneration method and regenerating unit are provided, the kind of the amines that is contained in described renovation process and the anticorrosive additive stripping liquid controlling is irrelevant, by the high organic solvent of price being regenerated and making it be used for anticorrosive additive stripping liquid controlling once more, can further alleviate because the environmental pollution that the resist stripping waste liquor is caused, by the high organic solvent of price is reused, further reduce expenses.
Other purpose of the present invention is, a kind of renovation process and regenerating unit of resist stripping waste liquor are provided, and the resist stripping waste liquor that is produced when described renovation process is suitable for that in better economy use contained the stripping process of stripper of various special amines and when using various resists and stripper is regenerated.
In order to reach above-mentioned purpose, the invention provides a kind of renovation process of resist stripping waste liquor, it is the method that the resist stripping waste liquor that contains water, resist, amines, organic solvent is regenerated, and the method is characterized in that it contains:
(a) add sour operation, the amines of described acid and resist stripping waste liquor reacts, the amine-acid compound that is not distilled when making amines be formed on the organic solvent distillation; With
(b) reaction product of above-mentioned (a) operation is distilled respectively, only obtain the operation of organic solvent.
The present invention also provides a kind of resist stripping waste liquor regenerating unit, and this regenerating unit is characterised in that it contains:
(a) contain the hold-up tank of the pending resist stripping waste liquor of water, resist, amines, organic solvent;
(b) sour hold-up tank;
(c) acid of being carried by above-mentioned sour hold-up tank is added in the stripping waste liquor of being carried by the hold-up tank of above-mentioned pending resist stripping waste liquor, made the amines and sour retort of reacting of stripping waste liquor;
(d) alembic that the stripping waste liquor of being carried by above-mentioned retort is distilled respectively; And
(e) the organic solvent hold-up tank that the organic solvent that distills out respectively with above-mentioned alembic is respectively captured and stores.
Has following effect based on anticorrosive additive stripping liquid controlling renovation process of the present invention and regenerating unit: the influence of the kind of the amines that it is not subjected in the anticorrosive additive stripping liquid controlling to be contained, by the high organic solvent of price being regenerated and making it be used for anticorrosive additive stripping liquid controlling once more, can further alleviate because the environmental pollution that the resist stripping waste liquor is caused; By the high organic solvent of price is reused, further reduce expenses; Be particularly suitable in better economy containing in the stripping process of stripper of various special amines and the resist stripping waste liquor that produced when using various resists and stripper is regenerated to use.
Description of drawings
Fig. 1 is based on the synoptic diagram of the resist stripping waste liquor regenerating unit of an embodiment of the invention.
Symbol description
10 pending resist stripping waste liquor hold-up tanks
11 pumps
12 automatic regulating valves
20 sour hold-up tanks
21 pumps
22 automatic regulating valves
30 retort
31 pumps
32 automatic regulating valves
40 alembics
43 single flash jars
44 second distillation jars
45 3 alembics
46 residual component drain tanks
47 relievers
50 organic solvent hold-up tanks
53 condensers
60 amines jars
Embodiment
Hereinafter the present invention will be described in detail.
The inventor finds, in existing resist stripping waste liquor regeneration method, if the resist stripping waste liquor that is produced when organic amine compound and organic solvent are retrieved that simultaneously use contained the stripping process of stripper of various special amines and when using various resists and stripper is regenerated, then can not be used as stripper because the organic amine compound that is reclaimed is different with the organic amine compound of reality use; After corresponding economic renovation process is studied therewith, find, if utilize economic method, remove resist, moisture and organic amine compound in the resist stripping waste liquor, only capture organic solvent then, the organic amine compound that will be suitable for various special strippers subsequently again makes an addition in the organic solvent of regeneration and makes anticorrosive additive stripping liquid controlling, then can solve whole issue this moment, thereby finish the present invention.
The present invention is the method that the resist stripping waste liquor that contains water, resist, amines, organic solvent is regenerated, the method is characterized in that, it contains: the operation of (a) adding acid, the amines of described acid and resist stripping waste liquor reacts, the amine-acid compound that is not distilled when making amines be formed on the organic solvent distillation; (b) reaction product of above-mentioned (a) operation is distilled respectively and only obtain the operation of organic solvent.
Above-mentioned resist stripping waste liquor can contain various organic amine compounds or various organic solvent with the difference of each operation of using stripper.Above-mentioned organic amine compound can be primary amine, secondary amine or tertiary amine, can be fatty amine, aliphatic cyclic amine, aromatic amine, heterocyclic amine, azanol.In addition, above-mentioned organic solvent can contain the single ether of glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethyleneglycol monophenylether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol, the single propyl ether of dipropylene glycol or the dipropylene glycol monobutyl ether of di-alcohols, can contain alkyl pyrrolidones such as dimethyl sulfoxide (DMSO), dimethyl acetamide, dimethyl formamide, dimethyl-imidazolinone, sulfolane or N-Methyl pyrrolidone.
In resist stripping waste liquor regeneration method of the present invention, as the acid of using in above-mentioned (a) operation, as long as it is the amine-acid compound that reacts and be not distilled when making the amines of stripping waste liquor be formed on the organic solvent distillation with amines in the stripping waste liquor, be not particularly limited, can be used alone or as a mixture benzoic acid, citric acid, formic acid, maleic acid, malic acid, salicylic acid, tartrate, acetate, oxalic acid, phosphoric acid, nitric acid, hydrochloric acid, sulfuric acid and perchloric acid etc.For the consumption of acid, need add at least with stripping waste liquor in identical acid equivalent or that be higher than equivalent of equivalent of the amines that contained, preferably carry out excessive interpolation so that the amines noresidue.Further preferably use the reaction product of sour and amine when organic solvent distills respectively, remaining acid can not sneak into acid wherein.
By above-mentioned (a) operation, the composition of pending resist stripping waste liquor contains resist, moisture, amine and the reaction product of acid, remaining acid and organic solvent.
The renovation process of resist stripping waste liquor of the present invention contain to the reaction product of above-mentioned (a) operation distill respectively and the operation that only captures organic solvent as (b) operation.In this operation, by distillation respectively, moisture, acid and organic solvent are distilled out respectively, can only capture organic solvent, and undistilled resist and acid separate by other approach with the reaction product of amine.
The above-mentioned organic solvent that captures respectively can form liquid once more by condenser, thereby can add the amines of special requirement in above-mentioned organic solvent, once more as stripper.
Stripping waste liquor regeneration method of the present invention is not subjected to the influence of the kind of amines, by the high organic solvent of price being regenerated and making it be used for anticorrosive additive stripping liquid controlling once more, can further alleviate because the environmental pollution that the resist stripping waste liquor is caused; By the high organic solvent of price is reused, further reduce expenses.
Hereinafter, as a concrete embodiment of the present invention, to use acetate as sour composition so that the method for following stripping waste liquor regeneration describes; Described stripping waste liquor is produced by each resist stripping process, it is made of amines, organic solvent, moisture and resist, contain MEA (monoethanolamine), MIPA (monoisopropanolamine), n-MEA (N-methylethanolamine) in the described amines, contain dibasic alcohol and alkyl pyrrolidone in the described organic solvent.
The total yield that adds with respect to above-mentioned amines in the stripping waste liquor that is made of amines (it contains MEA, MIPA, n-MEA), organic solvent (it contains dibasic alcohol and alkyl pyrrolidone), moisture and resist is excessive acetate.By adding acetate, acetate and the amines generation amine-acetic acidreaction product that reacts, the acetate that has neither part nor lot in reaction residues in the stripping waste liquor with liquid condition.Then resist, amine-acetic acidreaction product, moisture, the remaining acetate that has neither part nor lot in reaction, the potpourri of organic solvent are distilled respectively, at first distill out moisture, next distills out acetate, the dibasic alcohol of organic solvent and alkyl pyrrolidone and distillation takes place and residual resist and amine-acetic acidreaction product is separated only capture the purpose organic solvent by distillation then.Then, can in the organic solvent that is captured, optionally add amines such as MEA, MIPA or the n-MEA etc. of special requirement, once more as stripper.
In addition, hereinafter, as a concrete embodiment of the present invention, to using oxalic acid (C
2H
2O
4) as sour composition so that the method for following stripping waste liquor regeneration describes; Described stripping waste liquor is produced by each resist stripping process, and it is made of amines, organic solvent, moisture and resist, contains MEA, MIPA, n-MEA in the described amines, contains dibasic alcohol and alkyl pyrrolidone in the described organic solvent.Because described oxalic acid exists with the form of dihydrate at normal temperatures, thereby use oxalic acid dihydrate (C
2H
2O
4H
2O).
The total yield that adds with respect to above-mentioned amines in the stripping waste liquor that is made of amines (it contains MEA, MIPA, n-MEA), organic solvent (it contains dibasic alcohol and alkyl pyrrolidone), moisture and resist is excessive oxalic acid dihydrate.By adding oxalic acid dihydrate, oxalic acid dihydrate and the amines generation amine-oxalic acid reaction product that reacts, the oxalic acid dihydrate that has neither part nor lot in reaction residues in the stripping waste liquor.Then, resist, amine-oxalic acid reaction product, moisture, the remaining oxalic acid dihydrate that has neither part nor lot in reaction, the potpourri of organic solvent are distilled respectively, at first distilling out moisture and oxalic acid dihydrate decomposes and formic acid, carbon dioxide, the carbon monoxide of formation, secondly the dibasic alcohol in the organic solvent is separated with undecomposed oxalic acid dihydrate with residual resist, amine-oxalic acid reaction product with alkyl pyrrolidone, by distillation, only capture the purpose organic solvent.Then, can in the organic solvent that is captured, optionally add amines such as MEA, MIPA or the n-MEA etc. of special requirement, make it once more as stripper.
In addition, the invention provides resist stripping waste liquor regenerating unit, this regenerating unit is characterised in that it contains: the hold-up tank that (a) contains the pending resist stripping waste liquor of water, resist, amines, organic solvent; (b) sour hold-up tank; (c) acid of being carried by above-mentioned sour hold-up tank is added in the stripping waste liquor of being carried by the hold-up tank of above-mentioned pending resist stripping waste liquor, made the amines and sour retort of reacting of stripping waste liquor; (d) alembic that the stripping waste liquor of being carried by above-mentioned retort is distilled respectively; And the organic solvent hold-up tank that (e) organic solvent that is distilled respectively in above-mentioned alembic is respectively captured and stores.
Hereinafter the synoptic diagram shown in Figure 1 of an embodiment by resist stripping waste liquor regenerating unit of the present invention carries out specific description to the present invention.The pending anticorrosive additive stripping liquid controlling that will obtain in each resist stripping process is stored in the pending resist stripping waste liquor hold-up tank 10.Above-mentioned pending resist stripping waste liquor contains resist, and contains various amines such as MEA, MIPA, n-MEA, also contains moisture and organic solvent.The above-mentioned pending resist stripping waste liquor that is stored in the pending resist stripping waste liquor hold-up tank 10 is delivered in the retort 30 along pipe arrangement by pump 11.In order when carrying above-mentioned stripping waste liquor, to regulate the amount of stripping waste liquor, automatic regulating valve 12 can be set at the established part of pipe arrangement.This device also has sour hold-up tank 20 in addition, and it is used for storing the acid that the amines that contained with the resist stripping waste liquor reacts.Above-mentioned acid is preferably acetate or oxalic acid dihydrate.Acid is delivered to the retort 30 along pipe arrangement by pump 21 from above-mentioned sour hold-up tank 20.In order when carrying above-mentioned stripping waste liquor, to regulate the amount of acid, automatic regulating valve 22 can be set at the established part of pipe arrangement.When carrying, the amount of the acid that preferably is transferred is for the equivalent that equates with the total yield of the amines that contained in the stripping waste liquor at least or be excessive.React in retort 30 by the stripping waste liquor of pending resist stripping waste liquor hold-up tank 10 conveyings and the acid of carrying by sour hold-up tank 20, amine-the acid reaction product (for example in formation, amine-acetic acidreaction product or amine-oxalic acid reaction product), the acid that has neither part nor lot in reaction still is present in the stripping waste liquor, at this moment, contain resist, Acid-Base reaction product, moisture, the acid that has neither part nor lot in reaction, organic solvent in the stripping waste liquor.The stripping waste liquor that finishes above-mentioned reaction is delivered to alembic 40 by pump 31 along pipe arrangement from retort 30.In order when carrying above-mentioned stripping waste liquor, to regulate the amount of stripping waste liquor, can be provided with automatic regulating valve 32 at the established part of pipe arrangement.The composition that distills out in the stripping waste liquor respectively to be contained by the rising temperature in alembic 40 also captures.Preferred above-mentioned alembic 40 is divided into the single flash jar 43 that is used to capture moisture in being provided with, be used to capture the second distillation jar 44 of acid, be used to capture three alembics 45 and the residual component drain tank 46 of organic solvent.When using acetate as acid, the moisture that is contained in the stripping waste liquor is captured by single flash jar 43, the acetate that has neither part nor lot in reaction is captured by second distillation jar 44, organic solvent is captured by three alembics 45, and the reaction product of resist and amine-acetate distillation does not take place is discharged to residual component drain tank 46.Preferred above-mentioned alembic 40 can be provided with reliever 47 in addition, and can reduce vapo(u)rizing temperature this moment.To be delivered to organic solvent hold-up tank 50 by the organic solvent that above-mentioned three alembics 45 are captured.Above-mentioned organic solvent hold-up tank 50 has condenser 53, can make the organic solvent that is captured become liquid condition.Preferred above-mentioned organic solvent hold-up tank 50 is connected with the amines jar 60 of the amines that can add regulation, can add the amines that only is suitable for indivedual resist stripping processs by the amines that adds regulation, makes stripping liquid for regenerating thus.
Hereinafter enumerate preferred embodiment in order to understand the present invention, but embodiment only is used for the present invention is carried out example, scope of the present invention is not limited to following embodiment.
[embodiment]
Embodiment 1
In the stripping waste liquor that contains 3 weight portion resists, 5 portions of amine by weight compound MEA, 5 portions of amine by weight compound MIPA, 5 portions of amine by weight compound n-MEA, 10 weight portion moisture, 72 weight portion organic solvents (alkyl pyrrolidones of the dibasic alcohol of 50 weight portions and 22 weight portions) that obtains by each resist stripping process, add 10 weight portion acetate, form amine-acetic acid compound.The above-mentioned stripping waste liquor that is formed with amine-acetic acid compound is distilled respectively, capture moisture and residual acetate and organic solvent successively, residual resist and amine-separated from acetic acid are discharged.Make it form liquid the organic solvent cooling of above-mentioned capture, after the composition of the organic solvent that forms liquid analyzed as can be known, the dibasic alcohol in the 100 weight portion organic solvents be 61.4 weight portions, alkyl pyrrolidone be 38.6 weight portions, moisture less than 0.1 weight portion, total amines less than 0.1 weight portion, do not detect resin.
Embodiment 2
In the stripping waste liquor that contains 3 weight portion resists, 4 portions of amine by weight compound MEA, 4 portions of amine by weight compound MIPA, 4 portions of amine by weight compound n-MEA, 20 weight portion moisture, 65 weight portion organic solvents (45 weight portion dibasic alcohol and 20 weight portion alkyl pyrrolidones) that obtains by each resist stripping process, add 8 weight portion acetate, form amine-acetic acid compound.The above-mentioned stripping waste liquor that is formed with amine-acetic acid compound is distilled respectively, capture moisture and residual acetate and organic solvent successively, residual resist and amine-separated from acetic acid are discharged.The organic solvent cooling of above-mentioned capture is made its fluidization, after the composition of the organic solvent of fluidization analyzed as can be known, the dibasic alcohol in the 100 weight portion organic solvents be 61.8 weight portions, alkyl pyrrolidone be 38.2 weight portions, moisture less than 0.1 weight portion, total amines less than 0.1 weight portion, do not detect resin.
Embodiment 3
In the stripping waste liquor that contains 2 weight portion resists, 2 portions of amine by weight compound MEA, 2 portions of amine by weight compound MIPA, 2 portions of amine by weight compound n-MEA, 40 weight portion moisture, 52 weight portion organic solvents (36 weight portion dibasic alcohol and 16 weight portion alkyl pyrrolidones) that obtains by each resist stripping process, add 4 weight portion acetate, form amine-acetic acid compound.The above-mentioned stripping waste liquor that is formed with amine-acetic acid compound is distilled respectively, capture moisture and residual acetate and organic solvent successively, residual resist and amine-separated from acetic acid are discharged.The organic solvent cooling of above-mentioned capture is made its fluidization, after the composition of the organic solvent of fluidization analyzed as can be known, the dibasic alcohol in the 100 weight portion organic solvents be 58.9 weight portions, alkyl pyrrolidone be 41.1 weight portions, moisture less than 0.1 weight portion, total amines less than 0.1 weight portion, do not detect resin.
Embodiment 4
In the stripping waste liquor that contains 3 weight portion resists, 5 portions of amine by weight compound MEA, 5 portions of amine by weight compound MIPA, 5 portions of amine by weight compound n-MEA, 10 weight portion moisture, 72 weight portion organic solvents (50 weight portion dibasic alcohol and 22 weight portion alkyl pyrrolidones) that obtains by each resist stripping process, add 10.6 weight portion oxalic acid dihydrate, form amine-oxalate compound.The oxalic acid dihydrate that has neither part nor lot in reaction residues in the stripping waste liquor with the solid constituent form.The above-mentioned stripping waste liquor that is formed with amine-oxalate compound is distilled respectively, capture moisture, oxalic acid decompose and the material (formic acid, carbon monoxide, carbon dioxide etc.) and the organic solvent of formation, and residual resist is separated discharge with amine-oxalic acid and undecomposed oxalic acid dihydrate.The organic solvent cooling of above-mentioned capture is made its fluidization, after the composition of the organic solvent of fluidization analyzed as can be known, the dibasic alcohol in the 100 weight portion organic solvents be 62.2 weight portions, alkyl pyrrolidone be 37.8 weight portions, moisture less than 0.1 weight portion, total amines less than 0.1 weight portion, do not detect resin.
Embodiment 5
In the stripping waste liquor that contains 3 weight portion resists, 4 portions of amine by weight compound MEA, 4 portions of amine by weight compound MIPA, 4 portions of amine by weight compound n-MEA, 20 weight portion moisture, 65 weight portion organic solvents (45 weight portion dibasic alcohol and 20 weight portion alkyl pyrrolidones) that obtains by each resist stripping process, add 8.5 weight portion oxalic acid dihydrate, form amine-oxalate compound.The oxalic acid dihydrate that has neither part nor lot in reaction residues in the stripping waste liquor with the solid constituent form.The above-mentioned stripping waste liquor that is formed with amine-oxalate compound is distilled respectively, capture moisture, oxalic acid decompose and the material (formic acid, carbon monoxide, carbon dioxide etc.) and the organic solvent of formation, and residual resist is separated discharge with amine-oxalic acid and undecomposed oxalic acid dihydrate.The organic solvent cooling of above-mentioned capture is made its fluidization, after the composition of the organic solvent of fluidization analyzed as can be known, the dibasic alcohol in the 100 weight portion organic solvents be 58.3 weight portions, alkyl pyrrolidone be 41.7 weight portions, moisture less than 0.1 weight portion, total amines less than 0.1 weight portion, do not detect resin.
Embodiment 6
In the stripping waste liquor that contains 2 weight portion resists, 2 portions of amine by weight compound MEA, 2 portions of amine by weight compound MIPA, 2 portions of amine by weight compound n-MEA, 40 weight portion moisture, 52 weight portion organic solvents (36 weight portion dibasic alcohol and 16 weight portion alkyl pyrrolidones) that obtains by each resist stripping process, add 4.3 weight portion oxalic acid dihydrate, form amine-oxalate compound.The oxalic acid dihydrate that has neither part nor lot in reaction residues in the stripping waste liquor with the solid constituent form.The above-mentioned stripping waste liquor that is formed with amine-oxalate compound is distilled respectively, capture moisture, oxalic acid decompose and the material (formic acid, carbon monoxide, carbon dioxide etc.) and the organic solvent of formation, and residual resist is separated discharge with amine-oxalic acid and undecomposed oxalic acid dihydrate.The organic solvent cooling of above-mentioned capture is made its fluidization, after the composition of the organic solvent of fluidization analyzed as can be known, the dibasic alcohol in the 100 weight portion organic solvents be 62.8 weight portions, alkyl pyrrolidone be 37.2 weight portions, moisture less than 0.1 weight portion, total amines less than 0.1 weight portion, do not detect resin.
Claims (6)
1. the renovation process of a resist stripping waste liquor, it is the method that the resist stripping waste liquor that contains water, resist, amines, organic solvent is regenerated, and the method is characterized in that it contains:
(a) add sour operation, the amines of described acid and resist stripping waste liquor reacts and makes amine-acid compound that amines is not distilled when being formed on the organic solvent distillation; With
(b) reaction product of above-mentioned (a) operation is distilled respectively and only obtain the operation of organic solvent.
2. the renovation process of resist stripping waste liquor as claimed in claim 1 is characterized in that, the addition of described acid adopts at least equivalent that equates with the equivalent of the amines that contained in the stripping waste liquor or the amount that is higher than this equivalent.
3. the renovation process of resist stripping waste liquor as claimed in claim 1, it is characterized in that described acid is at least a kind that is selected from the group of being made up of benzoic acid, citric acid, formic acid, maleic acid, malic acid, salicylic acid, tartrate, acetate, oxalic acid, phosphoric acid, nitric acid, hydrochloric acid, sulfuric acid and perchloric acid.
4. resist stripping waste liquor regenerating unit, this regenerating unit is characterised in that it contains:
(a) contain the hold-up tank of the pending resist stripping waste liquor of water, resist, amines, organic solvent;
(b) sour hold-up tank;
(c) acid of being carried by above-mentioned sour hold-up tank is added in the stripping waste liquor of being carried by the hold-up tank of above-mentioned pending resist stripping waste liquor, made the amines and sour retort of reacting of stripping waste liquor;
(d) alembic that the stripping waste liquor of being carried by above-mentioned retort is distilled respectively; And
(e) the organic solvent hold-up tank that the organic solvent that is distilled respectively in above-mentioned alembic is respectively received and stores.
5. resist stripping waste liquor regenerating unit as claimed in claim 4 is characterized in that, described alembic comprises single flash jar, the second distillation jar that is used to capture acid that is used to capture moisture, three alembics that are used to capture organic solvent.
6. resist stripping waste liquor regenerating unit as claimed in claim 4 is characterized in that described alembic has reliever.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060020517A KR101266883B1 (en) | 2006-03-03 | 2006-03-03 | A recycling method for resist stripper scrapped and a recycling device for same |
| KR10-2006-0020517 | 2006-03-03 | ||
| KR1020060020517 | 2006-03-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101030047A true CN101030047A (en) | 2007-09-05 |
| CN101030047B CN101030047B (en) | 2011-08-24 |
Family
ID=38586820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100861621A Active CN101030047B (en) | 2006-03-03 | 2007-03-05 | Method and apparatus for regenerating resist stripping waste liquid |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4874835B2 (en) |
| KR (1) | KR101266883B1 (en) |
| CN (1) | CN101030047B (en) |
| TW (1) | TWI418957B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103721427A (en) * | 2012-10-11 | 2014-04-16 | 日本瑞环化工有限公司 | Resist stripper regeneration methods and devices |
| CN116003228A (en) * | 2022-12-26 | 2023-04-25 | 南京长江江宇环保科技股份有限公司 | Method for comprehensively utilizing photoresist-removing waste liquid |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101266897B1 (en) * | 2006-03-03 | 2013-05-23 | 주식회사 동진쎄미켐 | A recycling method for resist stripper scrapped and a recycling device for same |
| KR101007418B1 (en) * | 2008-05-28 | 2011-01-12 | 순천향대학교 산학협력단 | Method for recovering amine from amine-containing waste water |
| CN104707549B (en) * | 2015-03-19 | 2016-09-14 | 张汉文 | A kind of device and method reclaiming chromatographic grade organic reagent from organic reagent waste liquid |
| CN111018219A (en) * | 2019-12-23 | 2020-04-17 | 上海天汉环境资源有限公司 | Regeneration treatment process and device for waste stripping liquid |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW256929B (en) * | 1993-12-29 | 1995-09-11 | Hirama Rika Kenkyusho Kk | |
| US6106722A (en) * | 1997-08-12 | 2000-08-22 | Kinetico Incorporated | Filtering photoresist-containing liquid |
| CN1196032C (en) * | 1998-08-11 | 2005-04-06 | 东进世美肯株式会社 | Stripping agent, stripping method, stripping agent circulation equipment and stripping agent controller |
| JP3409005B2 (en) | 1999-01-29 | 2003-05-19 | 松下環境空調エンジニアリング株式会社 | Method and apparatus for regenerating stripper |
| JP2002131932A (en) | 2000-10-24 | 2002-05-09 | Kimura Chem Plants Co Ltd | Method for regenerating and recovering resist removing liquid, and device for regenerating and recovering the same |
| KR100390567B1 (en) * | 2000-12-30 | 2003-07-07 | 주식회사 동진쎄미켐 | method of controlling photoresist stripping process and method of regenerating photoresist stripping composition using near infrared spectrometer |
| JP2003057852A (en) | 2001-08-21 | 2003-02-28 | Asahi Kasei Corp | Method and system for treatment of stripped piece of resist |
| JP2003167358A (en) * | 2001-11-29 | 2003-06-13 | Nagase & Co Ltd | Equipment for regenerating used resist peeling solution and method therefor |
| JP2004066085A (en) * | 2002-08-05 | 2004-03-04 | Kimura Chem Plants Co Ltd | Solvent recovery system |
| JP4080449B2 (en) * | 2004-03-31 | 2008-04-23 | 日本リファイン株式会社 | Solvent recovery device and solvent recovery method |
-
2006
- 2006-03-03 KR KR1020060020517A patent/KR101266883B1/en active IP Right Grant
-
2007
- 2007-03-01 JP JP2007051322A patent/JP4874835B2/en not_active Expired - Fee Related
- 2007-03-02 TW TW096107176A patent/TWI418957B/en active
- 2007-03-05 CN CN2007100861621A patent/CN101030047B/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103721427A (en) * | 2012-10-11 | 2014-04-16 | 日本瑞环化工有限公司 | Resist stripper regeneration methods and devices |
| CN103721427B (en) * | 2012-10-11 | 2016-08-17 | 日本瑞环化工有限公司 | The renovation process of anticorrosive additive stripping liquid controlling and regenerating unit |
| CN116003228A (en) * | 2022-12-26 | 2023-04-25 | 南京长江江宇环保科技股份有限公司 | Method for comprehensively utilizing photoresist-removing waste liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070090602A (en) | 2007-09-06 |
| TWI418957B (en) | 2013-12-11 |
| CN101030047B (en) | 2011-08-24 |
| TW200745784A (en) | 2007-12-16 |
| JP2007241278A (en) | 2007-09-20 |
| JP4874835B2 (en) | 2012-02-15 |
| KR101266883B1 (en) | 2013-05-23 |
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