JP2003057852A - Method and system for treatment of stripped piece of resist - Google Patents

Method and system for treatment of stripped piece of resist

Info

Publication number
JP2003057852A
JP2003057852A JP2001250518A JP2001250518A JP2003057852A JP 2003057852 A JP2003057852 A JP 2003057852A JP 2001250518 A JP2001250518 A JP 2001250518A JP 2001250518 A JP2001250518 A JP 2001250518A JP 2003057852 A JP2003057852 A JP 2003057852A
Authority
JP
Japan
Prior art keywords
resist
stripping
stripped
piece
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001250518A
Other languages
Japanese (ja)
Inventor
Sadami Suzuki
貞美 鈴木
Haruhiro Yamashita
晴廣 山下
Tadao Sano
忠男 佐野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Kasei Engineering Corp
Original Assignee
Asahi Kasei Corp
Asahi Engineering Co Ltd Osaka
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp, Asahi Engineering Co Ltd Osaka filed Critical Asahi Kasei Corp
Priority to JP2001250518A priority Critical patent/JP2003057852A/en
Publication of JP2003057852A publication Critical patent/JP2003057852A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/50Reuse, recycling or recovery technologies
    • Y02W30/62Plastics recycling; Rubber recycling

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method and system for treatment of stripped pieces of resist which reduces danger during recovery of the stripped pieces of the resist and makes a contribution to cost effectiveness and environmental protectiveness by reducing the moisture content of wastes to <=1/5 that hitherto known. SOLUTION: A remover is acted on the object for cleaning stuck with the stripped pieces of the resist to be stripped to separate the stripped pieces and an acid is acted on the separated stripped pieces of the resist to lower the pH of the stripped pieces and to make the characteristic of the stripped pieces plastic and thereafter, the stripped pieces are transferred to the ensuring stroke. In acting the acid to the stripped pieces, the pH may be once lowered down to about <=6 and then the pH may be regulated to about 7 by subjecting the stripped pieces to dilution by rising. The action of the acid and the rising to the stripped pieces may be carried out in the same fixed vessel and the operation to pour the cleaning water after discharging of the treated water may be repeated a plurality of times. The moisture content may be lowered down to <=100% by acting the acid to the stripped pieces to lower the pH thereof and to make the characteristic plastic then subjecting the stripped pieces to dewatering.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、プリント基板の製
造プロセス等において生じる不要物質を処理する方法、
及び、その方法を実施する装置に関する。特に、レジス
トを剥離する時に生じるアルカリ性の剥離片の回収処理
方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of treating unnecessary substances generated in a printed board manufacturing process,
And an apparatus for implementing the method. In particular, the present invention relates to a method and an apparatus for collecting and processing an alkaline peeling piece generated when the resist is peeled off.

【0002】[0002]

【従来の技術】感光性樹脂を用いた基板製造プロセス
は、現在最も普及した技術であるが、感光処理した後の
レジスト剥離工程から、不要のレジスト剥離片が多量に
発生する。このレジスト剥離片の分離や回収には、効果
的な手段がなく、従来は、メッシュコンベア上や金網バ
スケット上で分離する方式や、ロータリー逆洗方式によ
る分離が行われていた。
2. Description of the Related Art Although a substrate manufacturing process using a photosensitive resin is the most popular technique at present, a large amount of unnecessary resist strips are generated in the resist stripping step after the photosensitization process. There is no effective means for separating and collecting the resist stripped pieces, and conventionally, separation by a method of separating on a mesh conveyor or a wire netting basket, or separation by a rotary backwashing method has been performed.

【0003】これらの分離方式では、レジスト剥離片に
残留するpH11以上の強アルカリ性剥離液の脱液を、
十分に行うことが困難であった。しかも、剥離液を多く
含んだレジスト剥離片は、ゲル状或いはゾル状になるこ
とがあり、取り扱いが容易でないため、中性化すること
なく手作業で袋詰めされ、廃棄物として廃棄されてい
た。その作業においては、強アルカリの付着物を取り扱
うため、マスクや合羽等の防護服を着用しなければなら
ない上に、安全性の観点から、作業者への負担が非常に
大きかった。更に、廃棄物が環境汚染物質となるため処
理費用もコスト高で、環境保護の見地からも好ましくな
かった。
In these separation systems, the removal of the strong alkaline stripping solution having a pH of 11 or more, which remains on the resist strip, is performed.
It was difficult to do enough. Moreover, since the resist stripping pieces containing a large amount of stripping solution may be in the form of gel or sol and are not easy to handle, they were manually bagged without being neutralized and discarded as waste. . In the work, since a strong alkali deposit is handled, it is necessary to wear a protective suit such as a mask and a feather, and from the viewpoint of safety, the burden on the worker is very large. Further, since the waste becomes an environmental pollutant, the treatment cost is high, which is not preferable from the viewpoint of environmental protection.

【0004】このような状況下で、本発明者は、遠心脱
水機を用いて水洗中和する方法を研究してきた。しか
し、剥離片はNa除放性であるために、処理に時間を要
し、また、単なる洗浄中和では、剥離片内のNaの減少
と共に洗浄水が剥雄片内に浸入するため、減容化に難が
ある。そのため、水分含有率を100%以下にするため
には、乾燥等の別途行程が必要であった。
Under these circumstances, the present inventor has studied a method of washing and neutralizing with a centrifugal dehydrator. However, since the stripping piece is Na-releasing, it takes a long time to process, and the mere washing neutralization causes a decrease in Na in the stripping piece and the washing water enters the stripping male piece. Difficult to fit. Therefore, in order to reduce the water content to 100% or less, a separate process such as drying is required.

【0005】[0005]

【発明が解決しようとする課題】そこで、本発明は、レ
ジスト剥離片の回収時の危険性を低減すると共に、廃棄
物の水分量を従来の1/5以下に減容化して、経済性や
環境保護性にも寄与するレジスト剥離片の処理方法、並
びに、その方法を実施する装置を提供することを課題と
する。
Therefore, the present invention reduces the risk at the time of collecting the resist strips and reduces the water content of the waste to ⅕ or less of the conventional one, thereby improving the economical efficiency. An object of the present invention is to provide a method for treating a resist strip, which also contributes to environmental protection, and an apparatus for carrying out the method.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
に、本発明のレジスト剥離片の処理方法及び装置は、次
の構成を備える。すなわち、剥離対象のレジスト剥離片
が付着している浄化対象物に、剥離液を作用して、レジ
スト剥離片を分離し、分離したレジスト剥離片に、酸を
作用して、レジスト剥離片のpHを下げ、レジスト剥離
片の性状をプラスティック化した後に、次行程へ移すこ
とを特徴とする。
In order to solve the above problems, a method and apparatus for treating resist strips according to the present invention has the following constitution. That is, the stripping liquid acts on the purification target to which the resist stripping piece to be stripped adheres to separate the resist stripping strip, and the separated resist stripping strip is treated with an acid to adjust the pH of the resist stripping strip. Is lowered and the property of the resist strip is made plastic, and then the process is moved to the next step.

【0007】ここで、レジスト剥離片に酸を作用する際
に、レジスト剥離片のpHを、約6以下まで一旦下げ、
その後、水洗による希釈を行って、レジスト剥離片のp
Hを、約7に調整して、酸の作用効率向上に寄与させて
もよい。
Here, when an acid acts on the resist strip, the pH of the strip is temporarily lowered to about 6 or less,
Then, dilute by washing with water to remove p from the resist strip.
H may be adjusted to about 7 to contribute to improving the action efficiency of the acid.

【0008】レジスト剥離片に対する酸の作用と、レジ
スト剥離片に対する水洗とを、同一の固定槽で行って、
処理水を排出した後に、洗浄水を注入する操作を複数回
繰り返して、作業と装置の簡素化に寄与させてもよい。
The action of the acid on the resist strip and the washing on the resist strip are performed in the same fixing tank,
The operation of injecting the cleaning water after discharging the treated water may be repeated a plurality of times to contribute to the simplification of the work and the apparatus.

【0009】レジスト剥離片に酸を作用してpHを下
げ、その性状をプラスティック化した後に、脱水を施
し、水分含有率を100%以下まで下げて、廃棄処理の
利便に寄与させてもよい。
Acid may be applied to the stripped resist to lower its pH, and its properties may be plasticized, followed by dehydration to reduce the water content to 100% or less, thereby contributing to the convenience of disposal.

【0010】このようなレジスト剥離片の処理方法を実
施するには、レジストを剥離する時に生じるアルカリ性
の剥離片を処理する装置であって、剥離対象のレジスト
剥離片が付着している浄化対象物に、剥離液を作用し
て、レジスト剥離片を剥離する剥離手段と、レジスト剥
離片と処理水とを分離する篭状の分離装置を有した固定
槽を備え、レジスト剥離片に対する酸の作用と水洗とを
行う中和手段と、レジスト剥離片の水分含有率を下げる
脱水手段とを備えた装置が好適である。
In order to carry out such a method for treating resist stripping pieces, an apparatus for treating alkaline stripping pieces produced when stripping a resist, wherein the resist stripping pieces to be stripped are adhered On the other hand, a stripping means that acts a stripping solution to strip the resist stripping piece, and a fixing tank having a basket-like separating device for separating the resist stripping piece and the treated water are provided, and the action of the acid on the resist stripping piece An apparatus equipped with a neutralizing means for washing with water and a dehydrating means for reducing the water content of the resist strips is suitable.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施形態を図面に
示した実施例に基づいて説明する。なお、本発明の実施
形態はこれに限定されず、適宜変更可能である。図1
に、本発明によるレジスト剥離片の処理装置の説明図を
示す。感光性樹脂であるドライレジストフィルムを用い
たプリント基板製造プロセスにおいては、回路パターン
を感光により基板上に焼き付け、現像し、その後、不要
なレジストを剥離する。本図は、その剥離工程から、処
理後のレジスト剥離片の搬出する工程までを示すもので
ある。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the examples shown in the drawings. The embodiment of the present invention is not limited to this, and can be modified as appropriate. Figure 1
FIG. 3 shows an explanatory view of the apparatus for treating resist stripped pieces according to the present invention. In a printed circuit board manufacturing process using a dry resist film which is a photosensitive resin, a circuit pattern is printed on a substrate by exposure to light and developed, and then unnecessary resist is peeled off. This figure shows from the peeling step to the step of carrying out the resist peeled pieces after the treatment.

【0012】まず、剥離機(10)において、浄化対象
物である現像後のプリント基板に、剥離機(10)の上
方に設置されたスプレーパイプ(10a)から、強アル
カリ性の剥離液をスプレーする。そして、プリント基板
上の不要な硬化レジストを、スプレー圧によって剥離す
る。プリント基板上には必要な回路パターンが残るが、
表面には剥離液が付着した状態であるので、コンベアに
よって水洗機に移動され洗浄される。水洗機では、スプ
レーノズルから新水が噴射されて、プリント基板の水洗
を行う。プリント基板は、この後、乾燥等の工程に進
む。
First, in the stripping machine (10), a strongly alkaline stripping solution is sprayed onto the developed printed circuit board, which is an object to be cleaned, from a spray pipe (10a) installed above the stripping machine (10). . Then, the unnecessary cured resist on the printed board is peeled off by the spray pressure. The necessary circuit pattern remains on the printed circuit board,
Since the peeling liquid is attached to the surface, the peeling liquid is transferred to the water washing machine by the conveyor for washing. In the washing machine, fresh water is sprayed from the spray nozzle to wash the printed circuit board. After that, the printed circuit board proceeds to a process such as drying.

【0013】剥離機(10)では、剥離したレジスト剥
離片が、剥離液に混合した状態で落下して、槽下部にそ
の混合液(L1)が一時貯留する。ここで、混合液(L
1)には、樹脂であるレジスト剥離片が水分を多く含ん
で軟化し、ゲル状或いはゾル状に近い非常に扱いにくい
状態で存在している。従来は、この混合液を濾過して、
水分含有率の高いままレジスト剥離片を回収して廃棄し
ていた。しかし、この工程が、危険性を孕むと同時に生
産効率を悪化し、廃棄物を多く出す原因になっていた。
そこで、本発明では、新たに固液分離装置(20)や、
中和装置(30)、脱水装置(60)といった諸機器を
配設し、工程の自動化を図っている。
In the stripping machine (10), the stripped resist strips fall in a state of being mixed with the stripping solution, and the mixed solution (L1) is temporarily stored in the lower part of the tank. Here, the mixed solution (L
In 1), the resist stripping piece which is a resin contains a large amount of water and softens, and is present in a gel or sol state which is very difficult to handle. Conventionally, this mixture is filtered,
The resist strips were collected and discarded with the high water content. However, this process is dangerous and at the same time deteriorates the production efficiency and causes a large amount of waste.
Therefore, in the present invention, a solid-liquid separation device (20) and
Various devices such as a neutralization device (30) and a dehydration device (60) are provided to automate the process.

【0014】剥離機(10)で生じた混合液(L1)
は、サービスタンク(11)を経てポンプ(12)によ
り、固液分離装置(20)に流入する。固液分離装置
(20)は、加圧濾過する装置であり、第1段階として
混合液の水分含有率を低下させる。この工程では、厳密
な固液の分離ではなく、次の工程の準備段階として剥離
液を除去する。ここで分離された剥離液(L2)は、剥
離液供給タンク(21)に送られる。なお、剥離液(L
2)は、ポンプ(24)によって、再び剥離機(10)
に戻り、循環使用される。
Liquid mixture (L1) produced by the peeling machine (10)
Flows into the solid-liquid separation device (20) by the pump (12) via the service tank (11). The solid-liquid separation device (20) is a device for pressure filtration, and reduces the water content of the mixed liquid as the first step. In this step, the stripping solution is removed as a preparatory step for the next step, rather than strict solid-liquid separation. The stripping liquid (L2) separated here is sent to the stripping liquid supply tank (21). The stripper (L
2) is the peeling machine (10) again by the pump (24)
Returned to and used cyclically.

【0015】一方、固液分離装置(20)内には、水分
含有率の低下したレジスト剥離片が残存する。固液分離
装置(20)には、所定の間隔で自動的に逆洗水(L
3)が、逆洗水供給口(s1)から供給される。逆洗水
(L3)によって、残存するレジスト剥離片が固液分離
装置(20)から排出され、回転式のバスケットを備え
たレジスト剥離片搬送コンベア(22)に臨む。レジス
ト剥離片搬送コンベア(22)のバスケットは、レジス
ト剥離片をコンベア上に落とす機構を備え、コンベアで
搬送されるレジスト剥離片は、自動的に剥離片供給タン
ク(23)に投入される。
On the other hand, in the solid-liquid separation device (20), resist stripped pieces with a reduced water content remain. The solid-liquid separator (20) is automatically backwashed with water (L) at predetermined intervals.
3) is supplied from the backwash water supply port (s1). The remaining resist strips are discharged from the solid-liquid separation device (20) by the backwash water (L3) and face a resist strip transport conveyor (22) equipped with a rotary basket. The basket of the resist stripping piece conveying conveyor (22) is provided with a mechanism for dropping the resist stripping piece onto the conveyor, and the resist stripping piece conveyed by the conveyor is automatically put into the stripping piece supply tank (23).

【0016】剥離片供給タンク(23)には、液面制御
用の液面計や制御器(23a)が設置され、受け入れた
レジスト剥離片をポンプ輸送するために、浄水の供給口
(s2)から自動弁(26)を介して希釈水を投入され
る。本装置においては、設備をコンパクト化しても酸の
供給や中和時の操作を安定化させるために、液面制御器
(23a)によって投入量を把握しながらレジスト剥離
片を移送し、投入量に見合った酸や希釈水を注入してい
る。なお、剥離片供給タンク(23)には、レジスト剥
離片を希釈撹拌して、移送を容易にするため、攪拌機
(23b)が設置されている。
A liquid level gauge and a controller (23a) for controlling the liquid level are installed in the stripping piece supply tank (23), and a purified water supply port (s2) is provided for pumping the received resist stripping piece. The dilution water is put in through the automatic valve (26). In this device, in order to stabilize the operation during acid supply and neutralization even when the equipment is made compact, the resist stripping piece is transferred while grasping the input amount by the liquid level controller (23a), and the input amount Injecting acid and dilution water that are suitable for. The peeling piece supply tank (23) is provided with a stirrer (23b) for diluting and stirring the resist peeling pieces to facilitate transfer.

【0017】レジスト剥離片は、剥離片供給タンク(2
3)から、ポンプ(25)を経て、中和装置(30)の
槽内に送られる。ここで、酸タンク(40)から、硫酸
等の酸を供給される。レジスト剥離片には、剥離剤とし
ての苛性ソーダを約4%含む強アルカリ液(pH11〜
13)が含まれている。また、レジスト剥離片内には、
Naが分子内に結合されているため、通常の脱液と水洗
浄との水洗中和の繰り返しではなかなかNaは溶出しな
い。代表的なレジストフィルムの剥離片には、乾燥重量
基準で1kg当たり約1.2モルのNaが結合してい
て、除放性のために洗浄効率は非常に低い。そして、水
洗ではNaの減少につれてゲル内に水分を吸収して膨潤
するため、重量が洗浄前より大き<なり、減量のために
は脱水装置等の付帯設傭が必要であった。しかし、ゲル
状のレジスト剥離片の脱水は容易でなく、乾燥設備は装
置が大きくなるほか、エネルギーコストも高くなる欠点
があった。
The resist strips are stored in the strip strip supply tank (2
From (3), it is sent into the tank of the neutralizer (30) via the pump (25). Here, an acid such as sulfuric acid is supplied from the acid tank (40). For the resist strip, a strong alkaline solution (pH 11 to 11) containing ca. 4% of caustic soda as a stripping agent is used.
13) is included. In the resist strip,
Since Na is bound in the molecule, Na is difficult to elute by repeating normal washing with water and neutralization with water. About 1.2 mol of Na per 1 kg of dry weight is bonded to the peeled pieces of a typical resist film, and the cleaning efficiency is very low due to the sustained release property. In the case of washing with water, as the amount of Na decreases, the gel absorbs water and swells, so that the weight becomes larger than that before washing, and an auxiliary equipment such as a dehydrator is necessary for reducing the weight. However, dehydration of the gel-like resist strips is not easy, and there is a drawback that the equipment for drying equipment is large and energy cost is high.

【0018】そこで、本発明では、このような問題を解
決するために、まず、強アルカリ液を含むレジスト剥離
片に酸を作用させて中和処理する。レジスト剥離片に酸
を作用する際には、レジスト剥離片のpHを約6以下ま
で一旦下げる。pH4以下まで下げると、中和作用が飽
和してしまうので、その後の洗浄行程を考慮すると、p
H4〜5に処理するのが最適である。この酸処理は中和
反応であるから非常に早く終結し、処理後の水分含有率
は中和時のpHに依存するが、pH4以下で中和した後
に遠心脱水を行うことによって、容易に乾燥重量基準の
水分含有率60〜100%程度が得られる。レジスト剥
離片の外観をみると、強アルカリ液を含んだ状態では白
色のスライム状であり、水洗のみではスライム状のまま
であり取り扱いにくい状態である。しかし、酸処理によ
るpHの低下と共に、べースの青色に急速に変化する。
この変色と共にプラスティック化するため、スライム状
から樹脂の破片状に性状が変化する。この変化は、非可
逆であり、水分と接触させても性状は変化しない。この
性質は酸で処理後に、水で洗浄して中性化して排出する
ために非常に都合がよい。
Therefore, in the present invention, in order to solve such a problem, first, an acid acts on a resist stripping piece containing a strong alkaline solution to neutralize it. When an acid acts on the resist strip, the pH of the strip is once lowered to about 6 or less. If the pH is lowered to 4 or less, the neutralizing action will be saturated, so when considering the subsequent washing process, p
It is optimal to process H4 to H5. Since this acid treatment is a neutralization reaction, it terminates very quickly, and the water content after treatment depends on the pH at the time of neutralization, but it can be easily dried by performing centrifugal dehydration after neutralizing at pH 4 or less. A water content of about 60 to 100% by weight is obtained. Looking at the appearance of the stripped resist, it looks like a white slime when it contains a strong alkaline solution, and it remains in a slime just by washing with water, which makes it difficult to handle. However, with the decrease in pH due to the acid treatment, it rapidly changes to a blue base color.
Because of the discoloration and plasticization, the properties change from a slime shape to a resin fragment shape. This change is irreversible, and the property does not change even when contacted with water. This property is very convenient for treating with acid, washing with water to neutralize and discharging.

【0019】中和装置(30)の槽内には、篭(30
a)が設けられている。篭(30a)は、中和を効率的
に行うためのものであって、必要に応じて、布や、紙、
プラスティックネット等が付設され、レジスト剥離片を
篭(30a)の内部に残し、洗浄水を篭(30a)の外
部に排出するように設計されている。中和装置(30)
には、撹拌機(30b)が設置され、撹拌しながら中和
することによりレジスト剥離片を浮遊させ、中和の効率
を上げると共に水洗効果を高めている。
Inside the tank of the neutralization device (30), a basket (30
a) is provided. The basket (30a) is for efficient neutralization, and if necessary, cloth, paper,
A plastic net or the like is attached, and the resist stripping piece is designed to be left inside the basket (30a) and the cleaning water is discharged to the outside of the basket (30a). Neutralizer (30)
Is equipped with a stirrer (30b), and the resist stripping pieces are floated by neutralizing while stirring to enhance the neutralization efficiency and the water washing effect.

【0020】硫酸や塩酸等の酸は、酸タンク(40)か
ら、ポンプ(41)を介して計量しながら中和装置(3
0)に供給される。酸注入の終了は、pH調整器(4
2)を用いて徐々に注入量を絞り込むこんで自動的に行
う。一定時間、酸処理した後は、廃水を下部の廃水タン
ク(50)に落とし、新水を供給口(s2)から注入す
る。新水の注入は、積算流量計(31)とコントローラ
(32)を用いて行い、注水の終了には、PH制御器を
用いて水量を徐々に絞り込む方法で安定的に行われる。
なお、新水の供給路には、高速注水用の自動弁(33)
と、中和用の遮断弁(34)が配設されている。
Acids such as sulfuric acid and hydrochloric acid are measured from the acid tank (40) via the pump (41) while neutralizing the neutralizer (3).
0). The pH adjustment (4
It is automatically performed by gradually narrowing the injection amount using 2). After the acid treatment for a certain period of time, waste water is dropped into the lower waste water tank (50) and new water is injected from the supply port (s2). Fresh water is injected by using the integrating flow meter (31) and the controller (32), and at the end of water injection, a PH controller is used to stably reduce the amount of water.
An automatic valve (33) for high-speed water injection is provided in the fresh water supply passage.
And a shutoff valve (34) for neutralization is provided.

【0021】酸処理後の中和は、水量を節約するため一
旦中和後、中和水を廃水タンク(50)に排出し、中和
操作を2〜3回繰り返すバッチ操作を採用している。1
回の中和操作で、pHは約1低下する。廃水タンク(5
0)は、樹脂や耐食金属性であり、液面調整器(50
a)や客先酸処理設備の制御信号によって、排水口へ誘
導する抜き出し弁(51)や、排水処理設備へ誘導する
弁(52)やポンプ(53)が自動運転される。
The neutralization after the acid treatment employs a batch operation in which the neutralized water is discharged to the waste water tank (50) and the neutralization operation is repeated 2-3 times in order to save the amount of water. . 1
The pH is lowered by about 1 by one neutralization operation. Wastewater tank (5
0) is a resin or a corrosion resistant metal, and is a liquid level controller (50
By the control signal of a) or the customer's acid treatment equipment, the extraction valve (51) leading to the drainage port, the valve (52) leading to the wastewater treatment equipment, and the pump (53) are automatically operated.

【0022】レジスト剥離片は、吸い込み管(61)と
ポンプ(62)を介して、脱水装置(60)の槽内に供
給される。このレジスト剥離片の注入時には、供給口
(s3)から、補助水が自動弁(63)を介して注入さ
れる。図示の脱水装置(60)は遠心脱水機であり、6
00G程度の遠心作用により効果的に脱水を行う。脱水
装置(60)の槽内には、遠心回転用の回転篭(60
a)が設置されている。回転は、注入時や掻き落とし時
に、適宜回転数をプログラム制御して行う。その駆動用
モーター(60f)はインバータ等にて回転制御され
る。
The resist strips are fed into the tank of the dehydrator (60) via the suction pipe (61) and the pump (62). During the injection of the resist strip, auxiliary water is injected from the supply port (s3) through the automatic valve (63). The illustrated dehydrator (60) is a centrifugal dehydrator, and
Dehydration is effectively performed by a centrifugal action of about 00G. A spinning basket (60) for centrifugal rotation is provided in the tank of the dehydrator (60).
a) is installed. The rotation is performed by appropriately controlling the number of rotations at the time of injection or scraping. The rotation of the drive motor (60f) is controlled by an inverter or the like.

【0023】回転籠の周囲と底部には、レジスト剥離片
のケーク(L4)が付着している。このケークを掻き取
るために、空気式掻き取り装置(60b)が併設されて
いる。空気式掻き取り装置(60b)には、供給口(s
4)から、圧縮空気が、駆動機(60c)と自動弁(6
0d)を介して供給される。脱水装置(60)の槽は、
底部抜き出し式であり、底部にはケークの排出口(60
e)が備わる。そのケーク排出口(60e)の下部に
は、レジスト剥離片の注入時におけるスプラッシュ防止
のために、スライド受け(64)が、自動弁(65)に
よって開閉自在に設置されている。
A cake (L4) of a resist stripping piece is attached to the periphery and bottom of the rotating basket. A pneumatic scraping device (60b) is provided to scrape the cake. The pneumatic scraping device (60b) has a supply port (s
4) Compressed air flows from the driver (60c) and the automatic valve (6).
0d). The tank of the dehydrator (60) is
It is a bottom extraction type and the cake outlet (60
e) is provided. A slide receiver (64) is installed below the cake discharge port (60e) so as to be openable and closable by an automatic valve (65) in order to prevent splash at the time of injecting the resist peeling pieces.

【0024】脱水されて排出されたレジスト剥離片(L
5)は、コンベア(70)の上に落下されて、箱(7
1)内にセットされたPP袋等に袋詰めされる。回収袋
が満杯になったら、新しい袋がコンベアで自動供給され
る。
The resist stripping pieces (L
5) is dropped onto the conveyor (70) and the box (7)
1) It is packed in a PP bag set inside. When the collection bag is full, a new bag is automatically supplied by the conveyor.

【0025】なお、本実施例では、遠心式の脱水機を挙
げたが、脱水機は遠心式に限定されず、多少の水分含有
率の残留を容認すれば、メッシュコンベアと真空サクシ
ョンを用いた方法、熱風乾燥機を用いた方法、スプレー
ドライヤーや、サイクロン方式を用いた方法でも可能で
ある。
In this embodiment, the centrifugal type dehydrator was mentioned, but the dehydrator is not limited to the centrifugal type, and a mesh conveyer and a vacuum suction are used as long as the residual moisture content is acceptable. A method, a method using a hot air dryer, a spray dryer, or a method using a cyclone method is also possible.

【0026】[0026]

【発明の効果】本発明は、上記の構成を備えることで次
の効果を奏する。すなわち、酸で中和処理を施すので、
レジスト剥離片がプラスティック化し、脱水を行うこと
により容易に重量で1/5以下に減容化させられる。そ
のため、減容化によって環境負荷が低減するとと共に、
廃棄処理費用も抑制できる。また、プラスティック化す
ることにより、レジスト剥離片は取り扱いにくいスライ
ム状からプラスティック破片状に変化し、その後の取り
扱いが容易になる。プラスティック化した廃棄物は、高
炉の還元材料としたり、他の重愼材として利用すること
も可能である。このレジスト剥離片の処理は、自動制御
下で行われるため、従来のような危険性はなくなり、作
業者の負担と労力が削減される。
The present invention has the following effects by having the above configuration. That is, since the neutralization treatment is performed with an acid,
The resist strips are made plastic, and the volume can be easily reduced to 1/5 or less by performing dehydration. Therefore, the environmental load is reduced by volume reduction,
Waste disposal costs can also be suppressed. Further, by making it plastic, the resist stripping piece changes from a difficult-to-handle slime shape to a plastic piece shape, and the subsequent handling becomes easy. The plasticized waste can be used as a reducing material for the blast furnace or can be used as another heavy-duty material. Since the processing of the resist strips is performed under automatic control, there is no danger as in the prior art, and the burden and labor of the operator is reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】レジスト剥離片の処理装置概要を示す説明図FIG. 1 is an explanatory diagram showing an outline of a processing device for a resist stripping piece.

【符号の説明】[Explanation of symbols]

10 剥離機 20 固液分離装置 30 中和装置 30a 篭 30b 撹拌機 31 積算流量計 32 コントローラ 33 高速注水用自動弁 34 中和用遮断弁 40 酸タンク 41 ポンプ 42 pH調整器 50 排水タンク 60 脱水装置 s2 新水供給口 10 peeling machine 20 Solid-liquid separator 30 Neutralizer 30a basket 30b stirrer 31 Integrated flow meter 32 controller 33 Automatic valve for high-speed water injection 34 Neutralization shut-off valve 40 acid tank 41 pumps 42 pH adjuster 50 drainage tank 60 dehydrator s2 Fresh water supply port

───────────────────────────────────────────────────── フロントページの続き (72)発明者 山下 晴廣 静岡県富士市鮫島2番地の1 旭化成株式 会社内 (72)発明者 佐野 忠男 静岡県富士市鮫島2番地の1 旭化成株式 会社内 Fターム(参考) 2H096 AA25 AA26 LA25 4F301 BF02 BF27 BF31 BG44 BG50 CA09 CA61 CA63 CA64 CA68 5F046 MA02 MA10    ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Haruhiro Yamashita             Asahi Kasei Co., Ltd. 1 No. 2 Samejima, Fuji City, Shizuoka Prefecture             In the company (72) Inventor Tadao Sano             Asahi Kasei Co., Ltd. 1 No. 2 Samejima, Fuji City, Shizuoka Prefecture             In the company F-term (reference) 2H096 AA25 AA26 LA25                 4F301 BF02 BF27 BF31 BG44 BG50                       CA09 CA61 CA63 CA64 CA68                 5F046 MA02 MA10

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】レジストを剥離する時に生じるアルカリ性
の剥離片を処理する方法であって、 剥離対象のレジスト剥離片が付着している浄化対象物
に、剥離液を作用して、レジスト剥離片を分離し、 分離したレジスト剥離片に、酸を作用して、レジスト剥
離片のpHを下げ、 レジスト剥離片の性状をプラスティック化した後に、次
行程へ移すことを特徴とするレジスト剥離片の処理方
法。
1. A method for treating an alkaline stripping piece generated when stripping a resist, wherein a stripping solution is applied to a cleaning object to which the resist stripping piece to be stripped adheres to remove the resist stripping piece. Acid is applied to the separated resist strips to lower the pH of the resist strips, the properties of the resist strips are made plastic, and the process is moved to the next step. .
【請求項2】レジスト剥離片に酸を作用する際に、 レジスト剥離片のpHを、約6以下まで一旦下げ、 その後、水洗による希釈を行って、 レジスト剥離片のpHを、約7に調整する請求項1に記
載のレジスト剥離片の処理方法。
2. When an acid acts on the resist strip, the pH of the strip is once lowered to about 6 or less, and then diluted with water to adjust the pH of the strip to about 7. The method for treating a resist stripped piece according to claim 1.
【請求項3】レジスト剥離片に対する酸の作用と、レジ
スト剥離片に対する水洗とを、同一の固定槽で行って、 処理水を排出した後に、洗浄水を注入する操作を複数回
繰り返す請求項2に記載のレジスト剥離片の処理方法。
3. The action of an acid on the resist strip and the washing of the resist strip in the same fixing tank, and after the treated water is discharged, the operation of injecting the wash water is repeated a plurality of times. The method for treating a resist stripped piece according to.
【請求項4】レジスト剥離片に酸を作用してpHを下
げ、その性状をプラスティック化した後に、 脱水を施し、水分含有率を100%以下まで下げる請求
項1ないし3に記載のレジスト剥離片の処理方法。
4. The resist stripping piece according to claim 1, wherein the resist stripping strip is acidified to lower the pH, plasticize its properties, and then dehydrated to reduce the water content to 100% or less. Processing method.
【請求項5】レジストを剥離する時に生じるアルカリ性
の剥離片を処理する装置であって、 剥離対象のレジスト剥離片が付着している浄化対象物
に、剥離液を作用して、レジスト剥離片を剥離する剥離
手段と、 レジスト剥離片と処理水とを分離する篭状の分離装置を
有した固定槽を備え、レジスト剥離片に対する酸の作用
と水洗とを行う中和手段と、 レジスト剥離片の水分含有率を下げる脱水手段とを備え
ることを特徴とするレジスト剥離片の処理装置。
5. An apparatus for treating an alkaline stripping piece generated when stripping a resist, wherein a stripping solution is applied to an object to be purified to which the stripping target resist stripping is adhered to remove the resist stripping piece. A stripping means for stripping, a fixing tank having a basket-shaped separating device for separating the resist stripping piece and the treated water, a neutralizing means for effecting acid action on the resist stripping piece and washing with water, and a resist stripping piece An apparatus for treating stripped resist, comprising: dehydrating means for reducing the water content.
JP2001250518A 2001-08-21 2001-08-21 Method and system for treatment of stripped piece of resist Withdrawn JP2003057852A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001250518A JP2003057852A (en) 2001-08-21 2001-08-21 Method and system for treatment of stripped piece of resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001250518A JP2003057852A (en) 2001-08-21 2001-08-21 Method and system for treatment of stripped piece of resist

Publications (1)

Publication Number Publication Date
JP2003057852A true JP2003057852A (en) 2003-02-28

Family

ID=19079319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001250518A Withdrawn JP2003057852A (en) 2001-08-21 2001-08-21 Method and system for treatment of stripped piece of resist

Country Status (1)

Country Link
JP (1) JP2003057852A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007241277A (en) * 2006-03-03 2007-09-20 Dongjin Semichem Co Ltd Regeneration method for resist stripping waste liquid and regeneration apparatus
KR101266883B1 (en) 2006-03-03 2013-05-23 주식회사 동진쎄미켐 A recycling method for resist stripper scrapped and a recycling device for same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007241277A (en) * 2006-03-03 2007-09-20 Dongjin Semichem Co Ltd Regeneration method for resist stripping waste liquid and regeneration apparatus
KR101266883B1 (en) 2006-03-03 2013-05-23 주식회사 동진쎄미켐 A recycling method for resist stripper scrapped and a recycling device for same
KR101266897B1 (en) 2006-03-03 2013-05-23 주식회사 동진쎄미켐 A recycling method for resist stripper scrapped and a recycling device for same
TWI418957B (en) * 2006-03-03 2013-12-11 Dongjin Semichem Co Ltd Recycling method for resist stripper scrapped and recycling device for the same
TWI418958B (en) * 2006-03-03 2013-12-11 Dongjin Semichem Co Ltd Recycling method for resist stripper scrapped and recycling device for the same

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