CN100587604C - Subsection interleaving aligning mark combined and aligning method thereof - Google Patents
Subsection interleaving aligning mark combined and aligning method thereof Download PDFInfo
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- CN100587604C CN100587604C CN200710046157A CN200710046157A CN100587604C CN 100587604 C CN100587604 C CN 100587604C CN 200710046157 A CN200710046157 A CN 200710046157A CN 200710046157 A CN200710046157 A CN 200710046157A CN 100587604 C CN100587604 C CN 100587604C
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Abstract
The present invention discloses a sectional staggered alignment mark assembly and an alignment method. A mask alignment mark branch is formed with two clusters. These two clusters with a staggered layout are composed of crossed subdivision raster at intervals at two vertical directions. One group of two groups of raster that are approximately divided according to spatial images in one group of raster of the mask alignment mark conducts alignment scanning on a work piece plane and detects information in connection with variation along position of raster polarization state at a vertical scanningdirection. High-precision alignment position will be acquired progressively according to the acquired alignment radioactive information and position information of a working table and a mask to create spatial positions of a mask pattern relative to a working table coordinate system. The mark assembly and the alignment method of the present invention can improve mark capture capacity, alignment accuracy and alignment scanning efficiency.
Description
Technical field
The present invention relates to the technique of alignment of lithographic equipment, relate in particular to the alignment methods that a kind of subsection interleaving alignment mark made up and adopted this marker combination.
Background technology
In commercial plant, because the needs of high precision and high production capacity, the measuring system and the control system of distributing a large amount of precise light electrical measurements, high-speed real-time signal sampling, data acquisition, exchanges data and communications etc.The control that these systems need us to adopt that multiple mode realizes that sensor signal controlling of sampling, data acquisition control, exchanges data control are communicated by letter with data transmission etc.Have the device of this measurement and demand for control to comprise: integrated circuit is made lithographic equipment, liquid crystal panel lithographic equipment, MEMS/MOEMS lithographic equipment, advanced encapsulation lithographic equipment, printed circuit board (PCB) lithographic equipment, printed circuit board (PCB) processing unit (plant) and printing circuit board element mounting device etc.
In lithographic equipment, use the alignment mark combination to carry out alignment scanning by the alignment system in the lithographic equipment and obtain alignment information such as the optical information of each alignment mark branch and positional information, these information are carried out respective handling, obtain the position relation between the alignment mark combination on mask alignment mark combination and the work stage datum plate, the alignment system of aiming at this lithographic equipment comprises: radiation-generating machine, mask graph illumination window and control panel thereof, mask and mask alignment mark combination thereof, mask platform, the mask platform position sensor, optical projection system, work stage and the combination of datum plate alignment mark thereof, work stage position sensor and radiation detection sensor; Wherein mask graph comprises exposure mask pattern and alignment mask figure, mask graph illumination window and control panel thereof be used to form window with radiation transmission to the alignment mask figure; Optical projection system is used for radiation irradiation is formed transmission picture or reflection image to the alignment mask figure, and this transmission picture or reflection image form aerial image by the optical projection system projection, surveys this aerial image with the sensor of workpiece stage fiducial plate alignment mark below; Radiation sensor is used to detect the emittance after aerial image passes through the transmission of work stage alignment patterns; Mask platform position sensor and work stage position sensor are surveyed the mask platform in the alignment scanning process and the locus of work stage respectively.
In the former said apparatus, in order to realize the aligning of mask graph, and generate high-precision alignment scanning information, need the mask alignment mark that can produce the high precision alignment scanning information alignment mark on the work stage datum plate.
Existing alignment mark, otherwise capture ability is relatively poor, need increase auxiliary mask alignment mark on mask, and increase more alignment scanning mode, catches step by step, thereby has reduced aligning efficient; The signal contrast of single alignment mark is not high, though can improve signal contrast with virtual digital processing method, has amplified simultaneously noise level synchronously yet, can not be from physically improving signal to noise ratio (S/N ratio), thus limited the raising of aiming at repeatable accuracy.
Summary of the invention
Technical matters solved by the invention is to provide a kind of subsection interleaving alignment mark combination and alignment methods thereof, to improve the efficient and the precision of lithographic equipment alignment scanning.
For solving the problems of the technologies described above, the invention provides a kind of subsection interleaving alignment mark combination, comprise the first and second alignment mark branches that are positioned on the mask, and be positioned at the 3rd, the 4th, the 5th and the 6th alignment mark branch that is used with the described first and second alignment mark branches on the work stage datum plate, wherein, the described first alignment mark branch is by two groups of optical grating constitutions, described two groups of gratings are arranged vertically mutually, every group of grating further comprises several grating markers, and these grating markers are arranged with predetermined spacing segmentation dislocation; The the described the 3rd and the 5th alignment mark branch forms along unidirectional grating by some groups respectively, and the direction of one group of grating in the grating orientation of described the 3rd alignment mark branch and the described first alignment mark branch is identical, and the grating orientation of described the 5th alignment mark branch is identical with another group grating orientation in the described first alignment mark branch; Described the second, the 4th and the 6th alignment mark branches into square beam orifice.
The first and second alignment mark branches on the described mask are corresponding with the 3rd, the 5th alignment mark branch and the 4th, the 6th alignment mark branch on the work stage datum plate respectively through the aerial image that optical projection system became.
The layout that overlaps at a certain distance of two groups of gratings in the described first alignment mark branch, two groups of gratings in the perhaps described first alignment mark branch do not overlap mutually.
Each grating marker in the described first alignment mark branch, and every group of grating in the described the 3rd and the 5th alignment mark branch also is subdivided into three tiny grid.
The 3rd is identical with the dutycycle of all grating markers of the first alignment mark branch on the 5th alignment mark branch and the mask on the described work stage datum plate, and on the work stage datum plate on the 3rd and the 5th alignment mark branch and the mask dutycycle of the tiny grid of all grating marker inside of the first alignment mark branch definite according to registration signal modulation and measurement requirement.
Another solution of the present invention provides a kind of method that adopts above-mentioned subsection interleaving alignment mark combination carrying out lithographic equipment to aim at, described lithographic equipment has an alignment system, and this alignment system comprises: radiation-generating machine, mask graph illumination window and control panel thereof, mask, mask platform, mask platform position sensor, optical projection system, work stage and work stage datum plate mark, work stage position sensor and radiation detection sensor; Wherein, comprise exposure mask pattern and some groups of mask alignment mark branches on the mask; Mask graph illumination window and control panel thereof form transmission window, and the radiation transmission that radiation-generating machine is produced forms the transmission picture in exposure mask pattern and mask alignment mark branch; Optical projection system forms aerial image with this transmission picture projection, and surveys this aerial image with the radiation detection sensor of workpiece stage fiducial plate mark below; The radiation information of radiation detection sensor aerial image after through the transmission of work stage datum plate mark, described radiation information comprise in radiation magnitude strength information, emittance information, the radiation phase information combination of any one or phase information and other two kinds of information; Mask platform position sensor and work stage position sensor are surveyed the mask platform in the alignment scanning process and the locus of work stage respectively; Described lithographic equipment alignment methods comprises the steps: that (1) carry out spacescan with the 4th or the 6th alignment mark branch to the aerial image of the second alignment mark branch, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the approximate location of alignment mark branch combination on the mask; (2) with the 3rd and the 5th alignment mark branch the aerial image of the first alignment mark branch is carried out the space coarse scanning, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the 3rd and the 5th alignment mark branch and the first alignment mark branch coarse alignment position, space on vertical direction each other; (3) on the basis of step (2), adjust scanning center, with the 3rd and the 5th alignment mark branch the aerial image of the first alignment mark branch being carried out the space accurately scans, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the accurate aligned position in space on vertical direction each other of the 3rd and the 5th alignment mark branch and the first alignment mark branch on the work stage datum plate; (4) carry out comprehensively with accurate aligned position on step (2) and (3) resulting both direction, proofread and correct and obtain aligned position, obtain the coordinate position of aerial image center under worktable coordinate system of transmission alignment mark combination on the mask; (5) repeating step (1)～(4), obtain several transmission alignment marks on the mask and be combined in spacial alignment coordinate position under the worktable coordinate system, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate position alignment light engraving devices.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
1, the present invention has reduced the thermal effect of mask registration scanning to lithographic equipment optical projection system and sniffer by adopting the mask alignment mark branch of lesser amt;
2, the mask alignment mark that is dislocatedly distributed of segmentation provided by the invention can improve the capture ability of mark, thereby promotes the efficient of mask registration scanning;
3, provide suitable mask registration method, improve the efficient of mask registration scanning, obtained higher alignment precision and system stability.
Description of drawings
To the description of specific embodiments of the invention, can further understand purpose, specific structural features and the advantage of its invention by following in conjunction with its accompanying drawing.Wherein, accompanying drawing is:
Fig. 1 is the structural representation of lithographic equipment alignment system.
Fig. 2 a does not have the structural representation of the alignment mark combination that the overlapping segmentation is dislocatedly distributed for the present invention.
Fig. 2 b is the overlap structural representation of the alignment mark combination that segmentation is dislocatedly distributed of the present invention.
Fig. 3 a is the arrangenent diagram of mask alignment mark branch on mask shown in Fig. 2 a.
Fig. 3 b is the arrangenent diagram of mask alignment mark branch on mask shown in Fig. 2 b.
Fig. 4 is the process flow diagram of lithographic equipment alignment methods of the present invention.
Embodiment
Below will be described in further detail subsection interleaving alignment mark combination of the present invention and alignment methods thereof.
Fig. 1 is the structural representation of lithographic equipment alignment system, 4 is mask among the figure, has mask graph (comprising exposure mask pattern and mask alignment mark branch combination 5) on it, 9 is by the photoetching workpiece, mask graph illumination window 2 and control panel 3 thereof are used to form window radiation 1 are transmitted in the mask alignment mark branch combination 5, to form the transmission picture; Optical projection system 8 is used for this transmission picture projection is formed aerial image, and surveys this aerial image with the radiation sensor 12 of workpiece stage fiducial plate mark 11 belows; Radiation sensor 12 is used to detect the radiation information after aerial image passes through 12 transmissions of work stage datum plate mark; Mask platform position sensor 7 and work stage position sensor 13 are surveyed the mask platform 6 in the alignment scanning process and the locus of work stage 10 respectively.By calculating the relational model parameter of radiation information and mask 4 and 10 relative positions of work stage, can obtain alignment information from this model, described alignment information comprise with work stage on the location dependent information of marker combination and sensor thereof, described radiation information comprises in light amplitude strength information, luminous energy information, the phase information combination of any one or phase information and other two kinds of information.
Shown in Fig. 2 a, Fig. 2 b, subsection interleaving alignment mark combination of the present invention comprises the first, second, third, fourth, the 5th and the 6th alignment mark branch 21～26, wherein the first and second alignment mark branches 21,22 are distributed on the mask, the the 3rd to the 6th alignment mark branch 23～26 is distributed on the work stage datum plate, first, second alignment mark branch 21,22 on the mask through aerial images that optical projection system became respectively with the work stage datum plate on the 3rd and the 5 23,25, and the 4th is corresponding with the 6th alignment mark branch 24,26.The described first alignment mark branch 21 is made of a plurality of grating markers, and these grating markers are divided into two groups, and these two groups of gratings are vertically arranged mutually.A plurality of grating markers in every group of grating segmentation dislocation are at a certain distance arranged.Along on the direction vertical with grating, these two groups of gratings can overlap at a certain distance, and (see Fig. 2 a), layout can not overlap (seeing Fig. 2 b) mutually yet.
The the 3rd and the 5th alignment mark branch the 23, the 25th on the work stage datum plate, by many group leaders optical grating constitution, and the 3rd becomes grating orientation almost parallel in the aerial image respectively with the 5th alignment mark branch 23,25 with one group of grating in the first alignment mark branch 21, when carrying out alignment scanning, corresponding that organized grating in the corresponding first alignment mark branch respectively;
Each grating marker in the described first alignment mark branch 21, and the 3rd, the 5th every group of grating in the alignment mark branch 23,25 also be subdivided into three tiny grid, the dutycycle of all gratings of the 3rd and the 5th alignment mark branch 23,25 on the work stage datum plate, dutycycle with all grating markers in the first alignment mark branch 21 is identical, but the dutycycle of their tiny grid can be inequality, determines according to registration signal modulation and measurement requirement.
The poroid distribution of transmission that is square of the 4th and the 6th alignment mark branch 24,26 on second alignment mark branch 22 on the mask and the work stage datum plate, before carrying out alignment scanning with the second, the 4th and the 6th alignment mark branch 22,24,26, aerial image by the 4th or the 6th alignment mark branch 24 or 26 scannings, the second alignment mark branch 22 can carry out coarse positioning to the aerial image of the first alignment mark branch 21 on the mask.
At aerial image with the 3rd or the 5th alignment mark branch 23 or 25 pairs first alignment mark branches 21, carry out in the process of alignment scanning along a certain group of grating vertical direction in the first alignment mark branch 21, carry out in the scope of alignment scanning at aerial image the first alignment mark branch 21, the the 4th or the 6th alignment mark branch 24 or 26 can comprise and receive whole aerial images that the second alignment mark branch 22 is become fully, and the optical information that the 4th or the 6th alignment mark branch 24 or 26 respective sensor detect does not change with moving of scanning position, with this optical information the resulting optical information of aerial image that scans the first alignment mark branch 21 on the mask is carried out normalization.
Fig. 3 a and Fig. 3 b are first, second alignment mark branch distribution situations on mask in the subsection interleaving alignment mark combination of the present invention.The box indicating exposure mask pattern of figure central authorities, four groups of mask alignment mark branch combinations of being made up of the first and second alignment mark branches have distributed around the exposure mask pattern.In other embodiments of the invention, can increase or reduce the quantity of alignment mark branch combination on the mask as required.
Compare with existing mask alignment mark, use alignment mark combination of the present invention to improve and catch precision and efficient, thereby enlarged the stability that lithographic equipment is aimed at, improved, can improve the efficient of mask registration efficient and other measurements mask transmission last slice adaptability.
In conjunction with Fig. 1 to Fig. 4, the concrete grammar step that subsection interleaving alignment mark combination the carrying out lithographic equipment among utilization Fig. 2 is aimed at is as follows:
At first, execution in step S1, with the aerial image of the 4th alignment mark branch to the second alignment mark branch, carry out alignment scanning along the direction of two groups of grating extensions in the first alignment mark branch respectively, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the approximate location of alignment mark branch combination on the mask;
Then, execution in step S2, with the 3rd alignment mark branch, respectively along with two groups of gratings of the first alignment mark branch in one group of grating marker direction, or along the definite diagonal of two groups of gratings of the first alignment mark branch, aerial image to the first alignment mark branch carries out the space coarse scanning, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, in computation process, the optical information that obtains with scanning process the 4th alignment mark branch respective sensor, the optical information that the 3rd alignment mark respective sensor is obtained carries out normalization respectively, obtains on the work stage datum plate coarse alignment position, space between alignment mark branch corresponding in the 3rd and the 5th alignment mark branch and mask;
Then, on the basis of step S2, execution in step S3, adjust scanning center, with the 3rd alignment mark branch, respectively along and the approximately perpendicular direction of the aerial image that every group of grating becomes of the first alignment mark branch, perhaps along the definite diagonal of two groups of gratings of the first alignment mark branch, the aerial image of the first alignment mark branch is carried out the space accurately to be scanned, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, in computation process, scan the resulting optical information of aerial image of the second alignment mark branch with the 4th alignment mark branch respective sensor in the scanning process, the resulting optical information of aerial image that the 3rd alignment mark respective sensor is scanned the first alignment mark branch carries out normalization, obtains the accurate aligned position in space between the 3rd alignment mark branch and the first alignment mark branch;
Subsequently, execution in step S4 utilizes on the resulting both direction of step S2 and S3 accurately that aligned position carries out comprehensively, proofreaies and correct and obtains aligned position, obtains the coordinate position of aerial image center under worktable coordinate system that the transmission alignment mark makes up on the mask;
Owing to have some groups of mask alignment mark branches on the mask, therefore need repeated execution of steps S1～S4, obtain all alignment mark branch group on the mask and be combined in spacial alignment coordinate position under the worktable coordinate system, last execution in step S5 is with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate position alignment light engraving devices.
With adopt existing mask alignment mark to carry out alignment scanning to compare, use above-mentioned alignment scanning method, whole mask registration can be shortened more than 4 seconds sweep time, thereby be possessed mask registration efficient preferably.
That more than introduces only is based on the preferred embodiments of the present invention, can not limit scope of the present invention with this.Any to the invention process step do well know in the art be equal to change or replace all do not exceed exposure of the present invention and protection domain.
Claims (8)
1, a kind of subsection interleaving alignment mark combination, comprise the first and second alignment mark branches that are positioned on the mask, and be positioned at the 3rd, the 4th, the 5th and the 6th alignment mark branch that is used with the described first and second alignment mark branches on the work stage datum plate, it is characterized in that: the described first alignment mark branch is by two groups of optical grating constitutions, described two groups of gratings are arranged vertically mutually, every group of grating further comprises several grating markers, and these grating markers are arranged with predetermined spacing segmentation dislocation; The the described the 3rd and the 5th alignment mark branch forms along unidirectional grating by some groups respectively, and the direction of one group of grating in the grating orientation of described the 3rd alignment mark branch and the described first alignment mark branch is identical, and the grating orientation of described the 5th alignment mark branch is identical with another group grating orientation in the described first alignment mark branch; Described the second, the 4th and the 6th alignment mark branches into square beam orifice.
2, subsection interleaving alignment mark combination as claimed in claim 1, it is characterized in that: the first and second alignment mark branches on the mask are corresponding with the 3rd, the 5th alignment mark branch and the 4th, the 6th alignment mark branch on the work stage datum plate respectively through the aerial image that optical projection system became.
3, subsection interleaving alignment mark as claimed in claim 1 combination is characterized in that: the layout that overlaps at a certain distance of two groups of gratings in the described first alignment mark branch.
4, subsection interleaving alignment mark combination as claimed in claim 1, it is characterized in that: two groups of gratings in the described first alignment mark branch do not overlap mutually.
5, subsection interleaving alignment mark as claimed in claim 1 combination is characterized in that, the 3rd is identical with the dutycycle of all grating markers of the first alignment mark branch on the 5th alignment mark branch and the mask on the work stage datum plate.
6, alignment mark combination as claimed in claim 1 is characterized in that: each grating marker in the described first alignment mark branch, and every group of grating in the described the 3rd and the 5th alignment mark branch also is subdivided into three tiny grid.
7, subsection interleaving alignment mark as claimed in claim 6 combination is characterized in that: on the work stage datum plate on the 3rd and the 5th alignment mark branch and the mask dutycycle of the tiny grid of all grating marker inside of the first alignment mark branch definite according to registration signal modulation and measurement requirement.
8, adopt the method for aiming at as each described subsection interleaving alignment mark combination carrying out lithographic equipment in the claim 1～7, described lithographic equipment has an alignment system, and this alignment system comprises: radiation-generating machine, mask graph illumination window and control panel thereof, mask, mask platform, mask platform position sensor, optical projection system, work stage and work stage datum plate mark, work stage position sensor and radiation detection sensor; Wherein
Comprise exposure mask pattern and some groups of mask alignment mark branches on the mask;
Mask graph illumination window and control panel thereof form transmission window, and the radiation transmission that radiation-generating machine is produced forms the transmission picture in exposure mask pattern and mask alignment mark branch;
Optical projection system forms aerial image with this transmission picture projection, and surveys this aerial image with the radiation detection sensor of workpiece stage fiducial plate mark below;
The radiation information of radiation detection sensor aerial image after through the transmission of work stage datum plate mark, described radiation information comprise in radiation magnitude strength information, emittance information, the radiation phase information combination of any one or phase information and other two kinds of information;
Mask platform position sensor and work stage position sensor are surveyed the mask platform in the alignment scanning process and the locus of work stage respectively;
It is characterized in that described lithographic equipment alignment methods comprises the steps:
(1) with the 4th or the 6th alignment mark branch the aerial image of the second alignment mark branch is carried out spacescan, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the approximate location of alignment mark branch combination on the mask;
(2) with the 3rd and the 5th alignment mark branch the aerial image of the first alignment mark branch is carried out the space coarse scanning, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the 3rd and the 5th alignment mark branch and the first alignment mark branch coarse alignment position, space on vertical direction each other;
(3) on the basis of step (2), adjust scanning center, with the 3rd and the 5th alignment mark branch the aerial image of the first alignment mark branch being carried out the space accurately scans, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the accurate aligned position in space on vertical direction each other of the 3rd and the 5th alignment mark branch and the first alignment mark branch on the work stage datum plate;
(4) carry out comprehensively with accurate aligned position on step (2) and (3) resulting both direction, proofread and correct and obtain aligned position, obtain the coordinate position of aerial image center under worktable coordinate system of transmission alignment mark combination on the mask;
(5) repeating step (1)～(4), obtain several transmission alignment marks on the mask and be combined in spacial alignment coordinate position under the worktable coordinate system, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate position alignment light engraving devices.
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| CN200710046157A CN100587604C (en) | 2007-09-20 | 2007-09-20 | Subsection interleaving aligning mark combined and aligning method thereof |
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| CN200710046157A CN100587604C (en) | 2007-09-20 | 2007-09-20 | Subsection interleaving aligning mark combined and aligning method thereof |
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| CN100587604C true CN100587604C (en) | 2010-02-03 |
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| CN105182680B (en) * | 2015-10-22 | 2019-12-17 | 深圳市华星光电技术有限公司 | Color resistance mask plate and using method thereof |
| CN112631091B (en) * | 2020-12-14 | 2022-07-05 | 华虹半导体(无锡)有限公司 | Wafer alignment method in photoetching process |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |