CN100587603C - Mask alignment marker and aligning method used for photo etching device - Google Patents
Mask alignment marker and aligning method used for photo etching device Download PDFInfo
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- CN100587603C CN100587603C CN200710045037A CN200710045037A CN100587603C CN 100587603 C CN100587603 C CN 100587603C CN 200710045037 A CN200710045037 A CN 200710045037A CN 200710045037 A CN200710045037 A CN 200710045037A CN 100587603 C CN100587603 C CN 100587603C
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Abstract
The present invention discloses a mask alignment mark and an alignment method. Partial structure of the mask alignment mark is different from the left part and longer as usual to enhance capacity of mark branches to capture mark scanning, increase success rate of coarse scanning, improve contrast of alignment information generated by the alignment scanning, elevate signal-to-noise ratio of information during alignment processing and heighten precision of mask alignment. The method of generating Moire fringe information by combining radial coarse scanning with tangential rotating coarse and fine scanning improves alignment scanning efficiency. A method of generating Moire fringe information by combining coarse and fine scanning along a raster direction in an alignment mark branch approximately vertical with two vertical directions improves alignment scanning efficiency.
Description
Technical field
The present invention relates to the technique of alignment of lithographic equipment, relate in particular to mask alignment mark that is used for lithographic equipment and the alignment methods that adopts this alignment mark.
Background technology
In commercial plant, because the needs of high precision and high production capacity, a large amount of high-speed real-time signal samplings, data acquisition, signal real time processing system are distributing.Wherein the signal real time processing system need adopt effective information processing model and method to reach high-accuracy, high efficiency requirement.Have the device of this demand to comprise: integrated circuit is made lithographic equipment, liquid crystal panel lithographic equipment, photomask marking press equipment, MEMS/MOEMS lithographic equipment, advanced encapsulation lithographic equipment, printed circuit board (PCB) lithographic equipment, printed circuit board (PCB) processing unit (plant) etc.
In the former said apparatus, in order to realize the aligning of mask graph, and generate high-precision alignment scanning information, need the mask alignment mark that can produce the high precision alignment scanning information alignment mark on the work stage datum plate.
Existing alignment mark, otherwise capture ability is relatively poor, need increase auxiliary mask alignment mark on mask, and increase more alignment scanning mode, catches step by step, thereby has reduced aligning efficient; The signal contrast of single alignment mark is not high, though can improve signal contrast with virtual digital processing method, has amplified simultaneously noise level synchronously yet, can not be from physically improving signal to noise ratio (S/N ratio), thus limited the raising of aiming at repeatable accuracy.
Summary of the invention
Technical matters solved by the invention is to provide the mask alignment mark of the contrast of a kind of capture ability that improves alignment scanning and alignment information, and use the mask alignment mark that is provided to carry out mask registration scanning, realize the method for capture ability, precision of alignment and the aligning efficient of raising mask alignment mark aerial image.
For solving the problems of the technologies described above, the invention provides a kind of mask alignment mark, place on the mask of mask platform respectively and on the datum plate of work stage, be used to provide the mask optical alignment, wherein, described mask alignment mark comprises first, the second and the 3rd alignment mark branch, wherein, the poroid distribution of transmission that is square of the second alignment mark branch, the first and the 3rd alignment mark branch is about the half-twist replacement each other of the second alignment mark branch, and the first and the 3rd alignment mark branch is respectively by first, the second and the 3rd grating marker structure is along constituting side by side with the grating vertical direction, wherein the first and the 3rd grating marker structure is identical, be distributed in the second grating marker structure both sides, described first is different with the length of the second grating marker structure with the length of the 3rd grating marker structure.
Further, the length of the second grating marker structure is 1.2 times to 100 times of the first and the 3rd grating marker structure, perhaps the length of the first and the 3rd grating marker structure is 1.2 times to 100 times of the second grating marker structure, and the grid in described first, second and the 3rd grating marker structure are subdivided into three tiny gratings.Preferably, the length of the second grating marker structure is 1.5 times, 2 times, 5 times, 10 times, 20 times or 50 times of the first and the 3rd grating marker structure; Perhaps the length of the first and the 3rd grating marker structure is 1.5 times, 2 times, 5 times, 10 times, 20 times or 50 times of the second grating marker structure.
Further, the dutycycle of all grating marker structures of corresponding the first, the 3rd alignment mark branch is unequal with the dutycycle of corresponding all grating marker structures in the mask alignment mark on the mask in the mask alignment mark on the work stage datum plate, and the dutycycle of the tiny grating of all grating marker inside configuration of the first, the 3rd alignment mark branch is determined according to registration signal modulation and measurement requirement on the work stage datum plate and in the mask alignment mark on the mask.
Another solution of the present invention provides a kind of aforementioned mask alignment mark that adopts and carries out the method that lithographic equipment is aimed at, described lithographic equipment has an alignment system, and this alignment system comprises: radiation-generating machine, mask graph illumination window and control panel thereof, mask, mask platform, mask platform position sensor, optical projection system, work stage and work stage datum plate mark, work stage position sensor and radiation detection sensor; Wherein, comprise exposure mask pattern and several mask alignment mark on the mask; Mask graph illumination window and control panel thereof form transmission window, and the radiation transmission that radiation-generating machine is produced forms the transmission picture on exposure mask pattern and mask alignment mark; Optical projection system forms aerial image with this transmission picture projection, and surveys this aerial image with the radiation detection sensor of workpiece stage fiducial plate mark below; The radiation information of radiation detection sensor aerial image after through the transmission of work stage datum plate mark, described radiation information comprise in radiation magnitude strength information, emittance information, the radiation phase information combination of any one or phase information and other two kinds of information; Mask platform position sensor and work stage position sensor are surveyed the mask platform in the alignment scanning process and the locus of work stage respectively; And the optical grating construction of the first alignment mark branch of the mask alignment mark on the work stage datum plate perpendicular to work stage radially, and the optical grating construction of the 3rd alignment mark branch is parallel to work stage radially; Described lithographic equipment alignment methods comprises the steps: that (1) slightly catch scanning with the second alignment mark branch on the workpiece stage fiducial plate to the aerial image of the second alignment mark branch of alignment mark on the mask, obtains the approximate location of mask alignment mark; (2) radially the aerial image of alignment mark branch corresponding on the mask is carried out coarse scanning with the first alignment mark branch on the workpiece stage fiducial plate along work stage, coarse scanning is radially carried out to the aerial image of alignment mark branch corresponding on the mask with the first alignment mark branch on the workpiece stage fiducial plate along work stage in the radially coarse alignment position that obtains between the two, obtains radially coarse alignment position between the two; (3) by radially accurately aligned position calculating, obtain the tangential scanning center angle of the tangential sweep center point correspondence of the 3rd alignment mark branch on the work stage datum plate, by the 3rd alignment mark branch on the rotational workpieces stage fiducial plate, aerial image to alignment mark branch corresponding on the mask tangentially carries out coarse scanning, obtains on the work stage the tangential coarse alignment position angle between alignment mark branch corresponding in the 3rd alignment mark branch and mask; (4) through after the angle adjustment of tangential coarse alignment position, with described radially coarse alignment position is the center that work stage is radially aimed at smart scanning, radially the aerial image of alignment mark branch corresponding on the mask is carried out essence scanning with the first alignment mark branch on the workpiece stage fiducial plate, obtain on the work stage the radially accurate aligned position between alignment mark branch corresponding in the first alignment mark branch and mask; (5) radially adjust the first alignment mark branch with described radially coarse alignment position calculation and along work stage, with described tangential coarse alignment position angle is the center angle that work stage is aimed at rotation sweep, the 3rd alignment mark branch on the rotational workpieces stage fiducial plate tangentially carries out essence scanning to the aerial image of alignment mark branch corresponding on the mask, obtains on the work stage the tangential accurate aligned position angle between alignment mark branch corresponding in the 3rd alignment mark branch and mask; (6) carry out comprehensively with tangential accurately aligned position angle with step (4) and (5) resulting radially accurate aligned position, proofread and correct and obtain aligned position, obtain the coordinate position of aerial image center under worktable coordinate system of the mask alignment mark on the mask; (7) repeating step (1)～(6), obtain the spacial alignment coordinate position of several mask alignment mark under worktable coordinate system on the mask, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate position alignment light engraving devices.
Another scheme of the present invention provides a kind of aforementioned mask alignment mark that adopts and carries out the method that lithographic equipment is aimed at, comprise the steps: that (a) slightly catches scanning with the second alignment mark branch in the mask alignment mark on the workpiece stage fiducial plate to the aerial image of the second alignment mark branch in the alignment mark on the mask, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain the thick center of transmission alignment mark combination; (b) along direction the aerial image of alignment mark branch corresponding on the mask is carried out the single or multiple lift coarse scanning with the first alignment mark branch on the workpiece stage fiducial plate perpendicular to it, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage datum plate the coarse alignment spatial positional information between alignment mark branch corresponding in the first alignment mark branch and mask along the direction of scanning; (c) the coarse alignment position calculation by the first alignment mark branch on mask and the work stage datum plate, upgrade the center of the 3rd alignment mark branch vertical scanning direction, with workpiece stage fiducial plate the 3rd alignment mark branch the 3rd alignment mark branch on the mask is carried out the single or multiple lift coarse scanning, the utilization scanning probe to described radiation information and mask the 3rd alignment mark branch and corresponding work stage datum plate alignment mark branch calculate along the positional information on the direction of scanning, obtain on the work stage datum plate the coarse alignment spatial positional information between alignment mark branch corresponding in the 3rd alignment mark branch and mask along the direction of scanning; (d) with on described work stage datum plate and the mask first with the 3rd alignment mark branch between coarse alignment position calculation mask on the scanning center position of the corresponding aerial image of the first alignment mark branch, scan along the aerial image of alignment mark branch corresponding on the mask being carried out essence with the first alignment mark branch on the workpiece stage fiducial plate approximately perpendicular to the direction of aiming at grating in the alignment mark branch, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage on the datum plate and mask between the first alignment mark branch along the accurate aligned position on the approximate direction of scanning; (e) with the scanning center position of the corresponding aerial image of the 3rd alignment mark branch on the coarse alignment position calculation mask plate between accurate aligned position between the first alignment mark branch on described work stage datum plate and the mask and the 3rd alignment mark branch, along the direction of aiming at grating in the near normal alignment mark branch aerial image of alignment mark branch corresponding on the mask being carried out essence with the 3rd alignment mark branch on the workpiece stage fiducial plate scans, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage on the datum plate and mask between the 3rd alignment mark branch along the accurate aligned position on the approximate direction of scanning; (f) with step (d) and (e) on the resultant mask the accurate aligned position of the first and the 3rd alignment mark branch carry out comprehensively, correction obtains aligned position, obtains the coordinate position of aerial image center under worktable coordinate system of transmission alignment mark combination on the mask; (g) repeat to obtain the spacial alignment coordinate position of several mask alignment mark under worktable coordinate system on the mask, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate positions calculating and the alignment light engraving device with step (a)～(f).
Compared with prior art, catch high-contrast mask alignment mark and alignment methods thereof owing to adopt symmetric form height of the present invention, can improve the capture ability of alignment mark aerial image of alignment scanning and contrast and the signal to noise ratio (S/N ratio) thereof that alignment scanning generates alignment information, this method can improve the efficient of alignment scanning, reach very high aligned position repeatable accuracy, that has realized alignment scanning is marked as the image height acquisition probability, has improved the efficient of alignment scanning.
Description of drawings
To the description of specific embodiments of the invention, can further understand purpose, specific structural features and the advantage of its invention by following in conjunction with its accompanying drawing.Wherein, accompanying drawing is:
Fig. 1 is the structural representation of lithographic equipment alignment system.
Fig. 2 is the structural representation of mask alignment mark of the present invention.
Fig. 3 is for aiming at and the calibration steps synoptic diagram.
Fig. 4 is the alignment methods process flow diagram of the present invention the 2nd embodiment.
Embodiment
Below will be described in further detail mask alignment mark of the present invention and alignment methods.
Fig. 1 is the structural representation of the alignment system of lithographic equipment, 4 is mask among the figure, has mask graph (comprising exposure mask pattern and mask alignment mark 5) on it, 9 is by the photoetching workpiece, mask graph illumination window 2 and control panel 3 thereof are used to form window radiation 1 are transmitted on the mask alignment mark 5, to form the transmission picture; Optical projection system 8 is used for this transmission picture projection is formed aerial image, and surveys this aerial image with the radiation sensor 12 of workpiece stage fiducial plate mark 11 belows; Radiation sensor 12 is used to detect the radiation information after aerial image passes through 12 transmissions of work stage datum plate mark; Mask platform position sensor 7 and work stage position sensor 13 are surveyed the mask platform 6 in the alignment scanning process and the locus of work stage 10 respectively.By calculating the relational model parameter of radiation information and mask 4 and 10 relative positions of work stage, can obtain alignment information from this model, described alignment information comprise with work stage on the location dependent information of marker combination and sensor thereof, described radiation information comprises in light amplitude strength information, luminous energy information, the phase information combination of any one or phase information and other two kinds of information.
On a kind of mask that places mask platform and the mask alignment mark on the datum plate of work stage, be the transmission alignment mark combination that is made of a plurality of alignment mark branch, described marker combination is used to provide described mask optical alignment.
Shown in Fig. 2 a, Fig. 2 b, described mask alignment mark comprises first 20a of alignment mark branch, the second alignment mark branch 30 and the 3rd 20b of mark branch, and the first and the 3rd 20a of alignment mark branch, 20b half-twist each other replace; The corresponding second alignment mark branch 30 figures poroid distribution of transmission that is square in the transmission alignment mark on the work stage datum plate, with the 20a of two other alignment mark branch, 20b carries out before the alignment scanning, aerial image by the corresponding second alignment mark branch 30 in the transmission alignment mark on the corresponding second alignment mark branch 30 scanning masks in the transmission alignment mark on the work stage datum plate, be used for corresponding the first and the 3rd 20a of alignment mark branch of transmission alignment mark on the mask, the aerial image of 20b carries out coarse positioning, thereby at the 20a of two other alignment mark branch that uses on the workpiece stage fiducial plate, 20b to two other alignment mark branch in the transmission alignment mark on the mask respectively or carry out simultaneously in the process of alignment scanning, can comprise and receive the aerial image that the corresponding second alignment mark branch 30 is become in the transmission alignment mark on the mask fully, projecting space picture with the corresponding second alignment mark branch 30 in the transmission alignment mark combination on the mask that is obtained in the alignment scanning process, through the radiation information that the corresponding second alignment mark branch in the transmission alignment mark on the work stage datum plate forms, the radiation information that part or all of alignment mark branch in the work stage datum plate transmission alignment mark is carried out the alignment scanning acquisition carries out normalization.
Shown in Fig. 2 c, described first, the 3rd 20a/20b of alignment mark branch is by first, the second and the 3rd grating marker structure 21～23 is along constituting side by side with the grating vertical direction, wherein the first and the 3rd aim at grating mark structure 21,23 is just the same, be distributed on second and aim at grating mark structure 22 both sides, second aims at grating mark structure 22 aims at grating mark structure 21 with first and the 3rd, 23 to compare its length inconsistent, its length is the first and the 3rd aligning grating mark structure 21,23 1.2 times to 100 times, preferred ratio also comprises 1.5 times, 2 times, 5 times, 10 times, 20 times or 50 times.Alternative dispensing means is that the first and the 3rd length of aiming at grating mark structure 21,23 is 1.2 times to 100 times of the second aligning grating mark structure 22, and preferred ratio also comprises 1.5 times, 2 times, 5 times, 10 times, 20 times or 50 times.So the purpose of design is the contrast that raising capture ability and radiation see through energy.
Referring to Fig. 2 a～Fig. 2 c, the described first and the 3rd 20a of alignment mark branch, the grating marker structure 21～23 of 20b further is subdivided into three tiny gratings, correspondence first in the transmission alignment mark on the work stage datum plate, the 3rd 20a of alignment mark branch, the dutycycle of all grating marker structures of 20b is unequal with the dutycycle of corresponding all grating marker structures in the transmission alignment mark on the mask, and on the work stage datum plate and on the mask in the transmission alignment mark first, the 3rd 20a of alignment mark branch, the dutycycle of the tiny grating of all grating marker inside configuration of 20b can be identical, also can be inequality, determine according to registration signal modulation and measurement requirement.
Use this transmission alignment mark can improve capture range more than 10 times, improve the signal contrast more than 2 times, improve the signal to noise ratio (S/N ratio) more than 2 times simultaneously, thereby improved the alignment precision of lithographic equipment, enlarge the stability that lithographic equipment is aimed at, improved the efficient of mask registration efficient and other measurements.
A kind of alignment methods of lithographic equipment.It is in the alignment system of as shown in Figure 1 lithographic equipment, by calculating the relational model parameter of relative position between radiation and mask and work stage, obtains aligned position from this model.
Specifically introduce the method flow that utilization aforementioned mask alignment mark carries out mask registration below in conjunction with Fig. 1 to Fig. 4.The O point is the geometric center of work stage among Fig. 3, and concrete steps are as follows:
1, carries out coarse scanning with the second alignment mark branch 30 in the transmission alignment mark 5 on the 30 pairs of masks of the second alignment mark branch in the transmission alignment mark 12 on the workpiece stage fiducial plate and catch whole transmission alignment mark, obtain the approximate location of transmission alignment mark, wherein on work stage datum plate and the mask three alignment mark branches of transmission alignment mark with work stage geometric center O along its radial array;
2, radially earlier the aerial image of alignment mark branch corresponding on the mask is carried out coarse scanning with grating structure proximate on the workpiece stage fiducial plate perpendicular to the work stage 20a of alignment mark branch radially, if the angle Θ that exists between the mark on the aerial image of alignment mark branch and the work stage datum plate on the corresponding mask changes less than 50 microradians, can think that then what obtain is vernier type Moire fringe aligning radiation information; If this angle Θ is greater than 50 microradians, then scan in the signal that generates except there being the vernier type Moire fringe to aim at the radiation information, also exist horizontal Moire fringe to aim at radiation information, with optical grating construction on above-mentioned aligning radiation information and the work stage datum plate perpendicular to work stage radially the 20a of alignment mark branch and mask on relative position information between the aerial image of corresponding alignment mark branch aim at calculating, obtain optical grating construction on the work stage perpendicular to work stage radially the 20a of alignment mark branch and mask on radially coarse alignment position B between corresponding alignment mark branch;
3, be parallel to the work stage 20b of alignment mark branch radially with grating structure proximate on the workpiece stage fiducial plate aerial image of alignment mark branch corresponding on the mask is tangentially carried out coarse scanning, with work stage geometric center O is the center of circle, with above-mentioned radially accurately aligned position be that direction is extended the first and the 3rd alignment mark in the above-mentioned transmission alignment mark combination and divided distance between branch center, the central point C that is tangentially scanned, and be the center angle with the corresponding tangential angle of this point, carry out coarse scanning earlier, scan in the aligning radiation information that generates except there being the vernier type Moire fringe to aim at the radiation information, also exist horizontal Moire fringe to aim at radiation information, with grating structure proximate on above-mentioned aligning radiation information and the work stage datum plate be parallel to work stage radially the 20b of alignment mark branch and mask on relative position information between the aerial image of corresponding alignment mark branch aim at calculating, obtain tangential coarse alignment position angle;
4, through after the angle adjustment of tangential coarse alignment position, with above-mentioned radially coarse alignment position is the center that work stage is radially aimed at smart scanning, radially the aerial image of alignment mark branch corresponding on the mask is carried out essence scanning with grating structure proximate on the workpiece stage fiducial plate perpendicular to the work stage 20a of alignment mark branch radially, this essence scanning can be to the aerial image of a plurality of lines on the mask on work stage datum plate face, also can be to the isolated aerial image of lines on work stage datum plate face on the mask; If alignment mark is branched off between picture and the sensor mark and has angle on the corresponding mask, then scan in the signal that generates except there being the vernier type Moire fringe to aim at the radiation information, also exist horizontal Moire fringe to aim at radiation information, with optical grating construction on above-mentioned aligning radiation information and the work stage datum plate perpendicular to work stage radially the 20a of alignment mark branch and mask on relative position information between the aerial image of corresponding alignment mark branch aim at calculating, obtain optical grating construction on the work stage perpendicular to work stage radially the 20a of alignment mark branch and mask on radially accurate aligned position A between corresponding alignment mark branch;
5, with tangential coarse alignment position angle in the step 3 is the center angle that work stage is aimed at rotation sweep, being parallel to the work stage 20b of alignment mark branch radially with grating structure proximate on the workpiece stage fiducial plate tangentially carries out essence to the aerial image of alignment mark branch corresponding on the mask and scans, scan in the signal that generates except there being the vernier type Moire fringe to aim at the radiation information, still exist horizontal Moire fringe to aim at radiation information, this essence scanning can be to the aerial image of a plurality of lines on work stage datum plate face, also can be to the isolated aerial image of lines on work stage datum plate face, with grating structure proximate on above-mentioned aligning radiation information and the work stage datum plate be parallel to work stage radially the 20b of alignment mark branch and mask on relative position information between the aerial image of corresponding alignment mark branch aim at calculating, obtain tangential accurately aligned position angle side-play amount θ, correspondence position point is D;
6, with step 4 resulting radially accurately the resulting tangential accurately aligned position angle theta of aligned position A and step 5 to carry out aligned position comprehensive, i.e. comprehensively radially A point and tangential D point, correction obtains aligned position, obtains the coordinate position of aerial image center under worktable coordinate system of transmission alignment mark combination on the mask.
7, repeat to obtain several transmission alignment marks on the mask and be combined in spacial alignment coordinate position under the worktable coordinate system with step 1～6, with these spacial alignment coordinate positions calculate and the alignment light engraving device in the coordinate position of exposure mask pattern center under worktable coordinate system.
Referring to Fig. 1 to Fig. 4, the alignment methods of another kind of lithographic equipment of the present invention comprises the steps:
(a) with the second alignment mark branch in the mask alignment mark on the workpiece stage fiducial plate aerial image of the second alignment mark branch in the alignment mark on the mask is slightly caught scanning, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain the thick center of transmission alignment mark combination;
(b) along direction the aerial image of alignment mark branch corresponding on the mask is carried out the single or multiple lift coarse scanning with the first alignment mark branch on the workpiece stage fiducial plate perpendicular to it, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage datum plate the coarse alignment spatial positional information between alignment mark branch corresponding in the first alignment mark branch and mask along the direction of scanning;
(c) the coarse alignment position calculation by the first alignment mark branch on mask and the work stage datum plate, upgrade the center of the 3rd alignment mark branch vertical scanning direction, with workpiece stage fiducial plate the 3rd alignment mark branch the 3rd alignment mark branch on the mask is carried out the single or multiple lift coarse scanning, the utilization scanning probe to described radiation information and mask the 3rd alignment mark branch and corresponding work stage datum plate alignment mark branch calculate along the positional information on the direction of scanning, obtain on the work stage datum plate the coarse alignment spatial positional information between alignment mark branch corresponding in the 3rd alignment mark branch and mask along the direction of scanning;
(d) with on described work stage datum plate and the mask first with the 3rd alignment mark branch between coarse alignment position calculation mask on the scanning center position of the corresponding aerial image of the first alignment mark branch, scan along the aerial image of alignment mark branch corresponding on the mask being carried out essence with the first alignment mark branch on the workpiece stage fiducial plate approximately perpendicular to the direction of aiming at grating in the alignment mark branch, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage on the datum plate and mask between the first alignment mark branch along the accurate aligned position on the approximate direction of scanning;
(e) with the scanning center position of the corresponding aerial image of the 3rd alignment mark branch on the coarse alignment position calculation mask plate between accurate aligned position between the first alignment mark branch on described work stage datum plate and the mask and the 3rd alignment mark branch, along the direction of aiming at grating in the near normal alignment mark branch aerial image of alignment mark branch corresponding on the mask being carried out essence with the 3rd alignment mark branch on the workpiece stage fiducial plate scans, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage on the datum plate and mask between the 3rd alignment mark branch along the accurate aligned position on the approximate direction of scanning;
(f) with step (d) and (e) on the resultant mask the accurate aligned position of the first and the 3rd alignment mark branch carry out comprehensively, correction obtains aligned position, obtains the coordinate position of aerial image center under worktable coordinate system of transmission alignment mark combination on the mask;
(g) repeat to obtain the spacial alignment coordinate position of several mask alignment mark under worktable coordinate system on the mask, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate positions calculating and the alignment light engraving device with step (a)～(f).
Utilization aforementioned mask alignment methods can shorten whole mask registration more than 8 seconds than prior art, thereby possess mask registration efficient preferably sweep time.
That more than introduces only is based on the preferred embodiments of the present invention, can not limit scope of the present invention with this.Any to the invention process step do well know in the art be equal to change or replace all do not exceed exposure of the present invention and protection domain.
Claims (16)
1, a kind of mask alignment mark, place on the mask of mask platform respectively and on the datum plate of work stage, be used to provide the mask optical alignment, described mask alignment mark comprises first, the second and the 3rd alignment mark branch, wherein, the poroid distribution of transmission that is square of the second alignment mark branch, the first and the 3rd alignment mark branch is about the half-twist replacement each other of the second alignment mark branch, and the first and the 3rd alignment mark branch is respectively by first, the second and the 3rd grating marker structure is along constituting side by side with the grating vertical direction, wherein the first and the 3rd grating marker structure is identical, be distributed in the second grating marker structure both sides, it is characterized in that: described first is different with the length of the second grating marker structure with the length of the 3rd grating marker structure.
2, mask alignment mark as claimed in claim 1, it is characterized in that: the length of the second grating marker structure is 1.2 times to 100 times of the first and the 3rd grating marker structure, and perhaps the length of the first and the 3rd grating marker structure is 1.2 times to 100 times of the second grating marker structure.
3, mask alignment mark as claimed in claim 2 is characterized in that: the length of the second grating marker structure is 1.5 times, 2 times, 5 times, 10 times, 20 times or 50 times of the first and the 3rd grating marker structure; Perhaps the length of the first and the 3rd grating marker structure is 1.5 times, 2 times, 5 times, 10 times, 20 times or 50 times of the second grating marker structure.
4, mask alignment mark as claimed in claim 1 is characterized in that: the grating in described first, second and the 3rd grating marker structure is subdivided into three tiny gratings.
5, mask alignment mark as claimed in claim 4, it is characterized in that: the dutycycle of all grating marker structures of corresponding the first, the 3rd alignment mark branch is identical with the dutycycle of corresponding all grating marker structures in the mask alignment mark on the mask in the mask alignment mark on the work stage datum plate, but the dutycycle difference of tiny grating is wherein determined according to registration signal modulation and measurement requirement.
6, adopt the method for carrying out the lithographic equipment aligning as each described mask alignment mark in the claim 1～5, described lithographic equipment has an alignment system, and this alignment system comprises: radiation-generating machine, mask graph illumination window and control panel thereof, mask, mask platform, mask platform position sensor, optical projection system, work stage and work stage datum plate mark, work stage position sensor and radiation detection sensor; Wherein
Comprise exposure mask pattern and several mask alignment mark on the mask;
Mask graph illumination window and control panel thereof form transmission window, and the radiation transmission that radiation-generating machine is produced forms the transmission picture on exposure mask pattern and mask alignment mark;
Optical projection system forms aerial image with this transmission picture projection, and surveys this aerial image with the radiation detection sensor of workpiece stage fiducial plate mark below;
The radiation information of radiation detection sensor aerial image after through the transmission of work stage datum plate mark, described radiation information comprise in radiation magnitude strength information, emittance information, the radiation phase information combination of any one or phase information and other two kinds of information;
Mask platform position sensor and work stage position sensor are surveyed the mask platform in the alignment scanning process and the locus of work stage respectively;
And the optical grating construction of the first alignment mark branch of the mask alignment mark on the work stage datum plate perpendicular to work stage radially, and the optical grating construction of the 3rd alignment mark branch is parallel to work stage radially; It is characterized in that described lithographic equipment alignment methods comprises the steps:
(1) with the second alignment mark branch on the workpiece stage fiducial plate aerial image of the second alignment mark branch of alignment mark on the mask is slightly caught scanning, obtain the approximate location of mask alignment mark;
(2) radially the aerial image of alignment mark branch corresponding on the mask is carried out coarse scanning with the first alignment mark branch on the workpiece stage fiducial plate along work stage, obtain radially coarse alignment position between the two;
(3) by radially accurately aligned position calculating, obtain the tangential scanning center angle of the tangential sweep center point correspondence of the 3rd alignment mark branch on the work stage datum plate, by the 3rd alignment mark branch on the rotational workpieces stage fiducial plate, aerial image to alignment mark branch corresponding on the mask tangentially carries out coarse scanning, obtains on the work stage the tangential coarse alignment position angle between alignment mark branch corresponding in the 3rd alignment mark branch and mask;
(4) through after the angle adjustment of tangential coarse alignment position, with described radially coarse alignment position is the center that work stage is radially aimed at smart scanning, radially the aerial image of alignment mark branch corresponding on the mask is carried out essence scanning with the first alignment mark branch on the workpiece stage fiducial plate, obtain on the work stage the radially accurate aligned position between alignment mark branch corresponding in the first alignment mark branch and mask;
(5) radially adjust the first alignment mark branch with described radially coarse alignment position calculation and along work stage, with described tangential coarse alignment position angle is the center angle that work stage is aimed at rotation sweep, the 3rd alignment mark branch on the rotational workpieces stage fiducial plate tangentially carries out essence scanning to the aerial image of alignment mark branch corresponding on the mask, obtains on the work stage the tangential accurate aligned position angle between alignment mark branch corresponding in the 3rd alignment mark branch and mask;
(6) carry out comprehensively with tangential accurately aligned position angle with step (4) and (5) resulting radially accurate aligned position, proofread and correct and obtain aligned position, obtain the coordinate position of aerial image center under worktable coordinate system of the mask alignment mark on the mask;
(7) repeating step (1)～(6), obtain the spacial alignment coordinate position of several mask alignment mark under worktable coordinate system on the mask, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate position alignment light engraving devices.
7, lithographic equipment alignment methods as claimed in claim 6 is characterized in that: three alignment mark branches of the mask alignment mark on work stage datum plate and the mask with the work stage geometric center along its radial array.
8, lithographic equipment alignment methods as claimed in claim 6, it is characterized in that: in the step (1), utilization slightly catch scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the approximate location of transmission alignment mark combination.
9, lithographic equipment alignment methods as claimed in claim 6, it is characterized in that: in the step (2), if the variable angle that exists between the mark on the aerial image of alignment mark branch and the work stage datum plate on the corresponding mask, can think then that what obtain is vernier type Moire fringe aligning radiation information less than 50 microradians; If this angle is greater than 50 microradians, then scan in the signal that generates except there being the vernier type Moire fringe to aim at the radiation information, also exist horizontal Moire fringe to aim at radiation information, the utilization scanning probe to radiation information and mask position information and work stage positional information calculate, obtain the radially coarse alignment position between alignment mark branch corresponding on the first alignment mark branch of mask alignment mark on the work stage datum plate and the mask.
10, lithographic equipment alignment methods as claimed in claim 6, it is characterized in that: the tangential sweep center point of step (3) is to be the center of circle with the work stage geometric center, with described radially accurately aligned position be that direction extends that the first and the 3rd alignment mark divides the distance between branch center to obtain in the described transmission alignment mark combination.
11, lithographic equipment alignment methods as claimed in claim 10, it is characterized in that: in the aligning radiation information that coarse scanning generated in the step (3) except there being the vernier type Moire fringe to aim at the radiation information, also exist horizontal Moire fringe to aim at radiation information, calculate with the tangential position angle information of described aligning radiation information and mask alignment mark branch and corresponding work stage datum plate alignment mark branch.
12, lithographic equipment alignment methods as claimed in claim 6, it is characterized in that: the described smart scanning of step (4) is to the aerial image of a plurality of lines on the mask on work stage datum plate face, or to isolating the scanning of the aerial image of lines on work stage datum plate face on the mask.
13, lithographic equipment alignment methods as claimed in claim 12, it is characterized in that: in the step (4), if alignment mark is branched off between picture and the corresponding work stage datum plate alignment mark branch and has angle on the mask, then scan in the signal that generates except there being the vernier type Moire fringe to aim at the radiation information, also exist horizontal Moire fringe to aim at radiation information, calculate with described aligning radiation information and mask position information and work stage positional information, obtain on the work stage datum plate the radially accurate aligned position between alignment mark branch corresponding in the first alignment mark branch and mask.
14, lithographic equipment alignment methods as claimed in claim 6, it is characterized in that: the described smart scanning of step (5), in the signal that generates except there being the vernier type Moire fringe to aim at the radiation information, still exist horizontal Moire fringe to aim at radiation information, this essence scanning is to the aerial image of a plurality of lines on work stage datum plate face, or to the isolated aerial image of lines on work stage datum plate face.
15, lithographic equipment alignment methods as claimed in claim 14, it is characterized in that: aim at calculating with the relative position information between the aerial image of alignment mark branch corresponding on the 3rd alignment mark branch on described aligning radiation information and the work stage datum plate and the mask, obtain tangential accurately aligned position angle.
16, adopt the method for carrying out the lithographic equipment aligning as each described mask alignment mark in the claim 1～5, described lithographic equipment has an alignment system, and this alignment system comprises: radiation-generating machine, mask graph illumination window and control panel thereof, mask, mask platform, mask platform position sensor, optical projection system, work stage and work stage datum plate mark, work stage position sensor and radiation detection sensor; Wherein
Comprise exposure mask pattern and several mask alignment mark on the mask;
Mask graph illumination window and control panel thereof form transmission window, and the radiation transmission that radiation-generating machine is produced forms the transmission picture on exposure mask pattern and mask alignment mark;
Optical projection system forms aerial image with this transmission picture projection, and surveys this aerial image with the radiation detection sensor of workpiece stage fiducial plate mark below;
The radiation information of radiation detection sensor aerial image after through the transmission of work stage datum plate mark, described radiation information comprise in radiation magnitude strength information, emittance information, the radiation phase information combination of any one or phase information and other two kinds of information;
Mask platform position sensor and work stage position sensor are surveyed the mask platform in the alignment scanning process and the locus of work stage respectively;
It is characterized in that described lithographic equipment alignment methods comprises the steps:
(a) with the second alignment mark branch in the mask alignment mark on the workpiece stage fiducial plate aerial image of the second alignment mark branch in the alignment mark on the mask is slightly caught scanning, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain the thick center of transmission alignment mark combination;
(b) along direction the aerial image of alignment mark branch corresponding on the mask is carried out the single or multiple lift coarse scanning with the first alignment mark branch on the workpiece stage fiducial plate perpendicular to it, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage datum plate the coarse alignment spatial positional information between alignment mark branch corresponding in the first alignment mark branch and mask along the direction of scanning;
(c) the coarse alignment position calculation by the first alignment mark branch on mask and the work stage datum plate, upgrade the center of the 3rd alignment mark branch vertical scanning direction, with workpiece stage fiducial plate the 3rd alignment mark branch the 3rd alignment mark branch on the mask is carried out the single or multiple lift coarse scanning, the utilization scanning probe to described radiation information and mask the 3rd alignment mark branch and corresponding work stage datum plate alignment mark branch calculate along the positional information on the direction of scanning, obtain on the work stage datum plate the coarse alignment spatial positional information between alignment mark branch corresponding in the 3rd alignment mark branch and mask along the direction of scanning;
(d) with on described work stage datum plate and the mask first with the 3rd alignment mark branch between coarse alignment position calculation mask on the scanning center position of the corresponding aerial image of the first alignment mark branch, scan along the aerial image of alignment mark branch corresponding on the mask being carried out essence with the first alignment mark branch on the workpiece stage fiducial plate approximately perpendicular to the direction of aiming at grating in the alignment mark branch, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage on the datum plate and mask between the first alignment mark branch along the accurate aligned position on the approximate direction of scanning;
(e) with the scanning center position of the corresponding aerial image of the 3rd alignment mark branch on the coarse alignment position calculation mask plate between accurate aligned position between the first alignment mark branch on described work stage datum plate and the mask and the 3rd alignment mark branch, along the direction of aiming at grating in the near normal alignment mark branch aerial image of alignment mark branch corresponding on the mask being carried out essence with the 3rd alignment mark branch on the workpiece stage fiducial plate scans, the utilization scanning probe to described radiation information and mask position information and work stage positional information calculate, obtain on the work stage on the datum plate and mask between the 3rd alignment mark branch along the accurate aligned position on the approximate direction of scanning;
(f) with step (d) and (e) on the resultant mask the accurate aligned position of the first and the 3rd alignment mark branch carry out comprehensively, correction obtains aligned position, obtains the coordinate position of aerial image center under worktable coordinate system of transmission alignment mark combination on the mask;
(g) repeat to obtain the spacial alignment coordinate position of several mask alignment mark under worktable coordinate system on the mask, with the coordinate position of center under worktable coordinate system of exposure mask pattern aerial image in these spacial alignment coordinate positions calculating and the alignment light engraving device with step (a)～(f).
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| CN200710045037A CN100587603C (en) | 2007-08-20 | 2007-08-20 | Mask alignment marker and aligning method used for photo etching device |
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| CN200710045037A CN100587603C (en) | 2007-08-20 | 2007-08-20 | Mask alignment marker and aligning method used for photo etching device |
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Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101487985B (en) * | 2009-02-18 | 2011-06-29 | 上海微电子装备有限公司 | Alignment mark search system used for photo-etching equipment and its alignment mark search method |
| CN101520613B (en) * | 2009-03-20 | 2011-11-30 | 上海微电子装备有限公司 | Device and method for calibrating mark position |
| CN102103336A (en) * | 2011-03-14 | 2011-06-22 | 张雯 | High-accuracy alignment mark structure based on machine vision alignment |
| CN103999192B (en) * | 2011-12-20 | 2017-03-08 | 夏普株式会社 | The control method of exposure system, the control device of exposure system and exposure system |
| CN102520593B (en) * | 2012-01-06 | 2014-02-26 | 汕头超声印制板公司 | Alignment verification method for exposure machine |
| CN103713477B (en) * | 2012-09-28 | 2015-11-25 | 无锡华润上华半导体有限公司 | The aligning structure of double face photoetching machine and alignment method |
| CN104678720B (en) * | 2013-12-03 | 2017-01-04 | 上海微电子装备有限公司 | Utilize the method that mask alignment system carries out work stage datum plate rotated detection |
| CN105070201B (en) * | 2015-07-20 | 2017-12-05 | 中国科学院上海光学精密机械研究所 | Alignment device for the Moire fringe of lithographic equipment |
| CN105182681B (en) * | 2015-08-11 | 2019-07-02 | 清华大学深圳研究生院 | A kind of mask plate and the method that a variety of depth structures are processed on same silicon wafer |
| CN106644858B (en) * | 2016-12-28 | 2019-12-24 | 中国科学院长春光学精密机械与物理研究所 | Laser particle analyzer and particle size distribution testing method |
| WO2020009762A1 (en) * | 2018-07-03 | 2020-01-09 | Applied Materials, Inc. | A system and method for making accurate grating patterns using multiple writing columns each making multiple scans |
| CN111623718B (en) * | 2019-02-28 | 2021-09-28 | 上海微电子装备（集团）股份有限公司 | Mask plate relief plate detection device, transmission system and photoetching equipment |
| CN111416661B (en) * | 2020-01-15 | 2021-06-29 | 华中科技大学 | Light path alignment method for space optical communication |
| CN111381460B (en) * | 2020-04-29 | 2021-07-16 | 中国科学院光电技术研究所 | Measurement system and measurement method for focusing, leveling and precise alignment |
| CN116097173A (en) * | 2021-03-16 | 2023-05-09 | 中芯国际集成电路制造(上海)有限公司 | Mask, alignment mark and lithography system |
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