CN106644858B - Laser particle analyzer and particle size distribution testing method - Google Patents
Laser particle analyzer and particle size distribution testing method Download PDFInfo
- Publication number
- CN106644858B CN106644858B CN201611238081.4A CN201611238081A CN106644858B CN 106644858 B CN106644858 B CN 106644858B CN 201611238081 A CN201611238081 A CN 201611238081A CN 106644858 B CN106644858 B CN 106644858B
- Authority
- CN
- China
- Prior art keywords
- laser
- scattered light
- sample
- charge coupled
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002245 particle Substances 0.000 title claims abstract description 70
- 238000012360 testing method Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 claims description 14
- 238000003384 imaging method Methods 0.000 claims description 10
- 230000003287 optical effect Effects 0.000 claims description 8
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 238000010586 diagram Methods 0.000 abstract description 9
- 238000004364 calculation method Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000001444 catalytic combustion detection Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0205—Investigating particle size or size distribution by optical means
- G01N15/0211—Investigating a scatter or diffraction pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The invention discloses a laser particle analyzer, which comprises: a laser light source for emitting a laser beam; the sample cell is used for containing a sample to be detected; the charge coupled photoelectric detector is used for receiving scattered light generated after the laser beam passes through the sample to be detected and converting the scattered light into a scattered light energy distribution graph, and the surface of the charge coupled photoelectric detector is provided with a circular ring mask plate; and the calculator is used for calculating the particle size distribution of the sample to be detected according to the scattered light energy distribution diagram. The purpose of using the circular ring mask plate is to more intuitively obtain the corresponding positions of the pixel points for receiving the scattered light, so that the energy of the scattered light can be conveniently extracted according to the corresponding positions of the pixel points, further the scattered light energy distribution map is rapidly drawn, and the calculation speed for calculating the particle size distribution of the sample to be detected is increased. The invention also provides a particle size distribution testing method, which has the above effects.
Description
Technical Field
The invention relates to the technical field of instruments and meters, in particular to a laser particle analyzer and a particle size distribution testing method.
Background
The laser particle size analyzer is an instrument for testing the particle size distribution and the particle size according to a scattering spectrum obtained by diffraction or scattering of laser light by particles. The specific working principle is as follows: because the laser has good monochromaticity and strong directivity, a beam of parallel laser can irradiate an infinite place in an unobstructed infinite space and has little divergence in the process of propagation; when the light beam is blocked by the particles, a part of the light is scattered, and the propagation direction of the scattered light forms an included angle theta with the propagation direction of the main light beam. Both scattering theory and experimental results tell us that the magnitude of the scattering angle theta is related to the size of the particles, and the larger the particles are, the smaller the theta angle of the generated scattered light is; the smaller the particle, the larger the angle theta of the scattered light produced. At the same time, the intensity of scattered light represents the number of particles of that size. The particle size distribution of the sample can be obtained by measuring the intensity of the scattered light at different angles.
In the prior art, most of the laser particle analyzer products sold in the market use silicon photodiodes or photoelectric elements such as CCDs and CMOSs as detectors. The silicon photodiode detector can directly perform later-stage signal processing on the photoelectric signals received by the ring detection unit, and has the defects that photoelectric elements such as a CCD (charge coupled device) or a CMOS (complementary metal oxide semiconductor) are directly utilized, a centering adjustment program needs to be added in a system, the computer operation memory is occupied, the operation speed is reduced, and the operation is complex.
Therefore, how to increase the operation speed of the particle size distribution is a technical problem to be solved by those skilled in the art.
Disclosure of Invention
The invention aims to provide a laser particle analyzer, which utilizes a circular mask plate to obtain the position corresponding to a pixel point of a charge coupled photoelectric detector for receiving scattered light, thereby improving the particle size distribution operation speed.
In order to solve the above technical problem, the present invention provides a laser particle analyzer, comprising:
a laser light source for emitting a laser beam;
the sample cell is used for containing a sample to be detected;
the charge coupled photodetector is used for receiving scattered light generated after the laser beam passes through the sample to be detected and converting the scattered light into a scattered light energy distribution graph, and the surface of the charge coupled photodetector is provided with a circular ring mask plate;
and the calculator is used for calculating the particle size distribution of the sample to be detected according to the scattered light energy distribution diagram.
Preferably, in the above laser particle analyzer, the ring mask includes a plurality of concentric rings, and a center of the ring with the smallest radius coincides with an optical center of the charge-coupled photodetector.
Preferably, in the above laser particle analyzer, a collimating and beam expanding device is further included between the laser light source and the sample cell.
Preferably, in the above laser particle analyzer, the collimating and beam-expanding device is a keplerian type laser beam-expanding device, and includes a converging lens and a collimating lens.
Preferably, in the above laser particle analyzer, a spatial filter located at a focal point of the converging lens is further included.
Preferably, in the above laser particle analyzer, an imaging lens is further included between the sample cell and the photodetector, and a focal point of the imaging lens coincides with a center of the photodetector.
The invention also comprises a particle size distribution testing method, which comprises the following steps:
step S1: arranging a circular ring mask plate on a charge coupled photoelectric detector of a laser particle analyzer, and adjusting the center of a circular ring with the minimum radius to be superposed with the optical center of the charge coupled photoelectric detector;
step S2: laser beams emitted by the laser light source pass through a sample cell in which a sample to be detected is placed to form scattered light;
step S3: the charge coupling photoelectric detector receives the scattered light, and coordinates of pixel points receiving the scattered light are obtained according to the circular mask plate;
step S4: and drawing the scattered light energy distribution map according to the coordinates of the pixel points, and calculating the particle size distribution of the sample to be detected.
Preferably, in the above method for testing particle size distribution, before the step S2, the method further includes:
step S11: adjusting the center of a minimum radius circular ring in the circular ring mask plate to coincide with the optical center of the charge coupled photoelectric detector;
step S12: the laser beam passes through the sample cell without the sample to be measured and is incident on the charge coupled photoelectric detector;
step S13: and judging whether the light spot of the laser beam on the charge coupled photodetector falls on the center of the minimum radius ring, if not, adjusting the centering of the laser beam on the charge coupled photodetector, and if so, executing the step S2.
The invention provides a laser particle analyzer, comprising: a laser light source for emitting a laser beam; the sample cell is used for containing a sample to be detected; the charge coupled photoelectric detector is used for receiving scattered light generated after the laser beam passes through the sample to be detected and converting the scattered light into a scattered light energy distribution graph, and the surface of the charge coupled photoelectric detector is provided with a circular ring mask plate; and the calculator is used for calculating the particle size distribution of the sample to be detected according to the scattered light energy distribution diagram. The purpose of using the circular ring mask plate is to more intuitively obtain the corresponding positions of the pixel points for receiving the scattered light, so that the energy of the scattered light can be conveniently extracted according to the corresponding positions of the pixel points, further the scattered light energy distribution map is rapidly drawn, and the calculation speed for calculating the particle size distribution of the sample to be detected is increased.
The invention also provides a particle size distribution testing method, which has the above effects.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
FIG. 1 is a schematic illustration of a laser particle sizer provided by an embodiment of the present invention;
fig. 2 is a schematic diagram of a charge coupled photodetector with a circular mask plate disposed on a surface thereof according to an embodiment of the present invention;
fig. 3 is a schematic diagram of a particle size distribution testing method according to an embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1 and fig. 2, fig. 1 is a schematic diagram of a laser particle sizer according to an embodiment of the present invention; fig. 2 is a schematic diagram of a charge coupled photodetector with a circular mask plate disposed on a surface thereof according to an embodiment of the present invention.
In a specific embodiment, the present invention provides a laser particle sizer, comprising:
a laser light source 1 for emitting a laser beam;
a sample cell 3 for containing a sample to be measured;
the charge coupled photodetector 5 is used for receiving scattered light generated after the laser beam passes through the sample to be detected and converting the scattered light into a scattered light energy distribution graph, and the surface of the charge coupled photodetector is provided with a circular ring mask plate;
and the calculator 6 is used for calculating the particle size distribution of the sample to be detected according to the scattered light energy distribution diagram.
Specifically, for the laser particle analyzer provided in this embodiment, please refer to the prior art for a specific setting manner and a working manner, which are not described herein again. The charge coupled photoelectric detector 5 is used for replacing a detector consisting of silicon photodiodes, so that the full data acquisition in the range of the measured particle size can be realized, the limitations of photoetching technology, processing technology and the like are avoided, and the method has wider application.
The charge coupled photodetector 5 is a photoelectric device that obtains signal charges generated by photoelectric conversion using an internal photoelectric effect, and is composed of a plurality of charge coupled units. A Metal Oxide Semiconductor (MOS) capacitor is used as a basic unit. The MOS capacitor is formed by forming a silicon dioxide layer on the surface of a P-type or N-type silicon substrate by an oxidation method, then evaporating a metal film on the silicon dioxide layer, and finally making a grid electrode by a photoetching method, thus forming the MOS capacitor transfer device, wherein a single MOS capacitor is a pixel or a photosensitive element of the CCD detector.
The fabrication of a reticle by photolithography is a process of removing a specific portion of a thin film on the surface of a wafer through a series of production steps. After that, a film with a micro-pattern structure is left on the surface of the wafer. Through the photolithography process, the feature pattern portion is finally remained on the wafer. The purpose of setting the circular ring mask plate on the surface of the charge coupled photodetector 5 is to more intuitively acquire the corresponding positions of each pixel point for receiving scattered light, so that the scattered light energy distribution map can be drawn quickly according to the corresponding positions of each pixel point, and the calculation speed of the particle size distribution of the sample to be detected is accelerated.
It should be noted that the laser light source 1 can be selected according to the requirement, and for example, the laser light source can be an infrared light laser light source 1 or a blue light laser light source 1, and the like, which are all within the protection range.
On the basis of the laser particle analyzer, the circular ring mask plate comprises a plurality of concentric circular rings 10, and the center of the circular ring with the minimum radius coincides with the optical center of the charge coupled photodetector 5.
As shown in fig. 2, the ring mask includes a plurality of concentric rings 10, the rings may be made of steel rings, and the number and radius of the concentric rings 10 are not specifically limited, and are all within the protection range.
On the basis of the laser particle analyzer, the particle analyzer further comprises a collimation and beam expansion device 2 arranged between the laser light source 1 and the sample cell.
Further, in the above laser particle analyzer, the collimation and beam expansion device 2 is a keplerian type laser beam expansion device, and includes a converging lens 7 and a collimating lens 8.
Further, in the above laser particle analyzer, a spatial filter 9 is further included at a focal point of the condensing lens.
General laser collimation and beam expanding devices 2 are divided into two types, a kepler type laser beam expanding device and a galileo type laser beam expanding device, in this embodiment, the kepler type laser beam expanding device is preferably adopted, a spatial filter 9 is added at a concentrated focus of a beam expanding system, all high-order scattered light can be filtered, a spatial low-frequency laser beam passes through the spatial filter 9, is a divergent beam, and is changed into a parallel monochromatic beam after passing through a collimating lens 8. The purpose is to realize the even illumination of the laser beam of incidenting in the sample cell 3, reduce the influence of stray light to the monitoring result, reduce the systematic error.
On the basis of the laser particle analyzer, the particle analyzer further comprises an imaging lens 4 arranged between the sample cell 3 and the charge-coupled photodetector 5, and the focal point of the imaging lens 4 coincides with the center of the charge-coupled photodetector 5.
Here, the charge-coupled photodetector 5 is placed at the focal point of the imaging lens 4 because a part of the parallel light beam is scattered, the imaging lens 4 converges the scattered light on its focal plane, and the imaging lens 4 at the focal plane receives the scattered light. The imaging lens 4 can be a lens such as a fourier lens, and is selected as required and is within a protection range.
As shown in fig. 3, fig. 3 is a schematic diagram of a particle size distribution testing method provided in the embodiment of the present invention.
The invention also comprises a particle size distribution testing method, which comprises the following steps:
step S1: the circular mask plate is arranged on a charge coupled photoelectric detector 5 of the laser particle analyzer,
step S2: laser beams emitted by the laser light source 1 pass through the sample cell 3 in which a sample to be detected is placed to form scattered light;
step S3: the charge coupling photoelectric detector 5 receives the scattered light, and coordinates of pixel points receiving the scattered light are obtained according to the circular mask plate;
step S4: and drawing the scattered light energy distribution map according to the coordinates of the pixel points, and calculating the particle size distribution of the sample to be detected.
Further, in the above particle size distribution test method, before the step S2, the method further includes:
step S11: adjusting the center of a minimum radius circular ring in the circular ring mask plate to coincide with the optical center of the charge coupled photodetector 5;
step S12: the laser beam passes through the sample cell 3 without the sample to be measured and is incident on the charge coupled photodetector 5;
step S13: and judging whether the light spot of the laser beam on the charge coupled photodetector 5 falls on the center of the minimum radius ring, if not, adjusting the centering of the laser beam on the charge coupled photodetector 5, and if so, executing the step S2.
The ring mask plate is fixed on the surface of the charge coupled photodetector 5, and the alignment of the laser particle analyzer light path on the photodetector can be completed in a mechanical adjustment mode, namely, whether the light spot of the laser beam on the charge coupled photodetector 5 falls on the center of the minimum radius ring is adjusted, so that the light energy background of the laser particle analyzer meets the test requirement, the divergence angle of the light beam corresponding to each pixel on the charge coupled photodetector 5 is known more intuitively and clearly, and the particle size distribution is calculated by using an inversion algorithm.
The embodiments are described in a progressive manner in the specification, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. The device disclosed by the embodiment corresponds to the method disclosed by the embodiment, so that the description is simple, and the relevant points can be referred to the method part for description.
The principles and embodiments of the present invention are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.
Claims (7)
1. A laser particle sizer, comprising:
a laser light source for emitting a laser beam;
the sample cell is used for containing a sample to be detected;
the charge coupled photodetector is used for receiving scattered light generated after the laser beam passes through the sample to be detected and converting the scattered light into a scattered light energy distribution graph, and the surface of the charge coupled photodetector is provided with a circular ring mask plate;
a calculator for calculating the particle size distribution of the sample to be detected according to the scattered light energy distribution map;
the circular ring mask plate comprises a plurality of concentric circular rings, and the center of the circular ring with the minimum radius is superposed with the optical center of the charge coupling photoelectric detector.
2. The laser particle sizer of claim 1, further comprising a collimated beam expander disposed between the laser light source and the sample cell.
3. The laser particle sizer of claim 2, wherein the collimating and beam expanding device is a keplerian type laser beam expanding device that includes a converging lens and a collimating lens.
4. The laser grain sizer of claim 3, further comprising a spatial filter positioned at a focal point of the converging lens.
5. The laser granulometer of claim 4, further comprising an imaging lens disposed between the sample cell and the photodetector, the imaging lens having a focal point coincident with a center of the photodetector.
6. A method for particle size distribution testing, comprising:
step S1: arranging a circular ring mask plate on a charge coupled photoelectric detector of a laser particle analyzer, and adjusting the center of a circular ring with the minimum radius to be superposed with the optical center of the charge coupled photoelectric detector; the circular ring mask plate comprises a plurality of concentric circular rings;
step S2: laser beams emitted by the laser light source pass through a sample cell in which a sample to be detected is placed to form scattered light;
step S3: the charge coupling photoelectric detector receives the scattered light, and coordinates of pixel points receiving the scattered light are obtained according to the circular mask plate;
step S4: and drawing the scattered light energy distribution map according to the coordinates of the pixel points, and calculating the particle size distribution of the sample to be detected.
7. The particle size distribution testing method of claim 6, wherein before the step S2, the method further comprises:
step S11: adjusting the center of a minimum radius circular ring in the circular ring mask plate to coincide with the optical center of the charge coupled photoelectric detector;
step S12: the laser beam passes through the sample cell without the sample to be measured and is incident on the charge coupled photoelectric detector;
step S13: and judging whether the light spot of the laser beam on the charge coupled photodetector falls on the center of the minimum radius ring, if not, adjusting the centering of the laser beam on the charge coupled photodetector, and if so, executing the step S2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611238081.4A CN106644858B (en) | 2016-12-28 | 2016-12-28 | Laser particle analyzer and particle size distribution testing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611238081.4A CN106644858B (en) | 2016-12-28 | 2016-12-28 | Laser particle analyzer and particle size distribution testing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106644858A CN106644858A (en) | 2017-05-10 |
| CN106644858B true CN106644858B (en) | 2019-12-24 |
Family
ID=58833217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611238081.4A Expired - Fee Related CN106644858B (en) | 2016-12-28 | 2016-12-28 | Laser particle analyzer and particle size distribution testing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106644858B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107991209B (en) * | 2017-12-01 | 2020-07-03 | 中国科学院长春光学精密机械与物理研究所 | Centering adjustment method and mechanism for laser particle analyzer |
| CN110595961A (en) * | 2019-08-29 | 2019-12-20 | 南京理工大学 | Engine combustion tail gas particle size distribution online testing device and testing method |
| CN111650100A (en) * | 2020-06-16 | 2020-09-11 | 辽东学院 | Particle size measuring equipment based on Mie's scattering theory |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02145940A (en) * | 1988-11-28 | 1990-06-05 | Horiba Ltd | Diffracted light detector for laser diffraction type particle size distribution measuring apparatus |
| US6236458B1 (en) * | 1998-11-20 | 2001-05-22 | Horiba, Ltd. | Particle size distribution measuring apparatus, including an array detector and method of manufacturing the array detector |
| CN100587603C (en) * | 2007-08-20 | 2010-02-03 | 上海微电子装备有限公司 | Mask alignment marker and aligning method used for photo etching device |
| CN101566740A (en) * | 2009-05-26 | 2009-10-28 | 中山大学 | Self-adapting spacial light field synthesizing system |
| CN102053050B (en) * | 2010-12-07 | 2013-03-06 | 上海理工大学 | Granularity centering measuring method utilizing CCD (charge coupled device) or CMOS (complementary metal-oxide-semiconductor) as photoelectric detector |
| CN103411859B (en) * | 2013-07-30 | 2016-05-11 | 北京航空航天大学 | A kind of centralising device and method for forward direction diffraction light luminous intensity distribution measurement |
| CN105928464B (en) * | 2016-06-08 | 2018-11-09 | 广东工业大学 | Automatic measurement system based on image mosaic and measurement method |
-
2016
- 2016-12-28 CN CN201611238081.4A patent/CN106644858B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN106644858A (en) | 2017-05-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5773939B2 (en) | Defect inspection apparatus and defect inspection method | |
| TWI435181B (en) | A projection exposure tool for microlithography with a measuring apparatus and a method for measuring and irradiation strength distribution | |
| US10067072B2 (en) | Methods and apparatus for speckle suppression in laser dark-field systems | |
| JP5676419B2 (en) | Defect inspection method and apparatus | |
| JP6440622B2 (en) | Sample inspection system detector | |
| CN106644858B (en) | Laser particle analyzer and particle size distribution testing method | |
| US7292393B2 (en) | Variable illuminator and speckle buster apparatus | |
| US9217717B2 (en) | Two dimensional optical detector with multiple shift registers | |
| TWI778264B (en) | Performance monitoring of design-based alignment | |
| CN101187783A (en) | Focusing and leveling measuring system and its measuring method | |
| WO2011001678A1 (en) | Exposure condition setting method and surface inspection apparatus | |
| TW201901143A (en) | Defect inspection device and defect inspection method | |
| US20180172514A1 (en) | Spectroscopic Overlay Metrology | |
| US11353799B1 (en) | System and method for error reduction for metrology measurements | |
| JP2012225901A (en) | Light emitting component measuring system and method thereof | |
| KR20160042068A (en) | Multi-spot illumination for improved detection sensitivity | |
| US9568437B2 (en) | Inspection device | |
| TWI647448B (en) | Lens array-based illumination for wafer inspection | |
| CN106706484B (en) | Laser particle analyzer | |
| CN102736428A (en) | Focusing and leveling device and method | |
| CN110763690B (en) | Surface detection device and method | |
| JP2015079009A (en) | Defect inspection method and defect inspection apparatus | |
| US11047805B2 (en) | Inspection device and detector | |
| JP2015203658A (en) | Inspection device | |
| US9791380B2 (en) | Inspection device and image capture element |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20191224 Termination date: 20211228 |