CN100543172C - Optical coating device - Google Patents
Optical coating device Download PDFInfo
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- CN100543172C CN100543172C CNB2005100342480A CN200510034248A CN100543172C CN 100543172 C CN100543172 C CN 100543172C CN B2005100342480 A CNB2005100342480 A CN B2005100342480A CN 200510034248 A CN200510034248 A CN 200510034248A CN 100543172 C CN100543172 C CN 100543172C
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- carrier
- flow
- stopping plate
- coating device
- coating
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Abstract
The invention provides a kind of optical coating device, comprise a coating chamber, a carrier, a rotation motor, a vapor deposition source and a flow-stopping plate.This carrier is located in this coating chamber, and it is used to install a plurality of assemblies to be plated.This rotation motor drives this carrier rotation through a shaft joint.This vapor deposition source is located at this coating chamber bottom, and is relative with this carrier.This flow-stopping plate is located between coating source and the carrier through a pillar stiffener, this flow-stopping plate comprises the difform shield of a plurality of tools, when assembly to be plated plates the repetition plated film of multilayer different thickness, make described difform shield cover vapor deposition source by rotating this pillar stiffener.
Description
[technical field]
The invention relates to a kind of optical coating device, especially about a kind of optical coating device with rotation flow-stopping plate.
[background technology]
At present, optical thin film is widely used in opticinstrument, as a lot of fields such as transmitter, other semiconductor lasers, interferometer, glasses and optical-fibre communications assembly.Optical thin film normally reaches its desired result by interference effect, it is meant that the dielectric film that plates one or more layers on optical module or separate substrates or metallic membrane or dielectric film change the light wave transmission characteristics.
At present, optical thin film is made usually based on physical vapor deposition (physicsvapor deposition, be called for short PVD), this method is by solid-state gaseous state or the ionic state of being converted into thin-film material, the material of gaseous state or ionic state passes through the space by evaporation source, arrives at substrate surface, after material arrives at substrate surface, will deposit and form film gradually.Usually, in order to make highly purified film, the processing procedure of plated film must be finished under high vacuum environment.Extend vacuum plating thus, common practices is that substrate is cleaned with the ultrasound scrubber, cleans back row and goes up anchor clamps, sends into coating equipment, heats and vacuumizes.After reaching high vacuum, the beginning plated film.During plated film, be heated by resistive the electron-bombardment of evaporation or electron beam gun, thin-film material is become ionic state, it is different and length arranged that the plated film time is then looked the number of plies and program.After plated film finishes, treat substrate cooling back taking-up.
Yet in the existing optical coating equipment, be the thickness distribution of control plated film, utilize the flow-stopping plate of special geometry to isolate ionic current usually, thereby suitably adjust the distribution of space ionic current, make coating film thickness controlled.As be disclosed in Chinese invention patent CN1459517A number on December 3rd, 2003, and it discloses a film coating apparatus and film coating method, sees also Fig. 4, and this film coating apparatus comprises a rotating disk 11, a shield 12 and a plating source 13.Wherein, rotating disk 11 can rule rotate; Shield 12 is to be provided with according to the specific thicknesses of coatings 3, is arranged at the position near substrate 2; Plating source 13 and rotating disk 11 are relative and establish, and this shield 12 is arranged between the two.The shape of shield 12 is to design according to different plated film demands.Shield 12 maintains static in such scheme, and when treating plated substrate 2 and carrying out the repetition plated film of multilayer different thickness, treats to need to change after the first step plated film is finished the shield 12 of different geometries.When changing shield 12, need vacuum breaker in advance, again change shield 12, vacuumize again at last afterwards just can proceed plated film, it is complex operation not only, and vacuum breaker and vacuumize the coating quality of not only wasting time and energy but also can influence this substrate 2 repeatedly.
The monitoring coupon that the rete 3 usefulness film coating apparatus of this substrate 2 carry is measured.The rete 3 and the monitoring coupon of this substrate 2 are certain ratio, usually need multiple above ratio in the optical design, and optical monitoring system commonly used now uses multiple above different monitoring ripple to monitor.But use multiple different monitoring ripple to monitor cost is improved, also can be excessive overstocked because of monitoring range, error is increased.
[summary of the invention]
Be the shortcoming of the optical coating device that overcomes prior art, be necessary to provide a kind of easy to operate, optical coating device that coating quality is high and with low cost.
A kind of optical coating device comprises a coating chamber, a carrier, a rotation motor, a vapor deposition source and a flow-stopping plate.In this coating chamber of this carrier, it is used to install a plurality of assemblies to be plated.This rotation motor drives this carrier rotation through a connector.This vapor deposition source is located at this coating chamber bottom, and relative with this carrier.This flow-stopping plate is located between coating source and the carrier through a pillar stiffener, this flow-stopping plate comprises the difform shield of a plurality of tools, when assembly to be plated plates the repetition plated film of multilayer different thickness, make described difform shield cover vapor deposition source by rotating this pillar stiffener.
Compared with prior art, the flow-stopping plate of described optical coating device is made up of a plurality of shields, and the shape of each shield has nothing in common with each other, when therefore on assembly to be plated, plating the film of different thickness, only need to adopt different shields, do not need to destroy the vacuum state of coating chamber, it can simplify the operation and reduce coating cost.And a plurality of shields because of adopting shape to have nothing in common with each other, so only need the monitoring ripple of single wavelength can measure thickness, it can reduce monitoring cost, and can improve the monitoring precision, and then improves coating quality.
[description of drawings]
Fig. 1 is the sectional view of optical coating device better embodiment of the present invention.
Fig. 2 be optical coating device better embodiment of the present invention the enlarged view of flow-stopping plate.
Fig. 3 be optical coating device better embodiment of the present invention the enlarged view of another shape flow-stopping plate.
Fig. 4 is the structural representation of existent technique optical coating device.
[embodiment]
See also Fig. 1, Fig. 1 is the optical coating device sectional view of better embodiment of the present invention.Better embodiment optical coating device 10 of the present invention comprises a coating chamber 20, a carrier 30, a rotation motor 301, a flow-stopping plate 40 and a vapor deposition source 50.This optical coating device 10 also is included in the shaft joint 302 between this rotation motor 301 and this carrier 30.One end of this shaft joint 302 is connected with rotation motor 301, and is positioned at outside this coating chamber 20, and the other end of this shaft joint 302 links to each other with carrier 30, and is positioned at this coating chamber 20.These carrier 30 profiles are a disc, and it is by rotation motor 301 driven rotary, and this carrier 30 is provided with a plurality of fixation device (figure does not show), and this fixation device is used to install a plurality of substrates to be plated.This vapor deposition source 50 is located at the bottom surface of this coating chamber 20, and is relative with this carrier 30.The bottom surface of this coating chamber 20 is provided with and the vertical pillar stiffener 41 in bottom surface, and this pillar stiffener 41 is used to support this flow-stopping plate 40, makes this flow-stopping plate 40 between this coating source 50 and this carrier 30.This grade stream plate 40 includes difform a plurality of shield 410, and each shield 410 all can rotate to a specific position.For ease of this flow-stopping plate 40 is mounted on this pillar stiffener 41, design an open holes 420 at the center of this flow-stopping plate 40.Be the position of rotation of this flow-stopping plate 40 of control outside coating chamber 20, these pillar stiffener 41 sealings can be extended to outside this coating chamber 20, drive by another motor.Vapor deposition source 50 is positioned at 40 times suitable distances of flow-stopping plate, and is relative with this carrier 30.These vapor deposition source 50 type of heating can adopt resistive heating vapour deposition method or electron beam.
During plated film, at first set flow-stopping plate 40 shapes by different plated film requirements.Rotation motor 301 drives carrier 30 by certain rotating speed rotation by coupling shaft 302, simultaneously, and evaporation vapor deposition source 50.According to different plated film demands, change the shape of flow-stopping plate 40, make its distribution of suitably adjusting the space ionic current, to satisfy the plated film requirement for the treatment of plated substrate with different demands.Seeing also Fig. 2, is the enlarged view of flow-stopping plate of the optical coating device of first embodiment of the invention.This flow-stopping plate 40 adopts four shields, 410 structures, and promptly this four shield 410 is cruciform, and the shape of each shield 410 establishes according to different plated film needs, and promptly the shape of each shield 410 is inequality.When assembly to be plated is carried out the repetition plated film of multilayer different thickness, after treating that the first layer plated film is finished, other shield 410 that rotary seal extends to the pillar stiffener 41 ， Shi File stream plate 40 outside this coating chamber 20 places between carrier 30 and the vapor deposition source 50, then continues next step plated film program.At coating chamber 20 inner rotary pillar stiffeners 41, different shields 410 are placed respectively between carrier 30 and the vapor deposition source 50, the vacuum state that does not need this moment to destroy in the coating chamber 20 reaches the program that vacuumizes again, thus not only easy to operate, and can improve coating quality.
Rotation pillar stiffener 41 when measuring thickness, difform shield 410 is placed respectively between carrier 30 and the vapor deposition source 50, therefore do not need multiple monitoring ripple to monitor, only need single monitoring ripple just can monitor, it can effectively reduce monitoring cost.Because of adopting single supervisory wavelength to monitor, so the ripple monitoring range can be excessive not overstocked, it can increase the monitoring precision again.
This flow-stopping plate 40 can also adopt shield 410 structures of other quantity, and as three shield structures, promptly Y font structure etc. sees also Fig. 3, is that three shield formula structures are the enlarged view of Y font structure flow-stopping plate 40.
For satisfying different demands, a wheel box (figure does not show) is installed, between this rotation motor 301 and shaft joint 302 to change the speed of rotation of this carrier 30.
The shape that is appreciated that the vacuum chamber 20 of optical coating device 10 of the present invention also can be other shape such as rectangular parallelepiped, square, spheroid or right cylinder.In addition, this carrier 30 also can be other framework with supporting role or assembly, can be one hemispherical as it, perhaps be the carrier of an extension four connecting rods or two carrier bars that are cross-linked in the middle of two in its, but, preferentially adopt the symmetric figure structure for reducing the centrifugal force that is produced when this carrier 30 rotates.
Claims (11)
1. optical coating device, comprise a coating chamber, one carrier, one rotation motor, one coating source and a flow-stopping plate, it is located at this carrier in this coating chamber, be used to install a plurality of assemblies to be plated, this rotation motor drives this carrier rotation through a shaft joint, this coating source is located at the bottom of this coating chamber and relative with carrier, it is characterized in that: this flow-stopping plate is located between coating source and the carrier through a pillar stiffener, this flow-stopping plate comprises the difform shield of a plurality of tools, when assembly to be plated plates the repetition plated film of multilayer different thickness, make described difform shield cover vapor deposition source by rotating this pillar stiffener.
2. optical coating device as claimed in claim 1 is characterized in that: the shape of this each shield is established according to different plated film demands.
3. optical coating device as claimed in claim 1 is characterized in that: this flow-stopping plate is provided with an open holes.
4. optical coating device as claimed in claim 1 is characterized in that: this pillar stiffener is arranged on the bottom surface of this coating chamber, cooperates with open holes on this flow-stopping plate.
5. optical coating device as claimed in claim 1 is characterized in that: this pillar stiffener sealing extends to outside this coating chamber, and it can be regulated flow-stopping plate and make position rotating outside coating chamber.
6. optical coating device as claimed in claim 5 is characterized in that: this flow-stopping plate is three shield structures, and promptly it is a Y font structure.
7. optical coating device as claimed in claim 1 is characterized in that: this flow-stopping plate is four shield structures, and promptly it is a cruciform.
8. optical coating device as claimed in claim 1 is characterized in that: this coating chamber is a kind of vacuum film coating chamber.
9. optical coating device as claimed in claim 1 is characterized in that: this carrier is provided with a plurality of fixation device.
10. optical coating device as claimed in claim 1 is characterized in that: this coating chamber be shaped as rectangular parallelepiped, square, spheroid or right cylinder.
11. optical coating device as claimed in claim 1 is characterized in that: this vapor deposition source is by resistance-type heating evaporation or beam bombardment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100342480A CN100543172C (en) | 2005-04-15 | 2005-04-15 | Optical coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100342480A CN100543172C (en) | 2005-04-15 | 2005-04-15 | Optical coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1847445A CN1847445A (en) | 2006-10-18 |
| CN100543172C true CN100543172C (en) | 2009-09-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100342480A Expired - Fee Related CN100543172C (en) | 2005-04-15 | 2005-04-15 | Optical coating device |
Country Status (1)
| Country | Link |
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| CN (1) | CN100543172C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102899617A (en) * | 2011-07-26 | 2013-01-30 | 御林汽配(昆山)有限公司 | Vacuum coating machine rotation mechanism |
| CN102660731A (en) * | 2012-05-11 | 2012-09-12 | 中国计量学院 | Vacuum ion sputtering optical fiber palladium plating alloy device |
| CN109371369B (en) * | 2018-12-05 | 2020-10-13 | 武汉华星光电半导体显示技术有限公司 | Vapor deposition cavity structure and shielding plate structure |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2573508Y (en) * | 2002-09-05 | 2003-09-17 | 精碟科技股份有限公司 | Film coating apparatus |
| CN1459517A (en) * | 2002-05-17 | 2003-12-03 | 精碟科技股份有限公司 | Film plating device and film plating method |
| CN1536099A (en) * | 2003-04-11 | 2004-10-13 | 精碟科技股份有限公司 | Deposition equipment |
-
2005
- 2005-04-15 CN CNB2005100342480A patent/CN100543172C/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1459517A (en) * | 2002-05-17 | 2003-12-03 | 精碟科技股份有限公司 | Film plating device and film plating method |
| CN2573508Y (en) * | 2002-09-05 | 2003-09-17 | 精碟科技股份有限公司 | Film coating apparatus |
| CN1536099A (en) * | 2003-04-11 | 2004-10-13 | 精碟科技股份有限公司 | Deposition equipment |
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| Publication number | Publication date |
|---|---|
| CN1847445A (en) | 2006-10-18 |
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