CN102660731A - Vacuum ion sputtering optical fiber palladium plating alloy device - Google Patents
Vacuum ion sputtering optical fiber palladium plating alloy device Download PDFInfo
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- CN102660731A CN102660731A CN2012101521632A CN201210152163A CN102660731A CN 102660731 A CN102660731 A CN 102660731A CN 2012101521632 A CN2012101521632 A CN 2012101521632A CN 201210152163 A CN201210152163 A CN 201210152163A CN 102660731 A CN102660731 A CN 102660731A
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- optical fiber
- palldium alloy
- ion
- stainless steel
- ion sputtering
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- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
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Abstract
The invention provides a vacuum ion sputtering optical fiber palladium plating alloy device which is characterized by consisting of a fixed sleeve (1), a pump (2), a valve (3), a vacuum chamber (4), a palladium alloy target (5), a heating rod (11), an ion extractor (6), an optical fiber (7), a stainless steel tube (8), a rotating wheel (9), a motor (10) and a base (12); and the optical fiber (7) penetrates into the stainless steel tube (8) through the fixed sleeve (1), and the optical fiber (7) penetrating out of the stainless steel tube (8) is wound on the rotating wheel (9) above the motor (10), so that the palladium alloy target (5) is heated by the heating rod and evaporated, the evaporated palladium alloy ion can be deposited on the rotating optical fiber (7), a palladium alloy film layer is formed on the surface of the optical fiber, and the redundant palladium allow ions are extracted out of the ion extractor (6). The device can be used for automatically, quickly, directly, and accurately evaporating an even thin film on the side face of the optical fiber, thereby being wide in market prospect.
Description
Technical field
The present invention relates to a kind of vacuum ion sputtering optical fiber plating palldium alloy device, belong to the industrial automation field.
Background technology
The ion sputtering machine is one of machine important in the industrial production, and particularly in informationalized today, flush type glass surface vapor deposition optical thin film be unable to do without the ion sputtering machine.Yet thereby cylindric optical fiber side also need be applied to industrial circle as flush type glass surface vapor deposition optical thin film.The vacuum ion sputtering optical fiber plating palldium alloy device of the present invention design will be applicable to the optical fiber side plated film, for optical fiber plated film and production created unprecedented convenient.
Summary of the invention
The object of the present invention is to provide a kind of vacuum ion sputtering optical fiber plating palldium alloy device, optical fiber side such as cylindric optical fiber side can pass through vacuum ion sputtering device vapor deposition optical thin film.Vacuum ion sputtering optical fiber plating palldium alloy device has characteristics such as automatic, quick and easy and even.
The present invention realizes through following technical scheme:
A kind of vacuum ion sputtering optical fiber plating palldium alloy device is characterized in that: be made up of fixed sleeving (1), pump (2), valve (3), Vakuumkammer (4), palldium alloy target (5), heating rod (11), ion extracting device (6), optical fiber (7), stainless steel tube (8), runner (9), motor (10) and base (12); Optical fiber (7) penetrates from fixed sleeving (1) and gets into the stainless steel needle tubing (8); The optical fiber (7) that passes from stainless steel needle pipe (8) is wrapped on the runner (9) of motor (10) top; Make palldium alloy palladium (5) be heated rod heating and be evaporated; Be evaporated on the optical fiber (7) that the palldium alloy ion can be deposited on rotation, form the palldium alloy rete at optical fiber surface, unnecessary palladium alloy ion is by ion extracting device (6) caterpillar.
Described a kind of vacuum ion sputtering optical fiber plating palldium alloy device, it is characterized in that: the length variations scope of fixed sleeving (1) is 10-50cm; Motor speed is that 0-60rpm is adjustable.
Described a kind of vacuum ion sputtering optical fiber plating palldium alloy device, it is characterized in that: by the kind of palldium alloy coated optical fibre is single-mode fiber or multimode optical fibers or photonic crystal fiber.
Described a kind of vacuum ion sputtering optical fiber plating palldium alloy device, it is characterized in that: optical fiber is adjustable according to the length range of fixed sleeving (1) by the length range of plated film, and the plated film length range is 10cm-200cm.
Principle of the present invention is: under vacuum condition, be made up of fixed sleeving (1), pump (2), valve (3), Vakuumkammer (4), palldium alloy target (5), heating rod (11), ion extracting device (6), optical fiber (7), stainless steel tube (8), runner (9), motor (10) and base (12); Optical fiber (7) penetrates from fixed sleeving (1) and gets into the stainless steel needle tubing (8); The optical fiber (7) that passes from stainless steel needle pipe (8) is wrapped on the runner (9) of motor (10) top; Make palldium alloy palladium (5) be heated rod heating and be evaporated; Be evaporated on the optical fiber (7) that the palldium alloy ion can be deposited on rotation, form the palldium alloy rete at optical fiber surface, unnecessary palladium alloy ion is by ion extracting device (6) caterpillar.
The invention has the beneficial effects as follows: optical fiber side can be through ion sputtering plated film vapor deposition optical thin film, have precision, automatically, evenly, characteristics such as quick and convenient.
Description of drawings
Fig. 1 is a kind of vacuum ion sputtering optical fiber plating palldium alloy device synoptic diagram.
Embodiment
As shown in Figure 1; A kind of vacuum ion sputtering optical fiber plating palldium alloy device is characterized in that: be made up of fixed sleeving (1), pump (2), valve (3), Vakuumkammer (4), palldium alloy target (5), heating rod (11), ion extracting device (6), optical fiber (7), stainless steel tube (8), runner (9), motor (10) and base (12); Optical fiber (7) penetrates from fixed sleeving (1) and gets into the stainless steel needle tubing (8); The optical fiber (7) that passes from stainless steel needle pipe (8) is wrapped on the runner (9) of motor (10) top; Make palldium alloy palladium (5) be heated rod heating and be evaporated; Be evaporated on the optical fiber (7) that the palldium alloy ion can be deposited on rotation, form the palldium alloy rete at optical fiber surface, unnecessary palladium alloy ion is by ion extracting device (6) caterpillar.
Optical fiber (7) penetrates from a fixed sleeving (1) and gets into the stainless steel needle tubing (8), and the optical fiber (7) that passes from stainless steel needle pipe (8) is wrapped on the runner (9) of motor shaft (10) top, and runner (9) drives optical fiber (7) and closely cooperates and turn round with motor shaft.Motor speed is that 40rpm is adjustable, simultaneously can anti-300 ℃ of high temperature, and fixed sleeving (1) bore is 5cm, and the length of fixed sleeving (1) is 30cm, and plated film length is 100cm.
In Vakuumkammer (4); Utilize geseous discharge that palldium alloy target (5) is evaporated and make and be evaporated material and ionization all takes place gas; Make to be evaporated material and reaction product is deposited on the optical fiber (7) of rotation, utilize ion extracting device (6) that unnecessary ion is got rid of outside the container simultaneously.
Claims (4)
1. a vacuum ion sputtering optical fiber plating palldium alloy device is characterized in that: be made up of fixed sleeving (1), pump (2), valve (3), Vakuumkammer (4), palldium alloy target (5), heating rod (11), ion extracting device (6), optical fiber (7), stainless steel tube (8), runner (9), motor (10) and base (12); Optical fiber (7) penetrates from fixed sleeving (1) and gets into the stainless steel needle tubing (8); The optical fiber (7) that passes from stainless steel needle pipe (8) is wrapped on the runner (9) of motor (10) top; Make palldium alloy palladium (5) be heated rod heating and be evaporated; Be evaporated on the optical fiber (7) that the palldium alloy ion can be deposited on rotation, form the palldium alloy rete at optical fiber surface, unnecessary palladium alloy ion is by ion extracting device (6) caterpillar.
2. a kind of vacuum ion sputtering optical fiber plating palldium alloy device according to claim 1, it is characterized in that: the length variations scope of fixed sleeving (1) is 10-50cm; Motor speed is that 0-60rpm is adjustable.
3. a kind of vacuum ion sputtering optical fiber plating palldium alloy device according to claim 1, it is characterized in that: by the kind of palldium alloy coated optical fibre is single-mode fiber or multimode optical fibers or photonic crystal fiber.
4. a kind of vacuum ion sputtering optical fiber plating palldium alloy device according to claim 1, it is characterized in that: optical fiber is adjustable according to the length range of fixed sleeving (1) by the length range of plated film, and the plated film length range is 10cm-200cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101521632A CN102660731A (en) | 2012-05-11 | 2012-05-11 | Vacuum ion sputtering optical fiber palladium plating alloy device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012101521632A CN102660731A (en) | 2012-05-11 | 2012-05-11 | Vacuum ion sputtering optical fiber palladium plating alloy device |
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| Publication Number | Publication Date |
|---|---|
| CN102660731A true CN102660731A (en) | 2012-09-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2012101521632A Pending CN102660731A (en) | 2012-05-11 | 2012-05-11 | Vacuum ion sputtering optical fiber palladium plating alloy device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103866241A (en) * | 2014-02-25 | 2014-06-18 | 广东省工业技术研究院(广州有色金属研究院) | Composite magnetron sputtering coating device for ion-assisted thermal evaporation |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001116931A (en) * | 1999-10-15 | 2001-04-27 | Japan Aviation Electronics Industry Ltd | Optical fiber film forming device |
| US20020051613A1 (en) * | 2000-10-30 | 2002-05-02 | Bawa Singh | Coating for optical fibers and method therefor |
| CN1847445A (en) * | 2005-04-15 | 2006-10-18 | 鸿富锦精密工业（深圳）有限公司 | Optical film-coating apparatus |
| CN102109636A (en) * | 2011-02-25 | 2011-06-29 | 中国电子科技集团公司第八研究所 | High temperature resistance and radiation resistance optical fiber and processing technology thereof |
| CN202576550U (en) * | 2012-05-11 | 2012-12-05 | 中国计量学院 | Vacuum ion sputtering optical fiber palladium plating alloy device |
-
2012
- 2012-05-11 CN CN2012101521632A patent/CN102660731A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001116931A (en) * | 1999-10-15 | 2001-04-27 | Japan Aviation Electronics Industry Ltd | Optical fiber film forming device |
| US20020051613A1 (en) * | 2000-10-30 | 2002-05-02 | Bawa Singh | Coating for optical fibers and method therefor |
| CN1847445A (en) * | 2005-04-15 | 2006-10-18 | 鸿富锦精密工业（深圳）有限公司 | Optical film-coating apparatus |
| CN102109636A (en) * | 2011-02-25 | 2011-06-29 | 中国电子科技集团公司第八研究所 | High temperature resistance and radiation resistance optical fiber and processing technology thereof |
| CN202576550U (en) * | 2012-05-11 | 2012-12-05 | 中国计量学院 | Vacuum ion sputtering optical fiber palladium plating alloy device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103866241A (en) * | 2014-02-25 | 2014-06-18 | 广东省工业技术研究院(广州有色金属研究院) | Composite magnetron sputtering coating device for ion-assisted thermal evaporation |
| CN103866241B (en) * | 2014-02-25 | 2016-07-13 | 广东省工业技术研究院(广州有色金属研究院) | A kind of ion auxiliary thermal evaporation combined magnetic-controlled sputter coating apparatus |
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Application publication date: 20120912 |