CN100524049C - 导电电极层的电照相构图 - Google Patents

导电电极层的电照相构图 Download PDF

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Publication number
CN100524049C
CN100524049C CNB2004800243879A CN200480024387A CN100524049C CN 100524049 C CN100524049 C CN 100524049C CN B2004800243879 A CNB2004800243879 A CN B2004800243879A CN 200480024387 A CN200480024387 A CN 200480024387A CN 100524049 C CN100524049 C CN 100524049C
Authority
CN
China
Prior art keywords
conductive
carrier
particles
electrophotographic
conductivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2004800243879A
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English (en)
Chinese (zh)
Other versions
CN1842751A (zh
Inventor
M·莱伦塔尔
M·S·伯贝里
C·C·安德森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN1842751A publication Critical patent/CN1842751A/zh
Application granted granted Critical
Publication of CN100524049C publication Critical patent/CN100524049C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
    • G03G7/0093—Image-receiving members, based on materials other than paper or plastic sheets, e.g. textiles, metals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern
    • G03G13/26—Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/09—Colouring agents for toner particles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/09—Colouring agents for toner particles
    • G03G9/0926—Colouring agents for toner particles characterised by physical or chemical properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/211—Changing the shape of the active layer in the devices, e.g. patterning by selective transformation of an existing layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Textile Engineering (AREA)
  • Liquid Developers In Electrophotography (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Conductive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CNB2004800243879A 2003-08-26 2004-08-23 导电电极层的电照相构图 Expired - Fee Related CN100524049C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/648,418 US7033713B2 (en) 2003-08-26 2003-08-26 Electrographic patterning of conductive electrode layers containing electrically-conductive polymeric materials
US10/648,418 2003-08-26

Publications (2)

Publication Number Publication Date
CN1842751A CN1842751A (zh) 2006-10-04
CN100524049C true CN100524049C (zh) 2009-08-05

Family

ID=34216725

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004800243879A Expired - Fee Related CN100524049C (zh) 2003-08-26 2004-08-23 导电电极层的电照相构图

Country Status (6)

Country Link
US (1) US7033713B2 (OSRAM)
JP (1) JP4709150B2 (OSRAM)
KR (1) KR101250578B1 (OSRAM)
CN (1) CN100524049C (OSRAM)
TW (1) TW200523694A (OSRAM)
WO (1) WO2005022272A1 (OSRAM)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7781047B2 (en) * 2004-10-21 2010-08-24 Eastman Kodak Company Polymeric conductor donor and transfer method
DE102004058209A1 (de) * 2004-12-02 2006-06-08 Printed Systems Gmbh Verfahren und Vorrichtung zur Erzeugung von Strukturen aus Funktionsmaterialien
JP2010506235A (ja) * 2006-10-13 2010-02-25 ヒューレット−パッカード デベロップメント カンパニー エル．ピー． 不相溶性添加物を含む現像液
JP5375825B2 (ja) * 2008-07-29 2013-12-25 東亞合成株式会社 導電性高分子のパターン形成方法及び基板の製造方法
US20100159648A1 (en) * 2008-12-22 2010-06-24 Tombs Thomas N Electrophotograph printed electronic circuit boards
US8512933B2 (en) 2008-12-22 2013-08-20 Eastman Kodak Company Method of producing electronic circuit boards using electrophotography
US20100155128A1 (en) * 2008-12-22 2010-06-24 Tombs Thomas N Printed electronic circuit boards and other articles having patterned coonductive images
WO2010099147A1 (en) * 2009-02-24 2010-09-02 Ntera Inc. Advanced electrode structures and electrochromic devices
JP5913777B2 (ja) * 2009-08-31 2016-04-27 富士通株式会社 導電パターン形成方法及び導電パターン形成装置
TW201441345A (zh) * 2013-04-16 2014-11-01 Polychem Uv Eb Internat Corp 一種含有強氧化物前驅物的水性蝕刻劑組成及其構造與導電線路圖案化製程
US9884437B2 (en) * 2014-06-20 2018-02-06 Palo Alto Research Center Incorporated Integral vasculature

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0440957B1 (de) * 1990-02-08 1996-03-27 Bayer Ag Neue Polythiophen-Dispersionen, ihre Herstellung und ihre Verwendung
US6045977A (en) * 1998-02-19 2000-04-04 Lucent Technologies Inc. Process for patterning conductive polyaniline films
EP1079397A1 (en) * 1999-08-23 2001-02-28 Agfa-Gevaert N.V. Method of making an electroconductive pattern on a support
US6340496B1 (en) * 1999-05-20 2002-01-22 Agfa-Gevaert Method for patterning a layer of conductive polymers
EP1054414B1 (en) * 1999-05-20 2003-03-12 Agfa-Gevaert Method for patterning a layer of conductive polymer

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4070189A (en) * 1976-10-04 1978-01-24 Eastman Kodak Company Silver halide element with an antistatic layer
US4731408A (en) * 1985-12-20 1988-03-15 Polaroid Corporation Processable conductive polymers
DE3843412A1 (de) * 1988-04-22 1990-06-28 Bayer Ag Neue polythiophene, verfahren zu ihrer herstellung und ihre verwendung
DE3913857A1 (de) * 1989-04-27 1990-10-31 Agfa Gevaert Ag Fotografisches material mit einer antistatikschicht
US5093439A (en) * 1989-10-19 1992-03-03 Ohio State University Research Foundation Processes for preparation of sulfonated polyaniline compositions and uses thereof
US5561030A (en) * 1991-05-30 1996-10-01 Simon Fraser University Fabrication of electronically conducting polymeric patterns
DE4202337A1 (de) * 1992-01-29 1993-08-05 Bayer Ag Verfahren zur durchkontaktierung von zweilagigen leiterplatten und multilayern
DE4211461A1 (de) * 1992-04-06 1993-10-07 Agfa Gevaert Ag Antistatische Kunststoffteile
DE4216762A1 (de) * 1992-05-21 1993-11-25 Agfa Gevaert Ag Antistatische Kunststoffteile
DE69319200T2 (de) * 1992-10-14 1999-01-28 Agfa-Gevaert N.V., Mortsel Antistatische Beschichtungszusammensetzung
US5443944A (en) * 1992-11-16 1995-08-22 Agta-Gevaert Ag Photographic material
DE69321567T2 (de) * 1992-12-17 1999-06-02 Agfa-Gevaert N.V., Mortsel Antistatische, dauerhafte Grundierschicht
EP0615256B1 (en) 1993-03-09 1998-09-23 Koninklijke Philips Electronics N.V. Method of manufacturing a pattern of an electrically conductive polymer on a substrate surface and method of metallizing such a pattern
ATE287929T1 (de) 1994-05-06 2005-02-15 Bayer Ag Leitfähige beschichtungen hergestellt aus mischungen enthaltend polythiophen und lösemittel
DE4436391A1 (de) * 1994-10-12 1996-04-18 Bayer Ag Verfahren zur direkten galvanischen Durchkontaktierung von zweilagigen Leiterplatten und Multilayern
US5716550A (en) * 1995-08-10 1998-02-10 Eastman Kodak Company Electrically conductive composition and elements containing solubilized polyaniline complex and solvent mixture
US5674654A (en) * 1996-09-19 1997-10-07 Eastman Kodak Company Imaging element containing an electrically-conductive polymer blend
US5665498A (en) * 1996-11-22 1997-09-09 Eastman Kodak Company Imaging element containing poly(3,4-ethylene dioxypyrrole/styrene sulfonate)
DE19802349B4 (de) * 1997-01-23 2010-04-15 Alps Electric Co., Ltd. Weichmagnetische amorphe Legierung, amorphe Legierung hoher Härte und ihre Verwendung
JP2000181115A (ja) * 1998-12-16 2000-06-30 Dainippon Printing Co Ltd 受像シート及び記録方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0440957B1 (de) * 1990-02-08 1996-03-27 Bayer Ag Neue Polythiophen-Dispersionen, ihre Herstellung und ihre Verwendung
US6045977A (en) * 1998-02-19 2000-04-04 Lucent Technologies Inc. Process for patterning conductive polyaniline films
US6340496B1 (en) * 1999-05-20 2002-01-22 Agfa-Gevaert Method for patterning a layer of conductive polymers
EP1054414B1 (en) * 1999-05-20 2003-03-12 Agfa-Gevaert Method for patterning a layer of conductive polymer
EP1079397A1 (en) * 1999-08-23 2001-02-28 Agfa-Gevaert N.V. Method of making an electroconductive pattern on a support

Also Published As

Publication number Publication date
US20050048391A1 (en) 2005-03-03
JP4709150B2 (ja) 2011-06-22
JP2007503699A (ja) 2007-02-22
TW200523694A (en) 2005-07-16
US7033713B2 (en) 2006-04-25
WO2005022272A1 (en) 2005-03-10
CN1842751A (zh) 2006-10-04
KR101250578B1 (ko) 2013-04-03
KR20060083969A (ko) 2006-07-21

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090805

Termination date: 20130823