CN100523839C - 计量工具的误差记录分析方法和系统 - Google Patents
计量工具的误差记录分析方法和系统 Download PDFInfo
- Publication number
- CN100523839C CN100523839C CNB2006100946057A CN200610094605A CN100523839C CN 100523839 C CN100523839 C CN 100523839C CN B2006100946057 A CNB2006100946057 A CN B2006100946057A CN 200610094605 A CN200610094605 A CN 200610094605A CN 100523839 C CN100523839 C CN 100523839C
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- China
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- error
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- metering outfit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 63
- 238000004458 analytical method Methods 0.000 title description 11
- 238000004377 microelectronic Methods 0.000 claims abstract description 68
- 238000005259 measurement Methods 0.000 claims abstract description 43
- 230000008439 repair process Effects 0.000 claims description 5
- 238000010606 normalization Methods 0.000 claims 28
- 235000012431 wafers Nutrition 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 14
- 238000012545 processing Methods 0.000 description 11
- 238000003909 pattern recognition Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 230000015654 memory Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000009472 formulation Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 238000004590 computer program Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005067 remediation Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000004630 atomic force microscopy Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32222—Fault, defect detection of origin of fault, defect of product
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- General Factory Administration (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/160,404 | 2005-06-22 | ||
| US11/160,404 US7065425B1 (en) | 2005-06-22 | 2005-06-22 | Metrology tool error log analysis methodology and system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1885049A CN1885049A (zh) | 2006-12-27 |
| CN100523839C true CN100523839C (zh) | 2009-08-05 |
Family
ID=36586511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100946057A Expired - Fee Related CN100523839C (zh) | 2005-06-22 | 2006-06-21 | 计量工具的误差记录分析方法和系统 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7065425B1 (enExample) |
| JP (1) | JP4398441B2 (enExample) |
| CN (1) | CN100523839C (enExample) |
| TW (1) | TW200715160A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7363098B2 (en) * | 2005-12-19 | 2008-04-22 | Tech Semiconductor Singapore Pte Ltd | Method to identify machines causing excursion in semiconductor manufacturing |
| US7631286B2 (en) * | 2005-12-30 | 2009-12-08 | Wafertech Llc | Automated metrology recipe generation |
| US7305320B2 (en) * | 2006-02-15 | 2007-12-04 | International Business Machines Corporation | Metrology tool recipe validator using best known methods |
| CN101536002B (zh) | 2006-11-03 | 2015-02-04 | 气体产品与化学公司 | 用于工艺监控的系统和方法 |
| US7953511B1 (en) * | 2007-09-21 | 2011-05-31 | National Semiconductor Corporation | System and method for reducing processing errors during wafer fabrication employing a 2D wafer scribe and monitoring system |
| JP5002395B2 (ja) * | 2007-09-28 | 2012-08-15 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置の制御装置 |
| WO2016117103A1 (ja) * | 2015-01-23 | 2016-07-28 | 株式会社 日立ハイテクノロジーズ | 半導体測定装置、或いは半導体検査装置に用いられるレシピ作成装置 |
| JP6339956B2 (ja) * | 2015-03-19 | 2018-06-06 | アズビル株式会社 | 不具合要因特定支援装置および不具合要因特定支援方法 |
| US10372114B2 (en) * | 2016-10-21 | 2019-08-06 | Kla-Tencor Corporation | Quantifying and reducing total measurement uncertainty |
| CN114245933B (zh) | 2019-09-06 | 2025-11-18 | 株式会社日立高新技术 | 制程信息提示系统、制程错误推定系统 |
| WO2021199227A1 (ja) | 2020-03-31 | 2021-10-07 | 株式会社日立ハイテク | エラー要因の推定装置及び推定方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6303395B1 (en) * | 1999-06-01 | 2001-10-16 | Applied Materials, Inc. | Semiconductor processing techniques |
| US20030176940A1 (en) * | 1997-12-02 | 2003-09-18 | Rangachari Murali D. | Method and apparatus for automating a microelectronic manufacturing process |
| US6671570B2 (en) * | 2000-10-17 | 2003-12-30 | Brooks Automation, Inc. | System and method for automated monitoring and assessment of fabrication facility |
| US20040044435A1 (en) * | 2002-08-30 | 2004-03-04 | Kay Hellig | Method and system for handling substrates in a production line including a cluster tool and a metrology tool |
| US6727106B1 (en) * | 2001-07-12 | 2004-04-27 | Advanced Micro Devices, Inc. | System and software for statistical process control in semiconductor manufacturing and method thereof |
| US20040173464A1 (en) * | 2001-08-24 | 2004-09-09 | Applied Materials, Inc. | Method and apparatus for providing intra-tool monitoring and control |
| US20040220688A1 (en) * | 2003-04-30 | 2004-11-04 | Almuth Behrisch | Advanced process control method and advanced process control system for acquiring production data in a chip production installation |
| US20050010319A1 (en) * | 2003-07-09 | 2005-01-13 | Sukesh Patel | System and method for validating and visualizing APC assisted semiconductor manufacturing processes |
| CN1589494A (zh) * | 2001-11-16 | 2005-03-02 | 先进微装置公司 | 使用集成度量数据作为前馈数据的方法与装置 |
| US20050052197A1 (en) * | 2003-07-14 | 2005-03-10 | Cory Watkins | Multi-tool manager |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5914879A (en) * | 1997-03-04 | 1999-06-22 | Advanced Micro Devices | System and method for calculating cluster tool performance metrics using a weighted configuration matrix |
| US6456894B1 (en) | 1999-06-01 | 2002-09-24 | Applied Materials, Inc. | Semiconductor processing techniques |
| US7257454B2 (en) * | 2003-11-21 | 2007-08-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dynamically adjusting the distribution for dispatching lot between current and downstream tool by using expertise weighting mechanism |
| US6999848B2 (en) | 2003-12-19 | 2006-02-14 | Intel Corporation | Process control apparatus, systems, and methods |
| TWI236044B (en) * | 2004-05-12 | 2005-07-11 | Powerchip Semiconductor Corp | System and method for real-time dispatching batch in manufacturing process |
-
2005
- 2005-06-22 US US11/160,404 patent/US7065425B1/en not_active Expired - Fee Related
-
2006
- 2006-04-19 US US11/407,543 patent/US7187993B2/en not_active Expired - Fee Related
- 2006-06-21 CN CNB2006100946057A patent/CN100523839C/zh not_active Expired - Fee Related
- 2006-06-22 JP JP2006173043A patent/JP4398441B2/ja not_active Expired - Fee Related
- 2006-06-22 TW TW095122514A patent/TW200715160A/zh unknown
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030176940A1 (en) * | 1997-12-02 | 2003-09-18 | Rangachari Murali D. | Method and apparatus for automating a microelectronic manufacturing process |
| US6303395B1 (en) * | 1999-06-01 | 2001-10-16 | Applied Materials, Inc. | Semiconductor processing techniques |
| US6671570B2 (en) * | 2000-10-17 | 2003-12-30 | Brooks Automation, Inc. | System and method for automated monitoring and assessment of fabrication facility |
| US6727106B1 (en) * | 2001-07-12 | 2004-04-27 | Advanced Micro Devices, Inc. | System and software for statistical process control in semiconductor manufacturing and method thereof |
| US20040173464A1 (en) * | 2001-08-24 | 2004-09-09 | Applied Materials, Inc. | Method and apparatus for providing intra-tool monitoring and control |
| CN1589494A (zh) * | 2001-11-16 | 2005-03-02 | 先进微装置公司 | 使用集成度量数据作为前馈数据的方法与装置 |
| US20040044435A1 (en) * | 2002-08-30 | 2004-03-04 | Kay Hellig | Method and system for handling substrates in a production line including a cluster tool and a metrology tool |
| US20040220688A1 (en) * | 2003-04-30 | 2004-11-04 | Almuth Behrisch | Advanced process control method and advanced process control system for acquiring production data in a chip production installation |
| US20050010319A1 (en) * | 2003-07-09 | 2005-01-13 | Sukesh Patel | System and method for validating and visualizing APC assisted semiconductor manufacturing processes |
| US20050052197A1 (en) * | 2003-07-14 | 2005-03-10 | Cory Watkins | Multi-tool manager |
Also Published As
| Publication number | Publication date |
|---|---|
| US20060293778A1 (en) | 2006-12-28 |
| JP2007003528A (ja) | 2007-01-11 |
| TW200715160A (en) | 2007-04-16 |
| CN1885049A (zh) | 2006-12-27 |
| US7187993B2 (en) | 2007-03-06 |
| JP4398441B2 (ja) | 2010-01-13 |
| US7065425B1 (en) | 2006-06-20 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20171116 Address after: Grand Cayman, Cayman Islands Patentee after: GLOBALFOUNDRIES INC. Address before: American New York Patentee before: Core USA second LLC Effective date of registration: 20171116 Address after: American New York Patentee after: Core USA second LLC Address before: American New York Patentee before: International Business Machines Corp. |
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| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090805 Termination date: 20190621 |
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| CF01 | Termination of patent right due to non-payment of annual fee |