CN100508386C - 弹性波装置 - Google Patents
弹性波装置 Download PDFInfo
- Publication number
- CN100508386C CN100508386C CNB2005100735687A CN200510073568A CN100508386C CN 100508386 C CN100508386 C CN 100508386C CN B2005100735687 A CNB2005100735687 A CN B2005100735687A CN 200510073568 A CN200510073568 A CN 200510073568A CN 100508386 C CN100508386 C CN 100508386C
- Authority
- CN
- China
- Prior art keywords
- film
- nonlinear resistance
- electrode
- substrate
- terminal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 238000010897 surface acoustic wave method Methods 0.000 claims abstract description 41
- 239000013078 crystal Substances 0.000 claims description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000004062 sedimentation Methods 0.000 claims description 3
- 229910052712 strontium Inorganic materials 0.000 claims description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 78
- 230000003068 static effect Effects 0.000 abstract description 25
- 230000006378 damage Effects 0.000 abstract description 11
- 239000010409 thin film Substances 0.000 abstract description 3
- 230000005611 electricity Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 12
- 238000003475 lamination Methods 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 238000003466 welding Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010335 hydrothermal treatment Methods 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 238000012536 packaging technology Methods 0.000 description 2
- 238000005036 potential barrier Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- SWPMTVXRLXPNDP-UHFFFAOYSA-N 4-hydroxy-2,6,6-trimethylcyclohexene-1-carbaldehyde Chemical compound CC1=C(C=O)C(C)(C)CC(O)C1 SWPMTVXRLXPNDP-UHFFFAOYSA-N 0.000 description 1
- 101100165535 Arabidopsis thaliana BLH4 gene Proteins 0.000 description 1
- 240000006829 Ficus sundaica Species 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000011222 crystalline ceramic Substances 0.000 description 1
- 229910002106 crystalline ceramic Inorganic materials 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910003447 praseodymium oxide Inorganic materials 0.000 description 1
- 230000005616 pyroelectricity Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000005676 thermoelectric effect Effects 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/589—Acoustic mirrors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02921—Measures for preventing electric discharge due to pyroelectricity
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0538—Constructional combinations of supports or holders with electromechanical or other electronic elements
- H03H9/0542—Constructional combinations of supports or holders with electromechanical or other electronic elements consisting of a lateral arrangement
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0538—Constructional combinations of supports or holders with electromechanical or other electronic elements
- H03H9/0547—Constructional combinations of supports or holders with electromechanical or other electronic elements consisting of a vertical arrangement
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6483—Ladder SAW filters
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (9)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004164100 | 2004-06-02 | ||
JPJP2004164100 | 2004-06-02 | ||
JP2004164100 | 2004-06-02 | ||
JPJP2005138836 | 2005-05-11 | ||
JP2005138836 | 2005-05-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1705227A CN1705227A (zh) | 2005-12-07 |
CN100508386C true CN100508386C (zh) | 2009-07-01 |
Family
ID=35577672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100735687A Expired - Fee Related CN100508386C (zh) | 2004-06-02 | 2005-06-02 | 弹性波装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN100508386C (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102457055A (zh) * | 2010-10-27 | 2012-05-16 | 瑷司柏电子股份有限公司 | 具有多气隙电极对的过电压保护元件 |
TWI566446B (zh) | 2013-11-20 | 2017-01-11 | 財團法人工業技術研究院 | 表面彈性波產生裝置、收發裝置及其產生方法 |
JP7195734B2 (ja) * | 2017-12-14 | 2022-12-26 | ミクロン電気株式会社 | 抵抗器及び抵抗器付きコンデンサ |
CN115632628B (zh) * | 2022-09-30 | 2024-05-24 | 锐石创芯(重庆)科技有限公司 | 滤波器结构及其制作方法、滤波器芯片及电子设备 |
CN117277988B (zh) * | 2023-11-22 | 2024-02-20 | 江苏卓胜微电子股份有限公司 | 横向耦合声学滤波器 |
-
2005
- 2005-06-02 CN CNB2005100735687A patent/CN100508386C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1705227A (zh) | 2005-12-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3677409B2 (ja) | 弾性表面波装置及びその製造方法 | |
CN100571032C (zh) | 声表面波元件、声表面波装置以及通信装置 | |
CN100508386C (zh) | 弹性波装置 | |
US7301421B2 (en) | Surface acoustic wave device, manufacturing method therefor, and communications equipment | |
US7190241B2 (en) | Elastic wave apparatus | |
WO2005002049A1 (ja) | 弾性表面波素子 | |
JP4382945B2 (ja) | 弾性表面波装置 | |
JP7252770B2 (ja) | 高周波デバイスおよびマルチプレクサ | |
JP4454410B2 (ja) | 弾性表面波装置およびその製造方法ならびに通信装置 | |
JP4496652B2 (ja) | 弾性表面波装置とその製造方法 | |
JP2009247014A (ja) | 弾性表面波装置 | |
JP3948550B2 (ja) | 弾性表面波装置 | |
JP4458954B2 (ja) | 弾性表面波装置およびその製造方法ならびに通信装置 | |
CN114844484A (zh) | 弹性波装置及包含所述弹性波装置的模块 | |
JP4610244B2 (ja) | 弾性表面波装置の製造方法 | |
JP4467403B2 (ja) | 弾性表面波素子および通信装置 | |
JP4454411B2 (ja) | 弾性表面波装置およびその製造方法ならびに通信装置 | |
JP2004120660A (ja) | 弾性表面波装置 | |
JP7370546B1 (ja) | 弾性波デバイス | |
JP2004235896A (ja) | 弾性表面波装置 | |
US20230134299A1 (en) | Acoustic wave device | |
JP2005020423A (ja) | 弾性表面波装置 | |
JP4514571B2 (ja) | 弾性表面波装置およびその製造方法ならびに通信装置 | |
JP4514562B2 (ja) | 弾性表面波装置および通信装置 | |
JP4514572B2 (ja) | 弾性表面波装置および通信装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: TAIYO YUDEN CO., LTD. Free format text: FORMER OWNER: FUJITSU MEDIA DEVICES LTD Effective date: 20101201 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: KANAGAWA PREFECTURE, JAPAN TO: TOKYO, JAPAN |
|
TR01 | Transfer of patent right |
Effective date of registration: 20101201 Address after: Tokyo, Japan, Japan Patentee after: Taiyo Yuden Co., Ltd. Address before: Kanagawa Patentee before: Fujitsu Media Devices Ltd |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090701 Termination date: 20110602 |