CN100500377C - 透明导电膜层抛光装置及其抛光方法 - Google Patents
透明导电膜层抛光装置及其抛光方法 Download PDFInfo
- Publication number
- CN100500377C CN100500377C CNB2006100349003A CN200610034900A CN100500377C CN 100500377 C CN100500377 C CN 100500377C CN B2006100349003 A CNB2006100349003 A CN B2006100349003A CN 200610034900 A CN200610034900 A CN 200610034900A CN 100500377 C CN100500377 C CN 100500377C
- Authority
- CN
- China
- Prior art keywords
- polishing cloth
- polishing
- substrate
- conductive film
- transparent conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 310
- 238000000034 method Methods 0.000 title claims abstract description 17
- 239000004744 fabric Substances 0.000 claims abstract description 222
- 230000005489 elastic deformation Effects 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims description 172
- 238000000576 coating method Methods 0.000 claims description 32
- 230000033001 locomotion Effects 0.000 claims description 32
- 239000011248 coating agent Substances 0.000 claims description 29
- 230000007246 mechanism Effects 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 6
- 238000000429 assembly Methods 0.000 claims description 4
- 230000000712 assembly Effects 0.000 claims description 4
- 239000011521 glass Substances 0.000 description 65
- 239000010408 film Substances 0.000 description 36
- 239000005357 flat glass Substances 0.000 description 16
- 238000010586 diagram Methods 0.000 description 12
- 210000003205 muscle Anatomy 0.000 description 9
- 230000006872 improvement Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229910003320 CeOx Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical group [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 239000003562 lightweight material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006100349003A CN100500377C (zh) | 2006-04-03 | 2006-04-03 | 透明导电膜层抛光装置及其抛光方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006100349003A CN100500377C (zh) | 2006-04-03 | 2006-04-03 | 透明导电膜层抛光装置及其抛光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1830622A CN1830622A (zh) | 2006-09-13 |
CN100500377C true CN100500377C (zh) | 2009-06-17 |
Family
ID=36993189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100349003A Expired - Fee Related CN100500377C (zh) | 2006-04-03 | 2006-04-03 | 透明导电膜层抛光装置及其抛光方法 |
Country Status (1)
Country | Link |
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CN (1) | CN100500377C (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113066942A (zh) * | 2021-03-19 | 2021-07-02 | 芜湖长信科技股份有限公司 | 一种oled的imito结构及oled消影镀膜方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1026958C (zh) * | 1989-11-20 | 1994-12-14 | 北京市电加工研究所 | 拉丝模复合研磨抛光机 |
CN1073909C (zh) * | 1997-09-30 | 2001-10-31 | 日本电气株式会社 | 适于高精度平面化的化学机械抛光方法 |
CN1078836C (zh) * | 1997-02-17 | 2002-02-06 | 日本电气株式会社 | 研磨装置 |
US6729941B2 (en) * | 2000-04-12 | 2004-05-04 | Shin-Etsu Handotai & Co., Ltd. | Process for manufacturing semiconductor wafer and semiconductor wafer |
EP1439031A1 (en) * | 1996-06-25 | 2004-07-21 | Ebara Corporation | Method and apparatus for dressing polishing cloth |
CN1699018A (zh) * | 2004-05-07 | 2005-11-23 | 欧洲系统光学公司 | 表面抛光的方法与元件 |
-
2006
- 2006-04-03 CN CNB2006100349003A patent/CN100500377C/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1026958C (zh) * | 1989-11-20 | 1994-12-14 | 北京市电加工研究所 | 拉丝模复合研磨抛光机 |
EP1439031A1 (en) * | 1996-06-25 | 2004-07-21 | Ebara Corporation | Method and apparatus for dressing polishing cloth |
CN1078836C (zh) * | 1997-02-17 | 2002-02-06 | 日本电气株式会社 | 研磨装置 |
CN1073909C (zh) * | 1997-09-30 | 2001-10-31 | 日本电气株式会社 | 适于高精度平面化的化学机械抛光方法 |
US6729941B2 (en) * | 2000-04-12 | 2004-05-04 | Shin-Etsu Handotai & Co., Ltd. | Process for manufacturing semiconductor wafer and semiconductor wafer |
CN1699018A (zh) * | 2004-05-07 | 2005-11-23 | 欧洲系统光学公司 | 表面抛光的方法与元件 |
Also Published As
Publication number | Publication date |
---|---|
CN1830622A (zh) | 2006-09-13 |
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Owner name: SHENZHEN XINSHIJIE OPTOELECTRONIC TECHNOLOGY CO., Free format text: FORMER OWNER: SHENZHEN NANBO DISPLAY DEVICE SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20121012 |
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Free format text: CORRECT: ADDRESS; FROM: 518067 SHENZHEN, GUANGDONG PROVINCE TO: 518057 SHENZHEN, GUANGDONG PROVINCE |
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Effective date of registration: 20121012 Address after: 518057 Guangdong Province, Shenzhen high tech Zone of Nanshan District City, North Industrial Zone No. three road, CSG electronics building five floor Patentee after: Shenzhen New Horizons Optoelectronic Technology Co., Ltd. Address before: Shenzhen Shekou 518067 Guangdong Province along the road No. 33 CSG Arts crafts emporium Patentee before: Shenzhen CSG Display Devices Co., Ltd. |
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Effective date of registration: 20160127 Address after: 443005 No. 38, Dalian Road, Yichang, Hubei Patentee after: YICHANG NANBO DISPLAY DEVICES CO., LTD. Address before: 518057 Guangdong Province, Shenzhen high tech Zone of Nanshan District City, North Industrial Zone No. three road, CSG electronics building five floor Patentee before: Shenzhen New Horizons Optoelectronic Technology Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090617 Termination date: 20190403 |
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CF01 | Termination of patent right due to non-payment of annual fee |