CN100471993C - Apparatus for treating surfaces of a substrate with atmospheric pressure plasma - Google Patents
Apparatus for treating surfaces of a substrate with atmospheric pressure plasma Download PDFInfo
- Publication number
- CN100471993C CN100471993C CNB2003801046854A CN200380104685A CN100471993C CN 100471993 C CN100471993 C CN 100471993C CN B2003801046854 A CNB2003801046854 A CN B2003801046854A CN 200380104685 A CN200380104685 A CN 200380104685A CN 100471993 C CN100471993 C CN 100471993C
- Authority
- CN
- China
- Prior art keywords
- processing device
- gas
- electrode
- surface processing
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32825—Working under atmospheric pressure or higher
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning In General (AREA)
Abstract
There is provided a surface treatment apparatus comprising gas storage part, including a first inlet port through which a processing gas is introduced, and b) the plasma generating part comprising an upper electrode and a lower electrode facing each other, a plasma generating space formed between the electrodes, at least one dielectric insulating the upper electrode and the lower electrode, a radiator lowering the surface temperature of the electrode, a second inlet port through which the processing gas is introduced from the processing gas storage part into the plasma generating space, an outlet port through which a plasma and the processing gas which has not been converted into the plasma are driven to outside of the plasma generating space, and an alternating current supply applying an alternating current voltage, wherein both the upper electrode and the lower electrode are flat-panel electrodes, the outlet port is formed on the lower electrode, and a substrate is located below the lower electrode. The apparatus is not limited to a shape of the substrate, and makes it possible to widen effective processing area of the substrate as well as to perform consecutive processes under atmospheric pressure.
Description
Technical field
The present invention relates to surface processing device (or plasma processing apparatus), relate in particular under barometric point produce plasma body and discharge plasma body to plasma generating space outside (or discharge space) in order to plasma body and the processed surperficial surface processing device that contacts of substrate (substrate).
Background technology
Can be divided into chemical surface treatment and plasma surface treatment such as removing from substrate surface with surface treatments such as glass substrate such as pollutions such as organic substance, the adhesive power that divests resist, increase organic film, surface correction, film formation, reducing metal oxide or cleaning liquid crystal.In surface treatment, the shortcoming that chemical surface treatment has chemistry that environment is had a negative impact.
Wherein a kind of plasma surface treatment method is the surface treatment that utilizes the low-temp low-pressure plasma body.This method produces plasma body in low-pressure chamber, low pressure plasma contacts with substrate to handle its surface then.Although the performance that it is good, this method generally is not used, because this method need keep the vacuum unit of low pressure, so is difficult to this method is applied to the continuous processing of carrying out under barometric point.As a result, actively barometric point is produced down plasma body and they are used in aspect such as surface treatment and make a search.
Japanese unexamined patent case 2-15171,3-241739, or 1-306569 has disclosed surface treatment method and device that substrate is positioned at plasma generating space.Especially, this method comprises a pair of metal electrode parallel to each other of configuration and is insulated with at least one dielectric material (dielectric), introduce plasma body (plasma) the generation space that is formed between the electrode with handling gas, between electrode, apply alternating-current to produce plasma body, reach the surface that is positioned at the substrate of plasma generating space with the Cement Composite Treated by Plasma that produces by handling gas.Yet, according to method illustrated in the file and device, because substrate need be located between two electrodes, so can only handle as thin as a wafer substrate.Reason for this reason, its application is very limited.In addition, when substrate is not dielectric material but conducting metal or semi-conductor,, the high risk of destroying substrate is arranged owing to be applied to the high-voltage of dielectric material.
In order to solve this shortcoming, suggestion has a method, the plasma body that wherein produces in plasma generating space to be discharged to the plasma generating space outside, contacts with substrate there to handle substrate surface.
US 5,185,132 have disclosed a surface treatment method, comprise the reaction vessel of the mixed gas of rare gas and reactant gases being introduced plate electrode with electric Jie's coating, wherein parallel to each other two or more the multi-electrode surface be provided with solid state dielectric, and wherein provide substrate in this electrode downstream, under barometric point with this mixed gas of plasma excitation producing active specy (active species), and the surface of handling this substrate with this active specy.Fig. 1 a is the stereographic map of the surface processing device of this method of use, and Fig. 1 b is the drawing in side sectional elevation of the employed electrode structure of device of Fig. 1 a.Shown in Fig. 1 a and 1b, surface processing device comprise two plate electrodes (101a, 101b), parallel to each other and with dielectric material (106a 106b) is insulated; Handle gas inlet (103), be installed in and be formed on plate electrode (101a is 101b) on plasma generating space (102) one sides between; Outlet (104) is installed on the opposite side of plasma generating space (102).Handle gas and at first introduce plasma generating space (102) via inlet (103), (101a, voltage of alternating current 101b) converts plasma body to be applied to plate electrode there.Plasma body and the processing gas that is not converted into plasma body are discharged to the outside of plasma generating space (102) via outlet (104), contact with substrate surface then and handle it.Yet, because outlet (104) is installed on the side of plasma generating space (102), so this surface processing device has the confined shortcoming of effective processing width (W) on surface.Widen the voltage of alternating current that effective processing width (W) needs rising suddenly to apply.
In order to solve above-mentioned shortcoming, US 6,424, and 091 discloses a surface processing device, comprises: a) at least one pair of electrode, and at least one of this counter electrode has dielectric layer at its outside surface; B) gas organization of supply produces with gas to this discharge space that is defined between this electrode in order to supplying plasma, and wherein this gas organization of supply provides one plasma generation gas from this discharge space towards substrate; And c) power supply, in order between this electrode, to provide AC voltage to produce plasma generation this plasma body at this discharge space with gas, wherein at least one of this counter electrode has the curved surface that is projected in this discharge space, and this discharge space is configured to from this discharge space towards this substrate this plasma body that outwards scatters.Fig. 2 is the drawing in side sectional elevation of the preferred embodiment of the employed electrode structure of this surface processing device, wherein plasma generation is with dielectric material (202a, 202b) insulating two cylindrical electrodes (201a in addition, 201b), substrate (204) surface that plasma body contact that so produces and processing are positioned at the surface processing device outside.Surface processing device with cylindrical electrode can be widened the processing width.But, because with the plate electrode texture ratio, the plasma generating space device of every electrode unit surface of cylindrical electrode obviously reduces, so this device still has the shortcoming of low plasma efficiency of conversion.Be about to handle the electrode useful area that gas converts plasma body to and obviously reduce, so reduce plasma conversion efficient and reduce the processing efficiency of substrate.And, because the electric power that the result wasted of low plasma efficiency of conversion, so this surface processing device needs more to many electric power than plate electrode.
Summary of the invention
Therefore, the objective of the invention is for a surface processing device is provided, solve the narrow width problem of effective processing area that the classic flat-plate electrode structure caused, and solve the discharge plasma space that the cylindrical electrode structure produced and reduce problem.
Another object of the present invention is for a surface processing device being provided, can handling substrate surface with continuation method again at the total processing area that increases substrate simultaneously.
Handle surface processing device that the plasma generation below the gas storage portion partly forms and will finish in detailed description of the present invention by providing the above-mentioned purpose of explanation and other by handling gas storage portion and being positioned at.The invention provides a kind of surface processing device, comprise A) have and hold the spatial of handling gas and handle gas storage portion and B) be positioned at the plasma generation part of handling below the gas storage portion, wherein handling gas storage portion comprises: first inlet, introduce processing gas via this first inlet, wherein plasma generation partly comprises: top electrode that a) faces with each other and lower electrode; B) be formed on plasma generating space between top electrode and the lower electrode; C) make on the described top electrode insulating dielectric material and make dielectric material under the described lower electrode insulating; D) second inlet via this second inlet, is handled the get along alone body storage compartment of regulating the flow of vital energy of gas and is introduced into plasma generating space; E) outlet, via this outlet, plasma body reaches the outside that the processing gas that is not converted into plasma body is discharged to plasma generating space; And f) applies the AC power of voltage of alternating current to top electrode; Wherein top electrode and lower electrode the two all be plate electrode, the top electrode upper surface of dielectric material that is incumbent on wherein, lower electrode covers down the lower surface of dielectric material, wherein handling atmosphere storage partly partly isolates by last dielectric material and plasma generation, wherein second inlet is formed on the dielectric material, second inlet only is formed on the outside of top electrode, thereby second inlet is not formed on top electrode inside, its middle outlet is formed on the lower electrode, outlet only is formed on lower electrode inside, thereby outlet runs through dielectric material and lower electrode down, and wherein substrate is positioned at below the lower electrode, and is not positioned at surface processing device inside.
Description of drawings
Fig. 1 a is the stereographic map with conventional surface treatment unit of plate electrode structure.
Fig. 1 b is the drawing in side sectional elevation of the employed electrode structure of device of Fig. 1 a.
Fig. 2 is the drawing in side sectional elevation with employed electrode structure of conventional surface treatment unit of cylindrical electrode structure.
Fig. 3 is the drawing in side sectional elevation according to surface processing device of the present invention.
Fig. 4 a and 4b are the stereographic map of preferred embodiment of the employed electrode structure of surface processing device of Fig. 3.
The primary clustering synopsis
The 101a plate electrode
The 101b plate electrode
102 plasma generating spaces
103 inlets
104 outlets
105 substrates
The 106a dielectric material
The 106b dielectric material
The 201a cylindrical electrode
The 201b cylindrical electrode
The 202a dielectric material
The 202b dielectric material
203 plasma bodys
204 substrates
300 handle gas storage portion
301a first inlet
301b first inlet
400 plasma generation parts
The dull and stereotyped top electrode of 401a
The dull and stereotyped lower electrode of 401b
402 plasma generating spaces
The 403a dielectric material
The 403b dielectric material
The 404a scatterer
The 404b scatterer
405a second inlet
405b second inlet
406 outlets
The 406a outlet
The 406b outlet
The 406c outlet
The 406d outlet
The 406e outlet
407 AC power
408 substrates
Embodiment
Fig. 3 is the drawing in side sectional elevation according to the preferred embodiment of surface processing device of the present invention.As shown in Figure 3, surface processing device is formed by handling gas storage portion (300) and being positioned at the plasma generation part of handling below the gas storage portion (400).Handle gas storage portion (300) and have, therefore, can suitably select its volume with regard to processing capacity and efficiency of conversion with handling the effect that gas steadily is fed to plasma generation part (400).Plasma generation part (400) has and will handle the effect that gas converts plasma body to.
Via first inlet (301a, 301b) the plasma generation use body of regulating the flow of vital energy is introduced into and handles gas storage portion (300), (301a 301b) is placed on the side of handling gas storage portion (300) first inlet.Though (301a 301b) will handle gas and introduce processing gas storage portion (300) two first inlets, it should be understood that the number of first inlet is not limited thereto for example.If the words that need can be placed four first inlets on four sides of handling gas storage portion (300), or have only an inlet to be positioned in the upper wall central authorities that handle gas storage portion (300).
Plasma generation part (400) comprises upper flat plate electrode (401a) and lower plate electrode (401b), be formed on electrode (401a, plasma generating space 401b) (402), make electrode (401a, 401b) insulating dielectric material (403a, 403b), reduce electrode (401a, scatterer (the 404a of surface temperature 401b), 404b), the body storage compartment (300) of regulating the flow of vital energy of getting along alone will be handled the second inlet (405a that gas is guided to plasma generation part (400), 405b), reach the outlet (406a that plasma body that will produce and the not conversion process gas that is left are discharged to plasma generating space (402) outside, 406b, 406c, 406d, 406e, general name " 406 ").Substrate (408) is located at below the lower plate electrode (401b).Upper flat plate electrode (401a) is connected to AC power (407) and lower plate electrode (401b) is grounded.
Handle gas at first via first inlet (301a, 301b) the introducing processing gas storage portion (300) that are installed on the sidewall of handling gas storage portion (300).(405a 405b) is fed to plasma generating space (402) to the processing gas of introducing, and helps to convert to plasma body by the voltage of alternating current that exchanges power supply (407) certainly and provide there via being positioned at the inlet of second on the dielectric material (403a) then.Plasma body and remaining not conversion process gas are discharged to plasma generating space (402) outside via the outlet (406) that is positioned on the lower plate electrode (401b), with substrate (408) surface of contact with processing.
Fig. 4 a is the stereographic map of the employed electrode structure of surface processing device of Fig. 3.As above-mentioned, electrode structure comprises the upper flat plate electrode (401a) and the lower plate electrode (401b) that face with each other, is formed on electrode (401a, plasma generating space 401b) (402), make electrode (401a, 401b) the insulating dielectric material (403a, 403b).(405a, 405b), (405a, 405b) the get along alone body storage compartment (300) of regulating the flow of vital energy is fed to plasma generating space (402) via second inlet to handle gas go up to form second inlet at dielectric material (403a).The processing gas that to introduce plasma generating space (402) with the voltage of alternating current that AC power was provided converts plasma body to.Plasma body that produces and the remaining processing gas that does not convert plasma body to via be formed on the lower plate electrode (401b) outlet (406a is to 406b; " 406 ") be discharged to plasma generating space (402) outside, plasma body contacts substrate (408) surface and handles it then.In this embodiment, total processing width (D1+D2+D3+D4+D5) of outlet (406) is obviously greater than the processing width (W) of classic flat-plate electrode structure, and using increases processed substrate possibility width greatly.And another advantage of the present invention is that very big although processing width (W) is provided the restriction of voltage, the length of electrode (D) obviously is not affected.In other words, be restricted to 0.01mm～30mm though processing width (W) typically is provided voltage, the length of electrode (D) can be made its length fully to increase by voltage influence hardly.As a result, always handling width (D1+D2+D3+D4+D5) also can significantly increase.In addition, according to conventional example,, be difficult to change the shape of outlet because need many corrections of device.According to the present invention, outlet (406) shape can have the variation of all kinds of circle, trilateral, ellipse or any other shape, except scatterer, need not any part of modifier.Therefore, has the advantage that can change outlet (406) shape according to processed substrate (408) shape.The outlet of Fig. 4 b diagram is formed this kind one exemplary embodiment in a plurality of holes.And, though in Fig. 4 a second inlet (405a 405b) is positioned on the two edges of dielectric material (403a), and significantly, second enters the mouth can be positioned on all four edges of dielectric material (403a) of cumulative volume of relevant plasma generating space (402).
The present invention is not specially limited the regulate the flow of vital energy kind of body of plasma generation use, can be widely used in general employed processing gas in this field.For example, can use nitrogen, oxygen, rare gas, carbonic acid gas, nitrogen oxide, perfluorinated gas, hydrogen, ammonia, chloride gas, ozone or its mixture etc.Can use helium, argon, neon or xenon to be used as rare gas.Can use CF
4, C
2F
6, CF
3CF=CF
2, CClF
3And SF
6Be used as perfluorinated gas.
Can with regard to ability in those of ordinary skill know and be fit to Cement Composite Treated by Plasma purpose of the present invention and suitably select to handle gas.For example, the mixture of mixture, nitrogen and AIR MIXTURES, rare gas or the nitrogen of use oxide gas, nitrogen and oxygen and rare gas is preferable.With regard to economic point of view, the mixture of nitrogen, nitrogen and oxygen, nitrogen and AIR MIXTURES are better.When removing resist or etching organic film, use oxygen, ozone, air, carbonic acid gas (CO
2), steam or nitrogen oxide (N
2O) preferable.In addition, when etching silicon, be effective together with using nitrogen or rare gas such as fluorine base gass such as CF4 or chloridating gas.When reducing metal oxide, can use such as reducing gass such as hydrogen or ammonia.
The AC power supplies frequency is preferable to the scope of 200MHz at 50Hz.When frequency is lower than 50Hz, the possibility of discharge instability is arranged.When frequency during, because the sizable temperature of plasma body rises, so arc discharge may take place greater than 200MHz.Frequency is preferable in the scope of 1kHz～100MHz, and frequency is better in the scope of 5kHz～100kHz.Can with regard to two electrodes (401a, 401b) area of the distance between, electrode, and plasma conversion efficient, and the type of electrodes that uses suitably select the voltage that applies.Usually, voltage is adjusted in the scope of 1kV～40kV.Can produce plasma discharge hardly when voltage is lower than 1kV, and voltage may destroy dielectric material during greater than 40kV.Preferable voltage is in the scope of 2kV～10kV, and best voltage is in the scope of 2kV～8kV.When frequency and voltage are adjusted in the scope of 5kHz～100MHz and 2kV～10kV separately, just do not need to meet the impedance that applies upper frequency and voltage, make simplification and the economic interests that can reach device.Be not specially limited the waveform that AC power (407) produces, can use pulse to involve sine wave.
During Cement Composite Treated by Plasma, (401a, surface temperature 401b) maintains 250 ℃ or lower to electrode, especially 200 ℃ or lower preferable.When electrode temperature during greater than 250 ℃, arc discharge may appear.Although it is, also unrestricted about the lower value of electrode temperature when temperature is maintained at the extra cooling of room temperature needs of following time.By (401a, (404a 404b) carries out electrode (401a, surface cool 401b) 401b) to install scatterer all around at electrode.Though do not limit scatterer (404b) shape of lower plate electrode (401b) especially, scatterer (404b) shape of lower plate electrode (401b) must be defined according to the shape of outlet (406).Especially, scatterer (404b) shape of lower plate electrode (401b) need have and can not hinder plasma body via the effusive shape of lower plate electrode (401b).Can carry out electrode (401a, surface cool 401b) by the circulation of air, water or refrigerant.For low electric power, air cycle is preferable, and for high electric power, water or coolant circulating are preferable.Though the scatterer of upper flat plate electrode (401a) and lower plate electrode (401b) (404a 404b) can independently cool off, utilize pipe connecting (not shown) connect scatterer (404a, 404b) preferable.And, when applying low electric power, can not need the scatterer (404b) of lower plate electrode (401b).
(403a 403b) makes the insulation of upper flat plate electrode (401a) and lower plate electrode (401b) with dielectric material.(403a 403b), can only make upper flat plate electrode (401a) and lower plate electrode (401b) insulation with a dielectric material, and this is known to a person of ordinary skill in the art though Fig. 3 and 4 uses two dielectric materials.Dielectric material (403a, 403b) by have 2000 or the insulating material of still less dielectric material constant make preferablely, but be not limited thereto.For example, can use MgF
2, CaF
2, LiF, alumina, glass, and pottery etc.Especially, use magnesium oxide to keep stability preferable.For example, can be by preparing such as ceramic powder such as alumina and a small amount of (this mixture of 0.01～5vol%) magnesian mixture and sintering produces sintering body, uses this sintering body to be used as and contains magnesian dielectric material.As another select example by with sputter, electron beam deposition or thermospray in addition coating MgO film can prepare on such as dielectric material substrate surfaces such as alumina or quartz and contain magnesian dielectric material.(403a, thickness 403b) is preferable in 0.1～2mm scope for dielectric material.When thickness during, can reduce the voltage that bears of dielectric layer less than 0.1mm.In addition, may break or peel off, make to be difficult to keep uniform glow discharge.When thickness during greater than 2mm, the voltage that bears can excessively increase.
Can by finish such as melted join, ceramic spraying or the known technologies such as chemistry or physical vapor deposition of electrode materials electricity (403a, 403b) and electrode (401a, 401b) connection between.
Although connecting dielectric material (403b) afterwards to lower plate electrode (401b), to export (406) and be formed on the lower plate electrode (401b) by cutting away given zone, but deposit or spraying dielectric material (as, copper, silver, aluminium, gold, platinum, palladium, molybdenum, tungsten or its alloy etc.) forming on the dielectric material that exports (406) preferable by cutting away given zone.
Can be modified to various forms according to surface processing device of the present invention.For example, the electrode structure of Fig. 4 can be connected to each other with parallel construction.And, can show the electrode temperature that measured, and the surface temperature of control electrode in addition such as installing controller control surface temperature by surface temperature, the installment monitor device that the installing thermometer measures electrode.Relevant this kind correction please refer to US6,424,091.By as US 5,185, general shown in 132, installing even device of flow or porous plate can be reached more consistent processing gas supply in the processing gas storage portion.
Surface processing device according to the present invention can be used for removing pollution such as substrate surface such as organic substance, with glass substrate, etching oxide film or etching silicone or metal etc. for example divests resist, increases bonding strength, surface corrections, film formation, the reducing metal oxide of organic film or clean liquid crystal, and what can be used for cleaning the cleaning of PCB (polychlorobiphenyl) bar and lead frame, large glass that TFT-LCD (Thin Film Transistor-LCD) uses cleans and divest resist on the large glass that riddles the TFT-LCD use in advance.And, can be used for all packaging steps of semiconductor fabrication processing, such as gluing, molded, welding, chip adorn attached, soak, and indicate and handle etc.And, can be used for removing semi-conductive metal oxide materials, form water-wetted surface or form water-proof surface.
Can under barometric point, handle substrate surface continuously according to surface processing device of the present invention.In other words, can be used for handling continuously by the mobile substrate relevant with surface processing device according to the present invention.
Though according to electrode and lower electrode on the surface processing device of the present invention is flat pole, but the narrow problem of effective processing area width that this device solves classic flat-plate electrode structure is caused, and solve because the problem that the discharge plasma space that the cylindrical electrode structure is caused reduces.In addition, this device does not limit substrate shape and can handle substrate surface in a continuous manner under barometric point.
Claims (16)
1, a kind of surface processing device comprises A) have and hold the spatial of handling gas and handle gas storage portion and B) be positioned at the plasma generation part of handling below the gas storage portion, wherein
The processing gas storage portion comprises: first inlet, introduce processing gas via this first inlet, wherein
Plasma generation partly comprises:
A) top electrode that faces with each other and lower electrode;
B) be formed on plasma generating space between top electrode and the lower electrode;
C) make on the described top electrode insulating dielectric material and make dielectric material under the described lower electrode insulating;
D) second inlet via this second inlet, is handled the get along alone body storage compartment of regulating the flow of vital energy of gas and is introduced into plasma generating space;
E) outlet, via this outlet, plasma body reaches the outside that the processing gas that is not converted into plasma body is discharged to plasma generating space; And
F) apply the AC power of voltage of alternating current to top electrode;
Wherein top electrode and lower electrode the two all be plate electrode,
The top electrode upper surface of dielectric material that is incumbent on wherein, lower electrode covers down the lower surface of dielectric material,
Wherein handle atmosphere storage and partly partly isolate by last dielectric material and plasma generation,
Wherein second inlet is formed on the dielectric material, and second inlet only is formed on the outside of top electrode, thereby second inlet is not formed on top electrode inside,
Its middle outlet is formed on the lower electrode, and outlet only is formed on lower electrode inside, thereby outlet runs through dielectric material and lower electrode down, and
Wherein substrate is positioned at below the lower electrode, and is not positioned at surface processing device inside.
2, surface processing device according to claim 1, its middle outlet has rectangle, circle, trilateral or oval in shape.
3, surface processing device according to claim 1, wherein the frequency of AC power is in 50Hz～200MHz scope, and voltage is in 1kV～40kV scope.
4, surface processing device according to claim 1, wherein the frequency of AC power is in 5kHz～100kHz scope, and voltage is in 2kV～10kV scope.
5, surface processing device according to claim 1 also comprises the even device of flow.
6, surface processing device according to claim 1 is wherein handled gas and is selected from nitrogen, oxygen, rare gas, carbonic acid gas, nitrogen oxide, perfluorinated gas, hydrogen, ammonia, chloride gas, ozone or its mixture.
7, surface processing device according to claim 1 is wherein handled mixture and nitrogen and AIR MIXTURES that gas is selected from nitrogen, nitrogen and oxygen.
8, surface processing device according to claim 1, wherein substrate is a semi-conductor.
9, surface processing device according to claim 1, wherein substrate is PCB bar or lead frame.
10, surface processing device according to claim 1, wherein substrate is the TFT-LCD large glass.
11, surface processing device according to claim 1, wherein device is used to remove the pollution of substrate surface, the adhesive power that increases organic film or film formation.
12, surface processing device according to claim 1, wherein device is used to divest resist.
13, surface processing device according to claim 1, wherein device is used for the surface correction.
14, surface processing device according to claim 1, wherein device is used for reducing metal oxide.
15, surface processing device according to claim 1, wherein device is used to clean liquid crystal glass substrate, etching oxide film or etching silicone or metal.
16, surface processing device according to claim 1, wherein said plasma generating space does not directly link with processing atmosphere storage portion isolator by second inlet.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020020076071 | 2002-12-02 | ||
| KR10-2002-0076071A KR100476136B1 (en) | 2002-12-02 | 2002-12-02 | Apparatus for treating the surface of a substrate with atmospheric pressure plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1720349A CN1720349A (en) | 2006-01-11 |
| CN100471993C true CN100471993C (en) | 2009-03-25 |
Family
ID=36165408
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801046854A Expired - Fee Related CN100471993C (en) | 2002-12-02 | 2003-11-19 | Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP4409439B2 (en) |
| KR (1) | KR100476136B1 (en) |
| CN (1) | CN100471993C (en) |
| AU (1) | AU2003279587A1 (en) |
| TW (1) | TWI227951B (en) |
| WO (1) | WO2004051702A2 (en) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100708320B1 (en) * | 2004-04-22 | 2007-04-17 | 김기현 | Apparatus for surface modification of casing-parts using atmospheric-pressure microwave plasma and method thereof |
| US8193096B2 (en) | 2004-12-13 | 2012-06-05 | Novellus Systems, Inc. | High dose implantation strip (HDIS) in H2 base chemistry |
| DE102005040596B4 (en) * | 2005-06-17 | 2009-02-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | A method of removing a doped surface layer on backs of crystalline silicon solar wafers |
| EP1907596A4 (en) * | 2005-07-26 | 2009-09-16 | Psm Inc | Injection type plasma treatment apparatus and method |
| WO2007017271A2 (en) * | 2005-08-11 | 2007-02-15 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V: | Plasma generating device and plasma generating method |
| JP4782529B2 (en) * | 2005-10-06 | 2011-09-28 | エア・ウォーター株式会社 | Manufacturing method of display device |
| KR100708212B1 (en) * | 2005-10-07 | 2007-04-16 | 주식회사 피에스엠 | Atmospheric pressure plasma shower unit and wire bonding apparatus and method using the same unit |
| KR100720527B1 (en) * | 2005-12-28 | 2007-05-22 | 동부일렉트로닉스 주식회사 | Cmos image sensor and method for fabricating the same |
| KR100760651B1 (en) * | 2006-01-24 | 2007-09-21 | 주식회사 셈테크놀러지 | Apparatus for treating the surface of a substrate having supply pipe for treatment gas |
| KR101293119B1 (en) * | 2006-11-28 | 2013-08-05 | 엘아이지에이디피 주식회사 | Atmospheric pressure Plasma surface treatment apparatus and Atmospheric pressure plasma surface treatment method |
| US8435895B2 (en) | 2007-04-04 | 2013-05-07 | Novellus Systems, Inc. | Methods for stripping photoresist and/or cleaning metal regions |
| KR101333878B1 (en) * | 2007-11-20 | 2013-11-27 | 엘지전자 주식회사 | Apparatus for treating surface of substrate with plasma in atmospheric pressure |
| KR100975665B1 (en) * | 2008-01-25 | 2010-08-17 | (주)에스이 플라즈마 | Atmosphere Pressure Plasma Generation Device for Mass Production |
| EP2283510B1 (en) | 2008-05-02 | 2013-01-23 | Oerlikon Solar AG, Trübbach | Plasma treatment apparatus and method for plasma-assisted treatment of substrates |
| KR101791685B1 (en) * | 2008-10-14 | 2017-11-20 | 노벨러스 시스템즈, 인코포레이티드 | High Dose Implantation Strip (HDIS) In H2 Base Chemistry |
| US8454850B2 (en) | 2009-09-02 | 2013-06-04 | Air Products And Chemicals, Inc. | Method for the removal of surface oxides by electron attachment |
| US20110143548A1 (en) | 2009-12-11 | 2011-06-16 | David Cheung | Ultra low silicon loss high dose implant strip |
| KR101770008B1 (en) | 2009-12-11 | 2017-08-21 | 노벨러스 시스템즈, 인코포레이티드 | Enhanced passivation process to protect silicon prior to high dose implant strip |
| WO2012010299A1 (en) * | 2010-07-21 | 2012-01-26 | Dow Corning France | Plasma treatment of substrates |
| JP2014514140A (en) * | 2011-03-11 | 2014-06-19 | パーデュー・リサーチ・ファウンデーション | Generation of disinfectant inside package using controlled gas composition |
| US9613825B2 (en) | 2011-08-26 | 2017-04-04 | Novellus Systems, Inc. | Photoresist strip processes for improved device integrity |
| US20130087287A1 (en) * | 2011-10-10 | 2013-04-11 | Korea Institute Of Machinery & Materials | Plasma reactor for removal of contaminants |
| KR101513423B1 (en) | 2013-04-04 | 2015-04-21 | 주식회사 테스 | Plasma generator and reaction chamber for thin film deposition, which comprises the same |
| CN104779136A (en) * | 2014-01-10 | 2015-07-15 | 上海和辉光电有限公司 | Method and equipment for removing photoresist |
| US9514954B2 (en) | 2014-06-10 | 2016-12-06 | Lam Research Corporation | Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films |
| KR101657762B1 (en) * | 2014-06-23 | 2016-09-19 | 광운대학교 산학협력단 | Plasma Jet Devices with Electric Safty and Heat-Dissipation |
| CN104936371B (en) * | 2015-06-09 | 2017-07-07 | 北京三十四科技有限公司 | A kind of coreless armature dielectric impedance structure |
| CN105047514B (en) * | 2015-07-27 | 2017-06-13 | 郑州大学 | In the method that glass surface plasma etching forms texture structure |
| KR102201183B1 (en) * | 2018-12-11 | 2021-01-13 | 한국과학기술원 | Method for recovering electrical property of two-dimensional material using hydrogen plasma and device thereof |
| CN109526131A (en) * | 2018-12-26 | 2019-03-26 | 哈尔滨工业大学 | Strengthen the method for plasma discharge under a kind of gas flowing environment using more ground electrodes |
| KR102524433B1 (en) * | 2019-11-27 | 2023-04-24 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | active gas generator |
| CN112139151A (en) * | 2020-09-11 | 2020-12-29 | 韩山师范学院 | Surface cleaning device for large equipment |
| JPWO2022114013A1 (en) * | 2020-11-30 | 2022-06-02 | ||
| KR20230069274A (en) * | 2021-11-11 | 2023-05-19 | 삼성디스플레이 주식회사 | Display device and manufacturing method thereof |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02213480A (en) * | 1989-02-14 | 1990-08-24 | Nippon Light Metal Co Ltd | Aluminum electrode for generating high frequency plasma |
| JPH07278850A (en) * | 1994-04-15 | 1995-10-24 | Fujitsu Ltd | Plasma treatment device and plasm treatment |
| DE19521548A1 (en) * | 1995-06-13 | 1996-12-19 | Ipsen Ind Int Gmbh | Method and device for controlling the electrical current density over a workpiece during heat treatment in plasma |
| JPH0963132A (en) * | 1995-08-23 | 1997-03-07 | Seiko Epson Corp | Production of substrate for optical information recording medium and device therefor |
| JPH09279350A (en) * | 1996-04-11 | 1997-10-28 | Anelva Corp | Surface treating device |
| JP4161533B2 (en) * | 2000-12-28 | 2008-10-08 | 松下電工株式会社 | Plasma processing method and plasma processing apparatus |
| JP2002253952A (en) * | 2001-02-28 | 2002-09-10 | Okura Ind Co Ltd | Method and apparatus for treating surface with plasma |
-
2002
- 2002-12-02 KR KR10-2002-0076071A patent/KR100476136B1/en not_active IP Right Cessation
-
2003
- 2003-11-19 AU AU2003279587A patent/AU2003279587A1/en not_active Abandoned
- 2003-11-19 WO PCT/KR2003/002485 patent/WO2004051702A2/en active Application Filing
- 2003-11-19 JP JP2004556947A patent/JP4409439B2/en not_active Expired - Fee Related
- 2003-11-19 CN CNB2003801046854A patent/CN100471993C/en not_active Expired - Fee Related
- 2003-11-24 TW TW092132938A patent/TWI227951B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003279587A8 (en) | 2004-06-23 |
| TW200414577A (en) | 2004-08-01 |
| JP4409439B2 (en) | 2010-02-03 |
| WO2004051702A3 (en) | 2004-12-02 |
| WO2004051702A2 (en) | 2004-06-17 |
| AU2003279587A1 (en) | 2004-06-23 |
| JP2006509331A (en) | 2006-03-16 |
| KR100476136B1 (en) | 2005-03-10 |
| KR20040048272A (en) | 2004-06-07 |
| CN1720349A (en) | 2006-01-11 |
| TWI227951B (en) | 2005-02-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100471993C (en) | Apparatus for treating surfaces of a substrate with atmospheric pressure plasma | |
| KR100320574B1 (en) | Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus | |
| JPWO2004061929A1 (en) | Plasma generator, ozone generator, substrate processing apparatus, and semiconductor device manufacturing method | |
| KR20080048541A (en) | Apparatus for the removal of a fluorinated polymer from a substrate and methods therefor | |
| EP0579060B1 (en) | Method for producing ozone | |
| KR100723019B1 (en) | Plasma generator | |
| KR100988291B1 (en) | Apparatus for surface treatment with plasma in atmospheric pressure having parallel plates type electrode structure | |
| KR20070022527A (en) | Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge | |
| CN112334599B (en) | Reactive gas generator and film forming apparatus | |
| EP1035757B1 (en) | Substrate electrode plasma generator and substance/material processing method | |
| JPH10326772A (en) | Dry etching device | |
| KR100988290B1 (en) | Apparatus for surface treatment with plasma in atmospheric pressure having parallel plates type electrode structure | |
| JP2002198356A (en) | Plasma treatment apparatus | |
| JP5787712B2 (en) | Plasma processing equipment | |
| JP3955835B2 (en) | Plasma surface treatment apparatus and treatment method thereof | |
| KR100760651B1 (en) | Apparatus for treating the surface of a substrate having supply pipe for treatment gas | |
| CN2870385Y (en) | Large-area flat-board normal-pressure radio-frequency cold plasma discharge apparatus | |
| JP2003062452A (en) | Atmospheric pressure plasma generation method and apparatus having comb electrode and plasma treatment method | |
| KR20070042381A (en) | Apparatus for treating the surface of a substrate with plasma in atmospheric pressure | |
| JP3948296B2 (en) | Plasma etching processing method and apparatus | |
| JP3927864B2 (en) | Atmospheric pressure plasma processing equipment | |
| JP2002208583A (en) | Plasma treating method | |
| JP2005517530A (en) | Atmospheric pressure plasma cleaning equipment | |
| JP3927863B2 (en) | Atmospheric pressure plasma processing equipment | |
| KR100483063B1 (en) | Cleaning apparatus using the atmospheric pressure plasma |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090325 Termination date: 20091221 |