JPH0963132A - Production of substrate for optical information recording medium and device therefor - Google Patents

Production of substrate for optical information recording medium and device therefor

Info

Publication number
JPH0963132A
JPH0963132A JP21508895A JP21508895A JPH0963132A JP H0963132 A JPH0963132 A JP H0963132A JP 21508895 A JP21508895 A JP 21508895A JP 21508895 A JP21508895 A JP 21508895A JP H0963132 A JPH0963132 A JP H0963132A
Authority
JP
Japan
Prior art keywords
discharge
stamper
substrate
gas
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21508895A
Other languages
Japanese (ja)
Inventor
Atsushi Takakuwa
敦司 高桑
Satoshi Nehashi
聡 根橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP21508895A priority Critical patent/JPH0963132A/en
Publication of JPH0963132A publication Critical patent/JPH0963132A/en
Pending legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To enable high-speed dry treatment by generating activated species such as excited species and ions of oxygen by electric discharge under atmospheric pressure, allowing them to react chemically with an org. material on the surface of a stamper and removing the org. material. SOLUTION: Gaseous helium and oxygen are fed from a gas feeder 5 into a metallic cover 2 and substd. for an atmosphere near an electrode 3 for causing electric discharge and a stamper 1. Electric discharge is caused between the electrode 3 and the stamper 1 by supplying high-frequency power from a high-frequency power source 4 to the electrode 3 to form an electric discharge part 7 and a UV-curing resin 8 remaining on the stamper 1 is removed by electric discharge treatment. In this case, various reactions by plasma such as dissociation, ionization and excitation of gas take place in the electric discharge part 7 and the remaining UV-curing resin 8 reacts with active seeds such as excited seeds and ions of oxygen and becomes CO, CO2 and steam, which are released from the stamper 1 and discharged through a duct 9.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、レーザなどによる光学
的書き込み、読み出しを行う光学的情報記録媒体用基板
に適した製造方法、及びその製造装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing method suitable for a substrate for an optical information recording medium for performing optical writing and reading by a laser and the like and a manufacturing apparatus therefor.

【0002】[0002]

【従来の技術】従来、光ディスクあるいは光カードなど
の光学的情報記録媒体は、基体の上に設けた薄い記録層
に光学的に検出可能な微小なピットをトラック上に形成
することにより、情報の高密度な記録をすることができ
る。このような光学的情報記録媒体においては、情報を
記録及び再生する際にトラックに沿ってレーザ光を走査
する必要があり、そのため一般にトラッキング用の案内
溝の付いた基板が用いられている。
2. Description of the Related Art Conventionally, in an optical information recording medium such as an optical disk or an optical card, information is recorded by forming minute optically detectable pits on a track in a thin recording layer provided on a substrate. High-density recording can be performed. In such an optical information recording medium, it is necessary to scan a laser beam along a track when recording and reproducing information, and therefore, a substrate having a guide groove for tracking is generally used.

【0003】このような案内溝、案内溝の付いた基板の
作製法としては、軟化したプラスチック材料をスタンパ
ーにてプレスした後に固化させる圧縮成形法、スタンパ
ーを配設した金型内に溶融したプラスチック材料を射出
して固化させる射出成形法や紫外線硬化樹脂を用いてス
タンパーから案内溝を転写する2P法などが知られてい
るが、案内溝の転写性、基板の耐溶剤性及び基板の光学
的歪みを少なくできるという点では2P法によるものが
最も優れている。また、2P法は他の方法に比べ、基板
1枚当たりの製造時間が長く、大量生産に向かないとい
う問題があるが、設備投資が非常に少なくてすむという
大きな利点がある。
The guide groove and the substrate having the guide groove are manufactured by a compression molding method in which a softened plastic material is pressed by a stamper and then solidified, and a plastic material melted in a die in which the stamper is arranged. An injection molding method of injecting and solidifying a material and a 2P method of transferring a guide groove from a stamper using an ultraviolet curable resin are known, but the transfer property of the guide groove, the solvent resistance of the substrate and the optical property of the substrate are known. The 2P method is the most excellent in that distortion can be reduced. Further, the 2P method has a problem that the manufacturing time per substrate is long and is not suitable for mass production as compared with other methods, but has a great advantage that the capital investment is very small.

【0004】[0004]

【発明が解決しようとする課題】しかし、2P法では以
下の問題を有する。2P法では、まず、基板もしくはス
タンパー上に紫外線硬化樹脂を塗布した後、基板とスタ
ンパーをはりあわせ、紫外線硬化樹脂が基板の全面に拡
がった時点で、透明な基板側から紫外線を所定時間照射
して、紫外線硬化樹脂を硬化させる。次に、基板を紫外
線硬化樹脂とともにスタンパーから剥離し、凹凸パター
ンを有する基板を得る。この剥離の際、スタンパー上に
紫外線硬化樹脂がわずかではあるが残留する。特に、図
1に示すように紫外線硬化樹脂が拡がる部分の最外周と
最内周の境界部分に残りやすい。そこで、スタンパーと
基板との離型性を良くするために、スタンパーを離型剤
で処理する方法、離型性の良い膜を成膜する方法、ある
いは、離型性の良い紫外線硬化樹脂を用いる方法などが
検討されているが、完全に紫外線硬化樹脂の残留をなく
すことができず、また、持続性、安定性にも問題があ
る。また、紫外線硬化樹脂などの有機物を除去する方法
としては、一般的にウェット法が知られているが、洗浄
工程後に洗浄剤を除去するためのリンス工程、スタンパ
ーを乾燥させるための乾燥工程が必要となりプロセスが
高価となり、処理時間も長くなるという問題点を有して
いる。また、ドライ法として、オゾン、紫外線をスタン
パーに照射する方法は紫外線硬化樹脂などの有機物に対
する除去能力が低く、処理時間が長くなるという問題点
を有している。近年、特開平6ー190269に記載さ
れているように、真空、水系を用いずに、大気圧下で放
電を発生させて、安価、簡便に表面を処理する装置が開
発された。
However, the 2P method has the following problems. In the 2P method, first, an ultraviolet curable resin is applied on a substrate or a stamper, then the substrate and the stamper are attached to each other, and when the ultraviolet curable resin spreads over the entire surface of the substrate, ultraviolet rays are irradiated for a predetermined time from the transparent substrate side. Then, the ultraviolet curable resin is cured. Next, the substrate is separated from the stamper together with the ultraviolet curable resin to obtain a substrate having an uneven pattern. At the time of this peeling, a slight amount of the ultraviolet curable resin remains on the stamper. In particular, as shown in FIG. 1, the ultraviolet curable resin is likely to remain on the boundary between the outermost circumference and the innermost circumference of the spreading portion. Therefore, in order to improve the releasability between the stamper and the substrate, a method of treating the stamper with a release agent, a method of forming a film with good releasability, or an ultraviolet curable resin with good releasability is used. Although a method and the like have been studied, it is not possible to completely eliminate the residue of the ultraviolet curable resin, and there are problems in durability and stability. A wet method is generally known as a method for removing organic substances such as an ultraviolet curable resin, but a rinsing step for removing the cleaning agent after the cleaning step and a drying step for drying the stamper are required. However, the process becomes expensive and the processing time becomes long. Further, as a dry method, a method of irradiating a stamper with ozone or an ultraviolet ray has a problem that it has a low ability to remove an organic substance such as an ultraviolet curable resin and a treatment time becomes long. In recent years, as described in Japanese Patent Laid-Open No. 6-190269, an apparatus has been developed which treats a surface inexpensively and easily by generating an electric discharge under atmospheric pressure without using a vacuum system and a water system.

【0005】そこで本発明の目的とするところは、上述
の問題点を解決し、スタンパー上に残留する紫外線硬化
樹脂などの有機物を従来に比べ短時間で除去し、光学的
情報記録媒体用基板を生産性高く、歩留まりを向上させ
て製造する方法を提供することにある。
Therefore, an object of the present invention is to solve the above-mentioned problems and to remove the organic substances such as the ultraviolet curable resin remaining on the stamper in a shorter time than in the conventional case, and to provide a substrate for an optical information recording medium. It is to provide a method of manufacturing with high productivity and improved yield.

【0006】[0006]

【課題を解決するための手段】本発明の光学的情報記録
媒体用基板の製造方法は、案内溝及び/または情報に対
応した凹凸パターンを有するスタンパーを用い、前記ス
タンパーの凹凸パターンを基板上に紫外線硬化樹脂を用
いて転写形成することにより光学的情報記録媒体用基板
を製造する方法において、大気圧、あるいはその近傍圧
力下において、少なくとも酸素を含むガス雰囲気中にて
放電を生じさせ、その放電により生成された励起、イオ
ンなどの活性種と前記スタンパー表面上の有機物とを化
学反応せしめ、前記有機物を除去する工程を含むことを
特徴とする。
A method of manufacturing a substrate for an optical information recording medium according to the present invention uses a stamper having a guide groove and / or an uneven pattern corresponding to information, and the uneven pattern of the stamper is formed on a substrate. In a method of manufacturing a substrate for an optical information recording medium by transferring and forming using an ultraviolet curable resin, a discharge is generated in a gas atmosphere containing at least oxygen under atmospheric pressure or a pressure in the vicinity thereof, and the discharge The method is characterized by including a step of chemically reacting the active species such as excitation and ions generated by the method and an organic substance on the stamper surface to remove the organic substance.

【0007】そして、前記スタンパーに対して、その近
傍に放電発生用電極を配置し、前記放電発生用電極に高
周波電圧を印加して、前記基板と前記放電発生用電極と
の空間で放電せしめることを特徴とする。
A discharge generating electrode is arranged in the vicinity of the stamper, and a high frequency voltage is applied to the discharge generating electrode to cause discharge in the space between the substrate and the discharge generating electrode. Is characterized by.

【0008】加えて、放電発生用電極と対電極の間に高
周波電圧を印加して放電せしめ、その放電空間に少なく
とも酸素ガスを通過させて励起、イオンなどの活性種を
生成し、前記酸素の活性種を含むガス流を、放電にさら
されない前記スタンパーにガス吹き出し口より吹き付け
ることを特徴とする。
In addition, a high-frequency voltage is applied between the discharge-generating electrode and the counter electrode to cause discharge, and at least oxygen gas is passed through the discharge space to generate excitation and active species such as ions. It is characterized in that a gas flow containing active species is sprayed from the gas outlet to the stamper that is not exposed to the discharge.

【0009】さらには、前記スタンパーを放電にさらし
て行う場合の放電発生用電極、あるいは放電にさらさず
ガス流を吹き付ける場合のガス吹き出し口を前記基板の
大きさ以上とすることを特徴とする。
Further, the discharge generating electrode when the stamper is exposed to a discharge, or the gas blowout port when a gas flow is blown without being exposed to the discharge is made larger than the size of the substrate.

【0010】前記スタンパーを冷却あるいは加熱してな
ることを特徴とする。
It is characterized in that the stamper is cooled or heated.

【0011】本発明の光学的情報記録媒体用基板の製造
装置は、大気圧、あるいはその近傍圧力下において、放
電発生用電極と、前記放電発生用電極に高周波電圧を印
加する手段と、少なくとも酸素を含むガスを前記放電発
生用電極近傍に導入する手段と、放電により生成された
気体、前記スタンパー表面上の有機物との反応ガスなど
のガスを排気する手段とを少なくとも具備することを特
徴とする。
The apparatus for manufacturing a substrate for an optical information recording medium according to the present invention comprises a discharge generating electrode, a means for applying a high frequency voltage to the discharge generating electrode under atmospheric pressure or a pressure in the vicinity thereof, and at least oxygen. At least a means for introducing a gas containing a gas near the discharge generating electrode, and a means for exhausting a gas such as a gas generated by the discharge or a reaction gas with an organic substance on the stamper surface. .

【0012】また、前記スタンパーを冷却あるいは加熱
する手段を少なくとも具備することを特徴とする。
Further, it is characterized in that at least means for cooling or heating the stamper is provided.

【0013】[0013]

【実施例】以下、本発明について図面に基づいて詳細に
説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.

【0014】(実施例1)図2は本発明の実施例1を示
す模式図である。
(Embodiment 1) FIG. 2 is a schematic view showing Embodiment 1 of the present invention.

【0015】放電処理は以下のようにして行なう。大気
圧下で行う処理であり従って雰囲気は空気である。アー
スに設置された金属カバー2内に絶縁物6で電気的に浮
かした放電発生用電極3を取り付ける。前記金属カバー
2内に、ガス供給装置5よりヘリウムガスと酸素を流
し、放電発生用電極3とスタンパー1近傍の雰囲気を前
記ヘリウムガスと酸素で置換する。次に前記放電発生用
電極3に高周波電源4より高周波電力を印加すると、前
記放電発生用電極3と前記スタンパー1との間で放電
し、放電部7を形成する。ここでは、放電を起こすため
のガスとしてヘリウムガスを用いたがアルゴンガスでも
よい。また、放電を起こすための条件としては前記金属
カバー2は必ずしも必要ではない。さらには前記金属カ
バー2は金属である必要はなく、セラミックでもよい。
The discharge process is performed as follows. The process is carried out under atmospheric pressure, so the atmosphere is air. A discharge generating electrode 3 electrically floated by an insulator 6 is mounted in a metal cover 2 installed on the ground. Helium gas and oxygen are caused to flow from the gas supply device 5 into the metal cover 2 to replace the atmosphere near the discharge generating electrode 3 and the stamper 1 with the helium gas and oxygen. Next, when high-frequency power is applied from the high-frequency power source 4 to the discharge-generating electrode 3, the discharge-generating electrode 3 is discharged between the stamper 1 to form the discharge portion 7. Here, helium gas was used as the gas for causing the discharge, but argon gas may be used. Further, the metal cover 2 is not always necessary as a condition for causing discharge. Furthermore, the metal cover 2 does not have to be metal, and may be ceramic.

【0016】まず、ポリカーボネート基板に紫外線硬化
樹脂を所定量塗布する。基板としては、ポリカーボネー
トを用いたが、アモルファスポリオレフィン、アクリ
ル、ポリエステル、エポキシ、ガラス等でも良い。紫外
線硬化樹脂としては、分子中に不飽和結合を有するプレ
ポリマー、オリゴマー、モノマーなどを用いることがで
きる。例えば、不飽和ポリエステル類、エポキシアクリ
レート、ウレタンアクリレート、ポリエーテルアクリレ
ート等のアクリレート類、エポキシメタクリレート、ウ
レタンメタクリレート、ポリエーテルメタクリレート、
ポリエステルメタクリレートなどのメタクリレート類を
一種または二種以上と、分子中に不飽和結合を有する光
重合性モノマー、例えばジシクロペンテニルアクリレー
ト、1,3−ブタンジオールアクリレート、ポリエチレ
ングリコールジアクリレート、ペンタエリスリトールト
リアクリレートなどの官能性モノマーを混合したもの、
さらに重合開始剤としてハロゲン化アセトフェノン類、
ベンゾフェノン、ベンゾイン、ベンゾインエーテル、ミ
ヒラーケトン、ベンジル、ベンジルジメチルケタール、
チオキサンソン類などのラジカル発生化合物が用いら
れ、硬化した状態でスタンパーから剥離しやすく、かつ
記録層とのマッチングの良いものであれば良い。次に基
板と前記スタンパー1をはりあわせ、紫外線硬化樹脂が
基板の全面に拡がった時点で、透明な基板側から紫外線
を所定時間照射して、紫外線硬化樹脂を硬化させる。次
に、基板を紫外線硬化樹脂とともに前記スタンパー1か
ら剥離し、凹凸パターンを有する基板を得る。次に前記
スタンパー1上に残留した紫外線硬化樹脂8を前記放電
処理により除去する。具体的には、前記放電部7ではプ
ラズマによるガスの解離、電離、励起など種々の反応が
存在し、前記スタンパー1の表面の前記残留した紫外線
硬化樹脂8が酸素のイオン、励起種などの活性種と反応
し一酸化炭素、二酸化炭素と水蒸気になり、前記スタン
パー1から離脱しダクト9にて排気される。
First, a predetermined amount of ultraviolet curable resin is applied to a polycarbonate substrate. Although polycarbonate is used as the substrate, amorphous polyolefin, acrylic, polyester, epoxy, glass, or the like may be used. As the ultraviolet curable resin, a prepolymer, an oligomer, a monomer or the like having an unsaturated bond in the molecule can be used. For example, unsaturated polyesters, acrylates such as epoxy acrylate, urethane acrylate, and polyether acrylate, epoxy methacrylate, urethane methacrylate, polyether methacrylate,
One or more methacrylates such as polyester methacrylate and a photopolymerizable monomer having an unsaturated bond in the molecule, for example, dicyclopentenyl acrylate, 1,3-butanediol acrylate, polyethylene glycol diacrylate, pentaerythritol triacrylate. A mixture of functional monomers such as
Furthermore, halogenated acetophenones as a polymerization initiator,
Benzophenone, benzoin, benzoin ether, Michler's ketone, benzyl, benzyl dimethyl ketal,
A radical-generating compound such as thioxanthone is used, and any compound that can be easily peeled off from the stamper in the cured state and has good matching with the recording layer may be used. Next, the substrate and the stamper 1 are attached to each other, and when the ultraviolet curable resin spreads over the entire surface of the substrate, ultraviolet rays are irradiated for a predetermined time from the transparent substrate side to cure the ultraviolet curable resin. Next, the substrate is separated from the stamper 1 together with the ultraviolet curable resin to obtain a substrate having an uneven pattern. Next, the ultraviolet curable resin 8 remaining on the stamper 1 is removed by the discharge treatment. Specifically, in the discharge part 7, various reactions such as gas dissociation, ionization, and excitation due to plasma exist, and the ultraviolet curable resin 8 remaining on the surface of the stamper 1 is activated by oxygen ions, excited species, and the like. It reacts with the seeds to form carbon monoxide, carbon dioxide and water vapor, which is separated from the stamper 1 and exhausted through the duct 9.

【0017】結果として、前記スタンパー1表面の前記
残留した紫外線硬化樹脂8は極めて簡単に除去された。
なお、この放電処理は基板1枚作成する度に行なう必要
はなく、前記スタンパー1表面の汚染の程度に応じて行
なえばよい。
As a result, the UV curable resin 8 remaining on the surface of the stamper 1 was removed very easily.
It should be noted that this discharge treatment need not be performed every time one substrate is prepared, and may be performed according to the degree of contamination on the surface of the stamper 1.

【0018】(比較例1)放電ガスとしてヘリウムガス
のみを用い、それ以外の工程は実施例1と同様にして前
記スタンパー1表面の汚染を除去しようと試みたが、変
化はほとんどなく汚染を除去することができなかった。
COMPARATIVE EXAMPLE 1 Only helium gas was used as the discharge gas, and other steps were carried out in the same manner as in Example 1 to try to remove the contamination on the surface of the stamper 1, but there was almost no change and the contamination was removed. I couldn't.

【0019】(実施例2)図3は本発明の実施例2を示
す摸式図である。
(Embodiment 2) FIG. 3 is a schematic diagram showing Embodiment 2 of the present invention.

【0020】放電処理は以下のようにして行なう。前記
実施例1の前記金属カバー2を前記放電発生用電極3の
先端近傍まで延ばしこれを放電発生のための対電極10
とする。前記同様に前記金属カバー2内に、前記ガス供
給装置5よりヘリウムガスと酸素を流し、内部をヘリウ
ムガスと酸素で置換し、前記放電発生用電極3に前記高
周波電源4より高周波電圧を印加すると、前記放電発生
用電極3の先端部と前記対電極10との間で放電する。
前記放電部7では、前記酸素ガスの一部はイオン、励起
種などの活性種となり、前記金属カバー2の先端部であ
る前記対電極10の形状で任意に決定されるガス吹き出
し口11より、前記ヘリウムガスとともに反応性ガス流
12となり吹き出す。前記ガス吹き出し口11から3〜
5mm離して前記スタンパー1を設置する。
The discharge process is performed as follows. The metal cover 2 of the first embodiment is extended to the vicinity of the tip of the discharge generating electrode 3, and the counter electrode 10 for generating discharge is provided.
And Similarly to the above, when helium gas and oxygen are caused to flow from the gas supply device 5 into the metal cover 2 to replace the inside with helium gas and oxygen, and a high frequency voltage is applied from the high frequency power source 4 to the discharge generating electrode 3. A discharge is generated between the tip of the discharge generating electrode 3 and the counter electrode 10.
In the discharge part 7, a part of the oxygen gas becomes active species such as ions and excited species, and from the gas outlet 11 arbitrarily determined by the shape of the counter electrode 10 which is the tip of the metal cover 2, The reactive gas stream 12 is blown out together with the helium gas. From the gas outlet 11 to 3 to
Install the stamper 1 at a distance of 5 mm.

【0021】まず、ポリカーボネート基板に紫外線硬化
樹脂を所定量塗布する。基板としては、ポリカーボネー
トを用いたが、アモルファスポリオレフィン、アクリ
ル、ポリエステル、エポキシ、ガラス等でも良い。次に
基板と前記スタンパー1をはりあわせ、紫外線硬化樹脂
が基板の全面に拡がった時点で、透明な基板側から紫外
線を所定時間照射して、紫外線硬化樹脂を硬化させる。
次に、基板を紫外線硬化樹脂とともに前記スタンパー1
から剥離し、凹凸パターンを有する基板を得る。次に前
記スタンパー1上に残留した紫外線硬化樹脂8を前記放
電処理により除去する。具体的には、前記ガス吹き出し
口11から吹き出す前記反応性ガス流12中の酸素のイ
オン、励起種などの活性種と前記スタンパー1の表面の
前記残留した紫外線硬化樹脂8が反応し一酸化炭素、二
酸化炭素と水蒸気になり、前記スタンパー1から離脱し
ダクト9にて排気される。
First, a predetermined amount of ultraviolet curable resin is applied to a polycarbonate substrate. Although polycarbonate is used as the substrate, amorphous polyolefin, acrylic, polyester, epoxy, glass, or the like may be used. Next, the substrate and the stamper 1 are attached to each other, and when the ultraviolet curable resin spreads over the entire surface of the substrate, ultraviolet rays are irradiated for a predetermined time from the transparent substrate side to cure the ultraviolet curable resin.
Next, the substrate and the stamper 1 together with the ultraviolet curable resin
Then, it is peeled off to obtain a substrate having an uneven pattern. Next, the ultraviolet curable resin 8 remaining on the stamper 1 is removed by the discharge treatment. Specifically, active species such as oxygen ions and excited species in the reactive gas stream 12 blown out from the gas outlet 11 and the UV curable resin 8 remaining on the surface of the stamper 1 react to react with carbon monoxide. Becomes carbon dioxide and water vapor, and is separated from the stamper 1 and exhausted through the duct 9.

【0022】結果として、前記スタンパー1表面の前記
残留した紫外線硬化樹脂8は極めて簡単に除去された。
なお、この放電処理は基板1枚作成する度に行なう必要
はなく、前記スタンパー1表面の汚染の程度に応じて行
なえばよい。
As a result, the UV curable resin 8 remaining on the surface of the stamper 1 was removed very easily.
It should be noted that this discharge treatment need not be performed every time one substrate is prepared, and may be performed according to the degree of contamination on the surface of the stamper 1.

【0023】以上実施例1、2において、前記スタンパ
ー1を放電にさらして行う場合の前記放電発生用電極
3、あるいは放電にさらさずガス流を吹き付ける場合の
前記ガス吹き出し口9の大きさは、大きいほど良く、前
記基板より大きければ、一括で処理が可能となり、短時
間で処理できるとともに前記スタンパー1を固定したま
ま処理できるので装置への負担を減らすこともできる。
In Embodiments 1 and 2, the size of the discharge generating electrode 3 when the stamper 1 is exposed to a discharge or the size of the gas blowout port 9 when a gas flow is blown without being exposed to the discharge is The larger the size, the better. If the size is larger than the substrate, the processing can be performed in a batch, and the processing can be performed in a short time, and the processing can be performed with the stamper 1 fixed, so that the load on the apparatus can be reduced.

【0024】(実施例3)図4は本発明の実施例3を示
す摸式図である。
(Embodiment 3) FIG. 4 is a schematic diagram showing Embodiment 3 of the present invention.

【0025】前記スタンパー1のホルダとして加熱、冷
却装置13を用いた。前記スタンパー1は放電、あるい
は前記放電発生用電極3の輻射熱により条件によっては
50度〜100度に加熱される。前記スタンパー1がニ
ッケル、アルミニウム、プラスチック等のように熱によ
り反り易いものの場合、前記スタンパー1を冷却しなが
ら処理することができる。
A heating / cooling device 13 was used as a holder for the stamper 1. The stamper 1 is heated to 50 to 100 degrees depending on the conditions by electric discharge or radiant heat of the electric discharge generating electrode 3. When the stamper 1 is easily warped by heat, such as nickel, aluminum, or plastic, the stamper 1 can be processed while being cooled.

【0026】また、前記スタンパー1がガラス、シリコ
ン等のように熱に対して安定しているものの場合、逆に
加熱を行うべきである。化学反応を利用した処理である
ので、熱は反応を促進する。本発明者の実験では、15
0度位で室温時に比べ、処理スピードは3倍以上となっ
た。
If the stamper 1 is stable against heat such as glass or silicon, it should be heated in reverse. Heat accelerates the reaction because it is a process using a chemical reaction. In the experiment by the present inventor, 15
At 0 degree, the processing speed was more than 3 times faster than at room temperature.

【0027】[0027]

【発明の効果】以上の説明からも明らかなように、本発
明によれば大気圧で放電させ酸素のイオン、励起種等の
活性種を生成し、それらとスタンパー表面上の有機物と
を化学反応させて、前記有機物を除去するという方法で
あるため、したがって、水系を用いない、かつ、高速の
ドライ処理が可能となるばかりか、簡単で、かつ、装置
コストが低くてすむという効果を有する。
As is apparent from the above description, according to the present invention, active species such as oxygen ions and excited species are generated by discharging at atmospheric pressure, and chemically react with them on the stamper surface. Since this is a method of removing the organic matter, therefore, not only an aqueous system is not required and a high-speed dry treatment is possible, but it is also simple and the apparatus cost is low.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の汚染したスタンパーを示す説明図。FIG. 1 is an explanatory view showing a contaminated stamper of the present invention.

【図2】本発明の実施例1を示す摸式図。FIG. 2 is a schematic diagram showing Embodiment 1 of the present invention.

【図3】本発明の実施例2を示す摸式図。FIG. 3 is a schematic diagram showing Embodiment 2 of the present invention.

【図4】本発明の実施例3を示す摸式図。FIG. 4 is a schematic diagram showing Embodiment 3 of the present invention.

【符号の説明】[Explanation of symbols]

1 スタンパー 2 金属カバー 3 放電発生用電極 4 高周波電源 5 ガス供給装置 6 絶縁物 7 放電部 8 残留した紫外線硬化樹脂 9 ダクト 10 対電極 11 ガス吹き出し口 12 反応性ガス流 13 加熱、冷却装置 1 Stamper 2 Metal Cover 3 Discharge Generation Electrode 4 High Frequency Power Supply 5 Gas Supply Device 6 Insulator 7 Discharge Section 8 Remaining UV Curing Resin 9 Duct 10 Counter Electrode 11 Gas Blowout 12 Reactive Gas Flow 13 Heating / Cooling Device

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 案内溝及び/または情報に対応した凹凸
パターンを有するスタンパーを用い、前記スタンパーの
凹凸パターンを基板上に紫外線硬化樹脂を用いて転写形
成することにより光学的情報記録媒体用基板を製造する
方法において、大気圧、あるいはその近傍圧力下におい
て、少なくとも酸素を含むガス雰囲気中にて放電を生じ
させ、その放電により生成された励起、イオンなどの活
性種と前記スタンパー表面上の有機物とを化学反応せし
め、前記有機物を除去する工程を含むことを特徴とする
光学的情報記録媒体用基板の製造方法。
1. A substrate for an optical information recording medium is formed by using a stamper having a guide groove and / or a concave / convex pattern corresponding to information, and transferring the concave / convex pattern of the stamper onto the substrate by using an ultraviolet curable resin. In the method for producing, under atmospheric pressure, or under pressure in the vicinity thereof, a discharge is generated in a gas atmosphere containing at least oxygen, and excitation generated by the discharge, active species such as ions and an organic substance on the stamper surface. A method for producing a substrate for an optical information recording medium, which comprises a step of chemically reacting with the organic substance to remove the organic substance.
【請求項2】 前記スタンパーに対して、その近傍に放
電発生用電極を配置し、前記放電発生用電極に高周波電
圧を印加して、前記基板と前記放電発生用電極との空間
で放電せしめることを特徴とする請求項1記載の光学的
情報記録媒体用基板の製造方法。
2. A discharge generating electrode is disposed in the vicinity of the stamper, and a high frequency voltage is applied to the discharge generating electrode to cause discharge in the space between the substrate and the discharge generating electrode. The method for manufacturing a substrate for an optical information recording medium according to claim 1.
【請求項3】 放電発生用電極と対電極の間に高周波電
圧を印加して放電せしめ、その放電空間に少なくとも酸
素ガスを通過させて励起、イオンなどの活性種を生成
し、前記酸素の活性種を含むガス流を、放電にさらされ
ない前記スタンパーにガス吹き出し口より吹き付けるこ
とを特徴とする請求項1記載の光学的情報記録媒体用基
板の製造方法。
3. A high-frequency voltage is applied between the discharge-generating electrode and the counter electrode to cause discharge, and at least oxygen gas is passed through the discharge space to generate excitation, active species such as ions, and the oxygen activity. 2. The method for manufacturing a substrate for an optical information recording medium according to claim 1, wherein a gas flow containing seeds is blown onto the stamper that is not exposed to the discharge from a gas outlet.
【請求項4】 前記スタンパーを放電にさらして行う場
合の放電発生用電極、あるいは放電にさらさずガス流を
吹き付ける場合のガス吹き出し口を基板の大きさ以上と
することを特徴とする請求項1記載の光学的情報記録媒
体用基板の製造方法。
4. The electrode for discharge generation when the stamper is exposed to a discharge, or the gas outlet when a gas flow is blown without being exposed to the discharge, is larger than the size of the substrate. A method for manufacturing a substrate for an optical information recording medium as described above.
【請求項5】 前記スタンパーを冷却あるいは加熱して
なることを特徴とする請求項2、請求項3記載の光学的
情報記録媒体用基板の製造方法。
5. The method for manufacturing a substrate for an optical information recording medium according to claim 2, wherein the stamper is cooled or heated.
【請求項6】 大気圧、あるいはその近傍圧力下におい
て、放電発生用電極と、前記放電発生用電極に高周波電
圧を印加する手段と、少なくとも酸素を含むガスを前記
放電発生用電極近傍に導入する手段と、放電により生成
された気体、前記スタンパー表面上の有機物との反応ガ
スなどのガスを排気する手段とを少なくとも具備するこ
とを特徴とする光学的情報記録媒体用基板の製造装置。
6. The discharge generating electrode, a means for applying a high frequency voltage to the discharge generating electrode, and a gas containing at least oxygen are introduced near the discharge generating electrode under atmospheric pressure or a pressure in the vicinity thereof. An apparatus for manufacturing a substrate for an optical information recording medium, comprising at least a means and a means for exhausting a gas such as a gas generated by electric discharge and a reaction gas with an organic substance on the stamper surface.
【請求項7】 前記スタンパーを冷却あるいは加熱する
手段を少なくとも具備することを特徴とする請求項6記
載の光学的情報記録媒体用基板の製造装置。
7. The apparatus for manufacturing a substrate for an optical information recording medium according to claim 6, further comprising at least a means for cooling or heating the stamper.
JP21508895A 1995-08-23 1995-08-23 Production of substrate for optical information recording medium and device therefor Pending JPH0963132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21508895A JPH0963132A (en) 1995-08-23 1995-08-23 Production of substrate for optical information recording medium and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21508895A JPH0963132A (en) 1995-08-23 1995-08-23 Production of substrate for optical information recording medium and device therefor

Publications (1)

Publication Number Publication Date
JPH0963132A true JPH0963132A (en) 1997-03-07

Family

ID=16666559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21508895A Pending JPH0963132A (en) 1995-08-23 1995-08-23 Production of substrate for optical information recording medium and device therefor

Country Status (1)

Country Link
JP (1) JPH0963132A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100476136B1 (en) * 2002-12-02 2005-03-10 주식회사 셈테크놀러지 Apparatus for treating the surface of a substrate with atmospheric pressure plasma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100476136B1 (en) * 2002-12-02 2005-03-10 주식회사 셈테크놀러지 Apparatus for treating the surface of a substrate with atmospheric pressure plasma

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