JPH0963133A - Production of substrate for optical information recording medium and device therefor - Google Patents
Production of substrate for optical information recording medium and device thereforInfo
- Publication number
- JPH0963133A JPH0963133A JP21508995A JP21508995A JPH0963133A JP H0963133 A JPH0963133 A JP H0963133A JP 21508995 A JP21508995 A JP 21508995A JP 21508995 A JP21508995 A JP 21508995A JP H0963133 A JPH0963133 A JP H0963133A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- discharge
- recording medium
- information recording
- optical information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、レーザなどによる光学
的書き込み、読み出しを行う光学的情報記録媒体用基板
に適した製造方法、及びその製造装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing method suitable for a substrate for an optical information recording medium for performing optical writing and reading by a laser and the like and a manufacturing apparatus therefor.
【0002】[0002]
【従来の技術】従来、光ディスクあるいは光カードなど
の光学的情報記録媒体は、基体の上に設けた薄い記録層
に光学的に検出可能な微小なピットをトラック上に形成
することにより、情報の高密度な記録をすることができ
る。このような光学的情報記録媒体においては、情報を
記録及び再生する際にトラックに沿ってレーザ光を走査
する必要があり、そのため一般にトラッキング用の案内
溝の付いた基板が用いられている。2. Description of the Related Art Conventionally, in an optical information recording medium such as an optical disk or an optical card, information is recorded by forming minute optically detectable pits on a track in a thin recording layer provided on a substrate. High-density recording can be performed. In such an optical information recording medium, it is necessary to scan a laser beam along a track when recording and reproducing information, and therefore, a substrate having a guide groove for tracking is generally used.
【0003】このような案内溝、案内溝の付いた基板の
作製法としては、軟化したプラスチック材料をスタンパ
ーにてプレスした後に固化させる圧縮成形法、スタンパ
ーを配設した金型内に溶融したプラスチック材料を射出
して固化させる射出成形法や紫外線硬化樹脂を用いてス
タンパーから案内溝を転写する2P法などが知られてい
るが、案内溝の転写性、基板の耐溶剤性及び基板の光学
的歪みを少なくできるという点では2P法によるものが
最も優れている。また、2P法は他の方法に比べ、基板
1枚当たりの製造時間が長く、大量生産に向かないとい
う問題があるが、設備投資が非常に少なくてすむという
大きな利点がある。The guide groove and the substrate having the guide groove are manufactured by a compression molding method in which a softened plastic material is pressed by a stamper and then solidified, and a plastic material melted in a die in which the stamper is arranged. An injection molding method of injecting and solidifying a material and a 2P method of transferring a guide groove from a stamper using an ultraviolet curable resin are known, but the transfer property of the guide groove, the solvent resistance of the substrate and the optical property of the substrate are known. The 2P method is the most excellent in that distortion can be reduced. Further, the 2P method has a problem that the manufacturing time per substrate is long and is not suitable for mass production as compared with other methods, but has a great advantage that the capital investment is very small.
【0004】[0004]
【発明が解決しようとする課題】一方、2P法に使用さ
れる紫外線硬化樹脂に要求される性能としては、基板と
の密着性が良いこと、スタンパーからの離形性が良いこ
と、記録層を劣化させないことなどが挙げられるが、硬
化性に優れ、かつ記録層を劣化させない樹脂は基板との
密着性が比較的良くないという傾向がある。そこで、特
開平1ー302554に記載されているように、プライ
マーを用いて樹脂の密着性を良くする方法が行われてい
るが、工程数の増加、歩留まりの低下、プライマーが原
因となる記録層の劣化などの問題点を有していた。さら
に、複屈折性やコスト性に優れるアモルファスポリオレ
フィン基板は、基板の表面エネルギーが小さいために紫
外線硬化樹脂のはじきが発生し、紫外線硬化樹脂との密
着性も悪いという問題点を有していた。On the other hand, the performance required for the UV curable resin used in the 2P method is that it has good adhesion to the substrate, good releasability from the stamper, and a recording layer. Although it does not deteriorate, a resin that has excellent curability and does not deteriorate the recording layer tends to have relatively poor adhesion to the substrate. Therefore, as described in JP-A-1-302554, a method of improving the adhesiveness of the resin by using a primer is used, but the number of steps is increased, the yield is decreased, and the recording layer caused by the primer is caused. There was a problem such as deterioration of. Further, the amorphous polyolefin substrate excellent in birefringence and cost has the problem that the ultraviolet curable resin is repelled due to the small surface energy of the substrate and the adhesiveness with the ultraviolet curable resin is poor.
【0005】そこで本発明の目的とするところは、上述
の問題点を解決し、基板と紫外線硬化樹脂との密着性を
良好にした光学的情報記録媒体用基板を、プライマーを
用いる場合に比べ、工程数を減らし、生産性高く、歩留
まりを向上させて製造する方法を提供することにある。Therefore, an object of the present invention is to solve the above-mentioned problems, and to compare the substrate for an optical information recording medium in which the adhesion between the substrate and the ultraviolet curing resin is good, to the case where a primer is used, It is an object of the present invention to provide a method for manufacturing by reducing the number of steps, improving productivity, and improving yield.
【0006】さらに、本発明は、複屈折、コスト的に有
利なアモルファスポリオレフィン基板を使用し、前記基
板と紫外線硬化樹脂との密着性が良好な光学的情報記録
媒体用基板を生産性高く製造することを目的とする。Further, according to the present invention, an amorphous polyolefin substrate, which is birefringent and cost effective, is used, and a substrate for an optical information recording medium having good adhesion between the substrate and an ultraviolet curable resin is manufactured with high productivity. The purpose is to
【0007】[0007]
【課題を解決するための手段】本発明の光学的情報記録
媒体用基板の製造方法は、案内溝及び/または情報に対
応した凹凸パターンを有するスタンパーを用い、前記ス
タンパーの凹凸パターンを基板上に紫外線硬化樹脂を用
いて転写形成することにより光学的情報記録媒体用基板
を製造する方法において、大気圧、あるいはその近傍圧
力下において、少なくとも酸素を含むガス雰囲気中にて
放電を生じさせ、その放電により生成された励起、イオ
ンなどの活性種により、前記基板を処理する工程を含む
ことを特徴とする。A method of manufacturing a substrate for an optical information recording medium according to the present invention uses a stamper having a guide groove and / or an uneven pattern corresponding to information, and the uneven pattern of the stamper is formed on a substrate. In a method of manufacturing a substrate for an optical information recording medium by transferring and forming using an ultraviolet curable resin, a discharge is generated in a gas atmosphere containing at least oxygen under atmospheric pressure or a pressure in the vicinity thereof, and the discharge And a step of treating the substrate with an active species such as excitation and ions generated by.
【0008】また、光学的情報記録媒体用基板がアモル
ファスポリオレフィンであることを特徴とする。Further, the substrate for the optical information recording medium is characterized by being an amorphous polyolefin.
【0009】そして、前記基板に対して、その近傍に放
電発生用電極を配置し、前記放電発生用電極に高周波電
圧を印加して、前記基板と前記放電発生用電極との空間
で放電せしめることを特徴とする。A discharge generating electrode is disposed in the vicinity of the substrate, and a high frequency voltage is applied to the discharge generating electrode to cause discharge in the space between the substrate and the discharge generating electrode. Is characterized by.
【0010】加えて、放電発生用電極と対電極の間に高
周波電圧を印加して放電せしめ、その放電空間に少なく
とも酸素ガスを通過させて励起、イオンなどの活性種を
生成し、前記酸素の活性種を含むガス流を、放電にさら
されない前記基板にガス吹き出し口より吹き付けること
を特徴とする。In addition, a high-frequency voltage is applied between the discharge generating electrode and the counter electrode to cause discharge, and at least oxygen gas is passed through the discharge space to generate excitation and active species such as ions to generate oxygen. It is characterized in that a gas flow containing active species is sprayed from the gas outlet to the substrate not exposed to the discharge.
【0011】さらには、前記基板を放電にさらして行う
場合の放電発生用電極、あるいは放電にさらさずガス流
を吹き付ける場合のガス吹き出し口を前記基板の大きさ
以上とすることを特徴とする。Further, the discharge generating electrode for exposing the substrate to a discharge or the gas outlet for blowing a gas flow without exposing to the discharge has a size larger than that of the substrate.
【0012】前記基板を冷却あるいは加熱してなること
を特徴とする。It is characterized in that the substrate is cooled or heated.
【0013】本発明の光学的情報記録媒体用基板の製造
装置は、大気圧、あるいはその近傍圧力下において、放
電発生用電極と、前記放電発生用電極に高周波電圧を印
加する手段と、少なくとも酸素を含むガスを前記放電発
生用電極近傍に導入する手段とを少なくとも具備するこ
とを特徴とする。The apparatus for producing a substrate for an optical information recording medium according to the present invention comprises a discharge generating electrode, a means for applying a high frequency voltage to the discharge generating electrode under atmospheric pressure or a pressure in the vicinity thereof, and at least oxygen. And a means for introducing a gas containing the gas into the vicinity of the discharge generating electrode.
【0014】また、前記基板を冷却あるいは加熱する手
段を少なくとも具備することを特徴とする。Further, it is characterized in that at least means for cooling or heating the substrate is provided.
【0015】[0015]
【実施例】以下、本発明について図面に基づいて詳細に
説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.
【0016】(実施例1)図1は本発明の実施例1を示
す模式図である。(Embodiment 1) FIG. 1 is a schematic view showing Embodiment 1 of the present invention.
【0017】大気圧下で行う処理であり従って雰囲気は
空気である。アースに設置された金属カバー2内に絶縁
物6で電気的に浮かした放電発生用電極3を取り付け
る。前記金属カバー2内に、ガス供給装置5よりヘリウ
ムガスと酸素を流し、放電発生用電極3とアモルファス
ポリオレフィン基板1近傍の雰囲気を前記ヘリウムガス
と酸素で置換する。次に前記放電発生用電極3に高周波
電源4より高周波電力を印加すると、前記放電発生用電
極3と前記基板1との間で放電し、放電部7を形成す
る。前記放電部7ではプラズマによるガスの解離、電
離、励起など種々の反応が存在し、前記基板表面の分子
結合の切断や酸化がおこり、紫外線硬化樹脂の塗れ性及
び密着性が向上する。ここでは、放電を起こすためのガ
スとしてヘリウムガスを用いたがアルゴンガスでもよ
い。また、放電を起こすための条件としては前記金属カ
バー2は必ずしも必要ではない。さらには前記金属カバ
ー2は金属である必要はなく、セラミックでもよい。前
記基板1としては、アモルファスポリオレフィンを用い
たが、ポリカーボネート、アクリル、ポリエステル、エ
ポキシ、ガラス等でも良い。The process is carried out under atmospheric pressure and therefore the atmosphere is air. A discharge generating electrode 3 electrically floated by an insulator 6 is mounted in a metal cover 2 installed on the ground. Helium gas and oxygen are caused to flow from the gas supply device 5 into the metal cover 2, and the atmosphere near the discharge generating electrode 3 and the amorphous polyolefin substrate 1 is replaced with the helium gas and oxygen. Next, when high-frequency power is applied from the high-frequency power source 4 to the discharge-generating electrode 3, the discharge-generating electrode 3 is discharged between the substrate 1 and the discharge portion 7 is formed. In the discharge part 7, various reactions such as gas dissociation, ionization, and excitation due to plasma exist, and molecular bonds on the surface of the substrate are broken and oxidized, so that the wettability and the adhesiveness of the ultraviolet curable resin are improved. Here, helium gas was used as the gas for causing the discharge, but argon gas may be used. Further, the metal cover 2 is not always necessary as a condition for causing discharge. Furthermore, the metal cover 2 does not have to be metal, and may be ceramic. Although amorphous polyolefin is used as the substrate 1, polycarbonate, acrylic, polyester, epoxy, glass or the like may be used.
【0018】前記基板1の全面に上記処理を施した後、
紫外線硬化樹脂を所定量塗布する。紫外線硬化樹脂とし
ては、分子中に不飽和結合を有するプレポリマー、オリ
ゴマー、モノマーなどを用いることができる。例えば、
不飽和ポリエステル類、エポキシアクリレート、ウレタ
ンアクリレート、ポリエーテルアクリレート等のアクリ
レート類、エポキシメタクリレート、ウレタンメタクリ
レート、ポリエーテルメタクリレート、ポリエステルメ
タクリレートなどのメタクリレート類を一種または二種
以上と、分子中に不飽和結合を有する光重合性モノマ
ー、例えばジシクロペンテニルアクリレート、1,3−
ブタンジオールアクリレート、ポリエチレングリコール
ジアクリレート、ペンタエリスリトールトリアクリレー
トなどの官能性モノマーを混合したもの、さらに重合開
始剤としてハロゲン化アセトフェノン類、ベンゾフェノ
ン、ベンゾイン、ベンゾインエーテル、ミヒラーケト
ン、ベンジル、ベンジルジメチルケタール、チオキサン
ソン類などのラジカル発生化合物が用いられ、硬化した
状態でスタンパーから剥離しやすく、かつ記録層とのマ
ッチングの良いものであれば良い。次に基板とスタンパ
ーをはりあわせ、紫外線硬化樹脂が基板の全面に拡がっ
た時点で、透明な基板側から紫外線を所定時間照射し
て、紫外線硬化樹脂を硬化させる。次に、基板を紫外線
硬化樹脂とともにスタンパーから剥離し、凹凸パターン
を有する基板を得る。このようにして得られた基板には
気泡などの欠陥は認められず、また基板と紫外線硬化樹
脂との密着性も良好であり、碁盤目テープ剥離試験を行
ったところ樹脂の剥離は起こらなかった。After the above treatment is applied to the entire surface of the substrate 1,
A predetermined amount of ultraviolet curable resin is applied. As the ultraviolet curable resin, a prepolymer, an oligomer, a monomer or the like having an unsaturated bond in the molecule can be used. For example,
Unsaturated polyesters, acrylates such as epoxy acrylate, urethane acrylate, and polyether acrylate, and one or more methacrylates such as epoxy methacrylate, urethane methacrylate, polyether methacrylate, and polyester methacrylate, and an unsaturated bond in the molecule. A photopolymerizable monomer having, for example, dicyclopentenyl acrylate, 1,3-
A mixture of functional monomers such as butanediol acrylate, polyethylene glycol diacrylate, pentaerythritol triacrylate, and halogenated acetophenones, benzophenone, benzoin, benzoin ether, Michler's ketone, benzyl, benzyl dimethyl ketal, thioxanthones as polymerization initiators. A radical-generating compound such as is used as long as it can be easily peeled from the stamper in a cured state and has a good matching with the recording layer. Next, the substrate and the stamper are attached to each other, and when the ultraviolet curable resin spreads over the entire surface of the substrate, ultraviolet rays are irradiated for a predetermined time from the transparent substrate side to cure the ultraviolet curable resin. Next, the substrate is separated from the stamper together with the ultraviolet curable resin to obtain a substrate having an uneven pattern. No defects such as bubbles were observed in the substrate thus obtained, and the adhesion between the substrate and the UV curable resin was also good. No resin peeling occurred in the cross-cut tape peeling test. .
【0019】(比較例1)アモルファスポリオレフィン
基板に大気圧下でのプラズマ処理の工程を除き、それ以
外の工程は実施例1と同様にして凹凸パターンを有する
基板を得た。しかし、スタンパー上に紫外線硬化樹脂の
転写残りが発生し、スタンパーの洗浄が必要になった。
さらに、基板上に硬化転写した紫外線硬化樹脂も碁盤目
テープ剥離試験により剥離した。Comparative Example 1 A substrate having a concavo-convex pattern was obtained in the same manner as in Example 1 except for the step of plasma treatment on the amorphous polyolefin substrate under atmospheric pressure. However, the transfer residue of the ultraviolet curable resin was generated on the stamper, and it became necessary to clean the stamper.
Further, the ultraviolet curable resin which was cured and transferred onto the substrate was also peeled off by a cross-cut tape peeling test.
【0020】(比較例2)ポリカーボネート基板に大気
圧下でのプラズマ処理の工程を除き、それ以外の工程は
実施例1と同様にして凹凸パターンを有する基板を得
た。しかし、基板上に硬化した紫外線硬化樹脂は碁盤目
テープ剥離試験により50%が剥離した。Comparative Example 2 A substrate having a concavo-convex pattern was obtained in the same manner as in Example 1 except for the step of plasma treatment on a polycarbonate substrate under atmospheric pressure. However, 50% of the UV curable resin cured on the substrate was peeled off by the cross-cut tape peeling test.
【0021】(比較例3)放電ガスとしてヘリウムガス
のみを用い、それ以外の工程は実施例1と同様にして凹
凸パターンを有する基板を得た。しかし、基板上に硬化
した紫外線硬化樹脂は碁盤目テープ剥離試験により80
%が剥離した。Comparative Example 3 A substrate having a concavo-convex pattern was obtained in the same manner as in Example 1 except that only helium gas was used as the discharge gas. However, the UV curable resin cured on the substrate is 80
% Peeled off.
【0022】(実施例2)図2は本発明の実施例2を示
す摸式図である。(Embodiment 2) FIG. 2 is a schematic diagram showing Embodiment 2 of the present invention.
【0023】前記実施例1の前記金属カバー2を前記放
電発生用電極3の先端近傍まで延ばしこれを放電発生の
ための対電極8とする。前記同様に前記金属カバー2内
に、前記ガス供給装置5よりヘリウムガスと酸素を流
し、内部をヘリウムガスと酸素で置換し、前記放電発生
用電極3に前記高周波電源4より高周波電圧を印加する
と、前記放電発生用電極3の先端部と前記対電極8との
間で放電する。前記放電部7では、前記酸素ガスの一部
はイオン、励起種などの活性種となり、前記金属カバー
2の先端部である前記対電極8の形状で任意に決定され
るガス吹き出し口9より、ヘリウムガスとともに反応性
ガス流10となり吹き出す。前記ガス吹き出し口9から
3〜5mm離して前記基板1を設置する。前記ガス吹き出
し口9から吹き出す前記反応性ガス流10中の酸素のイ
オン、励起種などの活性種と前記基板1の表面とが反応
し、表面の分子結合の切断や酸化がおこり、紫外線硬化
樹脂の塗れ性及び密着性が向上する。The metal cover 2 of the first embodiment is extended to the vicinity of the tip of the discharge generating electrode 3 and is used as a counter electrode 8 for generating discharge. Similarly to the above, when helium gas and oxygen are caused to flow from the gas supply device 5 into the metal cover 2 to replace the inside with helium gas and oxygen, and a high frequency voltage is applied from the high frequency power source 4 to the discharge generating electrode 3. A discharge is generated between the tip of the discharge generating electrode 3 and the counter electrode 8. In the discharge part 7, a part of the oxygen gas becomes active species such as ions and excited species, and from the gas outlet 9 arbitrarily determined by the shape of the counter electrode 8 which is the tip of the metal cover 2, The reactive gas stream 10 is blown out together with the helium gas. The substrate 1 is installed at a distance of 3 to 5 mm from the gas outlet 9. The surface of the substrate 1 reacts with active species such as oxygen ions and excited species in the reactive gas stream 10 blown out from the gas outlet 9 to cut the surface molecular bonds and oxidize, and thus the ultraviolet curable resin. The wettability and adhesiveness of are improved.
【0024】前記基板1の全面に上記処理を施した後、
紫外線硬化樹脂を所定量塗布する。次に基板とスタンパ
ーをはりあわせ、紫外線硬化樹脂が基板の全面に拡がっ
た時点で、透明な基板側から紫外線を所定時間照射し
て、紫外線硬化樹脂を硬化させる。次に、基板を紫外線
硬化樹脂とともにスタンパーから剥離し、凹凸パターン
を有する基板を得る。このようにして得られた基板には
気泡などの欠陥は認められず、また基板と紫外線硬化樹
脂との密着性も良好であり、碁盤目テープ剥離試験を行
ったところ樹脂の剥離は起こらなかった。After the above processing is applied to the entire surface of the substrate 1,
A predetermined amount of ultraviolet curable resin is applied. Next, the substrate and the stamper are attached to each other, and when the ultraviolet curable resin spreads over the entire surface of the substrate, ultraviolet rays are irradiated for a predetermined time from the transparent substrate side to cure the ultraviolet curable resin. Next, the substrate is separated from the stamper together with the ultraviolet curable resin to obtain a substrate having an uneven pattern. No defects such as bubbles were observed in the substrate thus obtained, and the adhesion between the substrate and the UV curable resin was also good. No resin peeling occurred in the cross-cut tape peeling test. .
【0025】以上実施例1、2において、前記基板1を
放電にさらして行う場合の前記放電発生用電極3、ある
いは放電にさらさずガス流を吹き付ける場合の前記ガス
吹き出し口9の大きさは、大きいほど良く、前記基板1
より大きければ、一括で処理が可能となり、短時間で処
理できるとともに前記基板1を固定したまま処理できる
ので装置への負担を減らすこともできる。In Embodiments 1 and 2, the size of the discharge generating electrode 3 when the substrate 1 is exposed to a discharge or the size of the gas blowout port 9 when a gas flow is blown without being exposed to the discharge is The larger the better, the substrate 1
If it is larger, the processing can be performed in a batch, and the processing can be performed in a short time and the processing can be performed while the substrate 1 is fixed, so that the load on the apparatus can be reduced.
【0026】(実施例3)図3は本発明の実施例3を示
す摸式図である。(Embodiment 3) FIG. 3 is a schematic diagram showing Embodiment 3 of the present invention.
【0027】前記基板1のホルダとして加熱、冷却装置
11を用いた。前記基板1は放電、あるいは前記放電発
生用電極3の輻射熱により条件によっては50度〜10
0度に加熱される。前記基板1がアモルファスポリオレ
フィン、ポリカーボネート、アクリル等のように熱によ
り反り易いものの場合、前記基板1を冷却しながら処理
することができる。アモルファスポリオレフィン基板に
冷却無しの条件と冷却有りの条件とで、それぞれ実施例
1と同様にして凹凸パターンを有する基板を得た。それ
ぞれの基板の処理後の反り角を図4に示す。冷却するこ
とにより、反り角の低減が可能である。A heating / cooling device 11 was used as a holder for the substrate 1. Depending on the conditions, the substrate 1 is discharged or radiant heat of the discharge generating electrode 3 may be 50 to 10 degrees Celsius.
It is heated to 0 degrees. When the substrate 1 is one that is easily warped by heat, such as amorphous polyolefin, polycarbonate, or acrylic, the substrate 1 can be processed while being cooled. A substrate having a concavo-convex pattern was obtained in the same manner as in Example 1 with and without cooling the amorphous polyolefin substrate. The warp angle of each substrate after processing is shown in FIG. The warp angle can be reduced by cooling.
【0028】また、前記基板1がガラス等のように熱に
対して安定しているものの場合、逆に加熱を行うべきで
ある。化学反応を利用した処理であるので、熱は反応を
促進する。本発明者の実験では、150度位で室温時に
比べ、処理スピードは3倍以上となった。When the substrate 1 is stable against heat, such as glass, it should be heated conversely. Heat accelerates the reaction because it is a process using a chemical reaction. In the experiment conducted by the present inventor, the processing speed was about three times or more at about 150 degrees as compared with the room temperature.
【0029】[0029]
【発明の効果】以上の説明からも明らかなように、本発
明によれば大気圧で放電させ酸素のイオン、励起種等の
活性種を生成し、それらと基板との反応を生じせしめ
て、基板と紫外線硬化樹脂との密着性を向上させるとい
う方法であるため、したがって、水系を用いない、か
つ、高速のドライ処理が可能となるばかりか、簡単で、
かつ、装置コストが低くてすむという効果を有する。As is apparent from the above description, according to the present invention, discharge is performed at atmospheric pressure to generate active species such as oxygen ions and excited species, thereby causing a reaction between them and the substrate. Since it is a method of improving the adhesion between the substrate and the ultraviolet curable resin, therefore, not only an aqueous system can be used, but also high-speed dry processing is possible, and it is simple and
In addition, the device cost is low.
【図1】本発明の実施例1を示す摸式図。FIG. 1 is a schematic diagram showing a first embodiment of the present invention.
【図2】本発明の実施例2を示す摸式図。FIG. 2 is a schematic diagram showing Embodiment 2 of the present invention.
【図3】本発明の実施例3を示す摸式図。FIG. 3 is a schematic diagram showing Embodiment 3 of the present invention.
【図4】本発明の実施例3の反り角についての説明図。FIG. 4 is an explanatory view of a warp angle according to a third embodiment of the present invention.
1 基板 2 金属カバー 3 放電発生用電極 4 高周波電源 5 ガス供給装置 6 絶縁物 7 放電部 8 対電極 9 ガス吹き出し口 10 反応性ガス流 11 加熱、冷却装置 1 substrate 2 metal cover 3 discharge generation electrode 4 high frequency power supply 5 gas supply device 6 insulator 7 discharge part 8 counter electrode 9 gas outlet 10 reactive gas flow 11 heating and cooling device
Claims (8)
パターンを有するスタンパーを用い、前記スタンパーの
凹凸パターンを基板上に紫外線硬化樹脂を用いて転写形
成することにより光学的情報記録媒体用基板を製造する
方法において、大気圧、あるいはその近傍圧力下におい
て、少なくとも酸素を含むガス雰囲気中にて放電を生じ
させ、その放電により生成された励起、イオンなどの活
性種により、前記基板を処理する工程を含むことを特徴
とする光学的情報記録媒体用基板の製造方法。1. A substrate for an optical information recording medium is formed by using a stamper having a guide groove and / or a concave / convex pattern corresponding to information, and transferring the concave / convex pattern of the stamper onto the substrate by using an ultraviolet curable resin. In the manufacturing method, a step of causing a discharge in a gas atmosphere containing at least oxygen under atmospheric pressure or a pressure in the vicinity thereof, and treating the substrate with active species such as excitation and ions generated by the discharge. A method for manufacturing a substrate for an optical information recording medium, which comprises:
スポリオレフィンである請求項1記載の光学的情報記録
媒体用基板の製造方法。2. The method for producing a substrate for an optical information recording medium according to claim 1, wherein the substrate for the optical information recording medium is an amorphous polyolefin.
用電極を配置し、前記放電発生用電極に高周波電圧を印
加して、前記基板と前記放電発生用電極との空間で放電
せしめることを特徴とする請求項1記載の光学的情報記
録媒体用基板の製造方法。3. A discharge generating electrode is disposed in the vicinity of the substrate, and a high-frequency voltage is applied to the discharge generating electrode to cause discharge in the space between the substrate and the discharge generating electrode. The method for manufacturing a substrate for an optical information recording medium according to claim 1.
圧を印加して放電せしめ、その放電空間に少なくとも酸
素ガスを通過させて励起、イオンなどの活性種を生成
し、前記酸素の活性種を含むガス流を、放電にさらされ
ない前記基板にガス吹き出し口より吹き付けることを特
徴とする請求項1記載の光学的情報記録媒体用基板の製
造方法。4. A high-frequency voltage is applied between the discharge-generating electrode and the counter electrode to cause discharge, and at least oxygen gas is passed through the discharge space to generate an active species such as excitation and ion, thereby generating oxygen. 2. The method for manufacturing a substrate for an optical information recording medium according to claim 1, wherein a gas flow containing seeds is sprayed from the gas outlet to the substrate not exposed to the discharge.
電発生用電極、あるいは放電にさらさずガス流を吹き付
ける場合のガス吹き出し口を前記基板の大きさ以上とす
ることを特徴とする請求項1記載の光学的情報記録媒体
用基板の製造方法。5. The electrode for discharge generation in the case where the substrate is exposed to a discharge, or the gas outlet for blowing a gas flow without being exposed to the discharge is made larger than the size of the substrate. 1. A method for manufacturing a substrate for an optical information recording medium according to 1.
とを特徴とする請求項3、請求項4記載の光学的情報記
録媒体用基板の製造方法。6. The method for manufacturing a substrate for an optical information recording medium according to claim 3, wherein the substrate is cooled or heated.
て、放電発生用電極と、前記放電発生用電極に高周波電
圧を印加する手段と、少なくとも酸素を含むガスを前記
放電発生用電極近傍に導入する手段とを少なくとも具備
することを特徴とする光学的情報記録媒体用基板の製造
装置。7. The discharge generating electrode, a means for applying a high frequency voltage to the discharge generating electrode, and a gas containing at least oxygen are introduced near the discharge generating electrode under atmospheric pressure or a pressure in the vicinity thereof. And a means for manufacturing an optical information recording medium substrate.
少なくとも具備することを特徴とする請求項7記載の光
学的情報記録媒体用基板の製造装置。8. The apparatus for manufacturing a substrate for an optical information recording medium according to claim 7, further comprising at least a means for cooling or heating the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21508995A JPH0963133A (en) | 1995-08-23 | 1995-08-23 | Production of substrate for optical information recording medium and device therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21508995A JPH0963133A (en) | 1995-08-23 | 1995-08-23 | Production of substrate for optical information recording medium and device therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0963133A true JPH0963133A (en) | 1997-03-07 |
Family
ID=16666576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21508995A Pending JPH0963133A (en) | 1995-08-23 | 1995-08-23 | Production of substrate for optical information recording medium and device therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0963133A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999010154A1 (en) * | 1997-08-25 | 1999-03-04 | Seiko Epson Corporation | Method and apparatus for manufacturing optical recording media |
EP0999249A3 (en) * | 1998-11-04 | 2003-02-26 | Singulus Technologies AG | Process for avoiding the inclusion of bubbles during the joining by adhesives of optical data carrier substrates |
-
1995
- 1995-08-23 JP JP21508995A patent/JPH0963133A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6280660B1 (en) | 1997-05-25 | 2001-08-28 | Seiko Epson Corporation | Method and apparatus for manufacturing optical recording medium |
WO1999010154A1 (en) * | 1997-08-25 | 1999-03-04 | Seiko Epson Corporation | Method and apparatus for manufacturing optical recording media |
KR100474787B1 (en) * | 1997-08-25 | 2005-03-08 | 세이코 엡슨 가부시키가이샤 | Method and apparatus for manufacturing optical recording media |
EP0999249A3 (en) * | 1998-11-04 | 2003-02-26 | Singulus Technologies AG | Process for avoiding the inclusion of bubbles during the joining by adhesives of optical data carrier substrates |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5281373A (en) | Process for producing substrate sheet for optical recording media | |
JPH0963133A (en) | Production of substrate for optical information recording medium and device therefor | |
US6361846B1 (en) | Device for curing an adhesive between two layers of an information carrier | |
JPH0963132A (en) | Production of substrate for optical information recording medium and device therefor | |
JPH05314545A (en) | Continuous production of substrate for optical information recording medium | |
JPH0963130A (en) | Stamper for manufacturing optical recording carrier and its production | |
JP2531792B2 (en) | Method for manufacturing substrate for optical recording medium | |
JP2665264B2 (en) | Continuous manufacturing method of substrate for optical recording medium | |
JP2967958B2 (en) | Stamper for optical disk and method of manufacturing the same | |
JP2670865B2 (en) | Method and apparatus for continuously producing substrate for optical recording medium | |
RU2243599C1 (en) | Method for compact disk manufacture | |
JPH10228674A (en) | Disk substrate | |
JPH0326375A (en) | Continuous production of substrate for optical information recording medium | |
JPH05325272A (en) | Continuous manufacture of substrate for optical information recording medium | |
JP2640535B2 (en) | Continuous manufacturing method of substrate for optical recording medium | |
JPH0395738A (en) | Production of substrate for optical information recording medium | |
JPH03108139A (en) | Continuous production of substrate for optical recording medium | |
JPH05205324A (en) | Manufacture of optical disk substrate | |
JPH02128337A (en) | Production of substrate for optical information recording medium | |
JPH0326373A (en) | Production of optical recording medium | |
JPS6275951A (en) | Manufacture of substrate for optical memory element | |
JP2000251335A (en) | Production of optical information recording medium | |
JP2003263792A (en) | Method for manufacturing flexible optical disk and flexible optical disk | |
JPH08255383A (en) | Direct recording medium for optical disk and its production | |
JPH01291926A (en) | Disc molding device |