CN100471894C - 减少水吸收的聚缩甲醛和共聚缩甲醛、其制备和应用 - Google Patents

减少水吸收的聚缩甲醛和共聚缩甲醛、其制备和应用 Download PDF

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Publication number
CN100471894C
CN100471894C CNB2004800214842A CN200480021484A CN100471894C CN 100471894 C CN100471894 C CN 100471894C CN B2004800214842 A CNB2004800214842 A CN B2004800214842A CN 200480021484 A CN200480021484 A CN 200480021484A CN 100471894 C CN100471894 C CN 100471894C
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CN
China
Prior art keywords
polyformals
bis
polyformal
linear
hydroxyphenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2004800214842A
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English (en)
Chinese (zh)
Other versions
CN1829760A (zh
Inventor
H·-W·霍伊尔
R·韦尔曼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Deutschland AG
Bayer Intellectual Property GmbH
Original Assignee
Bayer MaterialScience AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Bayer MaterialScience AG filed Critical Bayer MaterialScience AG
Publication of CN1829760A publication Critical patent/CN1829760A/zh
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Publication of CN100471894C publication Critical patent/CN100471894C/zh
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group
    • C08G2650/44—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group containing acetal or formal groups

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Artificial Filaments (AREA)
  • Materials For Medical Uses (AREA)
  • Polyethers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Polyurethanes Or Polyureas (AREA)
CNB2004800214842A 2003-07-25 2004-07-13 减少水吸收的聚缩甲醛和共聚缩甲醛、其制备和应用 Expired - Fee Related CN100471894C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10333928A DE10333928A1 (de) 2003-07-25 2003-07-25 Polyformale und Copolyformale mit reduzierter Wasseraufnahme, ihre Herstellung und Verwendung
DE10333928.0 2003-07-25

Publications (2)

Publication Number Publication Date
CN1829760A CN1829760A (zh) 2006-09-06
CN100471894C true CN100471894C (zh) 2009-03-25

Family

ID=34071903

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004800214842A Expired - Fee Related CN100471894C (zh) 2003-07-25 2004-07-13 减少水吸收的聚缩甲醛和共聚缩甲醛、其制备和应用

Country Status (9)

Country Link
US (1) US7199208B2 (https=)
EP (1) EP1651702B1 (https=)
JP (1) JP4637100B2 (https=)
KR (1) KR101106408B1 (https=)
CN (1) CN100471894C (https=)
AT (1) ATE422511T1 (https=)
DE (2) DE10333928A1 (https=)
ES (1) ES2320893T3 (https=)
WO (1) WO2005012379A2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10333927A1 (de) * 2003-07-25 2005-02-24 Bayer Materialscience Ag Polyformale als Coextrusionsschutzschicht auf Polycarbonat
DE102004054498A1 (de) * 2004-11-11 2006-05-24 Bayer Materialscience Ag Polycarbonat/Polyformal-Blend als Material für optische Datenspeicher mit verminderter Wasseraufnahme
US7521119B2 (en) * 2005-07-07 2009-04-21 Sabic Innovative Plastics Ip B.V. Windows and other articles made from DMBPC polycarbonate homopolymer and copolymer
DE102008036406A1 (de) * 2008-08-05 2010-02-11 Bayer Materialscience Ag Modifizierte Polycarbonate mit verbesserten Oberflächeneigenschaften
US8436128B2 (en) * 2008-12-25 2013-05-07 Bayer Intellectual Property Gmbh Substrate material for high speed optical discs
US20170247660A1 (en) * 2014-09-18 2017-08-31 National Health Research Institutes Progenitor cells, method for preparation thereof and uses thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801679A (en) * 1987-02-04 1989-01-31 Idemitsu Kosan Co., Ltd. Polyformal resin and process for producing said resin

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2738962A1 (de) 1976-11-08 1978-05-11 Gen Electric Filmbildende, ausformbare aromatische polyformalharze und verfahren zu ihrer herstellung
US4260733A (en) * 1978-03-23 1981-04-07 General Electric Company Method for making aromatic polyformals
US4374974A (en) * 1978-03-23 1983-02-22 General Electric Company Method for making polyformals and polyformal products made thereby
JPS60188426A (ja) * 1984-03-09 1985-09-25 Idemitsu Kosan Co Ltd 光学機器用の素材
EP0363760A1 (de) * 1988-10-12 1990-04-18 Bayer Ag Aromatische Ether
JPH02304742A (ja) * 1989-05-19 1990-12-18 Hitachi Ltd 光ディスクおよびその製造方法
JP3036774B2 (ja) * 1990-01-29 2000-04-24 出光興産株式会社 ポリホルマール樹脂とその製造法及びそれよりなる光学材料
JP2877415B2 (ja) * 1990-02-15 1999-03-31 出光興産株式会社 ポリエーテル樹脂とその製法及びそれよりなる光学材料
DE19515689A1 (de) * 1995-04-28 1996-10-31 Bayer Ag Polysulfon/Polyether-Blockcopolykondensate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801679A (en) * 1987-02-04 1989-01-31 Idemitsu Kosan Co., Ltd. Polyformal resin and process for producing said resin

Also Published As

Publication number Publication date
ES2320893T3 (es) 2009-05-29
DE10333928A1 (de) 2005-02-24
JP2007500760A (ja) 2007-01-18
KR20060066062A (ko) 2006-06-15
JP4637100B2 (ja) 2011-02-23
CN1829760A (zh) 2006-09-06
ATE422511T1 (de) 2009-02-15
DE502004008976D1 (de) 2009-03-26
WO2005012379A3 (de) 2005-04-21
US7199208B2 (en) 2007-04-03
US20050020802A1 (en) 2005-01-27
WO2005012379A2 (de) 2005-02-10
EP1651702A2 (de) 2006-05-03
EP1651702B1 (de) 2009-02-11
KR101106408B1 (ko) 2012-01-17

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C06 Publication
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TR01 Transfer of patent right

Effective date of registration: 20160629

Address after: Leverkusen, Germany

Patentee after: COVESTRO DEUTSCHLAND AG

Address before: German Monheim

Patentee before: BAYER INTELLECTUAL PROPERTY GmbH

Effective date of registration: 20160629

Address after: German Monheim

Patentee after: BAYER INTELLECTUAL PROPERTY GmbH

Address before: Germany Leverkusen

Patentee before: BAYER MATERIALSCIENCE AG

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090325

Termination date: 20180713