CN100468676C - 半导体器件焊盘形成方法 - Google Patents
半导体器件焊盘形成方法 Download PDFInfo
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- CN100468676C CN100468676C CNB2006101168503A CN200610116850A CN100468676C CN 100468676 C CN100468676 C CN 100468676C CN B2006101168503 A CNB2006101168503 A CN B2006101168503A CN 200610116850 A CN200610116850 A CN 200610116850A CN 100468676 C CN100468676 C CN 100468676C
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- semiconductor device
- solder pad
- conductive layer
- lattice
- sulfuric peroxide
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Application Number | Priority Date | Filing Date | Title |
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CNB2006101168503A CN100468676C (zh) | 2006-09-30 | 2006-09-30 | 半导体器件焊盘形成方法 |
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CNB2006101168503A CN100468676C (zh) | 2006-09-30 | 2006-09-30 | 半导体器件焊盘形成方法 |
Publications (2)
Publication Number | Publication Date |
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CN101154603A CN101154603A (zh) | 2008-04-02 |
CN100468676C true CN100468676C (zh) | 2009-03-11 |
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CNB2006101168503A Expired - Fee Related CN100468676C (zh) | 2006-09-30 | 2006-09-30 | 半导体器件焊盘形成方法 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102339770B (zh) * | 2011-09-07 | 2012-12-19 | 中国航天科技集团公司第九研究院第七七一研究所 | 一种提高铅锡凸点与晶圆上铝焊盘间剪切强度的工艺 |
CN104835748B (zh) * | 2014-02-08 | 2018-09-25 | 中芯国际集成电路制造(上海)有限公司 | 一种提高半导体器件键合可靠性的方法 |
CN104900481B (zh) * | 2014-03-04 | 2018-06-01 | 中芯国际集成电路制造(上海)有限公司 | 清洗焊盘的方法 |
CN105355566B (zh) * | 2014-08-21 | 2018-10-23 | 中芯国际集成电路制造(上海)有限公司 | 焊盘的表面处理方法及焊盘的制作方法 |
CN105428211A (zh) * | 2015-11-10 | 2016-03-23 | 武汉新芯集成电路制造有限公司 | 一种去除焊盘缺陷的方法 |
CN108962774B (zh) * | 2017-05-27 | 2020-08-04 | 中芯国际集成电路制造(上海)有限公司 | 一种提高重布线层表面均匀性的方法 |
CN117672817B (zh) * | 2024-01-31 | 2024-05-07 | 粤芯半导体技术股份有限公司 | 含氟气体刻蚀残留物的清洗方法、晶圆及其制备方法 |
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2006
- 2006-09-30 CN CNB2006101168503A patent/CN100468676C/zh not_active Expired - Fee Related
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CN101154603A (zh) | 2008-04-02 |
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C06 | Publication | ||
PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20111115 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090311 Termination date: 20180930 |