CN100410198C - Double-layer film structure filming glass without light pollution - Google Patents
Double-layer film structure filming glass without light pollution Download PDFInfo
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- CN100410198C CN100410198C CNB2006100334934A CN200610033493A CN100410198C CN 100410198 C CN100410198 C CN 100410198C CN B2006100334934 A CNB2006100334934 A CN B2006100334934A CN 200610033493 A CN200610033493 A CN 200610033493A CN 100410198 C CN100410198 C CN 100410198C
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Abstract
The present invention provides film plating glass with a double-layer film structure without light pollution. Firstly, a layer of transparent conducting thin film is subsided on a glass base plate; secondly, a layer of optics anti-reflection film matched with the transparent conducting thin film is subsided on the transparent conducting thin film. The transparent conducting thin film is mixture of one or more than one of ZrNx, TiNx and HfNx, wherein x is equal to or bigger than 0.6 and is equal to or smaller than 1.5; the refractivity n of the optics anti-reflection film is equal to or bigger than 1.5 and equal to or smaller than 2.7 in the position that the length of a light wave is 550 nanometers. By the optics anti-reflection design, the visible light reflectivity of the film plating glass with a double-layer film structure can be lowered to about 8%, and the visible light transmissivity is between 33% and 45% (medium transparent). The energy saving film plating glass without light pollution has the advantages of simple film layer structure, low cost, corrosion resistance, high durability, etc., and can be used for construction, vehicles and ships in a single sheet of glass way.
Description
Technical field
The invention belongs to technical field of glass materials, relate to a kind of two tunic structure coated glass of not having light pollution specifically.
Background technology
The widely-used of glass curtain wall is a notable feature of modern society's Highrise buildings.It is integrated the body of wall and the door and window of buildings, has the building external structure concurrently and goes along with sb. to guard him function and decoration functions, highlights the modern sense and the artistry of buildings.Glass curtain wall through the development of two more than ten years, nowadays extensively spreads all over China big and medium-sized cities in early eighties introducing in last century China.To the end of the year 2004, only just there are 2000 of curtain buildingses Beijing, 1,400 ten thousand square metres of areas.There are 1300 of curtain buildingses in Shanghai, and the curtain wall total area is above 1,000 ten thousand square metres.China has millions of square metres curtain wall to come into operation every year, and continues to increase with 10% speed.According to statistics, China has become maximum in the world glass curtain wall producing country and has used state.
Yet along with the deterioration of energy scarcity situation and carrying out of building energy conservation work, people recognize the defective of glass curtain wall aspect energy consumption gradually.The curtain wall that uses conventional clear glass to build, its heat transfer coefficient height, to sunlight and not effectively restriction of infrared emanation, whole the cold effect of building Xia Redong is fairly obvious, must adopt air-conditioning to regulate the room temperature throughout the year, and it is very huge to consume energy.New " the public building energy-saving design standard " put into effect of China (GB50189-2005) clearly stipulated: glass curtain wall can not use simple glass, must use energy-saving glass.
Energy-saving curtain wall glass on the market mainly comprises low emissivity glass (Low-E) and sunlight control (or solar heat reflection) glass (Sun-E) at present.Although country has made " qualification " (seeing the relevant regulations during " glass curtain wall optical property " (GB/T18091-2000)), the optical performance parameter of this " qualification " above-mentioned just in fact two class glass own to the reflectivity of cladding glass.Except the energy-saving glass (as water white transparency and light grey Low-E glass) of individual colors has lower visible reflectivity (about 10%), the glass of other most colors is all about 30%.
In addition, though the coated glass that is coated with individual layer tool infrared external reflection functional membrane material in optics and thermal property not as good as Sun-E or Low-E, technology is simple, and is cheap, should also be a good selection on energy-saving application.But this class coated glass also shows higher visible reflectance.The common clear plate glass reflectivity that does not have plated film is about 8%, and the reflectivity of glass rises to 20-30% even higher behind the plated film.When sun exposure is to the coated glass surface,, cause so-called light pollution because the reflex action of glass can produce the intensive reflected glare in closely.
Light pollution may cause serious unexpected traffic accident, and a flickering glass curtain wall mansion just as the mirror that piece is huge, carries out (repeatedly) reflection to daylight and various light.Dazzling reflected light enters in the automobile of running at high speed, and can cause officer's blind suddenly or eyesight illusion, serious harm pedestrian and driver's traffic safety.Build near the glass curtain wall in residential quarter in, daylight, advertising lighting or city floodlighting are reflexed in the resident family, cause detrimentally affect for resident's live and work environment.Every year is all received the complaint of a lot of relevant light pollution from various parts of the country by State Environmental Protection Administration.
Be to alleviate the problem of light pollution, there is clearer and more definite regulation in China in the use of cladding glass, and geographical position, direction and height of cladding glass building or the like have all been done restriction.As stipulate the whole surface glass curtain wall of the inaccurate construction of new building, that the arrangement of glass-wall building thing is too unconcentrated, or the place of concentrating in the Residential areas, glass curtain wall or the like is not set towards residential building.But cladding glass is as the notable feature of modern architecture, not only can beautifying urban environment, can also save building materials, alleviate the advantages such as deadweight of buildings, if can fundamentally effectively reduce the reflectivity of glass, overcome the shortcoming of light pollution, make it to have concurrently energy-saving and cost-reducing function simultaneously, cladding glass will inevitably be used widely, and this helps promoting the formation of the environmentally friendly and conservation-minded society of China.
Summary of the invention
The objective of the invention is to utilize the heat-reflective and the optics antireflective know-why of transparent conductive body, provide a kind of low reflection not have two tunic structure coated glass of light pollution.
For realizing above purpose, the present invention has taked following technical scheme: be coated with the layer of transparent conducting film on substrate of glass, be coated with the optics antireflective coating that one deck matches again on nesa coating.
In the present invention, nesa coating is an IVB family metal nitride film, and described metal nitride comprises TiN
x, ZrN
x, HfN
xA kind of or mixture between them in (0.6≤x≤1.5) etc.The optical characteristics of these metal nitride films and metallic film (as Ag, Au, Al etc.) is approaching: the high reflection of region of ultra-red, the visible region absorbs by force.Film thickness has certain visible light transmissivity when 80 nanometers are following.
IVB family metal nitride film is deposited on when on glass to golden, visible reflectance is higher, during thickness 40nm more than 35%, the relevant regulations of " the glass curtain wall optical property " that is higher than Ministry of Construction promulgation in (GB/T18091-2000) when golden (reflection require to be lower than 26%).Therefore, IVB family metal nitride film must could use in practice by means of optics antireflective design.
Specific refractory power is near 1.0 in visible light wave range for IVB family metal nitride, and optical extinction coefficient is also bigger, and increases with the increase of wavelength.
At IVB family metal nitride optical constant, according to the antireflective principle, the refractive index n of optics antireflective coating is 1.5≤n≤2.7 in optical wavelength 550 nanometers.Corresponding film material is including, but not limited to ZnS, Nb
2O
5, TiO
2, TeO
2, ZrO
2, HfO
2, Ta
2O
5, CeO
2, SiN
x(0.5≤x≤1.6 are Si during x=1.33
3N
4), SnO
2, In
2O
3, ITO, Y
2O
3, Al
2O
3, AlN, MgO, Sc
2O
3, ZnO, WO
3, SiO, SiO
aN
b, SiO
2Deng in one or more mixture, based on the consideration on technology and the performance, the preferred ZrO of optics antireflective coating
2, TiO
2, AlN, Al
2O
3And Si
3N
4, these film materials also have about good protection nesa coating.The film geometric thickness of nesa coating is 10～80 nanometers, and the corresponding matching thickness of optics antireflective coating is 10～300.
Before above-mentioned two tunics deposition, also can on glass substrate, deposit one deck SiO earlier
2Transition layer is to prevent that diffusion of contaminants in the glass matrix is in nesa coating.Because SiO
2The specific refractory power and the glass substrate of transition layer are approaching, and the optical property of above-mentioned two tunic structures can not be affected.
Through after the optimization design, the reflectivity of the coated glass among the present invention can be reduced to more than 30% about 8% before antireflective, and is suitable with the reflectivity of normal transparent sheet glass.Simultaneously, the transmitance of this coated glass is about 20% being promoted to more than 30% before the antireflective also, and window daylighting usefulness is improved.
The effect of the nesa coating of coated glass of the present invention is that reverberation is infrared, realizes the heat-insulation and heat-preservation function of glass port, reaches energy saving purposes; The effect of optics antireflective coating is the lighting performance that reduces visible reflectance and strengthen window.The infrared external reflection two tunic structure coated glass of no light pollution have advantages such as film layer structure is simple, with low cost, anticorrosive, and weather resistance is strong.
Nesa coating and antireflective coating all have good physicochemical property among the present invention, need not seal, and can use with the form of monolithic glass in the enforcement.In order to obtain better effect of heat insulation, also can be applied to it is characterized in that it and second glazing plate are in parallel spaced-apart relation in the vitreum of multiple layer assembling.
Description of drawings
Fig. 1 is two tunic structure coated glass structural representations of the present invention, glass matrix 1 is wherein arranged, nesa coating 2, optics antireflective coating 3.
Fig. 2 is the dispersion relation figure of transparent conductive film ZrN and TiN refractive index n and optical extinction coefficient k.Film adopts the magnetron sputtering mode, uses the corresponding metal target, at Ar and N
2Mixed gas in sputtering sedimentation.Optical constant is recorded by spectroscopic ellipsometers.
Fig. 3 is among the embodiment 1, TiO
2Antireflective coating deposits the reflection spectrum of preceding (dotted line) and deposition back (solid line) and sees through spectrogram.
Fig. 4 is among the embodiment 5, Si
3N
4Antireflective coating deposits the reflection spectrum of preceding (dotted line) and deposition back (solid line) and sees through spectrogram.
Embodiment
Below in conjunction with drawings and Examples content of the present invention is described further, but protection domain of the present invention is not limited only to following examples, everyly belongs to the technical scheme that content of the present invention comprises, all belong to the protection domain of this patent.
The optical constant (see figure 2) of utilizing film can obtain the top condition of relevant antireflective coating, i.e. Zui Jia specific refractory power and film thickness to calculating that optical multilayer is.
Transparent conductive film in the following examples and antireflection film all adopt conventional magnetron sputtering technique deposition to obtain.This magnetic control sputtering system comprises a sample and presets a chamber and a main sputtering chamber (diameter 45cm).Main sputtering chamber is connected with a molecular diffusion pump, and background vacuum pressure is 2.0 * 10
-6Pa.It can be 2 inches different targets for three diameters are installed that sputtering chamber has three target position.Each target position is inclined upwardly with 30 ° of angles, can burnt mode cosputtering of copolymerization or the independently mode sputter of three targets.The sample microscope carrier can heat up and can be in sputter procedure uniform rotation to guarantee film forming homogeneity.
Embodiment 1:
Glass substrate is successively put into alcohol and acetone soln after ultrasonic pond is cleaned 15 minutes, dry up, put into main vacuum sputtering chamber by the sample chamber of presetting with nitrogen.Put into main vacuum sputtering chamber.The mode of deposition of nesa coating is as follows: target is metallic Z r, and working gas is high purity Ar and N
2Mixed gas, Ar airshed 32sccm (cubic centimetre/second), N
2Airshed 4.3sccm (cubic centimetre/second) sputtering chamber aero operating pressure 0.67Pa, radio frequency power 40W, 400 ℃ of glass substrate temperature, depositing time 20 minutes.The sedimentary condition of antireflective coating is as follows: target is ceramic TiO
2, working gas is a high purity Ar gas, flow 32sccm, sputtering chamber aero operating pressure 0.6Pa, radio frequency power 120W, 400 ℃ of glass substrate temperature, depositing time 30 minutes.Film layer structure after deposition finishes is: TiO
2(25nm)/ZrN (40nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 5%, visible light transmissivity 38%.Referring to Fig. 3.
Embodiment 2:
Glass substrate is put into main vacuum sputtering chamber through the cleaning process as embodiment 1.The mode of deposition of nesa coating ZrN is fully with embodiment 1, depositing time 20 minutes.The sedimentary condition of antireflective coating is as follows: target is semi-conductor Si, and working gas is high purity Ar and N
2Mixed gas, Ar airshed 32sccm, N
2Airshed 2.8sccm, sputtering chamber aero operating pressure 0.65Pa, radio frequency power 80W, 400 ℃ of glass substrate temperature, depositing time 25 minutes.Film layer structure after deposition finishes is: Si
3N
4(40nm)/ZrN (40nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 8%, visible light transmissivity 36%.
Embodiment 3:
The mode of deposition of nesa coating ZrN is fully with embodiment 1.The sedimentary condition of antireflective coating is as follows: target is ceramic ZnO, and working gas is a high purity Ar gas, flow 32sccm, sputtering chamber aero operating pressure 0.6Pa, radio frequency power 40W, 400 ℃ of glass substrate temperature, depositing time 15 minutes.Film layer structure after deposition finishes is: ZnO (40nm)/ZrN (40nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 8%, visible light transmissivity 33%.
Embodiment 4:
The mode of deposition of nesa coating ZrN is fully with embodiment 1.The sedimentary condition of antireflective coating is as follows: target is metal A l, and working gas is high purity Ar and N
2Mixed gas, Ar airshed 32sccm, N
2Airshed 4.6sccm, sputtering chamber aero operating pressure 0.68Pa, radio frequency power 40W, 400 ℃ of glass substrate temperature, depositing time 32 minutes.Film layer structure after deposition finishes is: AlN (25nm)/ZrN (40nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 9%, visible light transmissivity 34%.
Embodiment 5:
Glass substrate is put into main vacuum sputtering chamber through the cleaning process as embodiment 1.The mode of deposition of nesa coating ZrN is fully with embodiment 2, depositing time 15 minutes.The sedimentary condition of antireflective coating is also identical with embodiment 2, depositing time 95 minutes.Film layer structure after deposition finishes is: Si
3N
4(160nm)/ZrN (30nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 4%, visible light transmissivity 43%.Referring to Fig. 4
Embodiment 6:
Glass substrate is put into main vacuum sputtering chamber through the cleaning process as embodiment 1.The mode of deposition of nesa coating is as follows: target is a metal Ti, and working gas is high purity Ar and N
2Mixed gas, Ar airshed 32sccm, N
2Airshed 4.1sccm sputtering chamber aero operating pressure 0.67Pa, radio frequency power 40W, 400 ℃ of glass substrate temperature, depositing time 22 minutes.The sedimentary conditionally complete of antireflective coating is with embodiment 2, depositing time 18 minutes.Film layer structure after deposition finishes is: Si
3N
4(40nm)/TiN (30nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 4%, visible light transmissivity about 37%.
Embodiment 7:
Glass substrate is put into main vacuum sputtering chamber through the cleaning process as embodiment 1.The mode of deposition of nesa coating is as follows: target is metal Hf, and working gas is high purity Ar and N
2Mixed gas, Ar airshed 32sccm, N
2Airshed 5.7sccm sputtering chamber aero operating pressure 0.68Pa, radio frequency power 40W, 400 ℃ of glass substrate temperature, depositing time 37 minutes.The sedimentary conditionally complete of antireflective coating is with embodiment 2, depositing time 18 minutes.Film layer structure after deposition finishes is: Si
3N
4(40nm)/HfN (30nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 7%, visible light transmissivity about 33%.
Embodiment 8:
The mode of deposition of nesa coating is following fully with embodiment 6, depositing time 22 minutes.The sedimentary condition of antireflective coating is as follows: target is ceramic Al
2O
3, working gas is high purity Ar, airshed 10sccm, sputtering chamber aero operating pressure 0.2Pa, radio frequency power 160W, 400 ℃ of glass substrate temperature, depositing time 45 minutes.Film layer structure after deposition finishes is: Al
2O
3(60nm)/TiN (30nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 7%, visible light transmissivity about 35%.
Embodiment 9:
The mode of deposition of nesa coating is following fully with embodiment 6, depositing time 22 minutes.The sedimentary condition of antireflective coating is as follows: target is metallic Z r, and working gas is high purity Ar and O
2Mixed gas, the Ar airshed is 32sccm, O
2Airshed is 0.6sccm, sputtering chamber aero operating pressure 0.6Pa, radio frequency power 40W, 400 ℃ of glass substrate temperature, depositing time 18 minutes.Film layer structure after deposition finishes is: ZrO
2(36nm)/TiN (30nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 5%, visible light transmissivity about 36%.
Embodiment 10:
The mode of deposition of nesa coating is following fully with embodiment 6, depositing time 22 minutes.The mode of deposition of antireflective coating is as follows: target is Al
2O
3, working gas is Ar, flow 10sccm, sputtering chamber aero operating pressure 0.2Pa, radio frequency power 160W, 400 ℃ of substrate temperatures, depositing time 25 minutes.Film layer structure after deposition finishes is: Al
2O
3(30nm)/TiN (30nm)/glass.The optical property index that obtains is as follows: visible reflectance is about 6%, visible light transmissivity about 33%.
In above embodiment, before described two tunics deposition, also can on glass substrate, deposit one deck SiO earlier
2Transition layer, experiment effect is unaffected.
Claims (4)
1. two tunic structure coated glass of not having light pollution, it is characterized in that: be coated with the corresponding optics antireflective coating of layer of transparent conducting film and one deck on substrate of glass, the optics antireflective coating is plated in the top of nesa coating; Described nesa coating is ZrN
x, 0.6≤x≤1.5 wherein; The refractive index n of described optics antireflective coating is in optical wavelength 550 nanometers 1.5≤n≤2.7; Described optics antireflective coating is Si
3N
4
2. according to two tunic structure coated glass of the no light pollution described in the claim 1, it is characterized in that: between substrate of glass and nesa coating, deposit SiO
2Transition layer.
3. according to two tunic structure coated glass of arbitrary described no light pollution in the claim 1～2, it is characterized in that: the geometric thickness of described nesa coating is 10～80 nanometers, and the geometric thickness of described optics antireflective coating is the 10-300 nanometer.
4. according to two tunic structure coated glass of arbitrary described no light pollution in the claim 3, it is characterized in that: the geometric thickness of described nesa coating is 30 nanometers, and the geometric thickness of described optics antireflective coating is 160 nanometers.
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|---|---|---|---|
| CNB2006100334934A CN100410198C (en) | 2006-02-08 | 2006-02-08 | Double-layer film structure filming glass without light pollution |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100334934A CN100410198C (en) | 2006-02-08 | 2006-02-08 | Double-layer film structure filming glass without light pollution |
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|---|---|
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| CN100410198C true CN100410198C (en) | 2008-08-13 |
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| CN101891394B (en) * | 2009-05-19 | 2013-01-02 | 信义光伏产业(安徽)控股有限公司 | Anti-reflection solution, ultra-white photovoltaic glass and manufacturing method thereof |
| CN102531406B (en) * | 2012-01-17 | 2015-03-25 | 信义玻璃工程（东莞）有限公司 | Antireflective coating solution and preparation method thereof, as well as photovoltaic glass and preparation method of photovoltaic glass |
| CN102944940B (en) * | 2012-12-04 | 2014-07-30 | 吴金军 | Light-sensitive photochromic lens |
| CN103936296A (en) * | 2014-03-12 | 2014-07-23 | 浙江大学 | Film designing method capable of eliminating reflection color of double-film-structured coated glass with non-steep interfaces |
| CN103884494A (en) * | 2014-03-21 | 2014-06-25 | 浙江大学 | Optical parameter detecting method for Si-based buffer layer coated glass |
| CN109748516A (en) * | 2019-03-13 | 2019-05-14 | 江阴泰榕光电科技有限公司 | The manufacture craft of electro-conductive glass |
| CN111007584B (en) * | 2019-11-21 | 2021-05-11 | 天津津航技术物理研究所 | Design method of oxide system infrared anti-reflection protective film |
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