CN100394638C - Reactor and power generator - Google Patents
Reactor and power generator Download PDFInfo
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- CN100394638C CN100394638C CNB2005800004834A CN200580000483A CN100394638C CN 100394638 C CN100394638 C CN 100394638C CN B2005800004834 A CNB2005800004834 A CN B2005800004834A CN 200580000483 A CN200580000483 A CN 200580000483A CN 100394638 C CN100394638 C CN 100394638C
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Abstract
Disclosed are a compact reactor capable of reducing pressure loss and supporting a lot of catalysts, and a power generator having the reactor. A reformer (5) includes a reactor main body (501) having inner space formed therein, and a channel structure (502) retained in the reactor main body (502). The channel structure (502) has a base plate (505) as its basic structure. A plurality of through holes (506) are formed in the base plate (505) to connect an area (510) to an area (511) in the reactor main body (501). The surface layer of the base plate (505) is anodized to be altered to a porous metal oxide, and a catalyst component is supported on that surface layer.
Description
Technical field
The present invention relates to a kind of Blast Furnace Top Gas Recovery Turbine Unit (TRT) that has the reactor of reactor body and be equipped with this reactor, wherein this reactor has channel design.
Background technology
In recent years, efficiently utilize the fuel cell of energy to carry out positive research and development to guaranteeing.Orientate fuel cell as following promising battery, described fuel cell can utilize the chemical energy by fuel and airborne oxygen generation electrochemical reaction directly to obtain electric energy.Hydrogen is a kind of fuel that is used for fuel cell, but should be noted that processing and hydrogen gas storage, and this is a gaseous state because of hydrogen at normal temperatures.Use liquid fuel, for example alcohol and gasoline can be used in system's relative compact of storage of liquids fuel.Yet, use liquid fuel need be used for liquid fuel and steam are heated to reaction high temperature to produce the reformer of the required hydrogen of generating.When fuel reforming type fuel cell during, reformer and fuel cell should be made compact as the power supply of compact electronic device.
To using chemical microreactor to research and develop as reformer, examine as described in the Japanese patent application KOKAI publication number 2002-102681 as mi, wherein this patent application discloses the compact chemical microreactor that has a plurality of substrates that link together by use and has produced microfabricated chemical reactor.Chemical microreactor described in this patent application openly will be discussed briefly.First substrate that at first prepares polystyrene, forming on one surface will be as the curved slot of passage.Then, by ultraviolet curable resin with cover described groove with second substrate bonding to first substrate, form bending channel thus in the junction of two substrates.Reactant is transported to the bending channel of chemical microreactor by pump etc.When reactant takes place at once, produce target product or intermediate product.
When heating during chemical microreactor, to through channel flow and the reactant that contact with the wall of passage, this impels reactant to take place more effectively to react with the heat transferred of chemical microreactor.When on the wall of catalyst carrier at passage, contact through the reactant of channel flow and the wall of passage, impel reactant more effectively to react.Yet when bending channel during at a plurality of location bending, the flow direction of fluid changes, and has increased pressure loss.This needs jumbo fluid supply mechanism (for example pump).
If reactant flows in the passage of chemical microreactor, then make reactant that the reaction of target product or intermediate product takes place to produce.When the reaction of the thing that is difficult at normal temperatures to react, should heat chemical microreactor.In Japanese patent application KOKAI publication number 2002-102681, also described a kind ofly, promptly formed therein in the substrate of passage and transmit heat by using electric heater (for example nichrome wire) to heat the mode of chemical microreactor.Yet this method can make the temperature of substrate portion of contact heater be different from the not temperature of the substrate portion of contact heater, perhaps produces temperature gradient at the depth direction as the groove of passage.This brings the problem that reaction temperature changes in the groove, makes reactant not react equably.
Summary of the invention
Therefore, the purpose of this invention is to provide a kind of compact reactor that can reduce pressure loss.
Another object of the present invention provides a kind of reactor that can make the reactant homogeneous reaction.
In order to reach this purpose, according to an aspect of the present invention, provide a kind of reactor, comprising:
Reactor body (21,301,501,601) has the inner space that is formed on wherein; With
Substrate (305,505,705,325,525,725) is inserted into so that the inner space of reactor body (21,301,501,601) is separated into two zones, and passes substrate get out a plurality of through holes (306,506,606) on thickness direction.
When reactant being offered of two zones separating by substrate, the reactant that is provided flows to another zone through the through hole of the substrate that serves as passage.When getting out a plurality of through hole that passes substrate, reactant flows to another regional pressure loss from a zone and becomes littler.
The formation of a plurality of through holes can so that more a large amount of catalyst carriers on the wall of through hole as the total amount of through hole.
When a plurality of through holes are formed in the substrate that remains in the reactor body, make contact area become bigger by making through hole quantity thinner and that increase the through hole penetrate substrate.In other words, flow through the wall of the easier contact through hole of fluid of through hole, increase the possibility of fluid contact wall, this causes effective reaction.
Preferably, in reactor, the superficial layer of substrate (305,505,705,325,525,725) should be oxidized, comprises that the superficial layer to through hole (306,506,606) carries out oxidation, and catalyst (516,616) should be carried on the superficial layer of oxidation.
The oxidation of the superficial layer of substrate is changed into porous metal oxide with the superficial layer of substrate, and increases surface area thus, make a large amount of catalytic components can be carried on superficial layer above, thereby accelerated reaction.
Preferably, in reactor, electric heating film (308,508,608) should be formed on in two surfaces of substrate (305,505,705) at least one.
When utilizing the electric heating electric heating film, the electric heating film that is formed on the substrate place makes heat by the substrate transmission.When the reactant contact substrate that flows in through hole, reactant is heated and produces thus effectively reaction.
Reactor according to another aspect of the present invention comprises:
Reactor body (21,701,801,901) has the inner space that is formed on wherein; With
Resistor substrate (705,805,905) is inserted into so that the inner space of reactor body (21,701,801,901) is separated into two zones, and gets out a plurality of through holes (706,806,906) by this substrate on thickness direction.
According to the present invention, because the resistor substrate plays the effect of the resistor that produces electric heating, so resistor substrate itself produces heat when applying voltage.Zone around the heating resistor substrate promptly adds heat through-hole makes reactant can utilize the effectively reaction of heat generation based on the substrate of carbon.
Description of drawings
By reading following specific description and accompanying drawing, these purposes of the present invention, other purpose and advantage will become more apparent, wherein:
Fig. 1 is the block diagram of Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1;
Fig. 2 is the perspective view of vaporizer 3, reformer 5 and CO (carbon monoxide) selective oxidation device 6;
Fig. 3 is the cross-sectional view of the vaporizer, reformer and the CO selective oxidation device that cut at thickness direction along the line III-III of Fig. 2;
Fig. 4 is the plane graph of substrate 305;
Fig. 5 is the cross-sectional view of vaporizer 13, reformer 15 and CO selective oxidation device 16;
Fig. 6 is the perspective view of reactor 20;
Fig. 7 is the cross-sectional view of the reactor that cuts at the thickness direction of reactor body 21 along the line VII-VII of Fig. 6;
Fig. 8 is the perspective view of vaporizer 3, reformer 5 and CO selective oxidation device 6;
Fig. 9 is the cross-sectional view of the vaporizer, reformer and the CO selective oxidation device that cut at thickness direction along the line IX-IX of Fig. 8;
Figure 10 is based on the base of carbon and pulls 705 plane graph;
Figure 11 is the perspective view of reactor 20; And
Figure 12 is the cross-sectional view of the reactor that cuts at the thickness direction of reactor body 21 along the line XII-XII of Figure 11.
Embodiment
Optimum way of the present invention is described below with reference to the accompanying drawings.Although in order to realize that the present invention has made the preferred restriction in various technical ground to following embodiment, these restrictions are not confined to scope of the present invention the example of the following examples and description.
[first embodiment]
Fig. 1 is the block diagram of Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1.
Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1 is assemblied in desktop PC, notebook personal computer, portable phone, PDA (personal digital assistant), communicator, wrist-watch, digital camera, Digital Video, game station, game machine, household electrical appliance or other electronic installation, and is used as the power supply of the main body of operation electronic installation.
Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1 comprises fuel container 2, vaporizer 3, petrolift 4, reformer 5, CO (carbon monoxide) selective oxidation device 6, fuel cell 7, air pump 8 and voltage application portion part 9.Fuel container 2 keeps as the fuel that is used for the raw material of Blast Furnace Top Gas Recovery Turbine Unit (TRT).Vaporizer 3 comprises the microreactor of vaporization from fuel container 2 supplied fuel.Petrolift 4 is from fuel container 2 draws fuel and with the fuel supply vaporizer of drawing 3.Reformer 5 comprises microreactor, and this microreactor is reformed to the air that is fed to hydrogen from vaporizer 3.CO selective oxidation device 6 comprises the microreactor of removing carbon monoxide from reformer 5 air supplied fuel mixtures.By the hydrogen from CO selective oxidation device 6 air supplied fuel mixtures and the electrochemical reaction of airborne oxygen, fuel cell 7 produces electric energy.Air pump 8 is drawn air outside and air is offered CO selective oxidation device 6 and fuel cell 7.Voltage application portion part 9 applies voltage to vaporizer 3, reformer 5 and CO selective oxidation device 6.Reactor adapted according to the present invention is in vaporizer 3, reformer 5 and CO selective oxidation device 6.
Vaporizer 3, petrolift 4, reformer 5, CO selective oxidation device 6 and air pump are installed in the main body of electronic installation.Fuel container 2 is arranged on the main body place of electronic installation separably, and when fuel container 2 is connected to the main body of electronic installation, gives vaporizer 3 by petrolift 4 with the supply of fuel in the fuel container 2.
The fuel that is retained in the fuel container 2 is the mixture of liquid chemical fuel and water.Available chemical fuel is hydrogeneous compound, alcohol for example, and as methyl alcohol and ethanol, and gasoline.In the present embodiment, use the mixture of first alcohol and water to act as a fuel.
Fuel cell 7 with fuel electrode as gas diffusion layers, it comprises catalyst particles and carrying particulate, as the air electrode of gas diffusion layers, it comprise catalyst particles and carrying particulate and be carried on fuel electrode and air electrode between hydrogen ion conductive solids polymer dielectric film.Air electrode waits by pipe and is connected to air pump 8, makes to supply air to air electrode.
Fig. 2 is the perspective view of vaporizer 3, reformer 5 and CO selective oxidation device 6, and Fig. 3 is the cross-sectional view of the vaporizer 3, reformer 5 and the CO selective oxidation device 6 that cut at thickness direction along the III-III of Fig. 2.
Shown in Fig. 2 and 3, vaporizer 3 has reactor body 301 and the channel design 302 that remains in the reactor body 301, and this reactor body is to have the container that is formed on inner space wherein.
As basic structure, channel design 302 has the substrate 305 that the metal by high heat conductance forms, for example aluminium (thermal conductivity 237W/mK), cerium (thermal conductivity 11.4W/mK), titanium (thermal conductivity 21.9W/mK) or silicon (thermal conductivity 148W/mK), by anodic oxidation, the upper surface of substrate can be a porous.The thickness of substrate 305 is less than length and the width of substrate 305 on in-plane.Substrate 305 has a plurality of through holes 306 that are penetrated into another surface from a surface of substrate 305 and serve as passage.Through hole 306 is formed along the thickness direction of substrate 305 parallel to each other, and straight-line extension is so that can be midway crooked.With reference to figure 4, Fig. 4 is the plane graph of the part of substrate 305, and through hole 306 has hexagonal cross section and is arranged to honeycomb-like pattern.Through hole 306 needn't necessarily form hexagon, but can adopt other shape, for example triangle, rectangle, the polygon greater than rectangle, circle or oval.Have the substrate of seeing in plane graph 305, through hole 306 needn't be arranged to honeycomb-like pattern, but can be arranged to two-dimensional array (for example matrix form).Preferably, for the material that is comprised in the fluid that flows in through hole 306, substrate 305 should have low activity, have high thermal conductivity and low thermal coefficient of expansion.
As shown in Figure 3, dielectric film 307, for example silicon dioxide film (SiO
2) or silicon nitride film (SiN) be formed between the through hole 306 on the side of the substrate 305 in the channel design 302.The electric heating film 308 that metal oxide (for example Ta-Si-O-N) or metal (for example Au) form is formed on the dielectric film 307.Electric heating film 308 is ohmic heater or semiconductor heat generator, and when electric current flows in electric heating film 308 or voltage when being applied to electric heating film 308, this electric heating film 308 utilizes electric energy to produce heat.Have the result of the substrate 305 of low resistivity owing to the voltage that is applied to electric heating film 308 causes electric current to flow to, the dielectric film 307 that is inserted between electric heating film 308 and the substrate 305 can be avoided and can not fully heat electric heating film 308.Inserting dielectric film 307 can also make the separation of electric heating film 308 than more difficult when electric heating film 308 is formed directly on the substrate 305.
Be formed on the electric heating film 308 such as protection dielectric films 309 such as silicon oxide film or silicon nitride films.Be coated on the electric heating film 308 protection dielectric film 309 protection electric heating films 308.
As shown in Figure 2, a wherein side of four sides of substrate 305 side of extending reactor body 301.Be formed on that a part of substrate 305 that exposes from reactor body 301 with integrally formed two lines 314 and 315 of electric heating film 308.Voltage application portion part 9 applies voltage/current by line 314 and 315 to electric heating film 308, electric heating film 308 is heated in 80 ℃ to 120 ℃ the scope.
Penetrate the part place of a side of reactor body 301 at substrate 305, the interface between substrate 305 and the reactor body 301 is sealed.
Shown in Fig. 2 and 3, the same with vaporizer 3, reformer 5 has reactor body 501 and the channel design 502 that remains in the reactor body 502, and this reactor body 501 is the containers that wherein are formed with the inner space.In Fig. 2 and 3, basically those parts of reformer 5 that are equal to the counterpart of vaporizer 3, dielectric film 507 usefulness that for example are equal to dielectric film 307 basically have 500 Reference numeral and represent that the low two digits of the Reference numeral of its lower two digits and the counterpart of vaporizer 3 is identical.With those and the description of the corresponding part of basic identical part of vaporizer 3 that omit reformer 5, but difference between reformer 5 and the vaporizer 3 is only described.
In reformer 5, inflow pipe 503 is communicated with the effuser 304 of vaporizer 3, and effuser 504 is communicated with the inflow pipe 603 of CO selective oxidation device 6.
In reformer 5, be formed on the whole superficial layer except the part that electric heating film 508 is covered of substrate 505 as the catalyst 516 of reforming catalyst.Especially, catalyst 516 be formed in addition the superficial layer of the substrate in through hole 506 505 on.Catalyst 516 be by the superficial layer to substrate 505 carry out oxidation with this superficial layer is become porous metal oxide and on as the superficial layer of the porous metal oxide of supporting body the bearing catalyst component obtain.When substrate 505 had aluminium, porous metal oxide was aluminium oxide (Al
2O
3).When substrate 505 had titanium, porous metal oxide was a titanium oxide.In reformer 5, will based on the catalyst carrier of Cu-ZnO on the superficial layer of substrate 505 with as catalytic component.Preferably, with respect to the material that is included in the through hole 506 in the fluid that flows, substrate 505 should have good corrosion resistance, easily bearing catalyst 516 and should have high thermal conductivity and low thermal coefficient of expansion.The thickness of substrate 505 is less than length and the width of substrate 505 on in-plane.A plurality of through holes 506 are formed along the thickness direction of substrate 505 parallel to each other, and straight-line extension is so that can be midway crooked.Voltage application portion part 9 applies voltage/current by line 514 and 515 to electric heating film 508, electric heating film 508 is heated in 200 ℃ to 300 ℃ the scope.
Shown in Fig. 2 and 3, as vaporizer 3, CO selective oxidation device 6 has reactor body 601 and the channel design 602 that remains in the reactor body 601, and this reactor body 601 is the containers that wherein are formed with the inner space.In Fig. 2 and 3, basically those parts of CO selective oxidation device 6 that are equal to the counterpart of vaporizer 3, the dielectric film 607 that for example is equal to dielectric film 307 basically, provide the Reference numeral with 600, the low two digits of the Reference numeral of its lower two digits and the counterpart of vaporizer 3 is identical.With the description of omitting, but difference between CO selective oxidation device 6 and the vaporizer 3 is only described corresponding to those parts of the basic identical partial C O selective oxidation device 6 of vaporizer 3.
In CO selective oxidation device 6, except inflow pipe 603 and effuser 604, reactor body 601 also is equipped with air hose 617.Air hose 617 is relative with the zone 610 of the inner space of the reactor body 601 that is arranged in inflow pipe 603 sides.Air hose 617 is communicated with air pump 8.Inflow pipe 603 is communicated with the effuser 504 of reformer 5, and effuser 604 is communicated with the fuel electrode of fuel cell 7.
In CO selective oxidation device 6, catalyst 616 is as the oxidant that is used for the oxidation reaction of carbon monoxide, and it is formed on the whole superficial layer except the part that electric heating film 608 is covered of substrate 605 (comprising the superficial layer in the through hole 606).Catalyst 616 be by the superficial layer to substrate 605 carry out oxidation with this superficial layer is become porous metal oxide and on as the superficial layer of the porous metal oxide of supporting body the bearing catalyst component obtain.In CO selective oxidation device 6, based on the catalyst carrier of Pt on the superficial layer of substrate 605 with as catalytic component.Preferably, with respect to the material that is comprised in the fluid that flows in through hole 606, substrate 605 should have good corrosion resistance, and easily bearing catalyst 616, and should have high thermal conductivity and low thermal coefficient of expansion.The thickness of substrate 605 is less than length and the width of substrate 605 on in-plane.A plurality of through holes 606 form along the thickness direction of substrate 605 parallel to each other, and straight-line extension is not so that can be crooked midway.Voltage application portion part 9 applies voltage/current by line 614 and 615 to electric heating film 608, electric heating film 608 is heated in 140 ℃ to 190 ℃ the scope.
Below, will method that make vaporizer 3, reformer 5 and CO selective oxidation device 6 be described.
At first, use photoetching technique, on the planar substrates 305,505 and 605 of preparation, form Etching mask.Then, the substrate 305,505 and 605 that has Etching mask on it is carried out etching.Thus, in relevant substrate 305,505 and 605, form through hole 306,506 and 606.
Then; by vapor deposition; for example CVD, PVD or sputter form dielectric film 307,507 and 607 with named order on a surface of related substrate 305,505 and 605; electric heating film 308,508 and 608 (comprising line 314 and 315,514 and 515 and 614 and 615), and protection dielectric film 309,509 and 609.
Then, in that substrate 505 and 605 is used as under the situation of anode, negative electrode is immersed in the electrolyte, for example (preferred concentration is 4%) in the solution of phosphorus, in the perhaps oxalic solution (preferred concentration is 5%), thus, the superficial layer of substrate 505 or 605 is carried out oxidation (anodic oxidation).When the superficial layer oxidation of substrate 505 and 605, substrate 505 and 605 superficial layer become the metal oxide (supporting body) of porous.This will make in substrate 505 and 605 each have the ability of carrying.
Next, catalytic component is carried on the superficial layer of substrate 505 and 605, forms catalyst 516 and 616.When the superficial layer of substrate 505 and 605 becomes the metal oxide of porous, can improve the adhesive strength of catalytic component.
Then, substrate 305,505 and 605 is remained in relevant reactor body 301,501 and 601, with the zone 311,511,611 that each the inner space in reactor body 301,501 and 601 is separated into the zone 310,510,610 of that side that is positioned at inflow pipe 303,503,603 and is positioned at that side of effuser 304,504,604.Be communicated with the zone 311,511,611 of that side that is positioned at effuser 304,504,604 through through hole 306,506, the 606 feasible zones 310,510,610 that are positioned at that side of inflow pipe 303,503,603.Make substrate 305,505 and 605 and line 314 and 315,514 and 515 or 614 and 615 in each a part extend to the outside of relevant reactor main body 301,501 or 601 so that be connected to voltage application portion part 9.
Below, will discuss the operation of Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1.
Voltage/current is imposed in electric heating film 308,508 and 608 each, and described electric heating film 308,508 or 608 heat transferred that produced are delivered to the catalyst 516 or 616 on the superficial layer then to substrate 305,505 or 605.
When starting fluid pump 4, will be in the reactor body 301 of vaporizer 3 from the supply of fuel of fuel container 2.When starting air pump 8, the air hose 617 of air outside by CO selective oxidation device 6 is fed to zone 610 in the reactor body 601.
In vaporizer 3, the zone 310 of fuel from reactor body 301 flows to zone 311 through through hole 306.At this moment, heating and vaporized fuel.Being formed on a plurality of through holes 306 in the substrate 305 has increased the surface area of substrate.Therefore, it is big that the contact area between fuel and the substrate 305 becomes, and makes carburretion be more prone to.
By effuser 304 and inflow pipe 503, the fuel (mist of first alcohol and water) of vaporizing is fed in the reactor body 501 of reformer 5.In reformer 5, the zone 510 of fuel from reactor body 501 flows to zone 511 through through hole 506.In reactor body 501, fuel contact catalyst 516 also is heated, and produces hydrogen and carbon dioxide.Particularly, methyl alcohol and steam reaction are to produce carbon dioxide and hydrogen, shown in chemical equation 1 given below.
CH
3OH+H
2O→3H
2+CO
2 (1)
May have such situation, promptly methyl alcohol and water vapour are not restructured as carbon dioxide and hydrogen fully in reactor body 501.In this case, shown in following chemical equation 2, methyl alcohol and steam reaction produce carbon dioxide and carbon monoxide.
2CH
3OH+H
2O→5H
2+CO+CO
2 (2)
The mist of carbon monoxide, carbon dioxide and the hydrogen etc. of generation in the reformer 5 is fed in the reactor body of CO selective oxidation device through effuser 504 and inflow pipe 603.By air hose 617, extraneous air is fed in the reactor body 601.Then, the zone 610 of the mist that has been fed to the zone 610 in the reactor body 601 from reactor body 601 flows in the zone 611 through through holes 606.In reactor body 601, optionally oxidation package is contained in carbon monoxide from the mist of reformer 5 supply to remove carbon monoxide.Particularly, carbon monoxide and the airborne oxygen that is selected from specially in the mist that reformer 5 supplied is reacted, produce carbon dioxide thus, shown in chemical equation 3 given below.
2CO+O
2→2CO
2 (3)
Then, the mist in the reactor body 601 is supplied to the fuel electrode of fuel cell 7 through effuser 604.On the fuel electrode of fuel cell 7, the hydrogen in the mist of being supplied resolves into hydrogen ion and electronics by the effect of the catalyst particles of fuel electrode, shown in following electrochemical equation formula 4.
H
2→2H
++2e
- (4)
In the mist of the fuel electrode that is supplied to fuel cell 7, the otiose product of electrochemical reaction (carbon dioxide etc.) is discharged into the outside.
Air supply is given the air electrode of fuel cell 7.Shown in electrochemistry chemical equation 5, airborne oxygen and hydrogen ion by solid polymer dielectric film and the electron reaction that obtains from fuel electrode produce water thus as product.
2H
++1/2O
2+2e
-→H
2O (5)
In the air of the air electrode that is supplied to fuel cell 7, otiose gas of electrochemical reaction (nitrogen etc.) and the water that produces are discharged into the outside.
In Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1, obviously as seen equation 4 and 5 represented electrochemistry chemical reactions occur in the fuel cell 7 from top, the generation electric energy.Use the electric energy that produces to start the main body of electronic installation, petrolift 4 and electric heating film 308,508,608.
According to present embodiment, as mentioned above, a plurality of through holes 306,506,606 run through relevant substrate 305,505,605, and the pressure loss of the fuel that flows in the through hole 306,506,606 becomes littler.Especially, when the passage that forms when through hole 306,506,606 was not crooked, the fluid streamlined flow made that reducing pressure loss becomes possibility.
When forming through hole 506,606 in relevant substrate 505,605, a large amount of catalytic components can be carried on the wall of through hole 506,606, as the total capacity of through hole 506,606.This makes that the contact area between fuel and the catalyst 516,616 is bigger, so that utilize catalyst 516,616 to carry out the reaction of reactant more efficiently.
The cross-sectional area of each in through hole 306,506,606 becomes more hour, the quantity that penetrates the through hole 306,506,606 of related substrate 305,505,605 by increase can increase the wall area of each through hole 306,506,606 of reactor body 301,501,601, causes the highly effective reaction of fuel.And the increase of the quantity of through hole 306,506,606 can increase the quantity of mobile reactant.
[second embodiment]
With reference to figure 5 second embodiment is described.
In Blast Furnace Top Gas Recovery Turbine Unit (TRT), become vaporizer 13, reformer 15 and CO selective oxidation device 16 according to vaporizer 3, reformer 5 and the CO selective oxidation device of the Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1 of first embodiment according to second embodiment.
Although the vaporizer 3 among first embodiment comprises channel design 302 and the vaporizer 13 among reactor body 301, the second embodiment with pole plate 305 and comprises channel design and the reactor body 301 with substrate 325.Those parts of the appropriate section of the vaporizer that is equal to first embodiment basically 3 of the vaporizer 13 of second embodiment among Fig. 5 are represented with identical Reference numeral, avoiding repeated and redundant to describe those parts that are equal to part substantially in the vaporizer 13, and difference between vaporizer 13 and the vaporizer 3 will be described corresponding to vaporizer 3.
Although the substrate 305 in the vaporizer 3 is single metallic plates, the substrate 325 in the vaporizer 13 is composite plates, and this composite plate comprises two metallic plates or heat-conducting plate 327 and 329 and be clipped in electric heating film 328 between this heat-conducting plate 327 and 329.The same with electric heating film 308, electric heating film 328 is semiconductor heat generators of ohmic heater or Ta-Si-O-N, Au or carbon.When electric heating film 328 remains between heat-conducting plate 327 and 329; pull at base on any outer surface of 325 and do not form electric heating film, dielectric film and protection dielectric film; make when forming channel design 322, can remove the step that forms dielectric film and protection dielectric film.Although heat-conducting plate 327 is the same with substrate 305 with 329, all by forming such as metals such as aluminium, cerium, titanium or silicon, the metal types that is used for heat-conducting plate 327 can be different from the metal that is used for heat-conducting plate 329.Heat-conducting plate 327 is relative with the zone 310 in the reactor body 301, and heat-conducting plate 327 is relative with zone 311.A plurality of through holes 326 extend through another surface from a surface of substrate 325 equally, and make zone 310 and zone 311 be communicated with.The part of substrate 325 extends to the outside of reactor body 301, so that current/voltage is applied to electric heating film 328 from the outside.The thickness of substrate 325 is less than length and the width of substrate 325 on in-plane.
In a second embodiment, reformer 15 comprises channel design 522 and the reactor body 501 with substrate 525.Those parts of the appropriate section of the reformer that is equal to first embodiment basically 5 of the reformer 15 of second embodiment among Fig. 5 are represented with identical Reference numeral, avoiding repeated and redundant to describe those parts that are equal to part substantially of reformer 15, and difference between reformer 15 and the reformer 5 will be described corresponding to reformer 5.
Substrate 525 in the reformer 15 is composite plates, and this composite plate comprises two metallic plates or heat-conducting plate 527 and 529 and be clipped in electric heating film 528 between heat-conducting plate 527 and 529.The same with electric heating film 508, electric heating film 528 is semiconductor heat generators of ohmic heater or Ta-Si-O-N, Au or carbon.When electric heating film 528 remains between heat-conducting plate 527 and 529, do not form electric heating film, dielectric film and protection dielectric film at any outer surface of substrate 525.Although heat-conducting plate 527 is the same with substrate 505 with 529, all by forming such as metals such as aluminium, cerium, titanium or silicon, the metal types that is used for heat-conducting plate 527 can be different from the metal that is used for heat-conducting plate 529.Heat-conducting plate 527 is relative with the zone 510 in the reactor body 501, and heat-conducting plate 529 is relative with zone 511.A plurality of through holes 526 extend through another surface from a surface of substrate 525 equally, and make zone 510 and zone 511 be communicated with.Catalyst 536 is formed on the whole superficial layer of substrate 525, comprises the superficial layer (except those parts of exposing electric heating film 528 of through hole 526) of through hole 526 inside.Catalyst 536 be by the superficial layer to heat-conducting plate 527 and 529 carry out oxidation with superficial layer is become porous metal oxide and on as the superficial layer of the porous metal oxide of supporting body bearing catalyst component (based on the catalyst of Cu/ZnO) obtain.The part of substrate 525 extends to the outside of reactor body 501, so that current/voltage is applied to electric heating film 525 from the outside.The thickness of substrate 525 is less than length and the width of substrate 525 on in-plane.
In a second embodiment, CO selective oxidation device 16 comprises channel design 622 and the reactor body 601 with substrate 625.Those parts of the appropriate section of the CO selective oxidation device 6 that is equal to first embodiment basically of the CO selective oxidation device 16 of second embodiment among Fig. 5 are represented with identical Reference numeral, avoiding repeated and redundant to describe those parts that are equal to part substantially of CO selective oxidation device 16, and difference between CO selective oxidation device 16 and the CO selective oxidation device 6 will be described corresponding to CO selective oxidation device 6.
Substrate 625 in the CO selective oxidation device 16 is composite plates, and this composite plate comprises two metallic plates or heat-conducting plate 627 and 629 and be clipped in electric heating film 628 between this heat-conducting plate 627 and 629.The same with electric heating film 608, electric heating film 628 is semiconductor heat generators of ohmic heater or Ta-Si-O-N, Au or carbon.When electric heating film 628 remains between heat-conducting plate 627 and 629, do not form electric heating film, dielectric film and protection dielectric film at any outer surface of substrate 625.Although heat-conducting plate 627 is the same with substrate 605 with 629, all by forming such as metals such as aluminium, cerium, titanium or silicon, the metal types that is used for heat-conducting plate 627 can be different from the metal that is used for heat-conducting plate 629.Heat-conducting plate 627 is relative with the zone 610 in the reactor body 601, and heat-conducting plate 629 is relative with zone 611.A plurality of through holes 626 extend through another surface from a surface of substrate 625 equally, and make zone 610 and zone 611 be communicated with.Catalyst 636 is formed on the whole superficial layer of substrate 625 (except those parts of exposing electric heating film 628 of through hole 626), and comprises the superficial layer of through hole 626 inside.Catalyst 636 be by the superficial layer to heat-conducting plate 627 and 629 carry out oxidation with this superficial layer is become porous metal oxide and on as the superficial layer of the porous metal oxide of supporting body bearing catalyst component (based on the catalyst of Pt) obtain.The part of substrate 625 extends to the outside of reactor body 601, so that current/voltage is applied to electric heating film 628 from the outside.The thickness of substrate 625 is less than length and the width of substrate 625 on in-plane.
When making vaporizer 13, preparation reformer 15 and CO selective oxidation device 16, substrate 325,525 and 626 and utilize photoetching technique on substrate 325,525 and 625, to form through hole 326,526 and 626 respectively.Then, by anodic oxidation the superficial layer of substrate 525 and 625 is become the metal oxide of porous, and catalytic component is carried on the surface of substrate 525 and 625.Substrate 325,525 and 625 remains in relevant reactor body 301,501 and 601.
In vaporizer 13, reformer 15 and CO selective oxidation device 16, electric heating film 328,528 and 628 utilize electricity to produce heats, heated substrates 325,525 and 625, and heatable catalyst 536 and 636 thus.When starting fluid pump 4, fuel flows through vaporizer 13, reformer 15, CO selective oxidation device 16 and fuel cell 7 according to specified order.In vaporizer 13, fuel flows to zone 311 from zone 310 through through hole 326, and further is heated to vaporization.In reformer 15, the fuel of vaporization flows to zone 511 from zone 510 through through hole 526, and utilizes fuel to produce hydrogen and carbon dioxide etc.In CO selective oxidation device 16, the mist that produces in the reformer 15 flows to zone 611 from zone 610 through through hole 626, and by the oxidation removal carbon monoxide.
In the present embodiment, when a plurality of through holes 326,526 and 626 ran through relevant substrate 325,525 and 625, the pressure loss of the fuel that flows in through hole 326,526 and 626 became littler.Especially, when through hole 326,526 and 626 when not crooked, it is littler that pressure loss can become.
When in electric heating film 328,528 and 628 each remained between the relevant heat-conducting plate, catalytic component can be carried on the major part of superficial layer of substrate 325,525 or 625.
[the 3rd embodiment]
Although in first embodiment channel design 302,502 and 602 remained on independently in the reactor body 301,501 and 601, in the 3rd embodiment, channel design 302,502 and 602 remains in the same reactor body 21, shown in Fig. 6 and 7.Fig. 6 is the perspective view of the reactor 20 of vaporizer, reformer and CO selective oxidation device with one, and Fig. 7 is the cross-sectional view of the reactor 20 that cuts at the thickness direction of reactor body 21 along the line VII-VII of Fig. 6.Use the reactor 20 shown in Fig. 6 and 7 in Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1, this reactor 20 has replaced all vaporizers 3 shown in Figure 1, reformer 5 and CO selective oxidation device 6.
Channel design 302,502 and 602 shown in Fig. 6 and 7 is basically the same as those in the first embodiment respectively.Those identical parts of appropriate section of Fig. 6 and channel design 302,502 7 and first embodiment and 602 are represented with identical Reference numeral, to avoid the repeated and redundant description to the channel design shown in Fig. 6 and 7 302,502 and 602.
In reactor body 21, from inflow pipe 22 towards effuser 23 and arrange substrate 305, the substrate 505 of channel design 502 and the substrate 605 of channel design 602 of channel design 302 according to named order.A surface of substrate 305 is relative with inflow pipe 22, and another surface of substrate 605 is relative with effuser 23, and substrate 305,505 and 605 abreast toward each other.Substrate 305 is separated into the inner space of reactor body 21 in the zone 25 and the zone 26 between substrate 305 and substrate 505 of inflow pipe 22 sides, substrate 505 is separated into zone 26 and the zone 27 between substrate 505 and substrate 605 with the inner space of reactor body 21, and substrate 605 is separated into the inner space of reactor body 21 in the zone 28 of zone 27 and effuser 23 sides.Air hose 24 is relative with the zone 27 between substrate 505 and the substrate 605.
Each substrate 305,505 and a part of 605 extend to the outside of reactor body 21, and form lines 314 and 315,514 and 515 or 614 and 615 in those parts of exposing from reactor body 21.Described line 314 and 315 and substrate 305 on electric heating film 308 integrally formed, described line 514 and 515 and substrate 505 on electric heating film 508 integrally formed, and described line 614 and 615 and substrate 605 on electric heating film 608 integrally formed.
In reactor 20, electric heating film 328,528 and 628 utilizes electricity to produce heats, heated substrates 305,505 and 605, and heatable catalyst 516 and 616 thus.When starting fluid pump 4, fuel is fed to the reactor body 21 from inflow pipe 22.When fuel flows to regionally 26 the time through through holes 306 from zone 25, fuel is heated and vaporizes.When the fuel of vaporization flows to regionally 27 the time through through holes 506 from zone 26, utilize fuel to produce hydrogen and carbon dioxide.When the mist that produces flow to through through holes 606 from zone 27 regional 28 the time, by the carbon monoxide in the oxidation removal mixture.
In the present embodiment, when through hole 306,506 and 606 ran through relevant substrate 305,505 and 605, the pressure loss of the fuel that flows in through hole 306,506 and 606 became littler.Especially, when through hole 306,506 and 606 when not crooked, can reduce pressure loss.
The present invention is not limited to present embodiment, but can make multiple modification and design changes under the condition that does not depart from the scope of the present invention with spirit.
In an embodiment, although each in the electric heating film 308,508 and 608 is formed on the surface of a relevant substrate 305,505 and 605, electric heating film can for example be formed on another surface and go up or can be formed on two surfaces.In the 3rd embodiment, can use the substrate 325,525 and 625 among second embodiment to replace substrate 305,505 and 605.
Although petrolift 4 is to be used for the device that vaporizer 3, vaporizer 13 and reactor 20 to described embodiment provides liquid fuel, can utilize the shower nozzle (drop discharge shower nozzle) of ink-jet printer will offer vaporizer 3, vaporizer 13 and reactor 20 as the fuel of drop.For vaporizer 3, for example can arrange a plurality of drop discharge shower nozzles in the mode relative at the inner surface of the roof of reactor body 301 with through hole 306, make the drop discharge shower nozzle to the fuel of through hole 306 injections, to give vaporizer 3 with supply of fuel as drop.
Although utilize Etching mask to come etch substrate 305,505 and 605, can use metal mask to form through hole 306,506 and 606 by blasting treatment by photoetching technique.
[the 4th embodiment]
Fig. 8 is the perspective view of vaporizer 3, reformer 5 and CO selective oxidation device 6, and Fig. 9 is the cross-sectional view of the vaporizer 3, reformer 5 and the CO selective oxidation device 6 that cut at thickness direction along the line IX-IX of Fig. 8.
Shown in Fig. 8 and 9, vaporizer 3 has reactor body 701 and the channel design 702 that remains in this reactor body 701, and this reactor body 701 is the containers that wherein are formed with the inner space.
To extend through another surface from a surface and be formed on the substrate 705 based on carbon as a plurality of through holes 706 of passage based on the substrate 705 of carbon, wherein said a plurality of through hole 706 forms along the thickness direction of described substrate 705 based on carbon parallel to each other, and straight-line extension is so that can be crooked midway.With reference to Figure 10, Figure 10 is the plane graph of the part of described substrate 705 based on carbon, and through hole 706 has hexagonal cross section, and is arranged to honeycomb-like pattern.Through hole 706 needn't necessarily form cellular, but can adopt other shape, for example triangle, rectangle, greater than rectangular polygon, circle or oval.For the substrate 705 based on carbon shown in the plane graph, through hole 706 needn't necessarily be arranged to honeycomb-like pattern, but can be arranged to two-dimensional array (for example matrix form).
Can form metal oxide film as diaphragm on the end face based on the part of the substrate 705 of carbon, this metal oxide film and fuel reaction are uncorrelated.
As shown in Figure 8, the relative both sides in four sides of described substrate 705 based on carbon extend to the outside of the relative both sides of reactor body 701 respectively.Voltage application portion part 9 is applied to voltage between the both sides of extension, and feasible substrate 705 based on carbon utilizes electricity to produce heats.Penetrate the part place of reactor body 701 at described substrate 705, seal based on the substrate 705 of carbon and the interface between the reactor body 701 described based on carbon.
In the time of on metal oxide film is formed on based on the end face of the substrate 705 of carbon, preferably metal oxide film should be separated into the outside of reactor body 701, to expose the end face based on the substrate 705 of carbon.
Shown in Fig. 8 and 9, the same with vaporizer 3, reformer 5 has reactor master alms bowl 801 and the channel design 802 that remains in this reactor body 801, and this reactor master alms bowl 801 is the containers that wherein are formed with the inner space.In Fig. 8 and 9, basically those parts of the counterpart that is equal to vaporizer 3 of reformer 5, reactor body 801 usefulness that for example are equal to reactor body 701 basically have 500 Reference numeral and represent that its lower two are identical with the low two digits of the Reference numeral of the counterpart of vaporizer 3.To omit reformer 5 and the description that is equal to corresponding those parts of part basically vaporizer 3, and will describe the difference between reformer 5 and the vaporizer 3.
In reformer 5, the effuser 704 of inflow pipe 803 and vaporizer 3 is communicated with, and the effuser 903 of effuser 804 and CO selective oxidation device 6 is communicated with.
The superficial layer based on the substrate 805 of carbon that can not be used as supporting body comes bearing catalyst 816.For example, catalyst 816 can be to be carried on porous metal oxide (aluminium oxide (Al for example
2O
3), titanium oxide or cerium oxide) catalytic component, wherein said porous metal oxide is formed on the superficial layer based on the substrate 805 of carbon as supporting body.Porous metal oxide can be a metal oxide of not participating in fuel reaction (referring to above-mentioned chemical equation 1), perhaps effective metal oxide in the reaction of fuel.The thickness of described substrate 805 based on carbon is less than substrate 805 length and width on in-plane based on carbon.Through hole 806 is formed on the substrate 805 based on carbon by this way, make them parallel to each other along the thickness direction based on the substrate 805 of carbon, and straight-line extension is so that can be crooked midway.
Shown in Fig. 8 and 9, the same with vaporizer 3, CO selective oxidation device 6 has reactor body 901 and the channel design 902 that remains in this reactor body 901, and this reactor body 901 is the containers that wherein are formed with the inner space.In Fig. 8 and 9, basically those parts of CO selective oxidation device 6 that are equal to the counterpart of vaporizer 3, for example being equal to dielectric film 707 dielectric films 907 usefulness basically has 600 Reference numeral and represents, the low two digits of the Reference numeral of its lower two digits and the counterpart of vaporizer 3 is identical, with avoid that repeated and redundant describes CO selective oxidation device 6 with vaporizer 3 be equal to corresponding those parts of part substantially.The following difference that will describe between CO selective oxidation device 6 and the vaporizer 3.
In CO selective oxidation device 6, except inflow pump 903 and efflux pump 904, reactor body 901 is equipped with air hose 917.Air hose 917 is in the face of the zone 910 of the inner space that is arranged in inflow pipe 903 sides in the reactor body 901.Air hose 917 and air pump 8 are communicated with.The effuser 804 of inflow pipe 903 and reformer 5 is communicated with, and the fuel electrode of effuser 904 and fuel cell 7 is communicated with.
In CO selective oxidation device 6, catalyst 916 is formed on the whole porous surface layer based on the substrate 905 of carbon and (comprises the superficial layer in the through hole 906).The catalyst 916 that is used for the oxidation reaction of carbon monoxide is the catalytic components that are carried on based on the perforated membrane on the superficial layer of the substrate 905 of carbon, and wherein said perforated membrane is as supporting body.In CO selective oxidation device 6, be carried on the perforated membrane based on the substrate 905 of carbon as catalytic component based on the catalyst of Pt.
The base based on carbon that can not be used as supporting body is pulled 905 superficial layer and is come bearing catalyst 916.For example, catalyst 916 can be to be carried on porous metal oxide (for example, aluminium oxide (Al
2O
3), titanium oxide or cerium oxide) the catalytic materials component, wherein said porous metal oxide is formed on the superficial layer based on the substrate 905 of carbon as supporting body.Porous metal oxide can be a metal oxide of not participating in the carbon monoxide oxidation, perhaps effective metal oxide in the reaction of fuel.In the time of on being carried on catalyst 916 as the porous metal oxide of supporting body, preferably, metal oxide film should be separated into the outside of reactor body 901, to expose the end face based on the substrate 905 of carbon.Based on the thickness of the substrate 905 of carbon less than length and the width of substrate 905 on in-plane based on carbon.Through hole 906 is formed on the substrate 905 based on carbon as follows, make it parallel to each other along the thickness direction based on the substrate 905 of carbon, and straight-line extension is so that can be crooked midway.
Below, will method that make vaporizer 3, reformer 5 and CO selective oxidation device 6 be described.
At first, prepare flat substrate 705,805 and 905 based on carbon, wherein said substrate 705,805 and 905 based on carbon demonstrates sufficiently high conductivity to be used as the living thermal resistor with porous surface layer, and demonstrate high resistivity, metal mask is formed on the substrate 705,805 and 905 based on carbon, then they is carried out etching with the metal mask on it.As a result, in substrate 705,805 and 905, form a plurality of through holes 706,806 and 906 respectively based on carbon.By the microparticle sandblast being arrived based on the substrate 705,805 of carbon and 905 end face (blasting treatment), can in based on the substrate 705,805 and 905 of carbon, form through hole 706,806 and 906 in the part.
Next, form catalyst 816 and 916 by going up the carrying component at the porous surface layer (the porous surface layer that comprises through hole 806 and 906 inside) of substrate 805 and 905.The method of bearing catalyst component can be dipping method (its based on the substrate 805 and 905 of carbon on coated catalysts slurry solution) on based on the superficial layer of the substrate 805 of carbon and 905.
When will not be during as supporting body based on the superficial layer of the substrate 805 of carbon and 905, form (coating) porous metal oxide film by sol-gel process, dip coated method etc. on based on the superficial layer of the substrate 805 of carbon and 905 (comprising the surface in through hole 806 and 906), and catalytic component is carried on the porous metal oxide film, form catalyst 816 and 916.
Then, to remain on based on the substrate 705,805 and 905 of carbon in relevant reactor body 701,801 and 901, each the inner space in reactor body 701,801 and 901 is separated into the zone 710,810 that is positioned at inflow pipe 703,803 and 903 sides and 910 and be positioned at the zone 711,811,911 of effuser 704,804,904 sides.By through hole 706,806,906 zone 710,810 and 910 of inflow pipe 703,803 and 903 sides is communicated with the zone 711,811,911 of effuser 704,804,904 sides, and makes based on each the two opposite sides in the substrate 705,805 and 905 of carbon and extend to relevant one outside in the reactor body 701,801 and 901.
To the operation of Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1 be described.
When utilizing voltage application portion part 9 when applying voltage/current, produce heat, heatable catalysts 816 and 916 thus based on the substrate 705,805 and 905 of carbon based in the substrate 705,805 and 905 of carbon each.
When starting fluid pump 4, supply fuel to the reactor body 701 of vaporizer 3 from fuel container 2.When starting air pump 8, air is fed to through the air hose 917 of CO selective oxidation device 6 in the zone 910 reactor body 901 from the outside.
In vaporizer 3, the zone 710 of fuel from reactor body 701 flows to zone 711 through through hole 706.When fuel flow through through hole 706, fuel contact was based on the end face of the substrate 705 of carbon, and was heated thus and vaporizes.Because increased surface area, so fuel and become big based on the contact area between the substrate 705 of carbon makes fuel be more prone to vaporization based on the substrate 705 of carbon based on the formation of a plurality of through holes in the substrate 705 of carbon.
The fuel (mixture of first alcohol and water) of vaporization is fed in the reactor body 801 of reformer 5 by effuser 704 and inflow pipe 803.In reformer 5, the zone 810 of fuel from reactor body 801 flows to zone 811 through through hole 806.In reactor body 801, fuel contact catalysis device 816 also is heated, and produces hydrogen and carbon dioxide.Particularly, methyl alcohol and steam reaction produce carbon dioxide and hydrogen, shown in chemical equation 1.
May have such situation, methyl alcohol and water vapour are not restructured as carbon dioxide and hydrogen fully in reactor body 801.In this case, methyl alcohol and steam reaction produce carbon dioxide and carbon monoxide, shown in chemical equation 2.
The mist of carbon monoxide, carbon dioxide and the hydrogen etc. that will produce in reformer 5 is fed in the reactor body of CO selective oxidation device through effuser 804 and inflow pipe 903.Through air hose 917, extraneous air is fed in the reactor body 901.Then, be supplied to the zone 910 of mist from reactor body 901 in the zone 910 in the reactor body 901 to flow to zone 911 through through hole 906.In reactor body 901, the carbon monoxide that is included in the mist that reformer 5 supplied is carried out optionally oxidation in reactor body 901, to remove carbon monoxide.Particularly, with carbon monoxide and the airborne oxygen reaction that is selected from specially in the mist that reformer 5 supplied, thereby produce carbon dioxide, shown in chemical equation 3.
Then, the mist in the reactor body 901 is supplied to the fuel electrode of fuel cell 7 through effuser 904.On the fuel electrode of fuel cell 7, utilize the effect of the catalyst particles of fuel electrode that the hydrogen gas in the mist of supply is separated into hydrogen ion and electronics, shown in electrochemical equation formula 4.
In the mist of the fuel electrode that is supplied to fuel cell 7, will be discharged into the outside to the otiose product of electrochemical reaction (carbon dioxide etc.).
Air supply is given the air electrode of fuel cell 7.Shown in electrochemistry chemical equation 5, airborne oxygen and through the hydrogen ion of solid polymer dielectric film and the electron reaction that obtains from fuel electrode produces water thus as product.
In the air of the air electrode that is supplied to fuel cell 7, will be discharged into the outside to otiose gas of electrochemical reaction (nitrogen etc.) and the water that produces.
In Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1, equation 4 and 5 represented electrochemistry chemical reactions take place in fuel cell 7, produce electric energy.Use the electric energy that produces to start the main body and the petrolift 4 of electronic installation.
In the present embodiment, when conduction based on the substrate 705,805 of carbon and 905 during as the supporting body of bearing catalyst, based on the substrate 705,805 and 905 of carbon because of the current/voltage that applies own generation heat.This has got rid of in reactor body 701,801 and 901 needs of independent heater, electric heating film etc., has simplified the structure of vaporizer 3, reformer 5 and CO selective oxidation device 6 thus.
When fuel directly with oneself generation heat based on the substrate 705,805 of carbon when 905 contact, can make the temperature of end face of substrate even, this guarantees efficient and uniform fuel reaction.
When a plurality of through holes 706,806 and 906 pass relevant based on carbon substrate 705,805 and 905 the time, the pressure loss of the fuel that flows in through hole 706,806 and 906 becomes littler.Because through hole 706,806 and 906 passages that form do not have bending, especially the fluid streamlined flow makes and can reduce pressure loss.
When in relevant substrate 805 and 905, forming a plurality of through hole 806,906, can on the wall of through hole 806,906, carry a large amount of catalytic components, be used for the total amount of through hole 806,906.This makes the contact area between fuel and the catalyst 516,616 become big, so that utilize catalyst 516,616 more effectively to carry out the reaction of reactant.And, when through hole 806,906 straight-line extensions, can suppress the pressure loss in the through hole 806,906, even when the quantity of the catalytic component that carries becomes bigger.
The cross-sectional area of each in through hole 706,806 and 906 becomes more hour, passing relevant substrate 705,805 and 905 through hole 706,806 and 906 quantity based on carbon by increase increases each through hole 706,806 of reactor body 701,801,901 and 906 wall area, and this has produced the highly effective reaction of fuel.And the quantity that increases through hole 706,806 and 906 can increase the quantity of mobile reactant.
[the 5th embodiment]
Although the channel design among the 4th embodiment 702,802 and 902 remains on independently in the reactor body 701,801 and 901, in the 5th embodiment, channel design 702,802 and 902 is remained in the same reactor body 21, shown in Figure 11 and 12.Figure 11 is the perspective view of the reactor 20 of vaporizer, reformer and CO selective oxidation device with one, and Figure 12 is the cross-sectional view of the reactor 20 that cuts at the thickness direction of reactor body 21 along the line XII-XII of Figure 11.In Blast Furnace Top Gas Recovery Turbine Unit (TRT) 1, use the reactor 20 shown in Figure 11 and 12, this reactor 20 replaces all vaporizers 3, reformer 5 and CO selective oxidation device 6 shown in Figure 1.
Those channel designs with the 4th embodiment are identical respectively with 902 with the channel design 702,802 shown in 12 for Figure 11.Those identical parts of counterpart of Figure 11 and channel design 702,802 12 and the 4th embodiment and 902 are represented with identical Reference numeral, to avoid the repeated and redundant description to the various piece of the channel design shown in Figure 11 and 12 702,802 and 902.
In reactor body 21, according to named order 23 the substrates 705 of arranging channel designs 702, channel design 802 from inflow pipe 22 to effuser based on carbon based on the substrate 805 of carbon and the substrate 905 based on carbon of channel design 902.A surface based on the substrate 705 of carbon is relative with inflow pipe 22, and is relative with effuser 23 based on another surface of the substrate 905 of carbon, and substrate 705,805 is parallel to each other relative with 905.The inner space of reactor body 21 is separated into the zone 25 of inflow pipe 22 sides and based on the substrate 705 of carbon with based on the zone 26 between the substrate 805 of carbon based on the substrate 705 of carbon, the inner space of reactor body 21 is separated into zone 26 and based on the substrate 805 of carbon with based on the zone 27 between the substrate 905 of carbon based on the substrate 805 of carbon, and the zone 28 that the inner space of reactor body 21 is separated into zone 27 and effuser 23 sides based on the substrate 905 of carbon.Air hose 24 and based on the substrate 805 of carbon and relative based on the zone 27 between the substrate 905 of carbon.
Extend to the outside of the relative both sides of reactor body 21 respectively based on the relative both sides of four sides of the substrate 705 of carbon.Voltage application portion part 9 applies voltage between the both sides of extending, feasible substrate 705,805 and 905 based on carbon utilizes electricity to produce heats.
In reactor 20,, when starting fluid pump 4, fuel is fed to the reactor body 21 from inflow pipe 22 utilizing substrate 705,805 and 905 to produce under the situation of heat based on carbon.When fuel flows to regionally 26 the time through through holes 706 from zone 25, fuel is heated and vaporizes.When the fuel of vaporization flows to regionally 27 the time through through holes 806 from zone 26, utilize fuel to produce hydrogen and carbon dioxide etc.When the mixture that produces flows to regionally 28 the time through through holes 906 from zone 27, from mixture, remove carbon monoxide by oxidation.
In the present embodiment, when a plurality of through holes 706,806 and 906 penetrate relevant based on carbon substrate 705,805 and 905 the time, the pressure loss of the fuel that flows in through hole 706,806 and 906 becomes littler.Especially, when through hole 706,806 and 906 when not crooked, can reduce pressure loss.When the substrate 705,805 and 905 based on carbon of conduction produces heat because of the current/voltage oneself that applies, needn't in reactor body 701,801 and 901, heater, electric heating film etc. be set, simplify the structure of vaporizer 3, reformer 5 and CO selective oxidation device 6 thus.When fuel directly and oneself generation heat based on the substrate 705,805 of carbon when 905 contact, fuel reaction efficiently takes place.And, utilize substrate 705,805 and 905 heats that produced can be used for fuel reaction effectively based on carbon.
The present invention is not limited to embodiment, but can make various distortion and design changes under the condition that does not depart from the scope of the present invention with spirit.
Although petrolift 4 is the devices that are used for providing to vaporizer 3 and reactor 20 liquid fuel, can utilize the shower nozzle (drop discharge shower nozzle) of ink-jet printer will offer vaporizer 3 and reactor 20 as the fuel of drop.For example, can arrange a plurality of drop discharge shower nozzles in the mode relative, make the drop discharge shower nozzle to the fuel of through hole 706 injections, with fuel supplying as drop at the inner surface of the roof of reactor body 21,701 with through hole 706.
Although in the foregoing description of embodiment, there is not to specifically describe preparation based on the substrate of carbon, but the substrate that is based on carbon can form by following step: at least a in not have to take place such as the adhesive of changes such as fusing (for example under the temperature at microreactor) in mixed active carbon powder and the graphite, and the resulting product of sintering then.
Under the condition that does not break away from the spirit and scope of the present invention, can make various embodiments and variation to this.The foregoing description is intended to describe the present invention, rather than limits the scope of the invention.Scope of the present invention is represented by appended claim, rather than is represented by embodiment.Multiple modification of equal value with claim meaning of the present invention and that make in claim should be thought within the scope of the invention.
Claims (18)
1. chemical reactor comprises:
Reactor body (21,301,501,601), it has the inner space that is formed on wherein; And
Substrate (305,505,705,325,525,725), be inserted into so that with described reactor body (21,301,501,601) described inner space is separated into two zones, and passes described substrate get out a plurality of through holes (306,506 on thickness direction, 606), with described substrate (305,505,705,325,525,725) superficial layer oxidation comprises described through hole (306,506,606) Nei superficial layer carries out oxidation, and catalyst (516,616) is carried on the oxidized superficial layer.
2. chemical reactor comprises:
Reactor body (21,301,501,601), it has the inner space that is formed on wherein; And
Substrate (305,505,705,325,525,725), be inserted into so that with described reactor body (21,301,501,601) described inner space is separated into two zones, and passes described substrate get out a plurality of through holes (306,506 on thickness direction, 606), electric heating film (308,508,608) is formed at least one of two surfaces of described substrate.
3. chemical reactor comprises:
Reactor body (21,301,501,601), it has the inner space that is formed on wherein; And
Substrate (305,505,705,325,525,725), be inserted into so that with described reactor body (21,301,501,601) described inner space is separated into two zones, and passes described substrate get out a plurality of through holes (306,506 on thickness direction, 606), described substrate is by two metallic plates (327,329,527,529,627,629) and be clipped in the composite plate that the electric heating film (328,528,628) between the described metallic plate forms.
4. chemical reactor according to claim 1, wherein, with described a plurality of through holes (306,506,606) form and make them along described substrate (305,505,705,325,525,725) thickness direction is parallel to each other, and straight-line extension is not so that can be crooked midway.
5. want 1 described chemical reactor according to right, wherein, described reactor body (21) has reformer (5), described reformer (5) comprises the substrate (505) with a plurality of through holes (506), and described reformer (5) is reformed to fuel, and gives fuel cell (7) with the supply of fuel of described reformation.
6. chemical reactor according to claim 1, wherein, described reactor body (21) has vaporizer (3) and hydrogen reformer (5), described vaporizer (3) comprises the substrate (305) with a plurality of through holes (306), and described hydrogen reformer (5) comprises the substrate (505) with a plurality of through holes (506).
7. Blast Furnace Top Gas Recovery Turbine Unit (TRT) by using fuel to power comprises:
Chemical reactor as claimed in claim 1 (20), it comprises reactor body (21), this reactor body (21) has fuel reforming and the supply of fuel of described reformation is given the reformer (5) of fuel cell (7); And
Described fuel cell (7), it utilizes the described fuel of reforming by described reformer (5) to generate electricity.
8. chemical reactor according to claim 1, wherein, described substrate (705,805,905) is the resistor substrate.
9. chemical reactor according to claim 8, wherein, described resistor substrate (705,805,905) has the material based on carbon.
10. chemical reactor according to claim 8 also comprises voltage application portion part (9), and it is used for directly voltage being applied to described resistor substrate (705,805,905), produces heat to utilize described resistor substrate (705,805,905).
11. chemical reactor according to claim 8, wherein, catalytic component is carried on the superficial layer of described resistor substrate (705,805,905), comprises on the superficial layer that is carried in the described through hole (706,806,906).
12. chemical reactor according to claim 8, wherein, carrier film is formed on described resistor substrate (705,805,905) on the superficial layer, comprise being formed on described through hole (706,806,906) on Nei the superficial layer, and catalytic component is carried on the described carrier film.
13. chemical reactor according to claim 8 wherein, described through hole (706,806,906) formed makes them parallel to each other along the thickness direction of described resistor substrate (705,805,905), and straight-line extension is so that can be crooked midway.
14. chemical reactor according to claim 8, wherein, described reactor body (21) has reformer (5), it comprises the resistor substrate (805) with a plurality of through holes (806), and described reformer (5) is reformed to fuel and give fuel cell (7) with the supply of fuel of described reformation.
15. want 8 described chemical reactors according to right, wherein said reactor body (21) has vaporizer (3) and hydrogen reformer (5), described vaporizer (3) comprises the resistor substrate (705) with a plurality of through holes (706), and described hydrogen reformer (5) comprises the resistor substrate (805) with a plurality of through holes (806).
16. the Blast Furnace Top Gas Recovery Turbine Unit (TRT) by using fuel to power comprises:
Chemical reactor as claimed in claim 8 (20), it comprises reactor body (21), this reactor body (21) has fuel reforming and the supply of fuel of described reformation is given the reformer (5) of fuel cell (7); And
Described fuel cell (7), it utilizes the described fuel of reforming by described reformer (5) to generate electricity.
17. the Blast Furnace Top Gas Recovery Turbine Unit (TRT) by using fuel to power according to claim 7 also comprises load (4), its electric energy that utilizes described fuel cell to produce comes work.
18. the Blast Furnace Top Gas Recovery Turbine Unit (TRT) by using fuel to power according to claim 17 also comprises heater block (9), it directly is applied to voltage described substrate (505,525,805) to heat described substrate (505,525,805).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51350/2004 | 2004-02-26 | ||
| JP51374/2004 | 2004-02-26 | ||
| JP2004051350A JP4366483B2 (en) | 2004-02-26 | 2004-02-26 | Reactor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1806360A CN1806360A (en) | 2006-07-19 |
| CN100394638C true CN100394638C (en) | 2008-06-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005800004834A Expired - Fee Related CN100394638C (en) | 2004-02-26 | 2005-02-25 | Reactor and power generator |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4366483B2 (en) |
| CN (1) | CN100394638C (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5038619B2 (en) * | 2005-11-18 | 2012-10-03 | 大日本印刷株式会社 | Microreactor and manufacturing method thereof |
| JP5434614B2 (en) | 2010-01-14 | 2014-03-05 | 東京エレクトロン株式会社 | Substrate processing equipment |
| CN102201587A (en) * | 2010-03-22 | 2011-09-28 | 中兴电工机械股份有限公司 | Liquid fuel gasifier with hot plates with through holes |
| JP5605757B2 (en) * | 2010-10-18 | 2014-10-15 | Ｔｏｔｏ株式会社 | Fuel cell device |
| JP6408754B2 (en) | 2013-02-06 | 2018-10-17 | 株式会社Ihi | Reactor |
| CN106784937B (en) * | 2016-11-28 | 2019-11-19 | 苏州氢洁电源科技有限公司 | The vaporizing chamber flow passage structure of methanol fuel cell |
| CN106784938B (en) * | 2016-11-28 | 2019-11-29 | 苏州氢洁电源科技有限公司 | The vaporizing chamber of methanol fuel cell |
| CN106784914B (en) * | 2016-11-28 | 2019-11-19 | 苏州氢洁电源科技有限公司 | The vaporizing chamber sealing structure of methanol fuel cell |
| CN106848353A (en) * | 2017-02-28 | 2017-06-13 | 李毅 | The methyl alcohol water vapor of methanol fuel cell and reformer |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0430184A2 (en) * | 1989-11-27 | 1991-06-05 | Ishikawajima-Harima Heavy Industries Co., Ltd. | Plate type reformer assembly |
| JPH08208202A (en) * | 1995-01-30 | 1996-08-13 | Fuji Electric Co Ltd | Fuel reformer |
| JPH1143305A (en) * | 1997-07-23 | 1999-02-16 | Toyota Motor Corp | Catalytic reaction device and gas distributing device |
| CN1228749A (en) * | 1996-08-26 | 1999-09-15 | 亚瑟·德·力托公司 | Method and apparatus for converting hydrocarbon fuel into hydrogen gas and carbon dioxide |
-
2004
- 2004-02-26 JP JP2004051350A patent/JP4366483B2/en not_active Expired - Fee Related
-
2005
- 2005-02-25 CN CNB2005800004834A patent/CN100394638C/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0430184A2 (en) * | 1989-11-27 | 1991-06-05 | Ishikawajima-Harima Heavy Industries Co., Ltd. | Plate type reformer assembly |
| JPH08208202A (en) * | 1995-01-30 | 1996-08-13 | Fuji Electric Co Ltd | Fuel reformer |
| CN1228749A (en) * | 1996-08-26 | 1999-09-15 | 亚瑟·德·力托公司 | Method and apparatus for converting hydrocarbon fuel into hydrogen gas and carbon dioxide |
| JPH1143305A (en) * | 1997-07-23 | 1999-02-16 | Toyota Motor Corp | Catalytic reaction device and gas distributing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005238099A (en) | 2005-09-08 |
| JP4366483B2 (en) | 2009-11-18 |
| CN1806360A (en) | 2006-07-19 |
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