CN1806360A - Reactor and power generator - Google Patents
Reactor and power generator Download PDFInfo
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- CN1806360A CN1806360A CNA2005800004834A CN200580000483A CN1806360A CN 1806360 A CN1806360 A CN 1806360A CN A2005800004834 A CNA2005800004834 A CN A2005800004834A CN 200580000483 A CN200580000483 A CN 200580000483A CN 1806360 A CN1806360 A CN 1806360A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
Disclosed are a compact reactor capable of reducing pressure loss and supporting a lot of catalysts, and a power generator having the reactor. A reformer (5) includes a reactor main body (501) having inner space formed therein, and a channel structure (502) retained in the reactor main body (502). The channel structure (502) has a base plate (505) as its basic structure. A plurality of through holes (506) are formed in the base plate (505) to connect an area (510) to an area (511) in the reactor main body (501). The surface layer of the base plate (505) is anodized to be altered to a porous metal oxide, and a catalyst component is supported on that surface layer.
Description
Technical field
The present invention relates to have the reactor and the generator that is equipped with reactor of the reactor body that comprises channel design.
Background technology
In recent years, the fuel cell of guaranteeing energy use has efficiently been made research and development energetically.The fuel cell that directly obtains electric energy from the chemical energy by fuel and airborne oxygen generation electrochemical reaction is positioned as following and by the battery of hope.Hydrogen is a kind of fuel that is used for fuel cell, but should be noted that processing and hydrogen gas storage, because hydrogen is gaseous state at normal temperatures.Liquid fuel, for example system's relative compact that the use of alcohol and gasoline can storage of liquids fuel.Yet the use of liquid fuel need be heated to reaction high temperature to produce the reformer of the required hydrogen of generating with liquid fuel and steam.When fuel reforming type fuel cell during, reformer and fuel cell should be made compact as the power supply of compact electronic installation.
To as the making of chemical microreactor of the reformer in examining Japanese patent application KOKAI publication number 2002-102681, described be used as research and development, wherein this patent application discloses the compact chemical microreactor that has a plurality of substrates that link together by use and has produced microfabricated chemical reactor.The open middle chemical microreactor of describing of this patent application will be described in briefly.First substrate that at first prepares polystyrene, forming on one surface will be as the curved slot of passage.Then, by ultraviolet curable resin with cover described groove with second substrate bonding to first substrate, form bending channel thus in the junction of two substrates.Reactant is transported to the bending channel of chemical microreactor by pump etc.Seasonable when the reactant genetic method, produce target product or intermediate product.
When the heating chemical microreactor, the reactant with the heat of chemical microreactor is transferred to the process channel flow and contacted with the wall of passage impels the more effective reaction of reactant.When catalyst is supported on the wall of passage, contact through the reactant of channel flow and the wall of passage, impel the more effective reaction of reactant.Yet when bending channel during at a plurality of location bending, the flow direction of fluid changes, and has increased pressure loss.This needs the big capacity of fluid supply mechanism (for example pump).
If reactant flows in the passage of chemical microreactor, the reaction of the reactant of generation target product or intermediate product takes place.When the reaction of the thing that is difficult at typical temperature to react, should heat chemical microreactor.Also described a kind of mode of heating chemical microreactor in Japanese patent application KOKAI publication number 2002-102681, promptly heat of transfer in substrate wherein passes through to use electric heater, and for example nichrome wire forms passage on this substrate.Yet this method causes the temperature of the substrate portion of contact heater to be different from the not temperature of the substrate portion of contact heater, and perhaps the depth direction at the groove that becomes passage produces temperature gradient.This brings the problem that reaction temperature changes in the groove, makes reactant not react equably.
Summary of the invention
Therefore, the purpose of this invention is to provide a kind of compact reactor that can reduce pressure loss.
Another object of the present invention provides a kind of reactor that allows the reactant homogeneous reaction.
In order to reach this purpose, according to an aspect of the present invention, provide a kind of reactor, comprising:
Reactor body (21,301,501,601) has the inner space that is formed on wherein; With
Substrate (305,505,705,325,525,725) is inserted into so that the inner space of reactor body (21,301,501,601) is separated into two zones, and passes substrate get out a plurality of through holes (306,506,606) on thickness direction.
When reactant being imposed on of two zones separating by substrate, the reactant that applies flows to another zone through the through hole of the substrate that serves as passage.When getting out a plurality of through hole by substrate, reactant flows to another regional pressure loss from a zone and diminishes.
The formation of a plurality of through holes can allow more substantial catalyst to be supported on the wall of through hole total amount as through hole.
When a plurality of through holes are formed in the substrate that remains in the reactor body, make contact area become bigger by making through hole quantity thinner and that increase the through hole penetrate substrate.In other words, flow through the wall of the easier contact through hole of fluid of through hole, increase the possibility of fluid contact wall, it causes effective reaction.
Preferably, in reactor, the superficial layer of substrate (305,505,705,325,525,725) should be oxidized, comprise through hole (306,506,606), and catalyst (516,616) should be to be supported on the superficial layer of oxidation.
The oxidation of the superficial layer of substrate is changed into porous metal oxide with the superficial layer of substrate, and increases surface area thus, make a large amount of catalytic components can be supported on superficial layer above, accelerated reaction.
Preferably, in reactor, electric heating film (308,508,608) should be formed at least one of two surfaces of substrate (305,505,705).
When with electric energy heating electric heating film, cause heat to shift by substrate in the formation of substrate place electric heating film.When the reactant contact substrate that flows in through hole, the heating reactant also produces effectively reaction thus.
Reactor according to another aspect of the present invention comprises:
Reactor body (21,301,801,901) has the inner space that is formed on wherein; With
Resistor substrate (705,805,905) is inserted into so that the inner space of reactor body (21,701,801,901) is separated into two zones, and gets out a plurality of through holes (706,806,906) by this substrate on thickness direction.
Play the effect of the resistor that produces electric heating because of resistor according to the present invention, so resistor substrate itself produces heat when applying voltage.Promptly add zone around the heat through-hole from the heating resistor substrate, make the heat reactant of the substrate by carbon back effectively to react.
Description of drawings
Following concrete description and accompanying drawing are of the present invention will to become more obvious with other purpose and advantage by reading, wherein:
Fig. 1 is the block diagram of generator 1;
Fig. 2 is the perspective view of vaporizer 3, reformer 5 and CO (carbon monoxide) selective oxidation device 6;
Fig. 3 is the cross-sectional view of the vaporizer, reformer and the CO selective oxidation device that cut at thickness direction along the line III-III of Fig. 2;
Fig. 4 is the plane graph of substrate 305;
Fig. 5 is the cross-sectional view of vaporizer 13, reformer 15 and CO (carbon monoxide) selective oxidation device 16;
Fig. 6 is the perspective view of reactor 20;
Fig. 7 is the cross-sectional view of the reactor that cuts at thickness direction along the line VII-VII of Fig. 6;
Fig. 8 is the perspective view of vaporizer 3, reformer 5 and CO selective oxidation device 6;
Fig. 9 is the cross-sectional view of the vaporizer, reformer and the CO selective oxidation device that cut at thickness direction along the line IX-IX of Fig. 8;
Figure 10 is the plane graph of the substrate 705 of carbon back;
Figure 11 is the perspective view of reactor 20; And
Figure 12 is the cross-sectional view of the reactor that cuts at thickness direction along the line XII-XII of Figure 11.
Embodiment
Optimum way of the present invention is described below with reference to the accompanying drawings.Although in order to realize that the present invention has made the preferred restriction in various technical ground to following embodiment, these restrictions are not confined to scope of the present invention the example of the following examples and description.
[first embodiment]
Fig. 1 is the block diagram of generator 1.
Vaporizer 3, petrolift 4, reformer 5, CO selective oxidation device 6 and air pump are installed in the main body of electronic installation.Fuel tank 2 is arranged on the main body place of electronic installation separably, and when fuel tank 2 is connected to the main body of electronic installation, by petrolift 4 fuel in the fuel tank 2 is imposed on vaporizer 3.
The fuel that is retained in the fuel tank 2 is the mixture of liquid chemical fuel and water.Available chemical fuel is hydrogeneous compound, and for example alcohol is as methyl alcohol and ethanol and gasoline.Use the mixture of first alcohol and water to act as a fuel in an embodiment.
Fig. 2 is the perspective view of vaporizer 3, reformer 5 and CO selective oxidation device 6, and Fig. 3 is the cross-sectional view of the vaporizer 3, reformer 5 and the CO selective oxidation device 6 that cut at thickness direction along the line III-III of Fig. 2.
Shown in Fig. 2 and 3, vaporizer 3 has reactor body 301 and the channel design 302 that remains in the reactor body 301, and this reactor body is to have the casing that is formed on inner space wherein.
As basic structure, channel design 302 has the substrate 305 that the metal by high heat conductance constitutes, for example aluminium (thermal conductivity 237W/mK), cerium (thermal conductivity 11.4W/mK), titanium (thermal conductivity 21.9W/mK) or silicon (thermal conductivity 148W/mK), by anodic oxidation, the upper surface of substrate can be a porous.At the thickness of in-plane upper substrate 305 length and width less than substrate 305.Substrate 305 has a plurality of through holes 306 that are penetrated into another surface from a surface of substrate 305 and serve as passage.Form through hole 306 by this way, feasible parallel to each other along the length direction of substrate 305, and straight-line extension is so that can be crooked midway.Reference is as Fig. 4 of the plane graph of the part of substrate 305, and through hole 306 has hexagonal cross section and is arranged to cellular pattern.Through hole 306 needn't form hexagon, and can adopt other form, for example triangle, rectangle, the polygon greater than rectangle, circle or oval.Have the substrate of seeing in plane graph 305, through hole 306 needn't be arranged to cellular pattern, but can be arranged to two-dimensional arrangements (for example matrix form).Preferably, substrate 305 should have bad reaction, have high thermal conductivity and low thermal coefficient of expansion for the material that comprises in the flowing liquid in through hole 306.
As shown in Figure 3, dielectric film 307, for example silicon dioxide film (SiO
2) or silicon nitride film (SiN) be formed between the through hole 306 on the side of the substrate 305 in the channel design 302.By metal oxide, for example Ta-Si-O-N or metal, for example the electric heating film 308 that constitutes of Au is formed on the dielectric film 307.Electric heating film 308 is ohmic heating element or semiconductor heating element, when electric current flows in electric heating film 308 or voltage produce heat when being applied to the there electrically.As having the result of the substrate 305 of low resistivity owing to the voltage that is applied to electric heating film 308 causes electric current to flow to, the insertion of the dielectric film 307 between electric heating film 308 and the substrate 305 can be avoided can not be to the abundant heating of electric heating film 308.The insertion of dielectric film 307 can also make the separation of electric heating film 308 than more difficult when electric heating film 308 is formed directly on the substrate 305.
Protection dielectric film 309, for example silicon oxide film or silicon nitride film are formed on the electric heating film 308.Be coated on the electric heating film 308 protection dielectric film 309 protection electric heating films 308.
As shown in Figure 2, a wherein side of four sides of substrate 305 side of extending reactor body 301.Form and electric heating film 308 integrally formed two lines 314 and 315 at that a part of substrate 305 that exposes from reactor body 301.Voltage application portion part 9 applies voltage/current by line 314 and 315 to electric heating film 308, with heating electric heating film 308 in 80 ℃ to 120 ℃ scope.
Penetrate the part hermetic sealing substrate 305 of a side of reactor body 301 and the interface between the reactor body 301 at substrate 305.
Shown in Fig. 2 and 3, as vaporizer 3, reformer 5 has the reactor body and the channel design 502 that remains in the reactor body 502 as the casing body with the inner space that is formed on wherein.In Fig. 2 and 3, basically those parts of reformer 5 that are equal to the counterpart of vaporizer 3, the dielectric film 507 that for example is equal to dielectric film 307 basically, provide the Reference numeral with 500, the low two digits of the Reference numeral of its lower two digits and the counterpart of vaporizer 3 is identical.With the description of omission, with the difference of only describing between reformer 5 and the vaporizer 3 corresponding to those parts of the reformer 5 of the basic identical part of vaporizer 3.
In reformer 5, the inflow pipe 503 of effuser 304 and vaporizer 3 are communicated with, and the effuser 504 of CO selective oxidation device 6 and inflow pipe 603 are communicated with.
In reformer 5, form on the whole superficial layer of the substrate 505 except the part that is covered by electric heating film 508 as the catalyst converter 516 of reformation catalyst converter.Especially, catalyst 516 be formed in addition the superficial layer of the substrate in through hole 506 505 on.Catalyst 516 is that superficial layer by oxidase substrate 505 is to change over superficial layer porous metal oxide and to obtain at the superficial layer upper support catalytic component as the porous metal oxide of supporting body.Porous metal oxide is aluminium oxide (Al when substrate 505 is aluminium
2O
3).When substrate 505 was titanium, porous metal oxide was a titanium oxide.In reformer 5, Cu-ZnO is catalyst based to be supported on the superficial layer of substrate 505 as catalytic component.Preferably, should have good corrosion resistance with respect to the material substrate 505 that is included in the fluid that flows in the through hole 506, easily support catalyst 516 also should have high thermal conductivity and low thermal coefficient of expansion.At the thickness of in-plane upper substrate 505 length and width less than substrate 505.Form a plurality of through holes 506 by this way, feasible parallel to each other along the length direction of substrate 505, and straight-line extension is so that can be crooked midway.Voltage application portion part 9 applies voltage/current by line 514 and 515 to electric heating film 508, with heating electric heating film 508 in 200 ℃ to 300 ℃ scope.
Shown in Fig. 2 and 3, as vaporizer 3, CO selective oxidation device 6 has as the reactor body 601 of the casing body that is formed on inner space wherein and remains on channel design 602 in the reactor body 601.In Fig. 2 and 3, basically those parts of CO selective oxidation device 6 that are equal to the counterpart of vaporizer 3, the dielectric film 607 that for example is equal to dielectric film 307 basically, provide the Reference numeral with 600, the low two digits of the Reference numeral of its lower two digits and the counterpart of vaporizer 3 is identical.With the description of omission, with the difference of describing between CO selective oxidation device 6 and the vaporizer 3 corresponding to those parts of the basic identical partial C O selective oxidation device 6 of vaporizer 3.
In CO selective oxidation device 6, except inflow pipe 603 and effuser 604, reactor body 601 is equipped with air hose 617.Air hose 617 is relative with the zone 60 of the inner space of the reactor body 601 that is arranged in inflow pipe 603 sides.Air hose 617 and and air pump 8 connections.The inflow pipe 603 of reformer 5 and effuser 504 are communicated with, and the fuel electrode of effuser 604 and fuel cell 7 is communicated with.
In CO selective oxidation device 6, be formed on the whole superficial layer of the substrate 605 (superficial layer that comprises through hole 606) except the part that is covered by electric heating film 608 as the catalyst 616 of the oxidation reaction that is used for carbon monoxide.Catalyst 616 is that superficial layer by oxidase substrate 605 is to change over superficial layer porous metal oxide and to obtain at the superficial layer upper support catalytic component as the porous metal oxide of supporting body.In CO selective oxidation device 6, Pt is catalyst based to be supported on the superficial layer as the substrate 605 of catalytic component.Preferably should have good corrosion resistance with respect to being included in the flowing material substrate 605 that flows in the through hole 606, easily support catalyst 616, should have high thermal conductivity and low thermal coefficient of expansion.At the thickness of in-plane upper substrate 605 length and width less than substrate 605.Form a plurality of through holes 606 by this way, feasible parallel to each other along the length direction of substrate 605, and straight-line extension is so that can be crooked midway.Voltage application portion part 9 applies voltage/current by line 614 and 615 to electric heating film 608, with heating electric heating film 608 in 140 ℃ to 190 ℃ scope.
Will be described below the method for making vaporizer 3, reformer 5 and CO selective oxidation device 6.
At first, use photoetching technique, on the planar substrates 305,505 and 605 of preparation, form Etching mask.Then, etching has the substrate 305,505 and 605 of Etching mask thereon.Thus, in relevant substrate 305,505 and 605, form through hole 306,506 and 606.
Then; by vapor deposition; for example CVD, PVD or sputter with the name order on a surface of related substrate 305,505 and 605, form dielectric film 307,507 and 607, electric heating film 308,508 and 608 (comprises line 314 and 315; 514 and 515, and 614 and 615) and protection dielectric film 309,509 and 609.
Then, substrate 505 and 605 serves as anode, and negative electrode is immersed in the electrolyte, and for example (preferred concentration is 4%) in the solution of phosphorus, in the perhaps oxalic solution (preferred concentration is 5%), thus, oxidase substrate 505 or 605 superficial layer (anodic oxidation).When the superficial layer oxidation of substrate 505 and 605, the superficial layer of substrate 505 and 605 is changed over the metal oxide (supporting body) of porous.This will allow substrate 505 and 605 each have the ability of support.
Next, catalytic component is supported on the superficial layer of substrate 505 and 605, forms catalyst 516 and 616.When the superficial layer of substrate 505 and 605 changes over the metal oxide of porous, can improve the adhesive strength of catalytic component.
Then, substrate 305,505 and 605 remains in relevant reactor body 301,501 and 601, is separated into the zone 311,511,611 on that side of zone 310,510,610 on that side of inflow pipe 303,504,603 and effuser 304,504,604 with each the inner space with reactor body 301,501 and 601.Make the zone 311,511,611 on that side of zone 310,510,610 on that side of inflow pipe 303,504,603 and effuser 304,504,604 be communicated with through through hole 306,506,606.Make substrate 305,505 and 605 and each a part of line 314,514 and 515 or 614 and 615 extend to relevant reactor main body 301,501 or 601 outsides that are connected to voltage application portion part 9.
To the operation of generator 1 be described.
Each of giving electric heating film 308,508 and 608 applies voltage/current, is sent to substrate 305,505 or 605 by electric heating film 308,508 or 608 heats that produce, then the catalyst 516 or 616 to the superficial layer.
When starting fluid pump 4, will be applied to from the fuel of fuel tank 2 reactive agent 301 of vaporizer 3.When starting air pump 8, the air hose 617 by CO selective oxidation device 6 imposes on zone 610 in the reactor body 601 with air outside.
In vaporizer 3, the zone 310 process through holes 306 of fuel from reactor body 301 are to zone 311.At this moment, heating and vaporized fuel.The formation of a plurality of through holes 306 has increased the surface area of substrate in substrate 305.Therefore, it is big that the contact area between fuel and the substrate 305 becomes, and makes carburretion easier.
The fuel (mist of first alcohol and water) of vaporization is applied in the reactive agent 501 of reformer 5, through effuser 304 and inflow pipe 503.In reformer 5, the zone 510 of fuel from reactor body 501 flows to zone 511 through through hole 506.In reactor body 501, fuel contact catalyst 516 also is heated, and produces hydrogen and carbon dioxide.Especially, methyl alcohol and steam reaction are to produce carbon dioxide and hydrogen, and be represented as chemical equation given below.
May have such situation, methyl alcohol and water vapour are not reformed in the carbon dioxide and hydrogen in the reactor body 501 fully.In this case, represented as following chemical equation, methyl alcohol and steam reaction produce carbon dioxide and carbon monoxide.
The mist of carbon monoxide, carbon dioxide and the hydrogen etc. that produce in reformer 5 is applied in the reactive agent of CO selective oxidation device through effuser 504 and inflow pipe 603.Be applied in the reactor body 601 by air hose 617 extraneous airs.Then, zone 610 mists that have been applied in the reactor body 601 flow to the zone 611 through through holes 606 from the zone 610 of reactor body 601.In reactor body 601, optionally oxidation package is contained in carbon monoxide from the mist that reformer 5 applies to remove carbon monoxide in reactor body 601.In fact, be selected from the carbon monoxide and the airborne oxygen reaction of the mist that applies from reformer 5 especially, increase carbon dioxide thus, represented as chemical equation given below 3.
Then, the mist in the reactor body 601 imposes on the fuel electrode of fuel cell 7 through effuser 604.On the fuel electrode of fuel cell 7, the hydrogen gas in the mist that applies resolves into hydrogen ion by the effect of the catalyst particles of fuel electrode, and electrochemical equation formula described as follows 4 is represented.
In the mist that is applied to fuel cell 7, the otiose product of electrochemical reaction (carbon dioxide etc.) is discharged into the outside.
Air is applied to the air electrode of fuel cell 7.Represented as electrochemistry chemical equation 5, airborne oxygen and hydrogen ion by solid polymer dielectric film and the electron reaction that obtains from fuel electrode produce water thus as product.
In the air of the air electrode that is applied to fuel cell 7, otiose gas of electrochemical reaction (nitrogen etc.) and the water that produces are discharged into the outside.
In generator 1, obviously as seen the electrochemistry chemical reactions of equation 4 and 5 expressions occur in the fuel cell 7 from top, the generation electric energy.The electric field energy that produces is used to start the main body of electronic installation, petrolift 4 and electric heating film 308,508,608.
According to embodiment, as mentioned above, a plurality of through holes 306,506,606 run through relevant substrate 305,505,605, and the pressure loss of the fuel that flows in through hole 306,506,606 becomes littler.Especially, when the passage that is formed by through hole 306,506,606 was not crooked, the fluid streamlined flow made that reducing pressure loss becomes possibility.
When at relevant substrate 505,605, middle formation through hole 506,606, a large amount of catalytic components can be supported on the wall of through hole 506,606, as the total capacity of through hole 506,606.This makes that the contact area between fuel and the catalyst 516,616 is bigger, and the result carries out the reaction of reactant more efficiently by catalyst 516,616.
When each cross-sectional area of through hole 306,506,606 becomes more hour, the quantity that penetrates the through hole 306,506,606 of related substrate 305,505,605 by increase can increase the wall area of each through hole 306,506,606 of reactor body 301,501,601, causes the highly effective reaction of fuel.And the increase of the quantity of through hole 306,506,606 can increase the quantity of mobile reactant.
[second embodiment]
With reference to figure 5 second embodiment will be described.
In generator, change into vaporizer 13, reformer 15 and CO selective oxidation device 16 according to vaporizer 3, reformer 5 and the CO selective oxidation device of the generator 1 of first embodiment according to second embodiment.
Although vaporizer 3 comprises channel design 302 and the reactor body 301 with pole plate 305 in first embodiment, vaporizer 13 comprises channel design and the reactor body 301 with substrate 325 in second embodiment.Basically those parts that are equal to the vaporizer 13 of second embodiment among Fig. 5 of appropriate section of vaporizer 3 of first embodiment are presented identical Reference numeral, avoiding, and difference between vaporizer 13 and the vaporizer 3 will be described to the description of those part redundances corresponding to the vaporizer 13 that is equal to part substantially of vaporizer 3.
Although the substrate 305 in the vaporizer 3 is single metallic plates, but the substrate 325 in the vaporizer 13 is to comprise two metallic plates or heat-conducting plate 327 and 329 and the composite plate that is clipped in the electric heating film 328 between heat-conducting plate 327 and 329, electric heating film 328, as electric heating film 308, be the semiconductor heating element of ohmic heating element or Ta-Si-O-N, Au or carbon.When electric heating film 328 remains between heat-conducting plate 327 and 329; on any outer surface of substrate 325, do not form electric heating film, dielectric film and protection dielectric film; the result can eliminate the step that forms dielectric film and protection dielectric film when forming channel structure 322.Although heat-conducting plate 327 and 329, as substrate 305, by metal, for example aluminium, cerium, titanium or silicon constitute, and the metal types that is used for heat-conducting plate 327 can be different from the metal that is used for heat-conducting plate 329.Heat-conducting plate 327 is relative with the zone 310 in the reactor body 301, yet heat-conducting plate 327 is relative with zone 311.A plurality of through holes 326 extend through another surface from a surface of substrate 325 equally, and allow zone 310 and zone 311 to be communicated with.The part of substrate 325 extends to the outside of reactor body 301, and current/voltage is applied to electric heating film 328 from the outside as a result.At the thickness of in-plane upper substrate 325 length and width less than substrate 325.
In second embodiment, reformer 15 comprises channel design and the reactor body 501 with substrate 525.Basically those parts that are equal to the reformer 15 of second embodiment among Fig. 5 of appropriate section of reformer 5 of first embodiment are presented identical Reference numeral, avoiding, and difference between reformer 15 and the reformer 5 will be described to the description of those part redundances corresponding to the reformer 15 that is equal to part substantially of reformer 5.
Substrate 525 in the reformer 15 is to comprise two metallic plates or heat-conducting plate 527 and 529 and the composite plate that is clipped in the electric heating film 528 between heat-conducting plate 527 and 529.Heat conducting film 528 as electric heating film 508, is the semiconductor heating element of ohmic heating element or Ta-Si-O-N, Au or carbon.When electric heating film 528 remains between heat-conducting plate 527 and 529, do not form electric heating film, dielectric film and protection dielectric film at any outer surface of substrate 525.Although heat-conducting plate 527 and 529, as substrate 505, by metal, for example aluminium, cerium, titanium or silicon constitute, and the metal types that is used for heat-conducting plate 527 can be different from the metal that is used for heat-conducting plate 529.Heat-conducting plate 527 is relative with the zone 510 in the reactor body 501, yet heat-conducting plate 529 is relative with zone 511.A plurality of through holes 526 extend through another surface from a surface of substrate 525 equally, and allow zone 510 and zone 511 to be communicated with.Catalyst 536 is formed on the whole superficial layer of the substrate 525 that comprises interior bone 526 (except those parts of the through hole 526 that exposes electric heating film 528).Catalyst 536 is that superficial layer by oxidation heat-conducting plate 527 and 529 is to change over superficial layer porous metal oxide and to obtain at the superficial layer upper support catalytic component (Cu/ZnO is catalyst based) as the porous metal oxide of supporting body.The part of substrate 525 extends to the outside of reactor body 501, and current/voltage is applied to electric heating film 525 from the outside as a result.At the thickness of in-plane upper substrate 525 length and width less than substrate 525.
In second embodiment, CO selective oxidation device 16 comprises channel design and the reactor body 601 with substrate 625.Basically those parts that are equal to the CO selective oxidation device 16 of second embodiment among Fig. 5 of appropriate section of CO selective oxidation device 6 of first embodiment are presented identical Reference numeral, avoiding, and difference between CO selective oxidation device 16 and the CO selective oxidation device 6 will be described to description corresponding to those part redundances that are equal to partial C O selective oxidation device 16 substantially of CO selective oxidation device 6.
Substrate 625 in the CO selective oxidation device 16 is to comprise two metallic plates or heat-conducting plate 627 and 629 and the composite plate that is clipped in the electric heating film 628 between heat-conducting plate 627 and 629.Heat conducting film 628 as electric heating film 608, is the semiconductor heating element of ohmic heating element or Ta-Si-O-N, Au or carbon.When electric heating film 628 remains between heat-conducting plate 627 and 629, do not form electric heating film, dielectric film and protection dielectric film at any outer surface of substrate 625.Although heat-conducting plate 627 and 629, as substrate 605, by metal, for example aluminium, cerium, titanium or silicon constitute, and the metal types that is used for heat-conducting plate 627 can be different from the metal that is used for heat-conducting plate 629.Heat-conducting plate 627 is relative with the zone 610 in the reactor body 601, yet heat-conducting plate 629 is relative with zone 611.A plurality of through holes 626 extend through another surface from a surface of substrate 625 equally, and allow zone 610 and zone 611 to be communicated with.Catalyst 636 is formed on the whole superficial layer of the substrate 625 that comprises interior bone 626 (except those parts of the through hole 626 that exposes electric heating film 628).Catalyst 636 is that superficial layer by oxidation heat-conducting plate 627 and 629 is to change over superficial layer porous metal oxide and to obtain at the superficial layer upper support catalytic component (Cu/ZnO is catalyst based) as the porous metal oxide of supporting body.The part of substrate 625 extends to the outside of reactor body 601, and current/voltage is applied to electric heating film 625 from the outside as a result.At the thickness of in-plane upper substrate 625 length and width less than substrate 625.
When making vaporizer 13, preparation reformer 15 and CO selective oxidation device 16, substrate 325,525 and 626 and on substrate 325,525 and 626, form through hole 326,526 and 626 respectively by photoetching technique.By anodic oxidation the superficial layer of substrate 525 and 625 is become the metal oxide of porous then, and catalytic component is supported on the surface of substrate 525 and 625.Substrate 325,525 and 625 remains in relevant reactor body 301,501 and 601.
In vaporizer 13, reformer 15 and CO selective oxidation device 16, electric heating film 328,528 and 628 produce heat electrically, heated substrates 325,525 and 626, and heatable catalyst 536 and 636 thus.When starting fluid pump 4, flow through vaporizer 13, reformer 15, CO selective oxidation device 16 and fuel cell 7 according to naming order fuel.In vaporizer 13, fuel flows to zone 311 from zone 310 through through hole 326, and further is heated to vaporization.In reformer 15, the fuel of vaporization flows to zone 511 from zone 510 through through hole 526, and produces hydrogen and carbon dioxide etc. by fuel.In CO selective oxidation device 16, the mist that produces in reformer 15 flows to zone 611 from zone 610 through through hole 626, and by the oxidation removal carbon monoxide.
When a plurality of through holes 326,526 and 626 ran through relevant substrate 325,525 and 625, the pressure loss of the fuel that flows in through hole 326,526 and 626 became littler in an embodiment.When through hole 326,526 and 626 when not crooked, especially, it is littler that pressure loss may become.
When each of electric heating film 328,528 and 628 remained between the relevant heat-conducting plate, catalytic component can be supported on above the major part of superficial layer of substrate 325,525 or 625.
[the 3rd embodiment]
Although channel design 302,502 and 602 remains on independently in the reactor body 301,501 and 601 in first embodiment, but in the 3rd embodiment, channel design 302,502 and 602 remains in the same reactor body 21, shown in Fig. 6 and 7.Fig. 6 has whole vaporizer, reformer and CO selective oxidation device perspective view, and Fig. 7 is the cross-sectional view of the reactor 20 that cuts at the thickness direction of reactor body 21 along the line VII-VII of Fig. 6.The reactor 20 of all vaporizers 3 shown in Figure 1, reformer 5 and CO selective oxidation device 6 that in generator 1, used the replacement shown in Fig. 6 and 7.
Fig. 6 and the channel design 302,502 shown in 7 be identical with first embodiment respectively.Fig. 6 identical with 602 appropriate section with the channel design 302,502 of first embodiment is presented identical Reference numeral with those parts of 7, the redundance of the channel design shown in Fig. 6 and 7 302,502 and 602 described avoiding.
In reactor body 21, with substrate 305, the substrate 505 of channel design 502 and the substrate 605 of channel design 602 of naming order 23 layout channel designs 302 from inflow pipe 22 towards effuser.A surface of substrate 305 is relative with inflow pipe 22, and another surface of substrate 605 is relative with effuser 23, and substrate 305,505 and 605 abreast toward each other.Substrate 305 is separated into the zone 25 of inflow pipe 22 sides and the inflow pipe 22 between substrate 305 and the substrate 505 with the inner space of reactor body 21, substrate 505 is separated into zone 27 between zone 26 and substrate 505 and the substrate 605 with the inner space of reactor body 21, and substrate 605 is separated into the inner space of reactor body 21 in the zone 28 of zone 27 and effuser 23 sides.Air hose 24 is relative with the zone 27 between substrate 505 and the substrate 605.
Each substrate 305,505 and a part of 605 extend to the outside of reactor body 21, and line 314 and 315,514 and 515 or 614 and 615 be formed on from reactor body 21 expose that part of on.Line 314 and 315 and substrate 305 be integrally formed on the electric heating film 308, line 514 and 515 and substrate 505 be integrally formed on the electric heating film 508, and line 614 and 615 and substrate 605 be integrally formed on the electric heating film 608.
In reactor 20, electric heating film 328,528 and 628 produces heat electrically, heated substrates 305,505 and 605 and heatable catalyst 516 and 616 thus.When starting fluid pump 4, fuel is imposed on reactor body 21 from inflow pipe 22.When fuel flow to through through holes 306 from zone 25 regional 26 the time, heating fuel and vaporization.When the fuel of vaporization flows to regionally 17 the time through through holes 506 from zone 26, produce hydrogen and carbon dioxide from fuel.When the mist that produces flow to through through holes 606 from zone 27 regional 28 the time, by the carbon monoxide in the oxidation removal mixture.
When through hole 306,506 and 606 ran through relevant substrate 305,505 and 605, the pressure loss of the fuel that flows in through hole 306,506 and 606 became littler in an embodiment.When through hole 306,506 and 606 when not crooked, especially, can reduce pressure loss.
The present invention is not limited to this embodiment, but can make multiple modification and design changes under the condition that does not depart from the scope of the present invention with spirit.
Although in an embodiment electric heating film 308,508 with 608 each be formed on the surface of a relevant substrate 305,505 and 605,, for example electric heating film can be formed on another surface and goes up or can be formed on two surfaces.In the 3rd embodiment, can use second substrate 325,525 and 625 among the embodiment to replace substrate 305,505 and 605.
Although petrolift 4 is structures that liquid fuel is provided to vaporizer 3, vaporizer 13 and reactor 20 among the embodiment, can will offer vaporizer 3, vaporizer 13 and reactor 20 as the fuel of droplet by the shower nozzle (droplet discharging shower nozzle) of ink-jet printer.For vaporizer 3, for example can be at the inner surface of the roof of reactor body 301 to arrange a plurality of droplets discharge shower nozzles with through hole 306 relative modes, make droplet discharge shower nozzle to through hole 306 injections as the fuel of droplet to provide fuel to vaporizer 3.
Although utilize mask etching substrate 305,505 and 605 against corrosion, can use metal mask to form through hole 306,506 and 606 by blasting treatment by photoetching technique.
[the 4th embodiment]
Fig. 8 is the perspective view of vaporizer 3, reformer 5 and CO selective oxidation device 6, and Fig. 9 is the cross-sectional view of the vaporizer 3, reformer 5 and the CO selective oxidation device 6 that cut at thickness direction along the line IX-IX of Fig. 8.
Shown in Fig. 8 and 9, vaporizer 3 has the reactor body 701 of casing body and remains on the channel design 702 of reactor body 701, and this casing body has formation inner space wherein.
As basic structure, channel design 702 comprises the carbon back substrate 705 of electrically conductive graphite or porous activated carbon.Carbon back substrate 705 is that electric heating has a resistance, and it has the conductivity of proper resistor rate and produce heat when applying current/voltage by voltage application portion part 9.With respect to the material that is included in the fluid that flows in the through hole 706, carbon back substrate 705 has bad reaction and high thermal conductivity, makes more easily to guarantee even temperature on the whole surface of substrate, and has low thermal coefficient of expansion, if make heating, catalyst is difficult to decompose.On in-plane, the thickness of carbon back substrate 705 is less than length and width.
The a plurality of through holes 706 that extend through another surface from a surface of carbon back substrate 705 and serve as passage are formed on the carbon back substrate 705, form a plurality of through holes 706 by this way, feasible parallel to each other along the length direction of substrate 705, and straight-line extension is so that can be crooked midway.Reference is as Figure 10 of the plane graph of the part of carbon back substrate 705, and through hole 706 has hexagonal cross section, and is arranged to cellular pattern.Through hole 706 needn't form cellular, but can adopt other form, for example triangle, rectangle, many and rectangular polygon, circle or oval.Have the substrate of seeing with plane graph 705, through hole 706 needn't be arranged to cellular figure, but can be arranged to two-dimensional arrangements (for example matrix form).
On a part of top surface of carbon back substrate 705, can form diaphragm with the incoherent metal oxide film of fuel reaction.
Carbon back substrate 705 remains in the reactor body 701, and supports and support by the diapire of lower support part 713 away from reactive agent 701 by the roof of upper support part 712 away from reactor body 701.By carbon back substrate 705 inner space of reactor body 701 is separated into the zone 710 of inflow pipe 703 sides and the zone 711 of effuser 704 sides.A surface of carbon back substrate 705 is relative with the roof of reactor body 701, yet another surface of carbon back substrate 705 is relative with the diapire of reactor body 701, and the zone 711 of the zone 710 of inflow pipe 703 sides and effuser 704 sides is communicated with by through hole 706.Therefore, through hole 706 serves as from the zone of inflow pipe 703 sides to the passage in the zone of effuser 704 sides.
As shown in Figure 8, the relative both sides of four sides of carbon back substrate 705 extend to the outside, relative both sides of reactor body 701 respectively.By voltage application portion part 9 voltage is applied between the both sides of extension, makes carbon back substrate 705 produce heat electrically.Run through the part sealing carbon back substrate 705 of reactor body 701 and the interface between the reactor body 701 at carbon back substrate 705.
When metal oxide film was formed on the top surface of carbon back substrate 705, preferably, metal oxide film should be separated into the outside of reactor body 701, to expose the top surface of carbon back substrate 705.
Shown in Fig. 8 and 9, as vaporizer 3, reformer 5 has the reactor body 801 and the channel design 802 that remains in the reactor body 801 as the casing body, and this casing body has the inner space that is formed on wherein.In Fig. 8 and 9, basically those parts of reformer 5 that are equal to the counterpart of vaporizer 3, the reactor body 801 that for example is equal to reactor body 701 basically is presented 500 Reference numeral, and the low two digits of the Reference numeral of the counterpart of the sum-bit vaporizer 3 that it is lower is identical.With the description of omitting, and the difference of reformer 5 and vaporizer 3 will be described corresponding to those parts of the reformer 5 that is equal to part basically of vaporizer.
In reformer 5, the effuser 704 of inflow pipe 803 and vaporizer 3 is communicated with, and the effuser 903 of effuser 804 and CO selective oxidation device 6 is communicated with.
Carbon back substrate 805 remains in the reactor body 801, and supports and support by the diapire of lower support part 813 away from reactive agent 801 by the roof of upper support part 812 away from reactor body 801.In reformer 5, the whole superficial layer of carbon back substrate 805 is perforated membranes of support catalyst 816.Therefore, catalyst 816 be formed in addition the superficial layer of the carbon back substrate 805 in through hole 806 on.Catalyst 816 is to be supported on catalytic component on the superficial layer of carbon back substrate 805 together with superficial layer as supporting body.In reformer 5, Cu/ZnO is catalyst based to be supported as the catalytic component on the superficial layer of carbon back substrate 805.
Can not be used as the superficial layer support catalyst 816 of the carbon back substrate 805 that serves as supporting body.For example catalyst 816 can be the porous metal oxide that is supported on the supporting body on the superficial layer that forms carbon back substrate 805 (aluminium oxide (Al for example
2O
3), titanium oxide or cerium oxide) catalytic component.Porous metal oxide can be the metal oxide that is not included in (referring to above-mentioned chemical equation 1) in the reaction of fuel, perhaps effective metal oxide in the reaction of fuel.The thickness of carbon back substrate 805 is less than length and width on in-plane.Through hole 806 is formed on the carbon back substrate 805 by this way, and is feasible parallel to each other along the length direction of substrate 805, and straight-line extension is so that can be crooked midway.
Shown in Fig. 8 and 9, as vaporizer 3, CO selective oxidation device 6 has the interpretative function main body 901 and the channel design that remains in the reactor body 901 as the casing body, and this casing body has the inner space that is formed on wherein.In Fig. 8 and 9, basically those parts of CO curing period 6 that are equal to the counterpart of vaporizer 3, for example be equal to dielectric film 707 dielectric films 907 basically and be presented 600 Reference numeral, the low two digits of the Reference numeral of its lower two digits and the counterpart of vaporizer 3 is identical, to avoid the redundance description corresponding to those parts that are equal to partial C O selective oxidation device 6 substantially of vaporizer.Following the different of CO selective oxidation device 6 and vaporizer 3 will be described.
In CO selective oxidation device 6, reactor body 901 is equipped with air pump 917 except inflow pump 903 and efflux pump 904.Air pump 917 is relative with the zone 910 of the inner space of the reactor body 901 that is arranged in inflow pipe 903 sides.Air hose 917 and air pump 8 are communicated with.The effuser 804 of inflow pipe 903 and reformer 5 is communicated with, and the fuel electrode of effuser 904 and fuel cell 7 is communicated with.
Carbon back substrate 905 remains in the reactor body 901, and supports and support by the diapire of lower support part 913 away from reactive agent 901 by the roof of upper support part 912 away from reactor body 901.
In CO selective oxidation device 6, catalyst 916 is formed on the whole porous surface layer of carbon back substrate 905 and (comprises the superficial layer in the through hole 906).The catalyst 916 that is used for the oxidation reaction of carbon monoxide is to be supported on catalytic component on the perforated membrane on the superficial layer of carbon back substrate 905 together with the perforated membrane that serves as supporting body.In CO selective oxidation device 6, Pt is catalyst based to be supported as the catalytic component on the perforated membrane of carbon back substrate 905.
The method of making vaporizer 3, reformer 5 and CO selective oxidation device 6 will be described below.
At first, the sufficiently high conductivity of preparation expression is to serve as the heat generating resistor with porous surface layer and the plane carbon back substrate 705,805 and 905 of high resistivity, metal mask is formed on carbon back substrate 705,805 and 905, with the metal mask on it etching successively they.As a result, in carbon back substrate 705,805 and 905, form a plurality of through holes 706,806 and 906 respectively.By the microparticle sandblast being arrived the top surface (blasting treatment) of carbon back substrate 705,805 and 905, through hole 706,806 and 906 can be formed in carbon back substrate 705,805 and 905.
Next, form catalyst 816 and 916 (the porous surface layer that comprises through hole 806 and 906 inside) by porous surface layer upper support component in carbon back substrate 805 and 905.Method at the superficial layer upper support catalytic component of carbon back substrate 805 and 905 can be dipping method (they are coated catalysts slurry solution on carbon back substrate 805 and 905).
When the superficial layer of carbon back substrate 805 and 905 can not serve as supporting body, (comprising the surface in through hole 806 and 906) by sol-gal process, dip coated method etc. on the superficial layer of carbon back substrate 805 and 905 forms (coating) porous metals oxide-film and at porous metals oxide-film upper support catalytic component, forms catalyst 816 and 916.
Then, carbon back substrate 705,805 and 905 is remained in relevant reactor body 710,801 and 901, with each the inner space with reactor body 701,801 and 901 be separated on inflow pipe 710,803 and 903 sides zone 710,810 and 910 and effuser 704,804,904 sides on zone 711,811,911.By through hole 706,806,906 make on inflow pipe 710,803 and 903 sides zone 710,810 and 910 and effuser 704,804,904 sides on zone 711,811,911 be communicated with, and make carbon back substrate 705,805 and 905 each two opposite sides extend to one the outside relevant with reactor body 701,801 and 901.
To the operation of generator 1 be described.
When by voltage application portion part 9 when each of carbon back substrate 705,805 and 905 applies voltage/current, carbon back substrate 705,805 and 905 produces heat, heatable catalysts 816 and 916 thus.
When starting fluid pump 4, fuel is provided to the reactor body 701 of vaporizer 3 from fuel tank body 2.When starting air pump 8, air is provided to the reactor body 901 in the zone 910 from the outside through CO selective oxidation device 6.
In vaporizer 3, the zone 710 of fuel from reactor body 701 flows to zone 711 through through hole 706.When fuel flow through through hole 706, the top surface of fuel contact carbon back substrate 705 also was heated thus and vaporizes.Because the formation of a plurality of through holes in the carbon back substrate 705 has increased the surface area of carbon back substrate 705, it is big that contact area between fuel and the carbon back substrate 705 becomes, and makes the easier vaporization of fuel.
The fuel (mixture of first alcohol and water) of vaporization is applied in the reactor body 801 of reformer 5, passes effuser 704 and inflow pipe 803.In reformer 5, the zone 810 of fuel from reactor body 801 flows in the zone 811 through through hole 806.In reactor body 810, fuel contact catalysis device 816 also is heated, and produces hydrogen and carbon dioxide.Particularly, methyl alcohol and steam reaction produce carbon dioxide and hydrogen, as shown in the chemical equation 1.
May have such situation, methyl alcohol and water vapour are not restructured as carbon dioxide and hydrogen fully in reactor body 801.In this case, methyl alcohol and steam reaction produce carbon dioxide and carbon monoxide, as shown in the chemical equation 2.
The mist of carbon monoxide, carbon dioxide and the hydrogen etc. that will produce in reformer 5 is provided in the reactor body of CO selective oxidation device through effuser 804 and inflow pipe 903.Through air hose 917, extraneous air is provided in the reactor body 901.Then, the zone 910 of zone 910 mists from reaction zone main body 901 that has been provided in the reactor body 901 flows to zone 911 through through hole 906.In reactor body 901, selectively be included in the oxidation reactor main body 901 from reformer 5 carbon monoxide the mist is provided, remove carbon monoxide.Particularly, be selected from the carbon monoxide and the airborne oxygen reaction of the mist that provides from reformer 5 especially, produce carbon dioxide, as shown in the chemical equation 3.
Then, the mist in the reactive agent 901 is imposed on the fuel electrode of fuel cell 7 through effuser 904.On the fuel electrode of fuel cell 7, the effect of the catalyst particles by fuel electrode is separated into hydrogen ion and electronics with the hydrogen gas in the mist that applies, as shown in the electrochemical equation formula 4.
In the mist of the fuel electrode that imposes on fuel cell 7, the otiose product of electrochemical reaction (carbon dioxide etc.) is discharged into the outside.
Air is imposed on the air electrode of fuel cell 7.Shown in electrochemistry chemical equation 5, airborne oxygen and through the hydrogen ion of solid polymer dielectric film and the electron reaction that obtains from fuel electrode produces water thus as product.
In the air of the air electrode that is applied to fuel cell 7, will be rejected to the outside to otiose gas of electrochemical reaction (nitrogen etc.) and the water that produces.
In generator 1, the electrochemistry chemical reaction of equation 4 and 5 expressions takes place in fuel cell 7.The electric energy that produces is used to start the main body and the petrolift 4 of electronic installation.
When the carbon back substrate 705,805 and 905 of conduction was used as the supporting body of support catalyst, carbon back substrate 705,805 and 905 was because the current/voltage that applies produces heat certainly in an embodiment.This has got rid of in reactor body 701,801 and 901 and has needed independent heater, electric heating film etc., has simplified structure, reformer 5 and the CO selective oxidation device 6 of vaporizer 3 thus.
When fuel directly with the carbon back substrate 705,805 that produces heat certainly when 905 contact, can make the temperature of top surface of substrate even, guarantee effective and uniform fuel reaction.
When a plurality of through holes 706,806 when 906 pass relevant carbon back substrate 705,805 and 905, the pressure loss of the fuel that flows in through hole 706,806 and 906 becomes littler.Because the passage that is formed by through hole 706,806 and 906 does not have bending, especially the fluid streamlined flow makes and can reduce pressure loss.
When in relevant substrate 805 and 905, forming a plurality of through hole 806,906, can be used for the total capacity of through hole 806,906 at a plurality of catalytic components of wall upper support of through hole 806,906.This makes the contact area between fuel and the catalyst 516,616 become big, and the result more effectively carries out the reaction of reactant by catalyst 516,616.And, when through hole 806,906 straight-line extensions, can suppress the pressure loss in the through hole 806,906, even when the quantity of the catalytic component that supports becomes bigger.
When each cross-sectional area of through hole 706,806 and 906 becomes more hour, run through the through hole 706,806 of relevant carbon back substrate 705,805 and 905 and 906 quantity increases each through hole 706,806 of reactor body 701,801,901 and 906 wall area by increase, produce the effecting reaction of fuel.And the increase of through hole 706,806 and 906 quantity can increase the quantity of mobile reactant.
[the 5th embodiment]
Although channel design 702,802 and 902 remains on independently reactor body 701,801 and 901 in the 4th embodiment, but channel design 702,802 and 902 remains in the identical reactor body 21 in the 5th embodiment, shown in Figure 11 and 12.Figure 11 is the perspective view of reactor 20, has whole vaporizer, reformer and CO selective oxidation device, and Figure 12 is the cross-sectional view of the reactor 21 that cuts at the thickness direction of reactor body 21 along the line XII-XII of Figure 11.Whole reactor 20 at the vaporizer 3 shown in Figure 1 of the replacement shown in Figure 11 and 12, reformer 5 and CO selective oxidation device 6 is used for generator 1.
Figure 11 and the channel design 702,802 shown in 12 and 902 identical with the 4th embodiment respectively.Figure 11 identical with 902 counterpart with the channel design 702,802 of the 4th embodiment is presented identical Reference numeral with those parts of 12, the redundance of the various piece of the channel design shown in Figure 11 and 12 702,802 and 902 described avoiding.
In reactor body 21, arrange carbon back substrate 705, the carbon back substrate 805 of passage 802 and the carbon back substrate 905 of channel design 902 of channel design 702 from inflow pipe 22 road effusers 23 with the order of name.A surface of carbon back substrate 705 is relative with inflow pipe 22, and the surperficial effuser of another of carbon back substrate 905 23 is relative, and substrate 705,805 is parallel to each other relative with 905.Carbon back substrate 705 is separated into zone 25 on inflow pipe 22 sides and the zone 26 between carbon back substrate 705 and the carbon back substrate 805 with the inner space of reactor body 21, carbon back substrate 805 is separated into zone 26 and 27 between carbon back substrate 805 and the carbon back substrate 905 with the inner space of reactor body 21, and carbon back substrate 905 is separated into the inner space of reactor body 21 in the zone 27 and the zone 28 of effuser 23 sides.Zone 27 between air hose 24 and carbon back substrate 805 and the carbon back substrate 905 is relative.
The relative both sides of four sides of carbon back substrate 705 extend to the outside, relative both sides of reactor body 21 respectively.Between the both sides of extending, apply voltage by voltage application portion part 9, make carbon back substrate 705,805 and 905 produce heat electrically.
In reactor 20, the carbon back substrate 705,805 and 905 with producing heat when starting fluid pump 4, imposes on reactor body 21 from inflow pipe 22 with fuel.When fuel flows to regionally 26 the time through through holes 706 from zone 25, fuel is heated and vaporizes.When the fuel of vaporization flows to regionally 27 the time through through holes 806 from zone 26, produce hydrogen and carbon dioxide etc. from fuel.When the mixture that produces flows to regionally 28 the time through through holes 906 from zone 27, from mixture, remove carbon monoxide by oxidation.
When a plurality of through holes 706,806 and 906 ran through relevant carbon back substrate 705,805 and 905, the pressure loss of the fuel that flows in through hole 706,806 and 906 became littler in an embodiment.When through hole 706,806 and 906 when not crooked, especially, can reduce pressure loss.When the carbon back substrate 705,805 and 905 of conduction produces heat certainly because of the current/voltage that applies, needn't heater, electric heating film etc. be set reactor body 701,801 and 901 kind, simplify the structure of vaporizer 3, reformer 5 and CO selective oxidation device 6 thus.When fuel directly with the carbon back substrate 705,805 that produces heat certainly when 905 contact, the reaction of fuel effectively takes place.And the amount of the heats that produce from carbon back substrate 705,805 and 905 can be used for fuel reaction effectively.
The present invention is not limited to embodiment, but can make various distortion and design changes under the condition that does not depart from the scope of the present invention with spirit.
Although petrolift 4 is structures that liquid fuel is provided to vaporizer 3, vaporizer 13 and reactor 20, can will offer vaporizer 3 and reactor 20 as the fuel of droplet by the shower nozzle (droplet discharging shower nozzle) of ink-jet printer.For example, can be at the inner surface of the roof of reactor body 21,701 to arrange a plurality of droplets discharge shower nozzles with through hole 706 relative modes, make droplet discharge shower nozzle to through hole 706 injections as the fuel of droplet so that fuel to be provided.
Although in the foregoing description of embodiment, do not specifically describe the preparation of carbon back substrate, but by not causing change, mixed active carbon powder and graphite at least a in the adhesive that melts when the temperature of little reaction for example, and the product that obtains of sintering then can form the carbon back substrate.
Under the condition that does not break away from the spirit and scope of the present invention, can make various embodiments and variation to this.The foregoing description be intended to describe originally peddle can, do not limit the scope of the invention.Represent scope of the present invention by subsidiary claim rather than embodiment.Multiple modification of equal value with claim meaning of the present invention and that make in claim is considered within the scope of the invention.
Claims (19)
1, a kind of reactor comprises:
Reactor body (21,301,501,601) has the inner space that is formed on wherein; With
Substrate (305,505,705,325,525,725), be inserted into and make described reactor body (21,301,501,601) described inner space is separated into two zones, and passes described substrate get out a plurality of through holes (306,506,606) on thickness direction.
2, according to the reactor of claim 1, wherein, the superficial layer of described substrate (305,505,705,325,525,725) is oxidized, comprise that described through hole (306,506,606) is oxidized, and catalyst (516,616) is supported on the superficial layer of described oxidation.
3, according to the reactor of claim 1, wherein, electric heating film (308,508,608) is formed at least one of two surfaces of described substrate (305,505,705).
4, according to the reactor of claim 1, wherein, described substrate (325,525,725) comprises two metallic plates (327,329,527,529,627,629) and the electric heating film (328,528,628) that is clipped between the described metal level.
5, according to the reactor of claim 1, wherein said through hole (306,506,606) forms by this way, and is feasible parallel to each other along the length direction of described substrate (305,505,705,325,525,725), and straight-line extension is so that can be crooked midway.
6, want 1 reactor according to right, wherein, described reactor body (21) has reformer (5), and described reformer (5) comprises the substrate (505) with a plurality of through holes (506), and fuel reforming and the fuel of described reformation offered fuel cell (7).
7, according to the reactor of claim 1, wherein, described reactor body (21) has vaporizer (3) and hydrogen reformer (5), described vaporizer (3) comprises the substrate (305) with a plurality of through holes (306), and described hydrogen reformer (5) comprises the substrate (505) with a plurality of through holes (506).
8, a kind of generator comprises:
Reactor as claimed in claim 1 (20), it comprises the reactor body (21) that has fuel reforming and the fuel of described reformation is offered the reformer (5) of fuel cell (7); With
Described fuel cell (7) utilizes the described fuel of reforming by described reformer (5) to produce electric power.
9, a kind of reactor comprises:
Reactor body (21,701,801,901) has the inner space that is formed on wherein; With
Resistor substrate (705,805,905) is inserted into feasible with described reactor body (21,701,801,901) described inner space is separated into two zones, and pass described resistor substrate and on thickness direction, get out a plurality of through holes (706,806,906).
10, according to the reactor of claim 9, wherein, described resistor substrate (705,805,905) has carbon-based material.
11, according to the reactor of claim 9, also comprise voltage application portion part (9), be used for directly voltage being applied to described resistor substrate (705,805,905), to produce heat from described resistor substrate (705,805,905).
12, according to the reactor of claim 9, wherein, catalytic component is supported on the superficial layer of the described resistor substrate (705,805,905) that comprises described through hole (706,806,906).
13, according to the reactor of claim 9, wherein, support membrane is formed on the superficial layer of the described resistor substrate (705,805,905) that comprises described through hole (706,806,906), and catalytic component is supported on the described support membrane.
14, according to the reactor of claim 9, wherein, described through hole (706,806,806) forms by this way, and is feasible parallel to each other along the length direction of described resistor substrate (705,805,905), and straight-line extension is so that can be crooked midway.
15, according to the reactor of claim 9, wherein, described reactor body (21) has reformer (5), and it comprises the substrate (805) with a plurality of through holes (806), and fuel reforming and the fuel of described reformation offered fuel cell (7).
16, want 9 reactor according to right, wherein said reactor body (21) has vaporizer (3) and hydrogen reformer (5), described vaporizer (3) comprises the substrate (705) with a plurality of through holes (706), and described hydrogen reformer (5) comprises the substrate (805) with a plurality of through holes (806).
17, a kind of generator comprises:
Reactor as claimed in claim 9 (20), it comprises the reactor body (21) that has fuel reforming and the fuel of described reformation is imposed on the reformer (5) of fuel cell (7); With
Described fuel cell (7) utilizes the described fuel of reforming by described reformer (5) to produce electric power.
18, a kind of generator comprises:
Reactor comprises having the reactor body (21,501,601) that is formed on inner space wherein; And substrate (505,525,805), be inserted into so that the described inner space of described reactor body (21,501,801) is separated into two zones, and pass described substrate and on thickness direction, get out a plurality of through holes (506,806), feasible working as when fuel passes described through hole (506,806), reformed;
Fuel cell (7) utilizes the fluid of being reformed by described substrate (505,525,805) to produce electric power; With
Load (4), the electric energy that produces by described fuel cell (7) moves.
19, according to the reactor of claim 18, also comprise heater block (9), it directly is applied to voltage described substrate (505,525,805) to heat described substrate (505,525,805).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51350/2004 | 2004-02-26 | ||
| JP51374/2004 | 2004-02-26 | ||
| JP2004051350A JP4366483B2 (en) | 2004-02-26 | 2004-02-26 | Reactor |
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| Publication Number | Publication Date |
|---|---|
| CN1806360A true CN1806360A (en) | 2006-07-19 |
| CN100394638C CN100394638C (en) | 2008-06-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2005800004834A Expired - Fee Related CN100394638C (en) | 2004-02-26 | 2005-02-25 | Reactor and power generator |
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| JP (1) | JP4366483B2 (en) |
| CN (1) | CN100394638C (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102201587A (en) * | 2010-03-22 | 2011-09-28 | 中兴电工机械股份有限公司 | Liquid fuel gasifier with hot plates with through holes |
| CN106784914A (en) * | 2016-11-28 | 2017-05-31 | 苏州氢洁电源科技有限公司 | The vaporizer sealing structure of methanol fuel cell |
| CN106784937A (en) * | 2016-11-28 | 2017-05-31 | 苏州氢洁电源科技有限公司 | The vaporizer flow passage structure of methanol fuel cell |
| CN106784938A (en) * | 2016-11-28 | 2017-05-31 | 苏州氢洁电源科技有限公司 | The vaporizer of methanol fuel cell |
| CN106848353A (en) * | 2017-02-28 | 2017-06-13 | 李毅 | The methyl alcohol water vapor of methanol fuel cell and reformer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5038619B2 (en) * | 2005-11-18 | 2012-10-03 | 大日本印刷株式会社 | Microreactor and manufacturing method thereof |
| JP5434614B2 (en) | 2010-01-14 | 2014-03-05 | 東京エレクトロン株式会社 | Substrate processing equipment |
| JP5605757B2 (en) * | 2010-10-18 | 2014-10-15 | Ｔｏｔｏ株式会社 | Fuel cell device |
| JP6408754B2 (en) | 2013-02-06 | 2018-10-17 | 株式会社Ihi | Reactor |
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| JPH085644B2 (en) * | 1989-11-27 | 1996-01-24 | 石川島播磨重工業株式会社 | Plate reformer |
| JPH08208202A (en) * | 1995-01-30 | 1996-08-13 | Fuji Electric Co Ltd | Fuel reformer |
| US6126908A (en) * | 1996-08-26 | 2000-10-03 | Arthur D. Little, Inc. | Method and apparatus for converting hydrocarbon fuel into hydrogen gas and carbon dioxide |
| JPH1143305A (en) * | 1997-07-23 | 1999-02-16 | Toyota Motor Corp | Catalytic reaction device and gas distributing device |
-
2004
- 2004-02-26 JP JP2004051350A patent/JP4366483B2/en not_active Expired - Fee Related
-
2005
- 2005-02-25 CN CNB2005800004834A patent/CN100394638C/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102201587A (en) * | 2010-03-22 | 2011-09-28 | 中兴电工机械股份有限公司 | Liquid fuel gasifier with hot plates with through holes |
| CN106784914A (en) * | 2016-11-28 | 2017-05-31 | 苏州氢洁电源科技有限公司 | The vaporizer sealing structure of methanol fuel cell |
| CN106784937A (en) * | 2016-11-28 | 2017-05-31 | 苏州氢洁电源科技有限公司 | The vaporizer flow passage structure of methanol fuel cell |
| CN106784938A (en) * | 2016-11-28 | 2017-05-31 | 苏州氢洁电源科技有限公司 | The vaporizer of methanol fuel cell |
| CN106784937B (en) * | 2016-11-28 | 2019-11-19 | 苏州氢洁电源科技有限公司 | The vaporizing chamber flow passage structure of methanol fuel cell |
| CN106784914B (en) * | 2016-11-28 | 2019-11-19 | 苏州氢洁电源科技有限公司 | The vaporizing chamber sealing structure of methanol fuel cell |
| CN106784938B (en) * | 2016-11-28 | 2019-11-29 | 苏州氢洁电源科技有限公司 | The vaporizing chamber of methanol fuel cell |
| CN106848353A (en) * | 2017-02-28 | 2017-06-13 | 李毅 | The methyl alcohol water vapor of methanol fuel cell and reformer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4366483B2 (en) | 2009-11-18 |
| JP2005238099A (en) | 2005-09-08 |
| CN100394638C (en) | 2008-06-11 |
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