CN100355757C - 取代噻吩并噻吩单体和导电聚合物 - Google Patents
取代噻吩并噻吩单体和导电聚合物 Download PDFInfo
- Publication number
- CN100355757C CN100355757C CNB2005101132742A CN200510113274A CN100355757C CN 100355757 C CN100355757 C CN 100355757C CN B2005101132742 A CNB2005101132742 A CN B2005101132742A CN 200510113274 A CN200510113274 A CN 200510113274A CN 100355757 C CN100355757 C CN 100355757C
- Authority
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- China
- Prior art keywords
- thiophene
- alkyl
- composition
- thieno
- tertiary butyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical class S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 229920001940 conductive polymer Polymers 0.000 title claims description 15
- 239000000178 monomer Substances 0.000 title description 26
- 239000002322 conducting polymer Substances 0.000 title description 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 20
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 13
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- 125000005843 halogen group Chemical group 0.000 claims abstract description 6
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 5
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 claims abstract description 5
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims abstract description 5
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 29
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- 239000004327 boric acid Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 claims description 2
- 125000001624 naphthyl group Chemical group 0.000 claims description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 125000001544 thienyl group Chemical group 0.000 claims 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 abstract description 52
- 229930192474 thiophene Natural products 0.000 abstract description 26
- -1 e.g. Chemical group 0.000 abstract description 14
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract description 6
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical group C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 abstract 2
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 abstract 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 abstract 1
- 239000010408 film Substances 0.000 description 17
- HMVMJEAHAGYQHQ-UHFFFAOYSA-N 2-tert-butylthieno[2,3-c]thiophene Chemical compound S1C=C2SC(C(C)(C)C)=CC2=C1 HMVMJEAHAGYQHQ-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 11
- 239000002019 doping agent Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 238000004770 highest occupied molecular orbital Methods 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 7
- 238000002484 cyclic voltammetry Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000005669 field effect Effects 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 229920000447 polyanionic polymer Polymers 0.000 description 5
- 150000003233 pyrroles Chemical class 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- GPTFUZRAANQDKE-UHFFFAOYSA-N 2-butylthieno[2,3-c]thiophene Chemical group S1C=C2SC(CCCC)=CC2=C1 GPTFUZRAANQDKE-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 229920001519 homopolymer Polymers 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 230000005693 optoelectronics Effects 0.000 description 4
- 229910020366 ClO 4 Inorganic materials 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 150000002505 iron Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- PFZLGKHSYILJTH-UHFFFAOYSA-N thieno[2,3-c]thiophene Chemical group S1C=C2SC=CC2=C1 PFZLGKHSYILJTH-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- VCEQRJWBUJIROQ-UHFFFAOYSA-N 2-phenylthieno[2,3-c]thiophene Chemical compound C=1C2=CSC=C2SC=1C1=CC=CC=C1 VCEQRJWBUJIROQ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- GKTQKQTXHNUFSP-UHFFFAOYSA-N thieno[3,4-c]pyrrole-4,6-dione Chemical group S1C=C2C(=O)NC(=O)C2=C1 GKTQKQTXHNUFSP-UHFFFAOYSA-N 0.000 description 2
- MEIRRNXMZYDVDW-MQQKCMAXSA-N (2E,4E)-2,4-hexadien-1-ol Chemical compound C\C=C\C=C\CO MEIRRNXMZYDVDW-MQQKCMAXSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- UXFQFBNBSPQBJW-UHFFFAOYSA-N 2-amino-2-methylpropane-1,3-diol Chemical compound OCC(N)(C)CO UXFQFBNBSPQBJW-UHFFFAOYSA-N 0.000 description 1
- MCLMZMISZCYBBG-UHFFFAOYSA-N 3-ethylheptanoic acid Chemical compound CCCCC(CC)CC(O)=O MCLMZMISZCYBBG-UHFFFAOYSA-N 0.000 description 1
- 239000004160 Ammonium persulphate Substances 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- 208000031639 Chromosome Deletion Diseases 0.000 description 1
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
- 241000790917 Dioxys <bee> Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000000023 Kugelrohr distillation Methods 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229930195725 Mannitol Natural products 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- 229910019800 NbF 5 Inorganic materials 0.000 description 1
- 241001597008 Nomeidae Species 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- 229910018286 SbF 6 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- PRPAGESBURMWTI-UHFFFAOYSA-N [C].[F] Chemical compound [C].[F] PRPAGESBURMWTI-UHFFFAOYSA-N 0.000 description 1
- OYVABZRZDZPVQD-UHFFFAOYSA-N [F].C=1C=CSC=1 Chemical compound [F].C=1C=CSC=1 OYVABZRZDZPVQD-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 1
- 235000019395 ammonium persulphate Nutrition 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 229910052728 basic metal Inorganic materials 0.000 description 1
- 150000003818 basic metals Chemical class 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical compound OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
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- 229920000547 conjugated polymer Polymers 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
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- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 125000003963 dichloro group Chemical group Cl* 0.000 description 1
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- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
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- 239000012467 final product Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000594 mannitol Substances 0.000 description 1
- 235000010355 mannitol Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 230000003446 memory effect Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
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Abstract
本发明公开了含有C3-8仲或叔烷基基团的噻吩并噻吩组合物。该噻吩并噻吩如下式所示:其中,R是C3-8仲或叔烷基基团,例如,异丙基、叔丁基、叔戊基、异戊基以及2-乙基己基,X和X′独立的选自H,卤素原子(如F,Cl,Br,I),MgCl,MgBr,MgI,Sn(R′)3(其中X′是C1-6烷基或-OC1-6烷基),硼酸,硼酸酯,-CH=CHR″(其中R″是H或C1-6烷基),-OC1-6烷基,-COOC1-6烷基,-S-COR''',-COR'''(其中,R'''是H或C1-6烷基),-C≡CH,以及聚芳环,如苯基,萘,吡咯,联噻吩,噻吩并噻吩以及噻吩等。
Description
技术领域
本发明涉及噻吩并噻吩单体和由这些单体聚合而成的导电聚合物。
背景技术
导电聚合物已经发展成为用于各种有机光电子学应用的一种可选的原材料。这样的光电子学应用包括聚合的发光二极管(薄膜显示),固态发光体,有机光电池,高级储存装置,有机场效应晶体管,超电容器以及电场致发光器件。
聚乙炔是第一批发现的众多导电聚合物中的一种,发现这样的聚合物能导电引起人们对其它类型导电聚合物的关注。近来,已经发现共轭聚(噻吩)和取代的噻吩衍生物具有导电性质。这些聚合物的一个特征就是它们可以被铸型成薄膜,并且可被传统的p型和N型掺杂或者被掺杂聚合物掺杂,它们可以被铸型成薄膜,它们的电学性质随之发生变化,从而使它们适用于各种光电子应用。
阐明噻吩单体与包含噻吩及其衍生物在内的的导电聚合物的代表性的论文与专利如下:
US 6,645,401公开了二噻吩并噻吩(DTT)与1,2-亚乙烯基或乙炔连接基团组成的共轭聚合物,该聚合物适用于制造半导体或者对电光学的和包含场效应晶体管,光电池和传感器装置在内的电子器件有用的电荷传输材料。众所周知,可由电化学聚合反应制备含有DTT的聚合物,但是其在溶解度和光电性质方面受到局限。
US 6,585,914公开了氟碳官能化的和/或杂环改性的聚噻吩,例如,用于制备用作n-型半导体的薄膜的α,ω-二全氟己基六噻吩(α,ω-diperflurohexylsexithiophene)。这些聚噻吩也可用于制备具有场效应晶体管流动性的薄膜晶体管。
US6,676,857公开了具有3-取代-4氟噻吩聚合单元的聚合物,这些聚合物作为液晶材料用作半导体,电荷传输材料,电光场效应晶体管,光电池和传感器装置。
US 6,695,978公开了苯并[b]噻吩和双苯并[b]噻吩的聚合物以及它们在半导体和光电装置中作为电荷传输材料的应用。
US 6,709,808公开了包括导电聚合物的成像材料,该导电聚合物以含吡咯的噻吩聚合物和含苯胺的聚合物为基础。
US2004/00010115A1公开了由重复的噻吩并[3,4-b]噻吩单元所组成的均聚物和共聚物在电活化实践中的应用。这些共聚物可以由3,4-亚乙基二氧噻吩,二噻吩,吡咯,苯并噻吩等制备。
论文“Synthesis and Electronic Properties of Poly(2-phenyl-thieno[3,4-b]thiophene):A new Low Band Gap Polymer,Chem .Mater.1999,11,1957-1958”公开了多种噻吩并噻吩聚合物,例如用作导电聚合物的聚(2-苯基-噻吩并[3,4-b]噻吩)和聚(2-癸基-噻吩并[3,4-b]噻吩)。
论文“Poly(2-decyl-thieno[3,4-b]thiophene):a New Soluble Low-Band GapConductingPolymer,Synthetic Metals 84(1997)243-244”公开了多种聚合的噻吩并噻吩,包括聚(2-癸基-噻吩并[3,4-b]噻吩)以及制备该聚合物的过程。
发明内容
本发明涉及具有C3-8仲或叔烷基基团的噻吩并噻吩单体和由这些单体(聚合单元)聚合而成的导电聚合物。这些聚合物可作为空穴注入材料,电荷传输材料,或者作为光学的,电子光学的或者电子器件的半导体应用于聚合的发光二极管(PLED),电场致发光器件,有机的场效应晶体管(FET或者OFET),平板显示应用(即LCD′S),无线电频率识别(RFID)标记,超电容器,有机光电效应(OPV′s)传感器,基于小分子或者聚合物的储存装置以及电解质电容器,还可作为储氢材料。
通过使用C3-8或叔烷基取代的噻吩并噻吩的单体和聚合物可以达到相应的技术效果。这些由部分单体和聚合物提供的技术效果可包括:各种各样的电子学应用;低毒性,环境稳定性以及一些单体和聚合物比起聚(噻吩并(3,4-b]噻吩)而言具有更正的最高占有分子轨道(HOMO)。
本发明涉及基于C3-8仲或叔烷基取代的噻吩并[3,4-b]噻吩的组合物,以及它们的聚合物。
已发现连接在噻吩并噻吩上的C3-8仲和叔烷基基团能提供独特的电学传导性质,从而使它们能够很好的适用于各种半导体。异丙基和叔丁基是优先选用的官能团。
C3-8仲或叔烷基取代的噻吩并噻吩衍生物可以在加入仲或叔官能团之前或之后制得。这样的化合物如结构式A所示:
其中,R是C3-8仲或叔烷基,X和X′独立的选自H,卤素原子,MgCl,MgBr,MgI,Sn(R’)3(其中,R′是C1-6烷基或-OC1-6烷基)硼酸,硼酸酯,-CH=CHR″(其中R″是H或C1-6烷基),-OC1-6烷基,-COOC1-6烷基,-S-COR,-COR(其中R是H或C1-6烷基),-C≡CH和可聚合的芳香族基团。这些仲和叔烷基包括异丙基,叔丁基,异戊基,叔戊基,2-乙基己基等。卤素原子包括F,Cl,Br,I等。可聚合的芳香族基团的例子包括苯基,萘基,吡咯,二噻吩,噻吩并噻吩,噻吩等。
制备均聚物和共聚物的优选单体是那些X和X均为H的结构式B所代表的化合物:
并且R是异丙基,叔丁基,叔戊基,异戊基或者2-乙基己基,优选为叔丁基。
结构式C所代表的、由单体B聚合单元组成的导电低聚物和聚合物是本发明的另一个方面:
其中,n是一个整数,Y是-CZ1=CZ2-或-C≡C-,Z1和Z2独立的是H,F,Cl或CN。低聚物一般具有2到10个单元,用来生产记忆和场效应晶体管设备。具有11到50,000个单元,通常20到10,000个单元的聚合物在各种电子光子学应用中作为空穴注入材料的薄膜是非常有用的。
优选结构式D所代表的均聚体:
其中,n是上述的整数,R是异丙基,叔丁基,叔戊基,异戊基或者2-乙基己基。尤为重要的是单体,2-叔丁基-噻吩并[3,4-b]噻吩以及由2-叔丁基-噻吩并[3,4-b]噻吩聚合单元所组成的低聚物和聚合物。
2-叔丁基-噻吩并[3,4-b]噻吩的合成,例如,可由2步反应过程来实现。
X和X′不为H的相应单体的很多衍生物可在单体形成之后制得。在后面的反应中,一个或两个氢原子可被其它的官能基团所替换。或者,部分衍生物可通过从一开始先将噻吩转换成其衍生物,然后进行2步反应而选择性制得,其中X和X′与上述1-2步反应一致。
仲和叔-烷基-噻吩并[3,4-b]噻吩单体的聚合反应可利用水相聚合方法来实现,其中,单体为2-叔丁基-噻吩并[3,4-b]噻吩,例如,在适于形成均聚物,如聚(2-叔丁基-噻吩并[3,4-b]噻吩)的反应条件下,聚阴离子和氧化剂在水存在下反应。通过这种聚合方法形成的聚合物可能在单步反应中聚合并被掺杂。
在水相聚合方法中聚阴离子和氧化剂的量可在较宽范围内变化而且对于任何给定的聚合反应都可以测定而不需要不必要的实验。例如,仲或叔-烷基-噻吩并[3,4-b]噻吩单体和合适的聚阴离子的重量比率的典型范围是0.001到50,优选0.05到2.0。2-仲或叔-烷基-噻吩并[3,4-b]噻吩单体和合适的氧化剂的摩尔比率的典型范围是0.01到10,优选为0.1到2.5。例如,当硫酸铁作氧化剂时,2-仲或叔-烷基-噻吩并[3,4-b]噻吩的用量范围是0.1到5。可以通过改变氧化剂的性质以适应可使用单体的离子化电势的变化。已知各种Fe(II)/Fe(III)对依据各自的配体具有不同的电势,例如FeCl3;Fe2(S2O8)3;Fe(phen)3。假若需要使用较弱的氧化剂,则可以考虑以Cu为基础的偶联体(couplets),如果是需要较强的氧化剂,则应当考虑Co基偶联体(couplets)。
在聚合反应过程中可使用强氧化剂。优先使用有机酸的过硫酸盐、三价铁盐和含有机残基的无机酸的Fe(III)盐,因为它们没有腐蚀性。有机酸三价铁盐的例子是C1-30烷基磺酸的Fe(III)盐,如甲烷或十二烷基磺酸;脂肪族C1-20羧酸如2-乙基己基羧酸;脂肪族全氟羧酸,如三氟乙酸和全氟辛酸;脂肪族二羧酸,如草酸以及芳香族,任选的C1-20-烷基取代的磺酸,如苯磺酸,对甲苯-磺酸以及十二烷基苯磺酸的三价铁盐。铁盐的特殊实例包括FeCl3,Fe2(SO4)3,Fe(ClO4)3和Fe2(S2O8)3。其它的氧化剂包括H2O2,K2Cr2O7,过硫酸铵,高锰酸钾,四氟硼酸铜,碘,空气和氧气。
合适的聚阴离子包括聚羧酸的阴离子,诸如聚丙烯酸,聚甲基丙烯酸,Nafion,聚马来酸,以及聚磺酸,如聚苯乙烯磺酸和聚乙烯磺酸的阴离子。聚羧酸和聚磺酸也可以是乙烯基羧基和乙烯基磺酸与其它单体,例如丙烯酸和苯乙烯的共聚物。提供聚阴离子的酸的分子量优选为1,000到500,000,更优选2000到500,000,最优选为约200,000。
如公开文献所述,结构式A所代表的单体有助于金属催化的聚合反应。根据X和X′取代基的性质而改变反应条件。
制备低聚物和聚合物,尤其是聚(2-叔-丁基-噻吩并[3,4-b]噻吩)的方法,包括电化学方法,其中2-叔-丁基-噻吩并[3,4-b]噻吩在电化学电池中通过一个三电极装置被聚合。合适的三电极装置包括一个选自铂、金、和玻璃碳扣式工作电极的扣式工作电极,一个铂条对电极(counter electrode),和一个Ag/Ag+非水参考电极。合适的电解液选自四丁基高氯酸铵/乙腈,triflate锂/乙腈和四丁基六氟磷酸铵/乙腈。
C3-8仲或叔烷基取代的噻吩并噻吩低聚物和聚合物的薄膜可被常规的的p-和n-型掺杂剂掺杂,在相应单体的聚合反应后。典型的掺杂过程包括在一个还原氧化反应中将薄膜半导体材料和一个氧化剂或还原剂与相应的源自所使用掺杂剂的补偿离子处理使之在材料上形成离域离子中心。例如,掺杂方法包括在正常大气压或减压条件下暴露于掺杂物质的蒸汽中,在含掺杂剂的溶液中进行电化学掺杂,将掺杂剂与半导体材料相接触以达到热扩散的效果,使掺杂剂离子输入半导体材料。
含空穴的(p-掺杂的)导电的聚合薄膜可以通过常规的p-掺杂剂制得。常规的p-掺杂剂包括卤素原子,如I2,Cl2,Br2,ICl,ICl3,IBr和IF,路易斯酸,如PF5,AsF5,SbF5,BF3,BCl3,SbCl5,BBr3和SO3,质子酸,有机酸或者氨基酸,如HF,HCl,HNO3,H2SO4,HClO4,FSO3H和ClSO3H,过渡金属化合物,如FeCl3,Fe(OCl)3,Fe(ClO4)3,Fe(4-CH3C6H4SO3)3,TiCl4,ZrCl4,HfCl4,NbF5,NbCl5,TaCl5,MoF5,MoCl5,WF5,WCl6,UF6和LnX3,其中Ln是镧系元素,X是阴离子,如Cl-,Br-,I-,I3 -,HSO4 -,SO4 2-,NO3 -,ClO4 -,BF4 -,B12F12 2-,PF6 -,AsF6 -,SbF6 -,FeCl4 -,Fe(CN)6 3-和各种磺酸阴离子,如芳基-SO3 -。也可以使用O2和O3。
使用电子作为载体的导电聚合薄膜如n-掺杂聚合薄膜可以利用常规的n-掺杂剂得到,常规的n-掺杂剂包括碱金属(如Li,Na,K,Rb和Cs),碱土金属如Ca,Sr和Ba。
C3-8仲或叔烷基取代的噻吩并[3,4-b]噻吩,如2-叔丁基-噻吩并[3,4-b]噻吩及其衍生物可以和其它的能够形成电子导电聚合物的聚合单体共聚合。这样的单体包括苯并-和二苯并噻吩,噻吩并噻吩,噻吩,二噻吩并噻吩,吡啶基噻吩,取代的噻吩,取代的噻吩并[3,4-b]噻吩,二噻吩并[3,4-b:3′,4′-d]噻吩,吡咯,联噻吩,取代的吡咯,亚苯基,取代的亚苯基,萘,取代的萘,联苯和三联苯以及它们的取代物,亚苯基亚乙烯基以及取代的亚苯基亚乙烯基。其它的单体如美国专利US4,959,430和US4,910,645所述,并且这些单体在此引为参考。
在处理C3-8仲或叔烷基取代的噻吩并[3,4-b]噻吩,如2-叔丁基-噻吩并[3,4-b]噻吩及其衍生物的低聚物和聚合物的过程中,添加剂,如乙二醇,二乙二醇,甘露醇,1,3-丙二醇,1,4-丁二醇,N-甲基吡咯烷酮,山梨醇,甘油,碳酸异丙烯酯以及其它合适的高沸点有机物可以被添加到分散体中以改进从这些分散体中制备而得的薄膜的导电性。其它修饰导电聚合物的普通的添加剂可以按照需要予以使用,这些添加剂包括抗氧化剂,紫外稳定剂,表面活性剂以及导电填充剂,如颗粒的铜、银、镍、铝、炭黑等。非传导性的填充剂,如滑石、云母、钙硅石、硅石、粘土、TiO2、染料、颜料等也可以与之结合以改进其些特殊的性能,比如增加模量,表面硬度,表面颜色等。
具体实施方式
下面提供的实施例用以阐述各种实施方式以及作对比照,但本发明并不仅限于这些范围。
实施例1
化合物2-叔丁基噻吩并[3,4-b]噻吩通过所述的一个两步反应来制备。
步骤1
3-溴-4-(3,3-二甲基-丁-1-炔)-噻吩的制备
一个1-升的圆底三颈烧瓶装备有一回流冷凝器,一个机械搅拌子,一个电热偶以及静态干燥的氮气入口。然后往烧瓶中加入60克二乙胺(之前用KOH粉末干燥并过滤),96.76克(0.40摩尔)3,4-二溴噻吩,500毫克(0.7毫摩尔)二氯二(三苯基磷)]钯(II),200mg(0.76mmol)三苯基膦,150mg(1.37mmol)碘化铜(I),以及25.0g(0.304mol.)3,3-二甲基-1-丁炔。将混合物搅拌加热至回流7小时.最初的温度是约65℃,6.0小时后,温度为约70℃。
将反应混合物冷却至室温,在一旋转蒸发器上蒸发除去二乙胺。将600mL混合了10g活性碳(Darco 2-20mesh)的正己烷加入反应残余物,搅拌混合物4小时,然后用一个100g的硅胶柱过滤。通过旋转蒸发仪蒸发移去正己烷。粗产物重91.57g。残留的液体在真空下,通过一填充了玻璃单环填充物的25cm的真空包装柱进行分步蒸馏。37.99g未反应的3,4-二溴噻吩(bp 40℃/0.45mmHg)和34.07g 3-溴-4-(3,3-二甲基-丁-1-炔)-噻吩(bp:60℃/0.75mm Hg)被分离出来,基于3,3-二甲基-1-炔具有46%的分离产率。
步骤2
2-叔丁基噻吩并[3,4-b]噻吩的制备
制备:
一个1L圆底三颈烧瓶装备有一隔膜端口,一个通风阀,一个磁性搅拌子,一个温度计,以及干燥氮气入口。在室温下将500mL二乙醚和46.8g(0.193mol)3-溴4-(3,3-二甲基-丁-1-炔)-噻吩装入烘干系统,在干冰/丙酮浴下冷却至-74℃后,将80毫升2.5M正丁基锂的正己烷溶液加入,反应25分钟,将温度上升至-70℃,加热至-10℃反应2h,接着冷却至-30℃。此时将6.54g(0.204mol)硫磺迅速加入并将温度上升至-5℃。保持-5℃反应1h后,将反应混合物冷却至-60℃,在-60℃反应1h后,将三颈瓶中的内容物转移至一分液漏斗萃取两次,每次用500mL的冰水,于2分钟内将部分结冰的水相从醚相中移去。在氮气保护下于室温放置16h后,萃取水相四次,每次用1体积L的醚。将合并的醚相用50g硫酸镁进行干燥,过滤并在55℃的水浴下通过旋转蒸发将醚除去。在暴露于空气之前将浓缩物冷却至0℃,在70℃和0.12托下进行Kugelrohr蒸馏,之后将其置于氮气中,得到98.9%2-叔丁基噻吩并-[3,4-b]噻吩(71%产率)蒸馏产物(27.0g)。Kugelrohr蒸馏产物在-15到-20℃下于庚烷重结晶,得到23.1g,纯度为99.4%的2-叔丁基噻吩并-[3,4-b]噻吩(61%产率)。
实施例2
噻吩并[3,4-b]噻吩和2-叔丁基噻吩并[3,4-b]噻吩的毒性比较
在毒性测试中噻吩并[3,4-b]噻吩的口服LD50为50mg/kg,皮肤LD50为200-400mg/kg.而2-叔丁基噻吩并[3,4-b]噻吩则显示了令人惊异的低毒性,2-叔丁基噻吩并[3,4-b]噻吩在毒性测试中其口服LD50>500mg/kg,皮肤LD50>400mg/kg。
实施例3
2-叔丁基噻吩并[3,4-b]噻吩的化学聚合反应
将2-叔丁基噻吩并[3,4-b]噻吩(0.3g,1.53mmol)和咪唑(0.178g,2.26mmol)溶于6毫升正丁醇中,将得到的溶液通过一0.45μm过滤器进行过滤。三-对甲苯磺酸(III)(2.3g,3.387mmol)溶于5毫升正丁醇,将得到的溶液通过一0.45μm过滤器进行过滤。立刻将两个溶液予以混合然后维持1000转份的速率一分钟使之在玻璃衬底上(典型的2.5×2.5cm)旋转涂层。使用三-对甲苯磺酸铁(III)的有利之处在于它并不需要结晶。形成涂层之后,将薄膜在一对流熔炉内进行干燥和烘烤(30分钟,110℃)。冷却至室温后,用正丁醇和去离子水冲洗数次以萃取在聚合过程中形成的铁盐(II)。使用外型仪测得薄膜的厚度为180nm。最终得到的薄膜的电导率在1.18*10-2S/cm和2.37*10-3S/cm之间。形成的聚(2-叔丁基噻吩并[3,4-b]噻吩)的可见-NIR光谱显示了其低带隙的特性。
实施例4
2-叔丁基噻吩并[3,4-b]噻吩的电化学聚合反应
聚(2-叔丁基噻吩并[3,4-b]噻吩)薄膜通过CV(循环伏安法)生成。薄膜在一个由一铂条(1cm2)对电极,一非水的Ag/Ag+参比电极,以及一铂扣式工作电极组成的标准三电极电池中生成。电解液是0.1M Bu4NPF6的MeCN溶液。2-叔丁基噻吩并[3,4-b]噻吩是0.01M。整个反应在氮气保护下进行。通常,从1.2V到-0.8V循环10次即可生成薄膜。CV实验从断路电势开始进行。显然,源自电流响应的聚合反应在一个经重复扫描低的还原氧化电势上以规则的间隔增加。
实施例5
聚(2-叔丁基噻吩并[3,4-b]噻吩)
在Pt电极上分布(profile)的评估
按实施例4所述方法生成的聚(2-叔丁基噻吩并[3,4-b]噻吩)薄膜通过CV进行评估。将刚生成的薄膜转移到一个新配制的无单体的电解液中,其中,电解液是0.1M Bu4NPF6的MeCN溶液。使用一个被聚(2-叔丁基噻吩并[3,4-b]噻吩)覆盖的标准三电极电池。该标准三电极电池由一铂条(1cm2)对电极,一非水的Ag/Ag+参比电极,以及一铂扣式工作电极组成。该反应在氮气保护下进行。CV在断路电势开始扫描阳极,电势窗口从0.6V到-1.85V扫描五次。HOMO(最高被占用分子轨道)值取决于循环伏安法实验中聚(2-叔丁基噻吩并[3,4-b]噻吩)开始的氧化反应。带隙则取决于循环伏安法实验中聚(2-叔丁基噻吩并[3,4-b]噻吩)开始的氧化反应和还原反应之差。
聚(2-叔丁基噻吩并[3,4-b]噻吩)的HOMO和带隙的实验数据
实验数据 | |
HOMO(eV) | -4.91 |
带隙(eV) | ~0.70 |
叔丁基取代的噻吩并噻吩以及其共轭低聚物和聚合物与它们的氢、癸基和苯基类似物相比具有更好的特性。2-叔丁基噻吩并[3,4-b]噻吩单体与噻吩并[3,4-b]噻吩相比显著的具有更好的毒理学特性。聚(2-叔丁基噻吩并[3,4-b]噻吩)的带隙(0.7eV)也低于聚(噻吩并[3,4-b]噻吩)(0.85eV-1.1eV),聚(2-癸基-噻吩并[3,4-b]噻吩)(1.2ev),和聚(2-苯基噻吩并[3,4-b]噻吩)(0.85eV)。此外,比聚(噻吩并[3,4-b]噻吩)更正的HOMO能级对于一些光电子应用来说是一个有益的参数。2-叔丁基噻吩并[3,4-b]噻吩单体易溶于多种溶剂,从而允许在各种条件下加工,与之对照的2-苯基噻吩并[3,4-b]噻吩则仅能微溶于这些溶剂。
可以预料:本发明所提供的其它的单体和聚合物也具有上述实施例展示的2-苯基噻吩并[3,4-b]噻吩和聚(2-叔丁基噻吩并[3,4-b]噻吩)所具有一个或更多的有益的特性。
本发明描述了比较具体的实施例,但是其它的实施例对于本领域技术人员来说是显而易见的,也包括在本发明权利要求的范围之内。
Claims (16)
1、噻吩并噻吩组合物,其包括
其中R是C3-8仲或叔烷基基团,X和X′独立地选自H,卤素原子,MgCl,MgBr,MgI,Sn(R′)3,硼酸根,硼酸酯基,-CH=CHR″,-OC1-6烷基,-COOC1-6烷基,-S-COR,-COR,-C≡CH,以及可聚合的芳香族基团,其中R′是C1-6烷基或-OC1-6烷基,R″是H或C1-6烷基,和R是H或C1-6烷基。
2、权利要求1的组合物,其中X和X′是氢,R是叔丁基。
3、权利要求1的组合物,其中X和X′至少有一个为硼酸酯基或硼酸根。
4、权利要求1的组合物,其中X和X′至少有-个为氢,R选自异丙基、叔丁基、叔戊基、异戊基以及2-7基己基。
5、权利要求1的组合物,其中X和X′中至少一个为卤素。
6、权利要求5的组合物,其中卤素原子是I,Br或Cl。
7、权利要求1的组合物,其中X和X′中至少一个为-CH=CHR″,R″为H。
8、权利要求1的组合物,其中X和X′中至少一个为(≡CH。
9、权利要求1的组合物,其中X和X′中至少一个为Sn(R′)3。
10、权利要求1的组合物,其中X和X′中至少一个为可聚合的芳香族基团。
11、权利要求10的组合物,其中X和X′中至少一个选自苯基,萘基,吡咯基,联噻吩基以及噻吩基。
12、权利要求10的组合物,其中X和X′中至少一个为噻吩并噻吩基。
14、权利要求13的聚合物,其中n是2到50,000中的一个整数。
15、权利要求13的聚合物,其中Y是-CH=CR″-,R″是H。
16、权利要求13的聚合物,其中Y是-C≡C-。
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- 2005-09-27 EP EP05021055A patent/EP1652850B1/en not_active Not-in-force
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- 2005-09-27 DE DE602005003629T patent/DE602005003629T2/de active Active
- 2005-09-30 CN CNB2005101132742A patent/CN100355757C/zh not_active Expired - Fee Related
- 2005-09-30 TW TW094134305A patent/TW200615276A/zh unknown
- 2005-09-30 KR KR1020050091922A patent/KR100817701B1/ko not_active IP Right Cessation
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JP2006104471A (ja) | 2006-04-20 |
US20060071200A1 (en) | 2006-04-06 |
SG121129A1 (en) | 2006-04-26 |
EP1652850A1 (en) | 2006-05-03 |
US7118692B2 (en) | 2006-10-10 |
JP4291314B2 (ja) | 2009-07-08 |
EP1652850B1 (en) | 2007-12-05 |
TW200615276A (en) | 2006-05-16 |
ATE380192T1 (de) | 2007-12-15 |
CN1760196A (zh) | 2006-04-19 |
DE602005003629D1 (de) | 2008-01-17 |
DE602005003629T2 (de) | 2008-11-13 |
KR20060051904A (ko) | 2006-05-19 |
KR100817701B1 (ko) | 2008-03-27 |
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