CL2021002648A1 - Copper electrodeposition device - Google Patents

Copper electrodeposition device

Info

Publication number
CL2021002648A1
CL2021002648A1 CL2021002648A CL2021002648A CL2021002648A1 CL 2021002648 A1 CL2021002648 A1 CL 2021002648A1 CL 2021002648 A CL2021002648 A CL 2021002648A CL 2021002648 A CL2021002648 A CL 2021002648A CL 2021002648 A1 CL2021002648 A1 CL 2021002648A1
Authority
CL
Chile
Prior art keywords
electrodeposition device
copper electrodeposition
plates
main beams
anode
Prior art date
Application number
CL2021002648A
Other languages
Spanish (es)
Inventor
Xiaodan Wang
Chong Li
Xiaofeng Xu
Chuangu Wu
Original Assignee
China Enfi Eng Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201910284535.9A external-priority patent/CN109930172A/en
Priority claimed from CN201920483635.XU external-priority patent/CN209941108U/en
Application filed by China Enfi Eng Corp filed Critical China Enfi Eng Corp
Publication of CL2021002648A1 publication Critical patent/CL2021002648A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

Dispositivo de electrodeposición de cobre que comprende primera y segunda vigas principales, primera y segunda placas conductoras, una pluralidad de placas anódicas y catódicas conectadas a las primera y segunda vigas principales, y una pluralidad de bastidores respectivamente ubicados entre placas anódicas y catódicas adyacentes. El dispositivo de electrodeposición tiene un pequeño espaciado de electrodos y un alto grado de paralelismo entre placas anódicas y catódicas.Copper electrodeposition device comprising first and second main beams, first and second conductive plates, a plurality of anode and cathode plates connected to the first and second main beams, and a plurality of racks respectively located between adjacent anode and cathode plates. The electrodeposition device has a small electrode spacing and a high degree of parallelism between anodic and cathodic plates.

CL2021002648A 2019-04-10 2021-10-08 Copper electrodeposition device CL2021002648A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910284535.9A CN109930172A (en) 2019-04-10 2019-04-10 Copper electrodeposition equipment
CN201920483635.XU CN209941108U (en) 2019-04-10 2019-04-10 Copper electrodeposition apparatus

Publications (1)

Publication Number Publication Date
CL2021002648A1 true CL2021002648A1 (en) 2022-07-01

Family

ID=72750945

Family Applications (1)

Application Number Title Priority Date Filing Date
CL2021002648A CL2021002648A1 (en) 2019-04-10 2021-10-08 Copper electrodeposition device

Country Status (2)

Country Link
CL (1) CL2021002648A1 (en)
WO (1) WO2020207480A1 (en)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1039545C (en) * 1993-05-31 1998-08-19 华东理工大学 Frame type fixed bed electrode electrolyzer and its industrial application
CN201785506U (en) * 2010-07-08 2011-04-06 江苏凯力克钴业股份有限公司 Electrodeposition tank
CN201826026U (en) * 2010-10-26 2011-05-11 张坚 Closed type winning cell
CN102453929A (en) * 2010-10-26 2012-05-16 张坚 Closed-type electro-winning cell
CN102251263A (en) * 2011-07-08 2011-11-23 浙江盈联科技有限公司 Novel energy-saving metal electrodeposition device
CN107916438B (en) * 2017-11-30 2019-08-06 郴州市金贵银业股份有限公司 A kind of electrolytic cell positioning busbar
CN108220999B (en) * 2018-01-22 2019-11-12 中南大学 A kind of device recycling cadmium containing the method for recycling cadmium in cadmium fumes and from cadmium-ammonia solution from metallurgy
CN109930172A (en) * 2019-04-10 2019-06-25 中国恩菲工程技术有限公司 Copper electrodeposition equipment

Also Published As

Publication number Publication date
WO2020207480A1 (en) 2020-10-15

Similar Documents

Publication Publication Date Title
CO2018000201A2 (en) High volume water electrolysis system
EA201892174A1 (en) CONFIGURATIONS OF ELECTRODES FOR ELECTROLYZERS AND RELATED METHODS
SE7708854L (en) ELECTROLY FOR ELECTROLYTICAL CELL
PE20181866A1 (en) SAFE ANODE FOR ELECTROCHEMICAL CELLS
BR112015019027A2 (en) ion bombardment device and method for using it to clean substrate surface
EA201590039A1 (en) ELECTROLYTIC CELL SUPPLIED BY CONCENTRIC ELECTRODE PAIRS
DK1846976T3 (en) Compact electrochemical transformer
EA201890792A1 (en) LIGHT EFFICIENT DEVICE AND DISPLAY DEVICE BASED ON OLED
CL2021002648A1 (en) Copper electrodeposition device
CL2019002779A1 (en) Physical materialization of multi-point electrolyte flow field for vanadium redox flow battery.
DK181038B8 (en) Advanced electrolytic aluminum cell
CL2022000357A1 (en) Electrolysis vessel.
EA202192763A1 (en) COPPER ELECTRODEPOSITION DEVICE
PH12016000295A1 (en) Fluorescent display tube
TW200943359A (en) Field emission display
AR067681A1 (en) A FUEL CELL AND A METHOD FOR MANUFACTURING A FUEL CELL
CL2018000632U1 (en) Anodic electrode spacer and spacer device, which increases the electrical efficiency of electro-obtaining metal cells.
RU2014141028A (en) ELECTROCHEMICAL REACTOR
CL2023003686A1 (en) Electrolyte distribution system with flow deflectors for electrodeposition processes.
TH173499A (en) Hollow cathode type plasma source
CL2009001211A1 (en) Method for arranging electrodes in an electrolytic process, comprising a group of electrolytic cells and a number of anodes and cathodes, in which the direction of current flow in the group of cells is deviated in different directions by a bar formed by a row of conductive segments; and an electrolytic system.
CL2018002956A1 (en) A system for injecting alternating current into electrolytic cells containing multiple anodes and intercalated cathodes, for electro-obtaining or electro-refining processes of copper and other metals, which provides a source of current connected to the end electrodes of the cell and sheets that separate the cell electrodes in consecutive groups of consecutive electrodes, which coefficient the leakage path of the alternating current.
AR104489A1 (en) SET OF ELECTRODES, ELECTRODE STRUCTURES AND ELECTROLYZERS
GB202217304D0 (en) High efficiency platinum electroplating solutions
CL2022000406A1 (en) Metal Electroplating Optimizer Device and System