WO2020207480A1

WO2020207480A1 - Copper electrodeposition device

Info

Publication number: WO2020207480A1
Application number: PCT/CN2020/084261
Authority: WO
Inventors: 王晓丹; 李冲; 徐小锋; 邬传谷
Original assignee: 中国恩菲工程技术有限公司
Priority date: 2019-04-10
Filing date: 2020-04-10
Publication date: 2020-10-15
Also published as: CL2021002648A1

Abstract

The present application discloses a copper electrodeposition device. The copper electrodeposition device comprises a first main beam, a second main beam, a first conductive plate provided on the first main beam, a second conductive plate provided on the second main beam, a plurality of anode plates and a plurality of cathode plates connected to the first main beam and the second main beam, and a plurality of frames respectively located between anode plates and cathode plates adjacent to each other, the plurality of anode plates and the plurality of cathode plates being arranged alternately at intervals, two side faces of the anode plates and the cathode plates being respectively in contact with the first conductive plate and the second conductive plate; the frames are provided with liquid inlet nozzles and liquid outlet nozzles; the plurality of frames are respectively and correspondingly provided between every adjacent anode plate and cathode plate, every adjacent anode plate and cathode plate are pressed tightly together with the frame therebetween, and a closed space is formed between said cathode plate and anode plate. Adjacent anode plates and cathode plates are provided away from each other to facilitate the removal of cathode plates. The copper electrodeposition device in the present application has small electrode spacing and a high degree of parallelism between anode plates and cathode plates.

Description

Copper electrowinning equipment

Cross references to related applications

This application requires the priority and rights of Chinese patent applications with application numbers of 201910284535.9 and 201920483635.X, and the application date of April 10, 2019. The entire contents of the above Chinese patent applications are hereby incorporated by reference into this application.

Technical field

The embodiments of the present application relate to the technical field of copper hydrometallurgy, in particular to a copper electrowinning equipment.

Background technique

At present, the equipment used in the traditional copper electrowinning process is mainly composed of an electrolytic cell, a cathode plate, an anode plate, a conductive plate and a liquid inlet pipe. The electrolytic cell is an open container approximately rectangular parallelepiped. The main function of the electrolytic cell in the copper electrowinning process is to contain the electrolyte and to support the cathode plate, anode plate, conductive plate and liquid inlet pipe. The cathode plate is the carrier for the cathode reaction in the electrowinning process, and the copper in the electrolyte is deposited on the cathode plate. The anode plate is the carrier produced by the anode reaction in the electrowinning process. The conductive plate functions to conduct current. The liquid inlet pipe leads the electrolyte into the electrolytic cell and distributes the electrolyte as evenly as possible.

During the electrowinning process, the cathode plates and the anode plates are arranged in a staggered arrangement at a certain pole distance, and the plate surface is immersed in an electrolytic tank containing electrolyte. The conductive rods on the cathode plate and the anode plate are overlapped with the conductive plates on the side of the electrolytic cell. The liquid inlet pipe is located at the bottom or edge of the electrolytic cell.

During the electrowinning process, the current flows from the conductive plate on the side of the electrolytic cell to the conductive rod of the anode plate. The current flows into the anode plate through the conductive rod and then flows to the cathode plate through the electrolyte. The current flows to the cathode plate through the cathode plate. Finally, it flows out from the conductive rod to the conductive plate on the other side of the electrolytic tank. The electrolyte flows into the electrolytic cell through the liquid inlet pipe, and then flows out through the overflow port of the electrolytic cell.

The electrowinning process requires that the distance between the cathode and the anode be reduced without causing a short circuit, so that the resistance of the electrolyte can be reduced, thereby reducing the energy consumption of the electrowinning process. In addition, the surface of the cathode plate and the surface of the anode plate should be kept as parallel as possible to facilitate the uniform deposition of copper on the cathode plate. Increase the economic current density as much as possible and increase the production capacity per unit area. Minimize the fugitive emission of acid mist during the electrowinning process. Reduce the amount of electrolyte per unit area of the electrode plate, so that the total solution circulation can be reduced, and the AC power consumption of the electrowinning process can be reduced. The above problems cannot be solved well when using traditional copper electrowinning equipment. The reasons are as follows:

First, in the production of copper electrowinning, the copper in the electrolysis will be deposited on the surface of the cathode, which requires the use of a special spreader to regularly remove the cathode from the electrolytic cell. The hook on the spreader needs to pass through the gap between the cathode and the anode. To extract the cathode. This requires a certain distance between the cathode and the anode when the cathode is taken out.

Second, the traditional copper electrowinning equipment's electrolyte inlet method is a liquid inlet manifold. If the distance between the cathode and the anode is too small, the electrolyte will be unevenly distributed, which will increase the concentration polarization of the electrowinning reaction. phenomenon;

Third, in actual production, since the electrode plate is only lapped on the conductive plate on the side of the electrolytic tank through the conductive rod, the plate surface immersed under the electrolyte has no limit, and the electrode plate is in a natural hanging state. If the bottom of the conductive rod is flat Insufficient degree or insufficient level of the conductive plate will cause the plate surface to tilt, which will affect the parallelism between the plates. Generally, the vertical error between the bottom and the top of the plate is ±5mm.

Fourth, increasing the current density of the electrowinning will also aggravate the concentration polarization phenomenon. If the negative impact of the increase in current density on the concentration polarization is to be reduced, the circulation method must be improved to make the electrolyte as uniform as possible. The electrolysis cell of the traditional electrowinning equipment is not conducive to weakening the concentration polarization due to its own structural characteristics and the arrangement of the liquid inlet pipe.

Fifth, the side wall of the traditional electrolytic cell needs a certain safe lifting distance from the edge of the electrode plate, generally 50-80mm, and the distance between the bottom of the electrolytic cell and the bottom edge of the electrode plate is larger, which makes the traditional electrowinning equipment unit extremely The plate area occupies a large amount of electrolyte, and the amount of solution participating in the effective circulation in the electrolytic cell only accounts for 15.41% of the total solution volume.

Sixth, due to the characteristics of the copper electrowinning process, acid mist will be generated during the production process, and it will increase with the increase of the current density. The electrolytic cell is an open container. In order to collect the acid mist produced during the production process, a movable hood must be installed on the electrolytic cell to collect the acid mist through exhaust, but the effect is not ideal.

Summary of the invention

This application aims to solve at least one of the technical problems existing in the prior art. For this reason, the embodiment of the present application proposes a copper electrowinning device. During the production of copper electrowinning, the distance between the anode plate and the cathode plate is small, the parallel error between the anode plate and the cathode plate is small, and the cathode current density is high. , The AC power consumption generated by the electrolyte circulation is low, and the concentration polarization effect is weak.

The copper electrowinning equipment according to the embodiment of the present invention includes: a first main beam and a second main beam, the first main beam and the second main beam extend in the front-rear direction, and the first main beam and the The second main beams are spaced apart and arranged oppositely in the left-right direction; a first conductive plate and a second conductive plate, the first conductive plate is provided on the first main beam, and the second conductive plate is provided on the On the second main beam; anode plate, the anode plate is arranged in a vertical direction orthogonal to the front-rear direction and the left-right direction and connected to the first main beam and the second main beam, the anode plate is A plurality of the anode plates are arranged at intervals in the front-rear direction, and the two side surfaces of the anode plate in the left-right direction are in contact with the first conductive plate and the second conductive plate respectively; the cathode plate, the The cathode plate is arranged along the vertical direction and is connected to the first main beam and the second main beam. There are multiple cathode plates, and the multiple cathode plates and the multiple anode plates are arranged in the front-rear direction. Spaced and arranged alternately, the two side surfaces of the cathode plate in the left-right direction are respectively in contact with the first conductive plate and the second conductive plate; a frame, the frame is provided with a plurality of liquid inlets and a plurality of outlets Liquid nozzle, the frame is multiple, and the multiple frames are correspondingly arranged between the two adjacent anode plates and the cathode plates, wherein the adjacent anode plates and the cathode plates It can be pressed against the frame between the two, and the frame is sealed with the periphery of the cathode plate and the periphery of the anode plate respectively, so that a closed space is formed between the cathode plate and the anode plate; The anode plate and the cathode plate may be separated from each other to facilitate taking out the cathode plate.

The copper electrodeposition equipment according to the embodiment of the present invention has the following advantages: First, the electrode spacing between the anode plate and the cathode plate during the production of copper electrodeposition is 70 to 80% of that of the traditional copper electrodeposition equipment, and the electrode spacing is greatly improved. To shrink. Second, the cathode current density of the electrowinning process can reach 350-500A/m ² , which is 30-40% higher than traditional copper electrowinning equipment, which can greatly increase the copper output. Third, the parallel error between the anode plate and the cathode plate can reach ±0.5mm, which is only 10% of the traditional equipment; fourth, the amount of electrolyte per unit area of the electrode plate is small, only equivalent to 20 ~ of the traditional equipment 30%, which can effectively reduce the AC power consumption due to electrolyte circulation in the production process; fifth, optimize the electrolyte circulation method, reduce the concentration polarization effect of the electrowinning reaction; sixth, the electrolyte circulates in a closed space , The acid mist produced by the electrowinning process can be absorbed in an organized manner; seventh, the electrolyte has a good heat preservation effect and basically does not require external heating.

According to an embodiment of the present invention, the frame is a corrosion-resistant plastic frame.

According to an embodiment of the present invention, the copper electrowinning equipment further includes a pressing device, the pressing device includes a thrust plate and a pressing plate arranged in the vertical direction, the thrust plate and the pressing plate The tight plates are installed on the first main beam and the second main beam and are arranged at intervals in the front-rear direction. A plurality of the anode plates, a plurality of the cathode plates and a plurality of the frames are located in the Between the thrust plate and the pressing plate; when the copper is deposited, the pressing plate and the thrust plate are close to each other to compress the anode plate, the cathode plate and the frame.

According to an embodiment of the present invention, the copper electrowinning equipment further includes a cart mounted on the side of the first main beam away from the second main beam and the second main beam is far away On at least one of the side surfaces of the first main beam, so that the cathode plate and the anode plate are away from each other.

According to a further embodiment of the present invention, the at least one side surface is provided with a guide rail, the cart is provided with a pawl, and the cart is movable along the guide rail and the cathode can be opened by the pawl. Plate or the anode plate.

According to an embodiment of the present invention, a plurality of the liquid inlet nozzles are distributed on the bottom side of the frame and the lower part of the side edge, and a plurality of the liquid nozzles are distributed on the top edge of the frame.

According to a further embodiment of the present invention, the copper electrowinning equipment further includes a liquid inlet branch pipe and a liquid return branch pipe, the liquid inlet branch pipe is U-shaped and is surrounded by the lower outside of the frame, and a plurality of the liquid inlet nozzles Communicate with the liquid inlet branch pipe; a plurality of the liquid outlet nozzles communicate with the liquid return branch pipe.

According to a further embodiment of the present invention, the liquid inlet branch pipe includes a bottom pipe section and two vertical pipe sections respectively connected to the two ends of the bottom pipe section, and the copper electrowinning device further includes a first liquid inlet main pipe and a second pipe section. Two main liquid inlet pipes, the first liquid inlet main pipe and the second liquid inlet main pipe are respectively communicated with the connection points of the two vertical pipe sections and the bottom pipe section.

According to an embodiment of the present invention, the frame is fixedly connected to the anode plate.

According to a further embodiment of the present invention, the copper electrowinning device further includes a first sealing gasket and a second sealing gasket, the first sealing gasket is arranged between the frame and the anode plate, and the second sealing gasket The gasket is provided between the frame and the cathode plate, so that when the anode plate, the cathode plate and the frame are pressed together, the frame and the anode plate and the frame and The cathode plates are sealed separately.

The additional aspects and advantages of the present invention will be partly given in the following description, and part of them will become obvious from the following description, or be understood through the practice of the present invention.

Description of the drawings

The above and/or additional aspects and advantages of the present invention will become obvious and easy to understand from the description of the embodiments in conjunction with the following drawings, in which:

Fig. 1 is a schematic front view of a copper electrowinning device according to an embodiment of the present invention.

Fig. 2 is a schematic top view of a copper electrowinning device according to an embodiment of the present invention.

Fig. 3 is an enlarged schematic view of A in Fig. 2.

Fig. 4 is a schematic side view of a copper electrowinning device according to an embodiment of the present invention.

Reference signs:

Copper electrowinning equipment 100,

First main beam 11, second main beam 12, guide rail 13, first conductive plate 21, second conductive plate 22, anode plate 3, cathode plate 4, frame 5, liquid inlet 51, liquid outlet 52, thrust Plate 61, compression plate 62, pull plate cart 7, pawl 71, liquid inlet branch pipe 81, first liquid inlet manifold 82, second liquid inlet manifold 83, liquid return branch pipe 84, first sealing gasket 91, second sealing Washer 92.

detailed description

The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary, and are intended to explain the application, but should not be understood as a limitation to the application. In the description of this application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " The orientation or positional relationship indicated by “back”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inner”, and “outer” are based on the orientation shown in the drawings or The positional relationship is only for the convenience of describing the application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the application.

Hereinafter, a copper electrowinning device 100 according to an embodiment of the present invention will be described with reference to FIGS. 1 to 4.

As shown in FIGS. 1-4, the copper electrowinning device 100 according to the embodiment of the present invention includes a first main beam 11, a second main beam 12, a first conductive plate 21, a second conductive plate 22, an anode plate 3, a cathode Board 4 and frame 5. Specifically, by providing the first main beam 11 and the second main beam 12, they mainly play a supporting role, such as supporting components such as the anode plate 3, the cathode plate 4, the first conductive plate 21 and the second conductive plate 22.

The first main beam 11 and the second main beam 12 extend in the front-rear direction, and the first main beam 11 and the second main beam 12 are spaced apart and arranged oppositely in the left-right direction.

The first conductive plate 21 is provided on the first main beam 11, and the second conductive plate 22 is provided on the second main beam 12.

The anode plate 3 is arranged in a vertical direction orthogonal to the front-rear direction and the left-right direction and is connected to the first main beam 11 and the second main beam 12. There are a plurality of anode plates 3, and the plurality of anode plates 3 are arranged at intervals in the front-rear direction, and two side surfaces of the anode plate 3 in the left-right direction are in contact with the first conductive plate 21 and the second conductive plate 22, respectively.

The cathode plate 4 is arranged vertically and connected to the first main beam 11 and the second main beam 12. There are multiple cathode plates 4, and the multiple cathode plates 4 and the multiple anode plates 3 are spaced and alternately arranged in the front and rear direction. The two side surfaces of the plate 4 in the left-right direction are in contact with the first conductive plate 21 and the second conductive plate 22, respectively.

The frame 5 is provided with a plurality of liquid inlet nozzles 51 and a plurality of liquid outlet nozzles 52. The frame 5 is multiple, and the plurality of frames 5 are correspondingly arranged between two adjacent anode plates 3 and cathode plates 4 respectively.

The adjacent anode plate 3 and the cathode plate 4 can be pressed together with the frame 5 between them, and the frame 5 is sealed with the peripheral part of the cathode plate 4 and the peripheral part of the anode plate 3 respectively, so that A closed space is formed between the cathode plate 4 and the anode plate 3; the adjacent anode plate 3 and the cathode plate 4 can be separated from each other, so that the cathode plate 4 can be taken out.

Specifically, as shown in Figures 1-4, the two main beams respectively extend in the front-rear direction and are arranged at intervals in the left-right direction. The two conductive plates are respectively arranged on the two main beams, that is, one conductive plate is arranged on one main beam On the beam, another conductive plate is arranged on the other main beam. A plurality of anode plates 3 are vertically arranged and arranged on the two main beams at intervals along the front and rear direction, and the two sides of the plurality of anode plates 3 are respectively in contact with the conductive plates on the two main beams. A plurality of cathode plates 4 are arranged vertically and arranged alternately with the plurality of anode plates 3 along the front and rear directions on the two main beams. The two sides of the plurality of cathode plates 4 are respectively in contact with the conductive plates on the two main beams. By providing two conductive plates, it can be used for the conduction of the anode plate 3 and the cathode plate 4. For example, the left side of the anode plate 3 and the conductive plates on the left main beam are conductive, and the right side of the anode plate 3 is insulated from the conductive plates on the right main beam; on the contrary, the left and left sides of the cathode plate 4 The conductive plate on the main beam is insulated, and the right side of the cathode plate 4 is conductive with the conductive plate on the right main beam.

A frame 5 is provided between each adjacent cathode plate 4 and anode plate 3. The adjacent anode plate 3, the frame 5 and the cathode plate 4 can be pressed tightly. One of the two sides of the frame 5 in the front and rear direction is hermetically connected to the periphery of the cathode plate 4. The other side of the two side surfaces is hermetically connected to the peripheral portion of the anode plate 3 so that the adjacent cathode plate 4 and the anode plate 3 form a closed space in the front-rear direction. The adjacent anode plate 3 and the cathode plate 4 can be separated from each other from the compressed state, so that the cathode plate 4 can be taken out. Thus, when the copper is electrowinning, the anode plate 3, the cathode plate 4 and the frame 5 are compressed, and a closed space is formed between the adjacent anode plate 3 and the cathode plate 4, and the electrolyte enters the closed space uniformly from the liquid inlet 51 The electrowinning is carried out in a distributed manner and flowing out from the outlet nozzle 52, so that the electrolyte in the enclosed space is continuously circulated. During the electrowinning process, copper is deposited on the cathode plate 4. Due to the better circulation effect, the concentration of the electrowinning reaction is extremely high. The chemical effect is weakened, the cathode current density can be increased to 350-500A/m ² , the acid mist generated during the electrolysis process can be absorbed in an organized manner, and the electrolyte has a good heat preservation effect and basically does not require external heating.

After the copper electrodeposition is over, the cathode plate 4 is pulled apart to increase the distance between the adjacent cathode plates 4 and the anode plate 3 to facilitate the removal of the cathode plate 4. After the copper deposited on the cathode plate 4 is peeled off, It is convenient to reinstall the cathode plate 4 during the first copper electrowinning. Since the anode plate 3, the cathode plate 4 and the frame 5 are pressed tightly, on the one hand, the distance between the anode plate 3 and the cathode plate 4 can be made 70～the distance between the anode plate 3 and the cathode plate 4 of the traditional copper electrowinning equipment. 80%, the electrode spacing is greatly reduced, so that the amount of electrolyte per unit area of the electrode plate is small, which is only equivalent to 20-30% of the amount of electrolyte per unit area of the traditional copper electrowinning equipment, thereby reducing the electrolyte. The total circulation volume reduces the AC power consumption during the electrowinning process; on the other hand, the parallel error between the anode plate 3 and the cathode plate 4 can reach ±0.5mm, which is only the anode plate 3 and the cathode plate of the traditional copper electrowinning equipment 10% of the parallel error between 4, due to the high parallelism between the anode plate 3 and the cathode plate 4, it can facilitate the uniform deposition of copper on the cathode plate 4, and at the same time, facilitate the short circuit between the anode plate 3 and the cathode plate 4. an examination.

The copper electrowinning device 100 according to the embodiment of the present invention has the following advantages: first, the electrode spacing between the anode plate 3 and the cathode plate 4 during the copper electrowinning production is 70-80% of that of the traditional copper electrowinning device. The spacing has been greatly reduced. Second, the cathode current density of the electrowinning process can reach 350-500A/m ² , which is 30-40% higher than traditional copper electrowinning equipment, which can greatly increase the copper output. Third, the parallel error between the anode plate 3 and the cathode plate 4 can reach ±0.5mm, which is only 10% of the traditional equipment; fourth, the electrolyte volume per unit area of the electrode plate is small, only equivalent to that of the traditional equipment 20-30%, which can effectively reduce the AC power consumption due to the electrolyte circulation in the production process; fifth, optimize the electrolyte circulation method, reduce the concentration polarization effect of the electrowinning reaction; sixth, the electrolyte is airtight Space circulation, the acid mist generated by the electrowinning process can be absorbed in an organized manner; seventh, the electrolyte has a good heat preservation effect and basically does not require external heating.

According to an embodiment of the present invention, the frame 5 is a corrosion-resistant plastic frame 5. The corrosion-resistant plastic frame 5 is adopted. On the one hand, the frame 5 has corrosion resistance to the electrolyte and improves the service life of the frame 5; on the other hand, the frame 5 is made of plastic material, which is easy to shape and manufacture, which can save costs.

As shown in Figures 2 and 4, according to an embodiment of the present invention, it further includes a pressing device. The pressing device includes a thrust plate 61 and a pressing plate 62 arranged in a vertical direction. The thrust plate 61 and the pressing plate 62 are installed on the first main beam 11 and the second main beam 12 and arranged at intervals in the front-rear direction. Specifically, a thrust plate 61 is installed at the front end of the first main beam 11 and the second main beam 12, a pressing plate 62 is installed at the rear end of the first main beam 11 and the second main beam 12, and a plurality of anode plates 3, The plurality of cathode plates 4 and the plurality of frames 5 are located between the thrust plate 61 and the pressing plate 62. When the copper electrode is accumulated, the pressing plate 62 and the thrust plate 61 are close to each other to compress the anode plate 3, the cathode plate 4 and the frame 5, so that a closed space is formed between the adjacent anode plate 3 and the cathode plate 4. Avoid leakage of electrolyte that enters the confined space.

As shown in Figures 1 and 4, according to an embodiment of the present invention, the copper electrowinning equipment further includes a cart 7 installed on the side of the first main beam 11 away from the second main beam 12 and The second main beam 12 is on at least one of the side surfaces away from the first main beam 11, so that the cathode plate 4 and the anode plate 3 are away from each other. Specifically, there are two carts 7 and the two carts 7 are installed on the outer side of the first main beam 11 and the outer side of the second main beam 12 respectively. Specifically, one cart 7 is installed on the On the outer side of one main beam, the other trolley 7 is installed on the outer side of the other main beam. The two trolleys operate synchronously to pull the cathode plate 4 and the anode plate 3 apart to facilitate the removal of the cathode plate 4 , In order to peel off the copper deposited on the cathode plate 4, at the same time, it is also convenient to reinstall the cathode plate 4 in the next copper electrodeposition.

As shown in FIG. 4, according to a further embodiment of the present invention, at least one side of the side of the first main beam 11 away from the second main beam 12 and the side of the second main beam 12 away from the first main beam 11 A guide rail 13 is provided on the upper part, and the cart 7 is provided with a pawl 71. The cart 7 can walk along the guide rail 13 and can open the cathode plate 4 or the anode plate 3 by the pawl 71.

Specifically, the outer side surface of the first main beam 11 and the outer side surface of the second main beam 12 are each provided with a guide rail 13, one of which can walk along one guide rail 13, and the other can walk along the other. The guide rail 13 moves, and the cathode plate 4 or the anode plate 3 is opened by the pawls 71 of the two pulling carts 7 to increase the inter-electrode distance between the cathode plate 4 and the anode plate 3 to facilitate the removal of the cathode plate 4 and strip the cathode The copper deposited on the plate 4 also facilitates the installation of the cathode plate 4 in the next copper electrodeposition.

As shown in FIG. 1, according to an embodiment of the present invention, a plurality of liquid inlet nozzles 51 are distributed on the bottom side and the side below the middle part of the frame 5, and a plurality of liquid outlet nozzles 52 are distributed on the top edge of the frame 5. Therefore, by arranging a plurality of liquid inlet nozzles 51 on the bottom and sides of the frame 5 below the middle part, for example, the plurality of liquid inlet nozzles 51 are evenly arranged at intervals, so that the electrolyte can be more evenly filled in the enclosed space. And flow out from the multiple outlet nozzles 52 on the bottom side of the frame 5, which further optimizes the circulation method of the electrolyte in the enclosed space, and more effectively reduces the concentration polarization effect of the electrowinning reaction, and at the same time produces The acid mist can be absorbed in an organized manner. In addition, the electrolyte has a good insulation effect and basically does not require external heating.

As shown in Figure 1, according to a further embodiment of the present invention, it further includes a liquid inlet branch pipe 81 and a liquid return branch pipe 84. The liquid inlet branch pipe 81 is U-shaped and surrounds the lower outside of the frame 5. A plurality of liquid inlet nozzles 51 and The liquid inlet branch pipe 81 is in communication; a plurality of liquid outlet nozzles 52 are communicated with the liquid return branch pipe 84. As a result, it is advantageous for the electrolyte to circulate evenly distributed in the closed space, and the concentration intensification phenomenon of the electrowinning reaction is reduced. In addition, for each frame 5, one liquid inlet branch pipe 81 is used to match multiple nozzles, which is simple in structure and easy to install; and one liquid return branch pipe 84 is used to match multiple liquid outlet nozzles 52, which is simple in structure and easy to install.

As shown in FIG. 1, according to a further embodiment of the present invention, the liquid inlet branch pipe 81 includes a bottom pipe section and two vertical pipe sections respectively connected to two ends of the bottom pipe section. Specifically, the bottom pipe section and the two vertical pipe sections enclose a U shape.

The copper electrowinning equipment 100 also includes a first inlet manifold 82 and a second inlet manifold 83. The first inlet manifold 82 and the second inlet manifold 83 are respectively in communication with the connection between the two vertical pipe sections and the bottom pipe section. . Specifically, one liquid inlet main pipe communicates with a connection point between a vertical pipe section and a bottom pipe section, and another liquid inlet main pipe communicates with a connection point between another vertical pipe section and the bottom pipe section. Therefore, it is advantageous for the electrolyte to circulate evenly in the enclosed space, reducing the concentration intensification phenomenon of the electrowinning reaction. At the same time, the conveying mode of the liquid inlet manifold to the liquid inlet branch pipe 81 is adopted to simplify the structure of the liquid inlet pipe and facilitate installation.

As shown in FIG. 1, according to an embodiment of the present invention, the frame 5 is fixedly connected to the anode plate 3. Therefore, when the cathode plate 4 is pulled apart, the cathode plate 4 and the frame 5 are changed from the sealed state to the separated state. Since the frame 5 and the anode plate 3 are fixed, the frame 5 will not fall off.

As shown in FIG. 4, according to a further embodiment of the present invention, the copper electrowinning device 100 further includes a first sealing gasket 91 and a second sealing gasket 92; the first sealing gasket 91 is arranged between the frame 5 and the anode plate 3. Two sealing gaskets 92 are provided between the frame 5 and the cathode plate 4, so that when the anode plate 3, the cathode plate 4 and the frame 5 are pressed together, the frame 5 and the anode plate 3 and between the frame 5 and the cathode plate 4 seal. The gap between the frame 5 and the anode plate 3 is sealed by the first tight ring 91, and the gap between the frame 5 and the cathode plate 4 is sealed by the second sealing gasket 92, and the sealing is reliable.

In the description of this specification, descriptions with reference to the terms "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" etc. mean specific features described in conjunction with the embodiment or example , The structure, materials, or characteristics are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the described specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine the different embodiments or examples and the characteristics of the different embodiments or examples described in this specification without contradicting each other.

In addition, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present application, "a plurality of" means at least two, such as two, three, etc., unless specifically defined otherwise.

In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and other terms should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection , Or integrated; it can be mechanically connected, or it can be electrically connected or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two components or the interaction relationship between two components, Unless otherwise clearly defined. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

In this application, unless expressly stipulated and defined otherwise, the “on” or “under” of the first feature on the second feature may be in direct contact with the first and second features, or indirectly through an intermediary. contact. Moreover, the "above", "above" and "above" of the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the level of the first feature is higher than the second feature. The “below”, “below” and “below” of the second feature of the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the level of the first feature is smaller than the second feature. Although the embodiments of the present application have been shown and described above, it can be understood that the above-mentioned embodiments are exemplary and should not be construed as limiting the present application. A person of ordinary skill in the art can comment on the foregoing within the scope of the present application. The embodiment undergoes changes, modifications, substitutions and modifications.

Claims

A copper electrowinning equipment, characterized in that it comprises:

The first main beam and the second main beam, the first main beam and the second main beam extend in the front-rear direction, and the first main beam and the second main beam are spaced apart and arranged oppositely in the left-right direction ；

A first conductive plate and a second conductive plate, the first conductive plate is provided on the first main beam, and the second conductive plate is provided on the second main beam;

The anode plate is arranged in a vertical direction orthogonal to the front and rear direction and the left and right direction and connected to the first main beam and the second main beam. The anode plates are arranged at intervals in the front and rear directions, and two side surfaces of the anode plates in the left and right directions are respectively in contact with the first conductive plate and the second conductive plate;

A cathode plate, the cathode plate is arranged along the vertical direction and connected to the first main beam and the second main beam, there are multiple cathode plates, multiple cathode plates and multiple anodes The plates are spaced and alternately arranged in the front and rear directions, and the two side surfaces of the cathode plate in the left and right directions are in contact with the first conductive plate and the second conductive plate respectively;

A frame, the frame is provided with a plurality of liquid inlet nozzles and a plurality of liquid outlet nozzles, the frame is multiple, and the plurality of frames are respectively correspondingly provided on the adjacent anode plate and the cathode plate between,

The adjacent anode plate and the cathode plate can be pressed against the frame between them, and the frame is sealed with the peripheral part of the cathode plate and the peripheral part of the anode plate, so that the cathode A closed space is formed between the plate and the anode plate; the adjacent anode plate and the cathode plate can be separated from each other so as to take out the cathode plate.
The copper electrowinning device according to claim 1, wherein the frame is a corrosion-resistant plastic frame.
The copper electrowinning equipment according to claim 1 or 2, further comprising a pressing device, the pressing device comprising a thrust plate and a pressing plate arranged along the vertical direction, the thrust plate And the pressing plate are installed on the first main beam and the second main beam and arranged at intervals in the front-rear direction, a plurality of the anode plates, a plurality of the cathode plates and a plurality of the The frame is located between the thrust plate and the pressing plate; when the copper is electro deposited, the pressing plate and the thrust plate are close to each other to connect the anode plate, the cathode plate and the frame Squeeze.
The copper electrowinning equipment according to any one of claims 1-3, further comprising a cart, which is installed on the side of the first main beam away from the second main beam And at least one of the side surfaces of the second main beam away from the first main beam, so that the cathode plate and the anode plate are away from each other.
The copper electrowinning equipment of claim 4, wherein the at least one side surface is provided with a guide rail, the cart is provided with a pawl, and the cart is movable along the guide rail and can pass through The pawl pulls away the cathode plate or the anode plate.
The copper electrowinning device according to any one of claims 1-5, wherein a plurality of the liquid inlet nozzles are distributed on the bottom side and the side below the middle of the frame, and a plurality of the outlet nozzles Liquid nozzles are distributed on the top edge of the frame.
The copper electrowinning device according to claim 6, further comprising a liquid inlet branch pipe and a liquid return branch pipe, the liquid inlet branch pipe is U-shaped and is enclosed outside the lower part of the frame, and a plurality of the inlet The liquid nozzle is communicated with the liquid inlet branch pipe, and a plurality of the liquid outlet nozzles are communicated with the liquid return branch pipe.
The copper electrowinning device according to claim 7, wherein the liquid inlet branch pipe includes a bottom pipe section and two vertical pipe sections respectively connected to the two ends of the bottom pipe section, and the copper electrowinning device further comprises The first liquid inlet header and the second liquid inlet header, the first liquid inlet header and the second liquid inlet header are respectively communicated with the connection points of the two vertical pipe sections and the bottom pipe section.
The copper electrowinning device according to any one of claims 1-8, wherein the frame is fixedly connected to the anode plate.
The copper electrode device according to claim 9, further comprising a first sealing gasket and a second sealing gasket, the first sealing gasket is provided between the frame and the anode plate, and the second The sealing gasket is arranged between the frame and the cathode plate, so that when the anode plate, the cathode plate and the frame are pressed together, the frame and the anode plate and the frame Seal with the cathode plate respectively.