CH657242A5 - Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken. - Google Patents
Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken. Download PDFInfo
- Publication number
- CH657242A5 CH657242A5 CH179282A CH179282A CH657242A5 CH 657242 A5 CH657242 A5 CH 657242A5 CH 179282 A CH179282 A CH 179282A CH 179282 A CH179282 A CH 179282A CH 657242 A5 CH657242 A5 CH 657242A5
- Authority
- CH
- Switzerland
- Prior art keywords
- plasma
- arc
- conductor
- electromagnet
- plasma source
- Prior art date
Links
- 238000009832 plasma treatment Methods 0.000 title claims description 7
- 239000004020 conductor Substances 0.000 claims description 50
- 238000004804 winding Methods 0.000 claims description 6
- 239000000696 magnetic material Substances 0.000 claims 2
- 150000002500 ions Chemical class 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 239000002245 particle Substances 0.000 description 8
- 230000005684 electric field Effects 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/40—Details, e.g. electrodes, nozzles using applied magnetic fields, e.g. for focusing or rotating the arc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/360,447 US4452686A (en) | 1982-03-22 | 1982-03-22 | Arc plasma generator and a plasma arc apparatus for treating the surfaces of work-pieces, incorporating the same arc plasma generator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH657242A5 true CH657242A5 (de) | 1986-08-15 |
Family
ID=23417983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH179282A CH657242A5 (de) | 1982-03-22 | 1982-03-23 | Lichtbogen-plasmaquelle und lichtbogenanlage mit einer solchen lichtbogen-plasmaquelle zur plasmabehandlung der oberflaeche von werkstuecken. |
Country Status (3)
| Country | Link |
|---|---|
| CH (1) | CH657242A5 (enrdf_load_stackoverflow) |
| DE (1) | DE3211264C2 (enrdf_load_stackoverflow) |
| FR (1) | FR2524245A1 (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4929321A (en) * | 1988-03-23 | 1990-05-29 | Balzers Aktiengesellschaft | Method and apparatus for coating workpieces |
| DE4006456C1 (en) * | 1990-03-01 | 1991-05-29 | Balzers Ag, Balzers, Li | Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19711347C2 (de) * | 1997-03-18 | 2000-10-05 | Forschungszentrum Juelich Gmbh | Beschichtungsvorrichtung auf Basis eines kathodischen Lichtbogens |
| UA101443C2 (ru) * | 2011-11-29 | 2013-03-25 | Национальный Научный Центр "Харьковский Физико-Технический Институт" | Анодный УЗЕЛ вакуумно-дугового ИСТОЧНИКа катодной ПЛАЗМЫ |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
| US3900585A (en) * | 1972-02-12 | 1975-08-19 | Agency Ind Science Techn | Method for control of ionization electrostatic plating |
| SU563826A1 (ru) * | 1975-06-04 | 1978-03-05 | Предприятие П/Я В-8851 | Устройство дл нанесени тонких пленок |
| JPS54110988A (en) * | 1978-01-31 | 1979-08-30 | Nii Chiefunorogii Afutomobirin | Coating vacuum evaporation apparatus |
| SU1040631A1 (ru) * | 1980-06-25 | 1983-09-07 | Предприятие П/Я В-8851 | Вакуумно-дуговое устройство |
-
1982
- 1982-03-23 CH CH179282A patent/CH657242A5/de not_active IP Right Cessation
- 1982-03-26 FR FR8205239A patent/FR2524245A1/fr active Granted
- 1982-03-26 DE DE19823211264 patent/DE3211264C2/de not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4929321A (en) * | 1988-03-23 | 1990-05-29 | Balzers Aktiengesellschaft | Method and apparatus for coating workpieces |
| DE4006456C1 (en) * | 1990-03-01 | 1991-05-29 | Balzers Ag, Balzers, Li | Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3211264A1 (de) | 1983-10-06 |
| DE3211264C2 (de) | 1984-10-31 |
| FR2524245A1 (fr) | 1983-09-30 |
| FR2524245B1 (enrdf_load_stackoverflow) | 1984-06-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |