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Publication of CH632096A5publicationCriticalpatent/CH632096A5/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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Physics & Mathematics
(AREA)
Spectroscopy & Molecular Physics
(AREA)
General Physics & Mathematics
(AREA)
Macromonomer-Based Addition Polymer
(AREA)
Polymerisation Methods In General
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Compositions Of Macromolecular Compounds
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Photosensitive Polymer And Photoresist Processing
(AREA)
CH1613077A1976-12-311977-12-28Photopolymerisable composition for the production of relief formes
CH632096A5
(en)
Zur Herstellung von Druck- und Reliefformen geeignetes lichtempfindliches Aufzeichnungsmaterial und Verfahren zur Herstellung von Druck- und Reliefformen mittels dieses Aufzeichnungsmaterials
