CH620314A5 - Method and apparatus for chemical treatment in a luminescent discharge - Google Patents
Method and apparatus for chemical treatment in a luminescent discharge Download PDFInfo
- Publication number
- CH620314A5 CH620314A5 CH264277A CH264277A CH620314A5 CH 620314 A5 CH620314 A5 CH 620314A5 CH 264277 A CH264277 A CH 264277A CH 264277 A CH264277 A CH 264277A CH 620314 A5 CH620314 A5 CH 620314A5
- Authority
- CH
- Switzerland
- Prior art keywords
- electrodes
- chamber
- impedance
- plasma
- ionization
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US66327176A | 1976-03-03 | 1976-03-03 | |
US76187977A | 1977-01-24 | 1977-01-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH620314A5 true CH620314A5 (en) | 1980-11-14 |
Family
ID=27098713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH264277A CH620314A5 (en) | 1976-03-03 | 1977-03-02 | Method and apparatus for chemical treatment in a luminescent discharge |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS52116785A (de) |
CH (1) | CH620314A5 (de) |
DE (1) | DE2708720C2 (de) |
FR (1) | FR2342783A1 (de) |
GB (1) | GB1544172A (de) |
NL (1) | NL7702232A (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4182646A (en) * | 1978-07-27 | 1980-01-08 | John Zajac | Process of etching with plasma etch gas |
US4183781A (en) * | 1978-09-25 | 1980-01-15 | International Business Machines Corporation | Stabilization process for aluminum microcircuits which have been reactive-ion etched |
US4342901A (en) * | 1980-08-11 | 1982-08-03 | Eaton Corporation | Plasma etching electrode |
GB2144669B (en) * | 1982-12-07 | 1986-02-26 | Standard Telephones Cables Ltd | Cleaning electrical contacts |
EP0146115B1 (de) * | 1983-12-16 | 1989-02-22 | Showa Aluminum Corporation | Verfahren zur Herstellung eines Aluminiumwerkstoffes zur Anwendung im Vakuum |
JPS60211061A (ja) * | 1984-04-05 | 1985-10-23 | Toyota Central Res & Dev Lab Inc | アルミニウム材のイオン窒化方法 |
US4749589A (en) * | 1984-12-13 | 1988-06-07 | Stc Plc | Method of surface treatment |
US5872426A (en) * | 1997-03-18 | 1999-02-16 | Stevens Institute Of Technology | Glow plasma discharge device having electrode covered with perforated dielectric |
US6879103B1 (en) | 1997-03-18 | 2005-04-12 | The Trustees Of The Stevens Institute Of Technology | Glow plasma discharge device |
US6900592B2 (en) | 1997-03-18 | 2005-05-31 | The Trustees Of The Stevens Institute Of Technology | Method and apparatus for stabilizing of the glow plasma discharges |
US6228438B1 (en) * | 1999-08-10 | 2001-05-08 | Unakis Balzers Aktiengesellschaft | Plasma reactor for the treatment of large size substrates |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3616403A (en) * | 1968-10-25 | 1971-10-26 | Ibm | Prevention of inversion of p-type semiconductor material during rf sputtering of quartz |
US3661761A (en) * | 1969-06-02 | 1972-05-09 | Ibm | Rf sputtering apparatus for promoting resputtering of film during deposition |
US3757733A (en) * | 1971-10-27 | 1973-09-11 | Texas Instruments Inc | Radial flow reactor |
DE2241229C2 (de) * | 1972-08-22 | 1983-01-20 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zum Ätzen von Substraten durch eine Glimmentladung |
JPS5740650B2 (de) * | 1973-08-11 | 1982-08-28 |
-
1977
- 1977-02-21 GB GB715077A patent/GB1544172A/en not_active Expired
- 1977-03-01 DE DE19772708720 patent/DE2708720C2/de not_active Expired
- 1977-03-02 CH CH264277A patent/CH620314A5/fr not_active IP Right Cessation
- 1977-03-02 NL NL7702232A patent/NL7702232A/xx not_active Application Discontinuation
- 1977-03-02 JP JP2329477A patent/JPS52116785A/ja active Granted
- 1977-03-02 FR FR7706112A patent/FR2342783A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
NL7702232A (nl) | 1977-09-06 |
GB1544172A (en) | 1979-04-11 |
DE2708720A1 (de) | 1977-09-15 |
JPS52116785A (en) | 1977-09-30 |
FR2342783A1 (fr) | 1977-09-30 |
DE2708720C2 (de) | 1982-08-26 |
FR2342783B1 (de) | 1982-06-11 |
JPS5347664B2 (de) | 1978-12-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |