CH617063B - PROCESS FOR ADJUSTING THE PROPERTIES OF A RESONATOR, RESONATOR OBTAINED BY THIS PROCESS AND USE OF THE RESONATOR. - Google Patents
PROCESS FOR ADJUSTING THE PROPERTIES OF A RESONATOR, RESONATOR OBTAINED BY THIS PROCESS AND USE OF THE RESONATOR.Info
- Publication number
- CH617063B CH617063B CH784777A CH784777A CH617063B CH 617063 B CH617063 B CH 617063B CH 784777 A CH784777 A CH 784777A CH 784777 A CH784777 A CH 784777A CH 617063 B CH617063 B CH 617063B
- Authority
- CH
- Switzerland
- Prior art keywords
- resonator
- altered
- mass
- resonant frequency
- properties
- Prior art date
Links
- 239000013078 crystal Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02157—Dimensional parameters, e.g. ratio between two dimension parameters, length, width or thickness
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Oscillators With Electromechanical Resonators (AREA)
- Electric Clocks (AREA)
Abstract
The quartz-crystal resonator has its frequency adjusted by altering its mass in at least one region having a small area compared to the total surface of the resonator. The region altered may lie at the edge of the resonator or close to it such that the temp. coefficient of the resonator's resonant frequency is changed without altering the dimensions of the resonator. Adjustment of the resonator takes place in two stages. First the resonator's mass is altered such that the temp. coefficient of the first order of the resonant frequency is zero. Then the mass is altered in a different place such that the resonant frequency is altered but not the thermal properties of the resonator.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH784777A CH617063GA3 (en) | 1977-06-27 | 1977-06-27 | Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator |
DE19782828048 DE2828048A1 (en) | 1977-06-27 | 1978-06-26 | Quartz crystal resonator adjustment - involves altering mass at two small areas near edge of resonator without changing size |
JP7793678A JPS5444857A (en) | 1977-06-27 | 1978-06-27 | Method of controlling characteristics of crystal oscillator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH784777A CH617063GA3 (en) | 1977-06-27 | 1977-06-27 | Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator |
Publications (2)
Publication Number | Publication Date |
---|---|
CH617063B true CH617063B (en) | |
CH617063GA3 CH617063GA3 (en) | 1980-05-14 |
Family
ID=4331307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH784777A CH617063GA3 (en) | 1977-06-27 | 1977-06-27 | Method of adjusting the properties of a resonator, resonator obtained by this method and use of the resonator |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5444857A (en) |
CH (1) | CH617063GA3 (en) |
DE (1) | DE2828048A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4375604A (en) * | 1981-02-27 | 1983-03-01 | The United States Of America As Represented By The Secretary Of The Army | Method of angle correcting doubly rotated crystal resonators |
JPS57188121A (en) * | 1981-05-15 | 1982-11-19 | Seiko Instr & Electronics Ltd | Frequency adjusting method of coupling oscillator |
JPS5833308A (en) * | 1981-08-21 | 1983-02-26 | Seiko Instr & Electronics Ltd | Coupled quartz oscillator |
JPS58159012A (en) * | 1982-03-16 | 1983-09-21 | Seiko Instr & Electronics Ltd | Manufacture of coupling vibrator unit |
JPS58166818A (en) * | 1982-03-29 | 1983-10-03 | Seiko Instr & Electronics Ltd | Frequency control method of coupling oscillator |
JPS58170109A (en) * | 1982-03-30 | 1983-10-06 | Seiko Instr & Electronics Ltd | Miniature gt-cut crystal oscillator |
US4455500A (en) * | 1983-07-28 | 1984-06-19 | Western Geophysical Company Of America | Sensitivity and capacitance adjustment method for piezoelectric accelerometers |
JPH0640612B2 (en) * | 1986-03-31 | 1994-05-25 | 朝日電波株式会社 | Piezoelectric vibrator |
US5168191A (en) * | 1987-10-02 | 1992-12-01 | Quartztronics, Inc. | Crystal resonator with low acceleration sensitivity and method of manufacture thereof |
US4935658A (en) * | 1987-10-02 | 1990-06-19 | Quartztronics, Inc. | Crystal resonator with low acceleration sensitivity and method of manufacture thereof |
US5022130A (en) * | 1987-10-02 | 1991-06-11 | Quartztronics, Inc. | Method of manufacturing crystal resonators having low acceleration sensitivity |
JPH02186817A (en) * | 1989-01-13 | 1990-07-23 | Seiko Electronic Components Ltd | Contour sliding crystal resonator |
US5112642A (en) * | 1990-03-30 | 1992-05-12 | Leybold Inficon, Inc. | Measuring and controlling deposition on a piezoelectric monitor crystal |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS533178A (en) * | 1976-06-30 | 1978-01-12 | Seiko Instr & Electronics Ltd | Crystal vibrator |
-
1977
- 1977-06-27 CH CH784777A patent/CH617063GA3/en not_active IP Right Cessation
-
1978
- 1978-06-26 DE DE19782828048 patent/DE2828048A1/en active Granted
- 1978-06-27 JP JP7793678A patent/JPS5444857A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH03804B2 (en) | 1991-01-09 |
DE2828048C2 (en) | 1989-03-16 |
JPS5444857A (en) | 1979-04-09 |
CH617063GA3 (en) | 1980-05-14 |
DE2828048A1 (en) | 1979-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |