CH611029A5 - - Google Patents

Info

Publication number
CH611029A5
CH611029A5 CH77877A CH77877A CH611029A5 CH 611029 A5 CH611029 A5 CH 611029A5 CH 77877 A CH77877 A CH 77877A CH 77877 A CH77877 A CH 77877A CH 611029 A5 CH611029 A5 CH 611029A5
Authority
CH
Switzerland
Application number
CH77877A
Inventor
Chih-Shum Lu
Original Assignee
Leybold Heraeus Inficon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Inficon filed Critical Leybold Heraeus Inficon
Publication of CH611029A5 publication Critical patent/CH611029A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Physical Vapour Deposition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CH77877A 1976-01-30 1977-01-21 CH611029A5 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/653,936 US4036167A (en) 1976-01-30 1976-01-30 Apparatus for monitoring vacuum deposition processes

Publications (1)

Publication Number Publication Date
CH611029A5 true CH611029A5 (ko) 1979-05-15

Family

ID=24622868

Family Applications (1)

Application Number Title Priority Date Filing Date
CH77877A CH611029A5 (ko) 1976-01-30 1977-01-21

Country Status (6)

Country Link
US (1) US4036167A (ko)
CH (1) CH611029A5 (ko)
DE (1) DE2700979C3 (ko)
FR (1) FR2339857A1 (ko)
GB (1) GB1543702A (ko)
IT (1) IT1076330B (ko)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4172020A (en) * 1978-05-24 1979-10-23 Gould Inc. Method and apparatus for monitoring and controlling sputter deposition processes
DE2940616A1 (de) * 1979-10-06 1981-04-16 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum plasma-aetzen in plasma-reaktoren
US4324812A (en) * 1980-05-29 1982-04-13 Ransburg Corporation Method for controlling the flow of coating material
US4406252A (en) * 1980-12-29 1983-09-27 Rockwell International Corporation Inductive heating arrangement for evaporating thin film alloy onto a substrate
USRE31968E (en) * 1980-12-31 1985-08-13 The Boeing Company Methods for forming thin-film heterojunction solar cells from I-III-VI.sub.2
US4335266A (en) * 1980-12-31 1982-06-15 The Boeing Company Methods for forming thin-film heterojunction solar cells from I-III-VI.sub.2
JPS57161063A (en) * 1981-03-31 1982-10-04 Nippon Sheet Glass Co Ltd Method and device for sticking metallic oxide film on substrate
US4394237A (en) * 1981-07-17 1983-07-19 Bell Telephone Laboratories, Incorporated Spectroscopic monitoring of gas-solid processes
GB2125541B (en) * 1982-08-13 1986-02-12 Inst Tzvetna Metalurgia Method and device for determination of dust content in dust gas flow
GB2130716A (en) * 1982-11-26 1984-06-06 Philips Electronic Associated Method of determining the composition of an alloy film grown by a layer-by layer process
US4428811A (en) 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of a group IVb metal
US4478173A (en) * 1983-04-18 1984-10-23 Energy Conversion Devices, Inc. Method and apparatus for sensing and controlling the intensity of energy in a deposition system
JPS60204626A (ja) * 1984-03-30 1985-10-16 Anelva Corp 酸化鉄薄膜の形成方法および装置
US4845041A (en) * 1985-11-20 1989-07-04 Analyte Corporation Atomic-absorption sputtering chamber and system
JPS62188941A (ja) * 1986-02-14 1987-08-18 Anelva Corp 真空蒸着のモニタリング用センサ−
US4988871A (en) * 1989-05-08 1991-01-29 Leybold Inficon, Inc. Gas partial pressure sensor for vacuum chamber
US5087815A (en) * 1989-11-08 1992-02-11 Schultz J Albert High resolution mass spectrometry of recoiled ions for isotopic and trace elemental analysis
DE4304612C2 (de) * 1993-02-16 1995-03-16 Fraunhofer Ges Forschung Verfahren zur kontinuierlichen Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze oder eines zu verdampfenden Materials im Vakuum
DE19607400C2 (de) * 1996-02-28 1999-09-09 Leybold Ag Verdampferschiffchen für eine Vorrichtung zur Beschichtung von Substraten
DE19609970A1 (de) 1996-03-14 1997-09-18 Leybold Systems Gmbh Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
US6558735B2 (en) * 2001-04-20 2003-05-06 Eastman Kodak Company Reusable mass-sensor in manufacture of organic light-emitting devices
US6513451B2 (en) * 2001-04-20 2003-02-04 Eastman Kodak Company Controlling the thickness of an organic layer in an organic light-emiting device
DE10361903A1 (de) * 2003-12-22 2005-07-28 Carl Zeiss Jena Gmbh Verfahren zur spektroskopischen Analyse einer biologischen oder chemischen Substanz
US7719681B2 (en) * 2007-10-12 2010-05-18 Inficon Apparatus and method for measuring vapor flux density
US8646408B2 (en) * 2009-12-31 2014-02-11 First Solar, Inc. Flux monitor
DE102012200211A1 (de) * 2012-01-09 2013-07-11 Carl Zeiss Nts Gmbh Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates
JP6707559B2 (ja) 2015-03-31 2020-06-10 ビューラー アルツェナウ ゲゼルシャフト ミット ベシュレンクテル ハフツングＢｕｅｈｌｅｒ Ａｌｚｅｎａｕ ＧｍｂＨ 被覆された基板の製造方法
DE102022208770A1 (de) 2022-08-24 2024-02-29 Hochschule Reutlingen, Körperschaft des öffentlichen Rechts Vorrichtung zum Erfassen von mindestens einer gasförmigen Komponente in einem Gas

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3168418A (en) * 1962-03-27 1965-02-02 Alloyd Electronics Device for monitoring and controlling evaporation rate in vacuum deposition
US3373278A (en) * 1965-01-06 1968-03-12 United States Steel Corp Determination of vapor coating rate by x-rays emitted from said vapor
FR1541499A (fr) * 1966-10-31 1968-10-04 Air Reduction Procédé et appareil de contrôle de la densité d'une vapeur par spectroscopie
CH475559A (fr) * 1967-04-21 1969-07-15 Battelle Development Corp Procédé de mesure de la vitesse d'évaporation sous vide, jauge pour la mise en oeuvre de ce procédé et application de ce procédé
US3612859A (en) * 1968-01-31 1971-10-12 Westinghouse Electric Corp Method for measuring and controlling the density of a metallic vapor
LU59669A1 (ko) * 1969-10-17 1971-08-10
US3734620A (en) * 1971-04-01 1973-05-22 Ibm Multiple band atomic absorption apparatus for simultaneously measuring different physical parameters of a material

Also Published As

Publication number Publication date
DE2700979C3 (de) 1979-02-22
FR2339857A1 (fr) 1977-08-26
US4036167A (en) 1977-07-19
GB1543702A (en) 1979-04-04
IT1076330B (it) 1985-04-27
DE2700979A1 (de) 1977-08-04
DE2700979B2 (de) 1978-06-22

Similar Documents

Publication Publication Date Title
DE2714346C3 (ko)
DK140653C (ko)
DK138564C (ko)
DK140581C (ko)
FR2350103B1 (ko)
DK139459C (ko)
JPS5515429B2 (ko)
DK142582C (ko)
DK141294C (ko)
JPS5323583U (ko)
DK139493C (ko)
JPS5745425B2 (ko)
JPS52100551U (ko)
JPS5427362Y2 (ko)
DK138293C (ko)
DK135905C (ko)
FR2376140B1 (ko)
JPS5626905Y2 (ko)
JPS52169233U (ko)
JPS539470U (ko)
JPS5388784U (ko)
JPS5375446U (ko)
JPS52154796U (ko)
JPS5362513U (ko)
CH613808A5 (ko)

Legal Events

Date Code Title Description
PL Patent ceased