CH609096A5 - - Google Patents
Info
- Publication number
- CH609096A5 CH609096A5 CH286675A CH286675A CH609096A5 CH 609096 A5 CH609096 A5 CH 609096A5 CH 286675 A CH286675 A CH 286675A CH 286675 A CH286675 A CH 286675A CH 609096 A5 CH609096 A5 CH 609096A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2412729A DE2412729C3 (de) | 1974-03-16 | 1974-03-16 | Verfahren und Anordnung zur Regelung der Verdampfungsrate und des Schichtaufbaus bei der Erzeugung optisch wirksamer Dünnschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH609096A5 true CH609096A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1979-02-15 |
Family
ID=5910275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH286675A CH609096A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-03-16 | 1975-03-06 |
Country Status (5)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0216602A1 (en) * | 1985-09-24 | 1987-04-01 | Machine Technology Inc. | Thin film deposition method and apparatus |
| DE3610733A1 (de) * | 1986-03-29 | 1987-10-01 | Leybold Heraeus Gmbh & Co Kg | Verfahren und vorrichtung zur messung der optischen eigenschaften von duennen schichten |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4198261A (en) * | 1977-12-05 | 1980-04-15 | Gould Inc. | Method for end point detection during plasma etching |
| US4317698A (en) * | 1980-11-13 | 1982-03-02 | Applied Process Technology, Inc. | End point detection in etching wafers and the like |
| DE3135443A1 (de) * | 1981-09-08 | 1983-03-24 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten |
| JPS5949508A (ja) * | 1982-09-14 | 1984-03-22 | Sony Corp | 複屈折板の製造方法 |
| JPS60243271A (ja) * | 1984-05-17 | 1985-12-03 | Matsushita Electric Ind Co Ltd | 真空蒸着方法 |
| DE3650546T2 (de) * | 1985-06-10 | 1996-11-28 | Energy Conversion Devices Inc | Optischer Datenträger |
| DE4003249A1 (de) * | 1990-02-03 | 1991-08-08 | Euro Composites | Verfahren zur steuerung der ofentemperatur bei der herstellung von mit phenolharz behandelten wabenstrukturen |
| JP2913745B2 (ja) * | 1990-04-10 | 1999-06-28 | 松下電器産業株式会社 | 真空蒸着装置 |
| TW591202B (en) * | 2001-10-26 | 2004-06-11 | Hermosa Thin Film Co Ltd | Dynamic film thickness control device/method and ITS coating method |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3636916A (en) * | 1966-03-14 | 1972-01-25 | Optical Coating Laboratory Inc | Coating apparatus and system |
| DE1276976B (de) * | 1962-01-29 | 1968-09-05 | Lab Pristroje Narodni Podnik | Verfahren und Vorrichtung zur optischen Schichtdickenmessung duenner Schichten waehrend ihrer Herstellung durch Aufdampfen im Vakuum |
| CH408433A (de) * | 1962-01-29 | 1966-02-28 | Lab Pristroje Narodni Podnik | Verfahren und Einrichtung zur optischen Prüfung dünner Schichten |
| US3347701A (en) * | 1963-02-05 | 1967-10-17 | Fujitsu Ltd | Method and apparatus for vapor deposition employing an electron beam |
| GB1051402A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1963-05-08 | |||
| GB1073293A (en) * | 1963-10-16 | 1967-06-21 | Edwards High Vacuum Int Ltd | Apparatus for controlling vapour deposition in a vacuum |
| US3853093A (en) * | 1970-01-14 | 1974-12-10 | Optical Coating Laboratory Inc | Optical thickness rate monitor |
| US3670693A (en) * | 1971-03-23 | 1972-06-20 | Collins Radio Co | Quartz crystal resonator tuning control apparatus |
| US3773548A (en) * | 1972-01-27 | 1973-11-20 | Optical Coating Laboratory Inc | Method of monitoring the rate of depositing a coating solely by its optical properties |
-
1974
- 1974-03-16 DE DE2412729A patent/DE2412729C3/de not_active Expired
-
1975
- 1975-02-27 IT IT20723/75A patent/IT1033252B/it active
- 1975-03-06 CH CH286675A patent/CH609096A5/xx not_active IP Right Cessation
- 1975-03-11 US US05/557,283 patent/US4068016A/en not_active Expired - Lifetime
- 1975-03-14 FR FR7508138A patent/FR2263984B1/fr not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0216602A1 (en) * | 1985-09-24 | 1987-04-01 | Machine Technology Inc. | Thin film deposition method and apparatus |
| DE3610733A1 (de) * | 1986-03-29 | 1987-10-01 | Leybold Heraeus Gmbh & Co Kg | Verfahren und vorrichtung zur messung der optischen eigenschaften von duennen schichten |
Also Published As
| Publication number | Publication date |
|---|---|
| IT1033252B (it) | 1979-07-10 |
| DE2412729C3 (de) | 1982-04-29 |
| US4068016A (en) | 1978-01-10 |
| FR2263984B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-04-30 |
| FR2263984A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1975-10-10 |
| DE2412729A1 (de) | 1975-09-25 |
| DE2412729B2 (de) | 1981-06-19 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |