CH606486A5 - - Google Patents

Info

Publication number
CH606486A5
CH606486A5 CH1497276A CH1497276A CH606486A5 CH 606486 A5 CH606486 A5 CH 606486A5 CH 1497276 A CH1497276 A CH 1497276A CH 1497276 A CH1497276 A CH 1497276A CH 606486 A5 CH606486 A5 CH 606486A5
Authority
CH
Switzerland
Application number
CH1497276A
Inventor
Hans Martens
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH606486A5 publication Critical patent/CH606486A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5893—Mixing of deposited material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0184—Manufacture or treatment of devices comprising intermetallic compounds of type A-15, e.g. Nb3Sn
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/917—Mechanically manufacturing superconductor
    • Y10S505/918—Mechanically manufacturing superconductor with metallurgical heat treating
    • Y10S505/919—Reactive formation of superconducting intermetallic compound
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49014—Superconductor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Electrochemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Electrochemical Coating By Surface Reaction (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
CH1497276A 1976-02-27 1976-11-29 CH606486A5 (et)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2608089A DE2608089C3 (de) 1976-02-27 1976-02-27 Verfahren zum Herstellen einer supraleitfähigen Nb3 Sn-Schicht auf einer Nioboberfläche für Hochfrequenzanwendungen

Publications (1)

Publication Number Publication Date
CH606486A5 true CH606486A5 (et) 1978-10-31

Family

ID=5971088

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1497276A CH606486A5 (et) 1976-02-27 1976-11-29

Country Status (7)

Country Link
US (1) US4105512A (et)
JP (1) JPS52105543A (et)
CH (1) CH606486A5 (et)
DE (1) DE2608089C3 (et)
FR (1) FR2342353A1 (et)
GB (1) GB1553743A (et)
NL (1) NL7700024A (et)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4352840A (en) * 1980-11-17 1982-10-05 Turbine Metal Technology, Inc. Interdispersed phase coatings method
JPS61183979A (ja) * 1985-02-08 1986-08-16 Yoshiro Saji 超電導磁気遮蔽体
DE3811695A1 (de) * 1988-04-07 1989-10-19 Interatom Verfahren zum herstellen von supraleitfaehigen nb(pfeil abwaerts)3(pfeil abwaerts)sn-schichten auf nioboberflaechen sowie vorrichtung zur durchfuehrung dieses verfahrens
US5476837A (en) * 1994-03-14 1995-12-19 Midwest Research Institute Process for preparing superconducting film having substantially uniform phase development
US5540787A (en) * 1995-06-14 1996-07-30 General Electric Company Method of forming triniobium tin superconductor
US6495215B1 (en) * 1999-05-26 2002-12-17 Tokyo Electron Limited Method and apparatus for processing substrate
CN113718313B (zh) * 2021-04-20 2023-07-21 中国科学院近代物理研究所 一种提高铌表面锡成核均匀性的处理方法
CN113817990A (zh) * 2021-09-16 2021-12-21 中国科学院近代物理研究所 一种在超导腔内部对锡源进行局部加热的电磁感应结构
CN115852302B (zh) * 2022-12-12 2024-10-18 中国科学院近代物理研究所 一种通过物理吸附有效避免铌三锡薄膜表面生成残余锡滴的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1254542A (en) * 1968-02-20 1971-11-24 Plessey Co Ltd Improvements in or relating to superconducting electrical conductors
DE2106628C3 (de) * 1971-02-12 1974-02-14 Siemens Ag, 1000 Berlin U. 8000 Muenchen Verfahren zur Oberflächenbehandlung von supraleitenden Niob-Hohlraumresonatoren
DE2239425C3 (de) * 1972-08-10 1978-04-20 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur elektrolytischen Behandlung von Nioboberflächen für Wechselstromanwendungen

Also Published As

Publication number Publication date
US4105512A (en) 1978-08-08
DE2608089A1 (de) 1977-09-01
FR2342353A1 (fr) 1977-09-23
DE2608089B2 (de) 1978-06-22
DE2608089C3 (de) 1979-03-15
GB1553743A (en) 1979-09-26
NL7700024A (nl) 1977-08-30
FR2342353B1 (et) 1981-01-09
JPS52105543A (en) 1977-09-05

Similar Documents

Publication Publication Date Title
FR2357828B1 (et)
FR2342353B1 (et)
DK141012C (et)
JPS5423521Y2 (et)
DE2632424C2 (et)
JPS5422634Y2 (et)
JPS5545673Y2 (et)
JPS5352470U (et)
JPS52145775U (et)
JPS5515587Y2 (et)
DK139204C (et)
JPS5544457Y2 (et)
JPS572181Y2 (et)
JPS5325116Y2 (et)
JPS5425877B2 (et)
JPS5345775U (et)
JPS52152152U (et)
JPS52154103U (et)
JPS52145142U (et)
JPS52113237U (et)
JPS5313226U (et)
DK529676A (et)
CS173369B1 (et)
JPS5382292U (et)
JPS5382873U (et)

Legal Events

Date Code Title Description
PL Patent ceased