CH603745A5 - - Google Patents

Info

Publication number
CH603745A5
CH603745A5 CH382176A CH382176A CH603745A5 CH 603745 A5 CH603745 A5 CH 603745A5 CH 382176 A CH382176 A CH 382176A CH 382176 A CH382176 A CH 382176A CH 603745 A5 CH603745 A5 CH 603745A5
Authority
CH
Switzerland
Application number
CH382176A
Inventor
Brian Charles Benson
David Rodney Dixon
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of CH603745A5 publication Critical patent/CH603745A5/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F271/00Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00
    • C08F271/02Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/00 on to polymers of monomers containing heterocyclic nitrogen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
CH382176A 1975-03-26 1976-03-26 CH603745A5 (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB12676/75A GB1547998A (en) 1975-03-26 1975-03-26 Photopolymersisable compositions

Publications (1)

Publication Number Publication Date
CH603745A5 true CH603745A5 (sv) 1978-08-31

Family

ID=10009084

Family Applications (1)

Application Number Title Priority Date Filing Date
CH382176A CH603745A5 (sv) 1975-03-26 1976-03-26

Country Status (20)

Country Link
JP (1) JPS51120802A (sv)
AT (1) AT354084B (sv)
AU (1) AU1234276A (sv)
BE (1) BE840110A (sv)
CA (1) CA1079561A (sv)
CH (1) CH603745A5 (sv)
DE (1) DE2612525A1 (sv)
DK (1) DK131876A (sv)
ES (1) ES446395A1 (sv)
FI (1) FI760797A (sv)
FR (1) FR2305443A1 (sv)
GB (1) GB1547998A (sv)
LU (1) LU74634A1 (sv)
MC (1) MC1098A1 (sv)
NL (1) NL7603121A (sv)
NO (1) NO761006L (sv)
NZ (1) NZ180383A (sv)
PT (1) PT64948B (sv)
SE (1) SE7603634L (sv)
ZA (1) ZA761700B (sv)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3215513C3 (de) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photoempfindliche Harzmasse
US4454219A (en) * 1981-04-27 1984-06-12 Hitachi Chemical Company, Ltd. Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer
JPH066603B2 (ja) * 1984-08-13 1994-01-26 日本合成化学工業株式会社 硬化性樹脂組成物

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3961961A (en) * 1972-11-20 1976-06-08 Minnesota Mining And Manufacturing Company Positive or negative developable photosensitive composition

Also Published As

Publication number Publication date
SE7603634L (sv) 1976-09-27
ES446395A1 (es) 1977-06-16
NO761006L (sv) 1976-09-28
DK131876A (da) 1976-09-27
MC1098A1 (fr) 1977-02-04
GB1547998A (en) 1979-07-04
CA1079561A (en) 1980-06-17
DE2612525A1 (de) 1976-10-14
ZA761700B (en) 1977-04-27
PT64948B (en) 1977-08-25
FR2305443A1 (fr) 1976-10-22
NL7603121A (nl) 1976-09-28
NZ180383A (en) 1978-09-20
PT64948A (en) 1976-04-01
JPS51120802A (en) 1976-10-22
LU74634A1 (sv) 1977-05-06
FI760797A (sv) 1976-09-27
AU1234276A (en) 1977-10-20
AT354084B (de) 1979-12-27
BE840110A (fr) 1976-09-27
ATA224576A (de) 1979-05-15
FR2305443B1 (sv) 1980-04-30

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Legal Events

Date Code Title Description
PL Patent ceased