CH584886A5 - - Google Patents

Info

Publication number
CH584886A5
CH584886A5 CH1366874A CH1366874A CH584886A5 CH 584886 A5 CH584886 A5 CH 584886A5 CH 1366874 A CH1366874 A CH 1366874A CH 1366874 A CH1366874 A CH 1366874A CH 584886 A5 CH584886 A5 CH 584886A5
Authority
CH
Switzerland
Application number
CH1366874A
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH1366874A priority Critical patent/CH584886A5/xx
Priority to NL7417049.A priority patent/NL163623C/xx
Priority to DE2540911A priority patent/DE2540911C3/de
Priority to GB40514/75A priority patent/GB1525945A/en
Priority to US05/619,528 priority patent/US4049352A/en
Priority to FR7530630A priority patent/FR2287687A1/fr
Priority to US05/696,410 priority patent/US4059067A/en
Publication of CH584886A5 publication Critical patent/CH584886A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/66—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by measuring frequency, phase shift or propagation time of electromagnetic or other waves, e.g. using ultrasonic flowmeters
    • G01F1/661—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by measuring frequency, phase shift or propagation time of electromagnetic or other waves, e.g. using ultrasonic flowmeters using light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/76—Devices for measuring mass flow of a fluid or a fluent solid material
    • G01F1/86—Indirect mass flowmeters, e.g. measuring volume flow and density, temperature or pressure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
CH1366874A 1974-10-09 1974-10-09 CH584886A5 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CH1366874A CH584886A5 (ja) 1974-10-09 1974-10-09
NL7417049.A NL163623C (nl) 1974-10-09 1974-12-31 Werkwijze voor het bepalen van de deeltjesstroom in een inrichting voor het in vacuo aanbrengen van lagen.
DE2540911A DE2540911C3 (de) 1974-10-09 1975-09-13 Verfahren zur Bestimmung des Teilchenflusses in einer Vakuumbeschichtungsanlage und Vorrichtung zur Durchführung des Verfahrens
GB40514/75A GB1525945A (en) 1974-10-09 1975-10-03 Vacuum deposition plants
US05/619,528 US4049352A (en) 1974-10-09 1975-10-03 Method and apparatus for determining the rate of flow of particles in a vacuum deposition device
FR7530630A FR2287687A1 (fr) 1974-10-09 1975-10-07 Procede de determination du flux particulaire dans une installation de depot de revetements sous vide, et installation appliquant ce procede
US05/696,410 US4059067A (en) 1974-10-09 1976-06-15 Apparatus for determining the rate of flow of particles in a vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1366874A CH584886A5 (ja) 1974-10-09 1974-10-09

Publications (1)

Publication Number Publication Date
CH584886A5 true CH584886A5 (ja) 1977-02-15

Family

ID=4394335

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1366874A CH584886A5 (ja) 1974-10-09 1974-10-09

Country Status (6)

Country Link
US (1) US4049352A (ja)
CH (1) CH584886A5 (ja)
DE (1) DE2540911C3 (ja)
FR (1) FR2287687A1 (ja)
GB (1) GB1525945A (ja)
NL (1) NL163623C (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837044A (en) * 1987-01-23 1989-06-06 Itt Research Institute Rugate optical filter systems
JPH0816265B2 (ja) * 1987-03-27 1996-02-21 双葉電子工業株式会社 クラスタ検出装置
DE3721875A1 (de) * 1987-07-02 1989-01-12 Gema Ransburg Ag Verfahren und einrichtung fuer eine pulverspruehbeschichtungsanlage
DE3806109A1 (de) * 1987-12-16 1989-07-06 Klaus Prof Dr Ing Baukhage Verfahren zur feststellung wenigstens der oberflaechenstruktur von bewegten sphaerischen partikeln
JPH0781958B2 (ja) * 1989-06-23 1995-09-06 三菱電機株式会社 微細粒子測定装置
US5534066A (en) * 1993-10-29 1996-07-09 International Business Machines Corporation Fluid delivery apparatus having an infrared feedline sensor
KR950034499A (ko) * 1994-01-28 1995-12-28 제임스 조셉 드롱 물리적인 증기증착 과정동안 필름들의 증착속도를 모니터하기 위한 방법 및 장치
US5472505A (en) * 1994-12-19 1995-12-05 Electronics & Telecommunications Research Institute Apparatus for monitoring films during MOCVD
FR2816714B1 (fr) * 2000-11-16 2003-10-10 Shakticom Procede et dispositif de depot de couches minces
WO2004036616A1 (de) * 2002-10-15 2004-04-29 Unaxis Balzers Ag Verfahren zur herstellung magnetron-sputterbeschichteter substrate und anlage hierfür
US7824730B2 (en) * 2007-08-31 2010-11-02 United Technologies Corporation Method and apparatus for measuring coating thickness with a laser
EP3640321B1 (en) 2015-10-09 2022-04-06 DEKA Products Limited Partnership Method for generating a tissue for transplant
US11299705B2 (en) 2016-11-07 2022-04-12 Deka Products Limited Partnership System and method for creating tissue
CN107164724B (zh) * 2017-05-11 2019-04-23 合肥京东方显示技术有限公司 镀膜机及靶材微粒的数量确定方法
CN113295666B (zh) * 2020-09-28 2023-08-22 成都理工大学 利用矿物拉曼参数对黄铁矿中As元素的定量分析方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3654109A (en) * 1968-04-25 1972-04-04 Ibm Apparatus and method for measuring rate in flow processes
US3734620A (en) * 1971-04-01 1973-05-22 Ibm Multiple band atomic absorption apparatus for simultaneously measuring different physical parameters of a material
US3817622A (en) * 1972-12-26 1974-06-18 Nasa Measurement of plasma temperature and density using radiation absorption

Also Published As

Publication number Publication date
FR2287687A1 (fr) 1976-05-07
GB1525945A (en) 1978-09-27
NL163623C (nl) 1980-09-15
DE2540911A1 (de) 1976-04-29
DE2540911C3 (de) 1979-10-04
US4049352A (en) 1977-09-20
NL163623B (nl) 1980-04-15
FR2287687B1 (ja) 1980-06-06
DE2540911B2 (de) 1979-02-08
NL7417049A (nl) 1976-04-13

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Legal Events

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