CH521287A - Verfahren zur Herstellung von kristallinem Silicumkarbid - Google Patents

Verfahren zur Herstellung von kristallinem Silicumkarbid

Info

Publication number
CH521287A
CH521287A CH1572068A CH1572068A CH521287A CH 521287 A CH521287 A CH 521287A CH 1572068 A CH1572068 A CH 1572068A CH 1572068 A CH1572068 A CH 1572068A CH 521287 A CH521287 A CH 521287A
Authority
CH
Switzerland
Prior art keywords
production
silicon carbide
crystalline silicon
crystalline
carbide
Prior art date
Application number
CH1572068A
Other languages
English (en)
Inventor
Strepkoff Serge
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH521287A publication Critical patent/CH521287A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/005—Growth of whiskers or needles
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/148—Silicon carbide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CH1572068A 1967-10-23 1968-10-21 Verfahren zur Herstellung von kristallinem Silicumkarbid CH521287A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR125392 1967-10-23

Publications (1)

Publication Number Publication Date
CH521287A true CH521287A (de) 1972-04-15

Family

ID=8640499

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1572068A CH521287A (de) 1967-10-23 1968-10-21 Verfahren zur Herstellung von kristallinem Silicumkarbid

Country Status (11)

Country Link
US (1) US3755541A (de)
JP (1) JPS4937040B1 (de)
AT (1) AT291193B (de)
BE (1) BE722670A (de)
CH (1) CH521287A (de)
DE (1) DE1804168A1 (de)
FR (1) FR1552005A (de)
GB (1) GB1206500A (de)
NL (1) NL6815009A (de)
NO (1) NO124829B (de)
SE (1) SE348381B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE377108B (de) * 1970-03-27 1975-06-23 Kanegafuchi Spinning Co Ltd
US4029844A (en) * 1973-04-24 1977-06-14 Atlantic Research Corporation Rocket nozzle comprising pyrolytic graphite-silicon carbide inserts
US3979500A (en) * 1973-05-02 1976-09-07 Ppg Industries, Inc. Preparation of finely-divided refractory powders of groups III-V metal borides, carbides, nitrides, silicides and sulfides
DE2364989C3 (de) * 1973-12-28 1979-10-18 Consortium Fuer Elektrochemische Industrie Gmbh, 8000 Muenchen Verfahren zur Herstellung von Schichten aus Siliciumcarbid auf einem Siliciumsubstrat
US4295890A (en) * 1975-12-03 1981-10-20 Ppg Industries, Inc. Submicron beta silicon carbide powder and sintered articles of high density prepared therefrom
US4468474A (en) * 1983-05-16 1984-08-28 Allied Corporation Iron/silicon-based catalyst exhibiting high selectivity to C2 -C62 Fischer-Tropsch reactions
US4891339A (en) * 1987-10-23 1990-01-02 Aerochem Research Laboratories, Inc. Process and apparatus for the flame preparation of ceramic powders
JP3384242B2 (ja) * 1996-03-29 2003-03-10 株式会社豊田中央研究所 炭化珪素単結晶の製造方法
US7247513B2 (en) * 2003-05-08 2007-07-24 Caracal, Inc. Dissociation of silicon clusters in a gas phase during chemical vapor deposition homo-epitaxial growth of silicon carbide
JP4662034B2 (ja) * 2005-04-14 2011-03-30 日立電線株式会社 炭化珪素単結晶の製造方法
CN104619881A (zh) 2012-08-17 2015-05-13 株式会社Ihi 耐热复合材料的制造方法及制造装置

Also Published As

Publication number Publication date
JPS4937040B1 (de) 1974-10-04
NO124829B (de) 1972-06-12
SE348381B (de) 1972-09-04
FR1552005A (de) 1969-01-03
US3755541A (en) 1973-08-28
DE1804168A1 (de) 1969-06-04
NL6815009A (de) 1969-04-25
AT291193B (de) 1971-07-12
BE722670A (de) 1969-04-21
GB1206500A (en) 1970-09-23

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Legal Events

Date Code Title Description
PL Patent ceased