CH458874A - Bain pour le dépôt non électrolytique de cuivre - Google Patents
Bain pour le dépôt non électrolytique de cuivreInfo
- Publication number
- CH458874A CH458874A CH1612366A CH1612366A CH458874A CH 458874 A CH458874 A CH 458874A CH 1612366 A CH1612366 A CH 1612366A CH 1612366 A CH1612366 A CH 1612366A CH 458874 A CH458874 A CH 458874A
- Authority
- CH
- Switzerland
- Prior art keywords
- bath
- copper
- electrolytic deposition
- electrolytic
- deposition
- Prior art date
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title 1
- 229910052802 copper Inorganic materials 0.000 title 1
- 239000010949 copper Substances 0.000 title 1
- 230000008021 deposition Effects 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US507049A US3383224A (en) | 1965-11-09 | 1965-11-09 | Electroless copper deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
CH458874A true CH458874A (fr) | 1968-06-30 |
Family
ID=24017059
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1612366A CH458874A (fr) | 1965-11-09 | 1966-11-09 | Bain pour le dépôt non électrolytique de cuivre |
Country Status (7)
Country | Link |
---|---|
US (1) | US3383224A (cs) |
BE (1) | BE689534A (cs) |
CH (1) | CH458874A (cs) |
DE (1) | DE1521512B1 (cs) |
FR (1) | FR1498966A (cs) |
GB (1) | GB1097848A (cs) |
NL (1) | NL148947B (cs) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4167601A (en) * | 1976-11-15 | 1979-09-11 | Western Electric Company, Inc. | Method of depositing a stress-free electroless copper deposit |
US4228213A (en) * | 1979-08-13 | 1980-10-14 | Western Electric Company, Inc. | Method of depositing a stress-free electroless copper deposit |
CA1184359A (en) * | 1981-10-23 | 1985-03-26 | Donald A. Arcilesi | Metallic impurity control for electroless copper plating |
DE3404270A1 (de) * | 1984-02-04 | 1985-08-08 | Schering AG, 1000 Berlin und 4709 Bergkamen | Waessriges alkalisches bad zur chemischen abscheidung von kupfer, nickel, kobalt und deren legierungen |
GB2154250B (en) * | 1984-02-17 | 1987-06-03 | Omi Int Corp | Complexing agent for electroless copper plating |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2329512A (en) * | 1941-04-11 | 1943-09-14 | Jr Reese F Clifford | Drinking glass holder |
DE731102C (de) * | 1941-12-13 | 1943-02-03 | Dr Herbert Brintzinger | Verfahren zur Erzeugung metallischer UEberzuege |
DE1135261B (de) * | 1953-08-27 | 1962-08-23 | Gen Am Transport | Verfahren zur chemischen Vernickelung eines Gegenstandes mit katalytischer Oberflaeche |
DE1154991B (de) * | 1961-01-26 | 1963-09-26 | Riedel & Co | Stammloesung fuer die Herstellung und Regenerierung eines waessrigen Bades zur stromlsen Vernickelung |
-
1965
- 1965-11-09 US US507049A patent/US3383224A/en not_active Expired - Lifetime
-
1966
- 1966-11-08 GB GB50015/66A patent/GB1097848A/en not_active Expired
- 1966-11-08 DE DE19661521512 patent/DE1521512B1/de not_active Withdrawn
- 1966-11-09 BE BE689534D patent/BE689534A/xx unknown
- 1966-11-09 CH CH1612366A patent/CH458874A/fr unknown
- 1966-11-09 NL NL666615822A patent/NL148947B/xx not_active IP Right Cessation
- 1966-11-09 FR FR83163A patent/FR1498966A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1521512B1 (de) | 1970-06-04 |
GB1097848A (en) | 1968-01-03 |
NL148947B (nl) | 1976-03-15 |
US3383224A (en) | 1968-05-14 |
BE689534A (cs) | 1967-05-09 |
NL6615822A (cs) | 1967-05-10 |
FR1498966A (fr) | 1967-10-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR1402776A (fr) | élévateur pour le bain | |
BE805484Q (fr) | Additif pour bain | |
FR1436451A (fr) | Nouveau bain pour dépôt électrolytique de palladium | |
FR1479961A (fr) | Pâtes pour le traitement de surfaces | |
CH458874A (fr) | Bain pour le dépôt non électrolytique de cuivre | |
FR1365970A (fr) | Bain de galvanoplastie | |
FR1491729A (fr) | Dispositif pour bain de vapeur | |
AT304219B (de) | Bad zur stromlosen Abscheidung von Metallen | |
FR1479037A (fr) | Bain galvanique acide pour le dépôt d'étain | |
FR1522048A (fr) | Dépôt non galvanique de métaux | |
CH438874A (fr) | Bain de nickelage électrolytique | |
FR87182E (fr) | Dépôt électrolytique de métaux réfractaires | |
CH491206A (de) | Badlösung zum stromlosen Abscheiden von Metallschichten | |
FR1380297A (fr) | Bain pour la galvanoplastie des métaux | |
FR1495830A (fr) | Revêtement de polyurée pour le cuivre | |
FR1468584A (fr) | Bain stabilisé pour cuivrage chimique | |
CH490509A (de) | Bad zum stromlosen Abscheiden von Metallschichten | |
FR1424042A (fr) | Solution pour le dépôt électrolytique de nickel | |
FR1385594A (fr) | Dépôt électrolytique de métaux réfractaires | |
AT270331B (de) | Bad zum Abscheiden von Kupferüberzügen | |
AT274511B (de) | Metallisierbad | |
FR1439012A (fr) | Huiles pour bain | |
FR1415787A (fr) | Savonnette pour le bain ou la douche | |
FR1475377A (fr) | Additifs pour bains de dépôt électrolytique | |
FR1446908A (fr) | Solutions galvanoplastiques pour le dépôt du zinc |