CH449372A - Galvanisches Bad - Google Patents
Galvanisches BadInfo
- Publication number
- CH449372A CH449372A CH1121664A CH1121664A CH449372A CH 449372 A CH449372 A CH 449372A CH 1121664 A CH1121664 A CH 1121664A CH 1121664 A CH1121664 A CH 1121664A CH 449372 A CH449372 A CH 449372A
- Authority
- CH
- Switzerland
- Prior art keywords
- winding
- eccentric
- axis
- eccentricity
- pawls
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/06—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms
- C07D233/08—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms
- C07D233/12—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D233/14—Radicals substituted by oxygen atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electromechanical Clocks (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DESCH33772A DE1242427B (de) | 1963-08-28 | 1963-08-28 | Galvanisches Zinnbad zum Abscheiden blanker bis glaenzender UEberzuege |
DESCH35588A DE1246346B (de) | 1963-08-28 | 1964-08-05 | Galvanisches Zinnbad zum Abscheiden blanker bis glaenzender Zinnueberzuege |
Publications (1)
Publication Number | Publication Date |
---|---|
CH449372A true CH449372A (de) | 1967-12-31 |
Family
ID=25993112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1121664A CH449372A (de) | 1963-08-28 | 1964-08-27 | Galvanisches Bad |
Country Status (6)
Country | Link |
---|---|
US (1) | US3361652A (xx) |
BE (1) | BE652405A (xx) |
CH (1) | CH449372A (xx) |
DE (2) | DE1242427B (xx) |
GB (1) | GB1022746A (xx) |
NL (4) | NL6409945A (xx) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL128321C (xx) * | 1965-02-13 | |||
NL6505921A (xx) * | 1965-05-11 | 1966-11-14 | ||
NL151449B (nl) * | 1966-09-14 | 1976-11-15 | Philips Nv | Werkwijze voor de bereiding van een zuur bad voor het elektrolytisch neerslaan van tin. |
FR1538593A (fr) * | 1967-07-27 | 1968-09-06 | Parker Ste Continentale | Procédé et solution pour le dépôt électrolytique d'étain |
NL6910903A (xx) * | 1969-07-16 | 1971-01-19 | ||
US3785939A (en) * | 1970-10-22 | 1974-01-15 | Conversion Chem Corp | Tin/lead plating bath and method |
US3755096A (en) * | 1971-07-01 | 1973-08-28 | M & T Chemicals Inc | Bright acid tin plating |
US3875029A (en) * | 1974-02-19 | 1975-04-01 | R O Hull & Company Inc | Plating bath for electrodeposition of bright tin and tin-lead alloy |
US4207148A (en) * | 1975-11-28 | 1980-06-10 | Minnesota Mining And Manufacturing Company | Electroplating bath for the electrodeposition of tin and tin/cadmium deposits |
DE2650572C2 (de) * | 1976-11-04 | 1978-09-14 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Mengenüberwachung eines Netzmittels in einem Elektrolyt für die Oberflächenbehandlung von Metallen |
US4139425A (en) * | 1978-04-05 | 1979-02-13 | R. O. Hull & Company, Inc. | Composition, plating bath, and method for electroplating tin and/or lead |
PL120216B1 (en) * | 1979-01-11 | 1982-02-27 | Politechnika Warszawska | Process for electrochemical manufacture of bright tin coatingsovjannykh pokrytijj |
BG34691A1 (en) * | 1981-07-14 | 1983-11-15 | Todorov | Electrolyte for depositing bright tin coatings |
EP0652306B1 (en) * | 1987-12-10 | 2000-09-27 | LeaRonal, Inc. | Tin, lead or tin/lead alloy electrolytes for high-speed electroplating |
US5174887A (en) * | 1987-12-10 | 1992-12-29 | Learonal, Inc. | High speed electroplating of tinplate |
US4844780A (en) * | 1988-02-17 | 1989-07-04 | Maclee Chemical Company, Inc. | Brightener and aqueous plating bath for tin and/or lead |
US8440065B1 (en) | 2009-06-07 | 2013-05-14 | Technic, Inc. | Electrolyte composition, method, and improved apparatus for high speed tin-silver electroplating |
CN101962790B (zh) * | 2010-08-20 | 2012-05-23 | 河南科技大学 | 一种半光亮酸性镀锡的电解质组合物 |
EP2740820A1 (de) | 2012-12-04 | 2014-06-11 | Dr.Ing. Max Schlötter GmbH & Co. KG | Elektrolyt und Verfahren zur Abscheidung von lötbaren Schichten |
JP6133056B2 (ja) * | 2012-12-27 | 2017-05-24 | ローム・アンド・ハース電子材料株式会社 | スズまたはスズ合金めっき液 |
IL303728A (en) | 2020-12-18 | 2023-08-01 | Basf Se | The composition for electrolytic plating of tin or tin alloy that includes a leveling agent |
WO2024022979A1 (en) | 2022-07-26 | 2024-02-01 | Basf Se | Composition for tin or tin alloy electroplating comprising leveling agent |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE508197A (xx) * | 1951-01-12 | |||
DE971778C (de) * | 1953-05-05 | 1959-03-26 | Max Schloetter Fa Dr Ing | Verfahren zur galvanischen Abscheidung von Zinn aus sauren Elektrolyten |
FR1185579A (fr) * | 1957-10-30 | 1959-08-03 | Perfectionnements à l'électrolyse des solutions aqueuses de sels métalliques | |
US3082157A (en) * | 1958-06-23 | 1963-03-19 | Bethlehem Steel Corp | Electrodeposition of tin |
-
0
- NL NL124247D patent/NL124247C/xx active
- NL NL134963D patent/NL134963C/xx active
-
1963
- 1963-08-28 DE DESCH33772A patent/DE1242427B/de active Pending
-
1964
- 1964-08-05 DE DESCH35588A patent/DE1246346B/de active Pending
- 1964-08-24 GB GB34585/64A patent/GB1022746A/en not_active Expired
- 1964-08-24 US US391790A patent/US3361652A/en not_active Expired - Lifetime
- 1964-08-27 NL NL6409945A patent/NL6409945A/xx unknown
- 1964-08-27 CH CH1121664A patent/CH449372A/fr unknown
- 1964-08-28 BE BE652405D patent/BE652405A/xx unknown
-
1968
- 1968-02-07 NL NL6801713A patent/NL6801713A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
NL124247C (xx) | |
NL134963C (xx) | |
DE1246346B (de) | 1967-08-03 |
DE1242427B (de) | 1967-06-15 |
NL6801713A (xx) | 1968-04-25 |
GB1022746A (en) | 1966-03-16 |
US3361652A (en) | 1968-01-02 |
NL6409945A (xx) | 1965-03-01 |
BE652405A (xx) | 1964-12-16 |
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