CH449372A - Galvanisches Bad - Google Patents

Galvanisches Bad

Info

Publication number
CH449372A
CH449372A CH1121664A CH1121664A CH449372A CH 449372 A CH449372 A CH 449372A CH 1121664 A CH1121664 A CH 1121664A CH 1121664 A CH1121664 A CH 1121664A CH 449372 A CH449372 A CH 449372A
Authority
CH
Switzerland
Prior art keywords
winding
eccentric
axis
eccentricity
pawls
Prior art date
Application number
CH1121664A
Other languages
German (de)
English (en)
French (fr)
Inventor
Joachim Dr Korpiun
Sedlacek Friedrich
Joachim Dr Steeg
Original Assignee
Max Schloetter Fa Dr Ing
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Max Schloetter Fa Dr Ing filed Critical Max Schloetter Fa Dr Ing
Publication of CH449372A publication Critical patent/CH449372A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/06—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms
    • C07D233/08—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms
    • C07D233/12—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to ring carbon atoms with alkyl radicals, containing more than four carbon atoms, directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D233/14—Radicals substituted by oxygen atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electromechanical Clocks (AREA)
CH1121664A 1963-08-28 1964-08-27 Galvanisches Bad CH449372A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DESCH33772A DE1242427B (de) 1963-08-28 1963-08-28 Galvanisches Zinnbad zum Abscheiden blanker bis glaenzender UEberzuege
DESCH35588A DE1246346B (de) 1963-08-28 1964-08-05 Galvanisches Zinnbad zum Abscheiden blanker bis glaenzender Zinnueberzuege

Publications (1)

Publication Number Publication Date
CH449372A true CH449372A (de) 1967-12-31

Family

ID=25993112

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1121664A CH449372A (de) 1963-08-28 1964-08-27 Galvanisches Bad

Country Status (6)

Country Link
US (1) US3361652A (lm)
BE (1) BE652405A (lm)
CH (1) CH449372A (lm)
DE (2) DE1242427B (lm)
GB (1) GB1022746A (lm)
NL (4) NL6409945A (lm)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL128321C (lm) * 1965-02-13
NL6505921A (lm) * 1965-05-11 1966-11-14
NL151449B (nl) * 1966-09-14 1976-11-15 Philips Nv Werkwijze voor de bereiding van een zuur bad voor het elektrolytisch neerslaan van tin.
FR1538593A (fr) * 1967-07-27 1968-09-06 Parker Ste Continentale Procédé et solution pour le dépôt électrolytique d'étain
NL6910903A (lm) * 1969-07-16 1971-01-19
US3785939A (en) * 1970-10-22 1974-01-15 Conversion Chem Corp Tin/lead plating bath and method
US3755096A (en) * 1971-07-01 1973-08-28 M & T Chemicals Inc Bright acid tin plating
US3875029A (en) * 1974-02-19 1975-04-01 R O Hull & Company Inc Plating bath for electrodeposition of bright tin and tin-lead alloy
US4207148A (en) * 1975-11-28 1980-06-10 Minnesota Mining And Manufacturing Company Electroplating bath for the electrodeposition of tin and tin/cadmium deposits
DE2650572C2 (de) * 1976-11-04 1978-09-14 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Mengenüberwachung eines Netzmittels in einem Elektrolyt für die Oberflächenbehandlung von Metallen
US4139425A (en) * 1978-04-05 1979-02-13 R. O. Hull & Company, Inc. Composition, plating bath, and method for electroplating tin and/or lead
PL120216B1 (en) * 1979-01-11 1982-02-27 Politechnika Warszawska Process for electrochemical manufacture of bright tin coatingsovjannykh pokrytijj
BG34691A1 (en) * 1981-07-14 1983-11-15 Todorov Electrolyte for depositing bright tin coatings
EP0319997B1 (en) * 1987-12-10 1995-10-04 LeaRonal, Inc. Tin, lead or tin/lead alloy electrolytes for high speed electroplating
US5174887A (en) * 1987-12-10 1992-12-29 Learonal, Inc. High speed electroplating of tinplate
US4844780A (en) * 1988-02-17 1989-07-04 Maclee Chemical Company, Inc. Brightener and aqueous plating bath for tin and/or lead
US8440065B1 (en) 2009-06-07 2013-05-14 Technic, Inc. Electrolyte composition, method, and improved apparatus for high speed tin-silver electroplating
CN101962790B (zh) * 2010-08-20 2012-05-23 河南科技大学 一种半光亮酸性镀锡的电解质组合物
EP2740820A1 (de) 2012-12-04 2014-06-11 Dr.Ing. Max Schlötter GmbH & Co. KG Elektrolyt und Verfahren zur Abscheidung von lötbaren Schichten
JP6133056B2 (ja) * 2012-12-27 2017-05-24 ローム・アンド・ハース電子材料株式会社 スズまたはスズ合金めっき液
WO2022129238A1 (en) 2020-12-18 2022-06-23 Basf Se Composition for tin or tin alloy electroplating comprising leveling agent
WO2024022979A1 (en) 2022-07-26 2024-02-01 Basf Se Composition for tin or tin alloy electroplating comprising leveling agent

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE508197A (lm) * 1951-01-12
DE971778C (de) * 1953-05-05 1959-03-26 Max Schloetter Fa Dr Ing Verfahren zur galvanischen Abscheidung von Zinn aus sauren Elektrolyten
FR1185579A (fr) * 1957-10-30 1959-08-03 Perfectionnements à l'électrolyse des solutions aqueuses de sels métalliques
US3082157A (en) * 1958-06-23 1963-03-19 Bethlehem Steel Corp Electrodeposition of tin

Also Published As

Publication number Publication date
GB1022746A (en) 1966-03-16
DE1242427B (de) 1967-06-15
US3361652A (en) 1968-01-02
NL6409945A (lm) 1965-03-01
BE652405A (lm) 1964-12-16
NL124247C (lm)
NL134963C (lm)
DE1246346B (de) 1967-08-03
NL6801713A (lm) 1968-04-25

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