CH364986A - Verfahren zur Herstellung eines Ultraviolett-Filters und nach diesem Verfahren hergestelltes Filter - Google Patents
Verfahren zur Herstellung eines Ultraviolett-Filters und nach diesem Verfahren hergestelltes FilterInfo
- Publication number
- CH364986A CH364986A CH4359157A CH4359157A CH364986A CH 364986 A CH364986 A CH 364986A CH 4359157 A CH4359157 A CH 4359157A CH 4359157 A CH4359157 A CH 4359157A CH 364986 A CH364986 A CH 364986A
- Authority
- CH
- Switzerland
- Prior art keywords
- cerium
- layer
- filter
- absorbing
- absorption
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 230000008569 process Effects 0.000 title description 5
- 238000010521 absorption reaction Methods 0.000 claims description 30
- 229910052684 Cerium Inorganic materials 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 15
- 235000012239 silicon dioxide Nutrition 0.000 claims description 9
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 8
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 238000007738 vacuum evaporation Methods 0.000 claims description 6
- 229910052681 coesite Inorganic materials 0.000 claims description 5
- 229910052906 cristobalite Inorganic materials 0.000 claims description 5
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 229910052682 stishovite Inorganic materials 0.000 claims description 5
- 229910052905 tridymite Inorganic materials 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 150000001785 cerium compounds Chemical class 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 230000035699 permeability Effects 0.000 claims description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims 6
- 230000001419 dependent effect Effects 0.000 claims 4
- 230000005494 condensation Effects 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 39
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 17
- 239000011521 glass Substances 0.000 description 12
- 238000001704 evaporation Methods 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000004904 UV filter Substances 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 239000010453 quartz Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- JIHMVMRETUQLFD-UHFFFAOYSA-N cerium(3+);dioxido(oxo)silane Chemical compound [Ce+3].[Ce+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O JIHMVMRETUQLFD-UHFFFAOYSA-N 0.000 description 2
- DRVWBEJJZZTIGJ-UHFFFAOYSA-N cerium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Ce+3].[Ce+3] DRVWBEJJZZTIGJ-UHFFFAOYSA-N 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011872 intimate mixture Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- -1 iron Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Optical Filters (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL111367D NL111367C (forum.php) | 1957-03-08 | ||
| CH4359157A CH364986A (de) | 1957-03-08 | 1957-03-08 | Verfahren zur Herstellung eines Ultraviolett-Filters und nach diesem Verfahren hergestelltes Filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH4359157A CH364986A (de) | 1957-03-08 | 1957-03-08 | Verfahren zur Herstellung eines Ultraviolett-Filters und nach diesem Verfahren hergestelltes Filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH364986A true CH364986A (de) | 1962-10-15 |
Family
ID=4515071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH4359157A CH364986A (de) | 1957-03-08 | 1957-03-08 | Verfahren zur Herstellung eines Ultraviolett-Filters und nach diesem Verfahren hergestelltes Filter |
Country Status (2)
| Country | Link |
|---|---|
| CH (1) | CH364986A (forum.php) |
| NL (1) | NL111367C (forum.php) |
-
0
- NL NL111367D patent/NL111367C/xx active
-
1957
- 1957-03-08 CH CH4359157A patent/CH364986A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL111367C (forum.php) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0120408B2 (de) | Verfahren zur Beschichtung eines transparenten Substrates | |
| DE69825398T2 (de) | Durchsichtiges Substrat mit einem Dünnschichtaufbau mit Infrarot reflaktierenden Eigenschaften | |
| DE2643586A1 (de) | Reflektor | |
| DE2554232A1 (de) | Verfahren zur herstellung eines lichtdurchlaessigen absorbierenden belages auf unterlagen und nach diesem verfahren hergestellte belaege | |
| DE3150525A1 (de) | Polykristalline zinksulfid- und zinkselenid-erzeugnisse mit verbesserter optischer qualitaet sowie verfahren zur herstellung derartiger artikel | |
| DE4208811A1 (de) | Aufdampfmaterial zur herstellung hochbrechender optischer schichten | |
| DE2347525C3 (de) | Sonnenschutzglas | |
| EP0792852B1 (de) | Verfahren zur Herstellung stabilisierter Aufdampfmaterialien auf Basis von Titanoxid | |
| DE1913901B2 (de) | Kaltlichtspiegel mit teilweise aus Silizium bestehenden Schichten, der einen Reflexionskoeffizienten von über 90 % aufweist | |
| EP1597212B1 (de) | Aufdampfmaterial zur herstellung hochbrechender optischer schichten | |
| DE3302827A1 (de) | Verfahren zum herstellen von optischen elementen mit interferenzschichten | |
| CH364986A (de) | Verfahren zur Herstellung eines Ultraviolett-Filters und nach diesem Verfahren hergestelltes Filter | |
| DE2229909C3 (de) | Verfahren zur Herstellung blaugefärbter lichtdurchlässiger Schichten | |
| DE2050556C3 (de) | Verfahren zur Herstellung einer hochbrechenden optisch homogenen und absorptionsfreien Oxidschicht | |
| DE2419122A1 (de) | Verfahren zur herstellung von tio tief 2 -schichten durch verdampfen aus einer schmelzfluessigen titan-sauerstoffphase | |
| DE10065647A1 (de) | Aufdapfmaterial zur Herstellung hochbrechender optischer Schichten und Verfahren zur Herstellung des Aufdampfmaterials | |
| DE1157002B (de) | Im sichtbaren Spektralgebiet farbstichfreies UV-Absorptionsfilter | |
| AT206202B (de) | Ultraviolett-Filter | |
| DE4321301A1 (de) | Dünne Schicht aus Galliumoxid und Herstellverfahren dafür | |
| EP0028604B1 (de) | Reflexminderungs-schicht auf hochreflektierenden oberflächen | |
| DE1228489B (de) | Verfahren zum Herstellen duenner, im sichtbaren Wellenlaengengebiet praktisch absorptionsfreier Oxydschichten fuer optische Zwecke durch Aufdampfen im Vakuum | |
| DE4305856C1 (de) | Verfahren zur Herstellung von im Vakuum aufgedampften Barriereschichten für die Verpachungsindustrie und Aufdampfgut für ihre Herstellung | |
| DE1771918C (de) | Verfahren zum Herstellen von Mischkristallschichten aus Cadmiumsulfid und Cadmiumselenid durch Aufdampfen im Hochvakuum | |
| DE1104283B (de) | Verfahren zum Herstellen von duennen Schichten auf Unterlagen durch Verdampfen von Metallverbindungen | |
| DD247925A1 (de) | Verfahren zur herstellung von inhomogenen schichten mit definiertem brechzahlverlauf |