CH255422A - Procédé et appareil pour constituer progressivement un revêtement sur un support. - Google Patents

Procédé et appareil pour constituer progressivement un revêtement sur un support.

Info

Publication number
CH255422A
CH255422A CH255422DA CH255422A CH 255422 A CH255422 A CH 255422A CH 255422D A CH255422D A CH 255422DA CH 255422 A CH255422 A CH 255422A
Authority
CH
Switzerland
Prior art keywords
coating
support
gradually forming
gradually
forming
Prior art date
Application number
Other languages
English (en)
Inventor
Alexander Paul
Original Assignee
Alexander Paul
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB1496344A external-priority patent/GB593468A/en
Application filed by Alexander Paul filed Critical Alexander Paul
Publication of CH255422A publication Critical patent/CH255422A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH255422D 1944-08-04 1945-07-31 Procédé et appareil pour constituer progressivement un revêtement sur un support. CH255422A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1496344A GB593468A (en) 1944-08-04 Improvements in or relating to methods of and apparatus for depositing certain substances by thermal evaporation in a vacuum chamber

Publications (1)

Publication Number Publication Date
CH255422A true CH255422A (fr) 1948-06-30

Family

ID=10050642

Family Applications (1)

Application Number Title Priority Date Filing Date
CH255422D CH255422A (fr) 1944-08-04 1945-07-31 Procédé et appareil pour constituer progressivement un revêtement sur un support.

Country Status (3)

Country Link
US (1) US2440135A (fr)
CH (1) CH255422A (fr)
FR (1) FR911585A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817513A1 (de) * 1988-05-24 1989-12-07 Leybold Ag Vorrichtung zum verdampfen von metallen
DE4104415C1 (fr) * 1991-02-14 1992-06-04 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2503571A (en) * 1947-05-02 1950-04-11 Bell Telephone Labor Inc Apparatus for coating surfaces by thermal vaporization at atmospheric pressure
US2631948A (en) * 1949-05-23 1953-03-17 Ohio Commw Eng Co Method and apparatus for gas plating
US2763576A (en) * 1949-05-23 1956-09-18 Ohio Commw Eng Co Method for gas plating
US2649754A (en) * 1949-07-14 1953-08-25 Ohio Commw Eng Co Apparatus for plating metal objects
US2665320A (en) * 1949-09-22 1954-01-05 Nat Res Corp Metal vaporizing crucible
US2635579A (en) * 1949-12-01 1953-04-21 Nat Res Corp Coating by evaporating metal under vacuum
US2665224A (en) * 1950-03-07 1954-01-05 Nat Res Corp Process for vapor coating
US2606270A (en) * 1950-10-28 1952-08-05 Gen Electric Condensation nuclei generator
US2810663A (en) * 1951-12-29 1957-10-22 Bell Telephone Labor Inc Fabrication of laminated transmission lines
GB770753A (en) * 1952-12-31 1957-03-27 Edwards & Co London Ltd W Improvements in or relating to apparatus for the vaporisation of metals and metalloids
DE938644C (de) * 1953-07-03 1956-02-02 Hubert Mansfeld Verfahren zur Aufbringung lichtempfindlicher Stoffe auf Schichttraeger
FR1214352A (fr) * 1957-12-23 1960-04-08 Hughes Aircraft Co Dispositif semi-conducteur et procédé pour le fabriquer
US3153137A (en) * 1961-10-13 1964-10-13 Union Carbide Corp Evaporation source
US3129315A (en) * 1961-12-26 1964-04-14 Lear Siegler Inc Vacuum vaporizing fixture
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
DE1281772B (de) * 1963-08-10 1968-10-31 Licentia Gmbh Bedampfungsvorrichtung zum Aufdampfen von Selenschichten
US3281517A (en) * 1963-11-19 1966-10-25 Melpar Inc Vacuum furnace
US3394678A (en) * 1966-12-23 1968-07-30 Air Reduction Apparatus for vacuum coating
US3699917A (en) * 1970-10-02 1972-10-24 Cogar Corp Vapor deposition apparatus
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
US3888649A (en) * 1972-12-15 1975-06-10 Ppg Industries Inc Nozzle for chemical vapor deposition of coatings
US3984585A (en) * 1974-05-30 1976-10-05 Fuji Xerox Co., Ltd. Vacuum evaporation plating method
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
JPS523583A (en) * 1975-06-27 1977-01-12 Toshinori Takagi Crystal film forming process
JPS5210869A (en) * 1975-07-15 1977-01-27 Toshinori Takagi Thin film forming method
CH626407A5 (fr) * 1977-07-08 1981-11-13 Balzers Hochvakuum
FR2501726B1 (fr) * 1981-03-13 1985-11-08 Univ Delaware Procede et appareil de depot d'un materiau par evaporation sous vide
JPS60251273A (ja) * 1984-05-28 1985-12-11 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
US5080870A (en) * 1988-09-08 1992-01-14 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
US5156815A (en) * 1988-09-08 1992-10-20 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
DE4204938C1 (fr) * 1992-02-19 1993-06-24 Leybold Ag, 6450 Hanau, De
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
ATE326555T1 (de) * 2002-07-19 2006-06-15 Lg Electronics Inc Quelle zur thermischen pvd-beschichtung für organische elektrolumineszente schichten
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
EP1496134B1 (fr) * 2003-07-04 2015-03-25 Agfa HealthCare NV Appareil de dépôt en phase vapeur
EP2381011B1 (fr) * 2003-08-04 2012-12-05 LG Display Co., Ltd. Source d'évaporation pour faire évaporer une couche électroluminescente organique
ATE541327T1 (de) * 2004-10-21 2012-01-15 Lg Display Co Ltd Organische elektrolumineszente vorrichtung und herstellungsverfahren
US7166169B2 (en) * 2005-01-11 2007-01-23 Eastman Kodak Company Vaporization source with baffle
JP4440837B2 (ja) * 2005-01-31 2010-03-24 三星モバイルディスプレイ株式會社 蒸発源及びこれを採用した蒸着装置
KR100711886B1 (ko) * 2005-08-31 2007-04-25 삼성에스디아이 주식회사 무기 증착원 및 이의 가열원 제어방법
KR100711885B1 (ko) * 2005-08-31 2007-04-25 삼성에스디아이 주식회사 유기 증착원 및 이의 가열원 제어방법
KR100645689B1 (ko) * 2005-08-31 2006-11-14 삼성에스디아이 주식회사 선형 증착원
EP1788113B1 (fr) * 2005-10-26 2011-05-11 Applied Materials GmbH & Co. KG Evaporateur avec un réservoir pour recevoir le matériau à évaporer
US20070178225A1 (en) * 2005-12-14 2007-08-02 Keiji Takanosu Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device
DE102007012370A1 (de) * 2007-03-14 2008-09-18 Createc Fischer & Co. Gmbh Bedampfungseinrichtung und Bedampfungsverfahren zur Molekularstrahlbedampfung und Molekularstrahlepitaxie
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065999A1 (fr) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Source de déposition linéaire
WO2011065998A1 (fr) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Source de déposition linéaire
EP3559303A1 (fr) 2016-12-22 2019-10-30 Flisom AG Source d'évaporation linéaire
EP3559302A1 (fr) 2016-12-22 2019-10-30 Flisom AG Source linéaire destinée au dépôt en phase vapeur équipée d'écrans thermiques
WO2018114373A1 (fr) 2016-12-22 2018-06-28 Flisom Ag Source linéaire destinée au dépôt en phase vapeur dotée d'au moins trois éléments chauffants électriques
EP3559304A1 (fr) 2016-12-22 2019-10-30 Flisom AG Source de vapeur linéaire
EP3559305B1 (fr) 2016-12-22 2023-09-20 Flisom AG Système rouleau à rouleau de dépôt en phase vapeur

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1256599A (en) * 1916-07-03 1918-02-19 Max Ulrich Schoop Process and mechanism for the production of electric heaters.
US2074281A (en) * 1933-07-13 1937-03-16 Sommer Ludwig August Method and apparatus for the production of metallic coatings on electrically nonconducting substances by the thermal vaporization of metals in vacuo
BE417869A (fr) * 1935-10-12
US2153786A (en) * 1936-07-17 1939-04-11 Alexander Process and apparatus for thermal deposition of metals
US2273941A (en) * 1937-08-11 1942-02-24 Bosch Gmbh Robert Process for the production of resistances
US2242101A (en) * 1940-11-25 1941-05-13 Gen Electric X Ray Corp Method of conditioning x-ray generators
GB551757A (en) * 1941-09-03 1943-03-09 Paul Alexander Improvements in or relating to the deposition of metals

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817513A1 (de) * 1988-05-24 1989-12-07 Leybold Ag Vorrichtung zum verdampfen von metallen
US4979468A (en) * 1988-05-24 1990-12-25 Leybold Aktiengesellschaft Installation for the evaporation of metals
DE4104415C1 (fr) * 1991-02-14 1992-06-04 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De

Also Published As

Publication number Publication date
US2440135A (en) 1948-04-20
FR911585A (fr) 1946-07-12

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