CH255422A - A method and apparatus for gradually forming a coating on a support. - Google Patents

A method and apparatus for gradually forming a coating on a support.

Info

Publication number
CH255422A
CH255422A CH255422DA CH255422A CH 255422 A CH255422 A CH 255422A CH 255422D A CH255422D A CH 255422DA CH 255422 A CH255422 A CH 255422A
Authority
CH
Switzerland
Prior art keywords
coating
support
gradually forming
gradually
forming
Prior art date
Application number
Other languages
French (fr)
Inventor
Alexander Paul
Original Assignee
Alexander Paul
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB1496344A external-priority patent/GB593468A/en
Application filed by Alexander Paul filed Critical Alexander Paul
Publication of CH255422A publication Critical patent/CH255422A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH255422D 1944-08-04 1945-07-31 A method and apparatus for gradually forming a coating on a support. CH255422A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1496344A GB593468A (en) 1944-08-04 Improvements in or relating to methods of and apparatus for depositing certain substances by thermal evaporation in a vacuum chamber

Publications (1)

Publication Number Publication Date
CH255422A true CH255422A (en) 1948-06-30

Family

ID=10050642

Family Applications (1)

Application Number Title Priority Date Filing Date
CH255422D CH255422A (en) 1944-08-04 1945-07-31 A method and apparatus for gradually forming a coating on a support.

Country Status (3)

Country Link
US (1) US2440135A (en)
CH (1) CH255422A (en)
FR (1) FR911585A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817513A1 (en) * 1988-05-24 1989-12-07 Leybold Ag DEVICE FOR EVAPORATING METALS
DE4104415C1 (en) * 1991-02-14 1992-06-04 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De

Families Citing this family (54)

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US2503571A (en) * 1947-05-02 1950-04-11 Bell Telephone Labor Inc Apparatus for coating surfaces by thermal vaporization at atmospheric pressure
US2763576A (en) * 1949-05-23 1956-09-18 Ohio Commw Eng Co Method for gas plating
US2631948A (en) * 1949-05-23 1953-03-17 Ohio Commw Eng Co Method and apparatus for gas plating
US2649754A (en) * 1949-07-14 1953-08-25 Ohio Commw Eng Co Apparatus for plating metal objects
US2665320A (en) * 1949-09-22 1954-01-05 Nat Res Corp Metal vaporizing crucible
US2635579A (en) * 1949-12-01 1953-04-21 Nat Res Corp Coating by evaporating metal under vacuum
US2665224A (en) * 1950-03-07 1954-01-05 Nat Res Corp Process for vapor coating
US2606270A (en) * 1950-10-28 1952-08-05 Gen Electric Condensation nuclei generator
US2810663A (en) * 1951-12-29 1957-10-22 Bell Telephone Labor Inc Fabrication of laminated transmission lines
GB770753A (en) * 1952-12-31 1957-03-27 Edwards & Co London Ltd W Improvements in or relating to apparatus for the vaporisation of metals and metalloids
DE938644C (en) * 1953-07-03 1956-02-02 Hubert Mansfeld Process for applying light-sensitive materials to the support
FR1214352A (en) * 1957-12-23 1960-04-08 Hughes Aircraft Co Semiconductor device and method for making it
US3153137A (en) * 1961-10-13 1964-10-13 Union Carbide Corp Evaporation source
US3129315A (en) * 1961-12-26 1964-04-14 Lear Siegler Inc Vacuum vaporizing fixture
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
DE1281772B (en) * 1963-08-10 1968-10-31 Licentia Gmbh Vapor deposition device for the vapor deposition of selenium layers
US3281517A (en) * 1963-11-19 1966-10-25 Melpar Inc Vacuum furnace
US3394678A (en) * 1966-12-23 1968-07-30 Air Reduction Apparatus for vacuum coating
US3699917A (en) * 1970-10-02 1972-10-24 Cogar Corp Vapor deposition apparatus
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
US3888649A (en) * 1972-12-15 1975-06-10 Ppg Industries Inc Nozzle for chemical vapor deposition of coatings
US3984585A (en) * 1974-05-30 1976-10-05 Fuji Xerox Co., Ltd. Vacuum evaporation plating method
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
US3971334A (en) * 1975-03-04 1976-07-27 Xerox Corporation Coating device
JPS523583A (en) * 1975-06-27 1977-01-12 Toshinori Takagi Crystal film forming process
JPS5210869A (en) * 1975-07-15 1977-01-27 Toshinori Takagi Thin film forming method
CH626407A5 (en) * 1977-07-08 1981-11-13 Balzers Hochvakuum
FR2501726B1 (en) * 1981-03-13 1985-11-08 Univ Delaware METHOD AND APPARATUS FOR DEPOSITING MATERIAL BY VACUUM EVAPORATION
JPS60251273A (en) * 1984-05-28 1985-12-11 Mitsubishi Heavy Ind Ltd Method for controlling extent of evaporation in vacuum depositing apparatus
US5080870A (en) * 1988-09-08 1992-01-14 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
US5156815A (en) * 1988-09-08 1992-10-20 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
DE4204938C1 (en) * 1992-02-19 1993-06-24 Leybold Ag, 6450 Hanau, De
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
EP1560467B1 (en) * 2002-07-19 2014-02-26 LG Display Co., Ltd. Source for thermal physical vapor deposition of organic electroluminescent layers
EP1496134B1 (en) * 2003-07-04 2015-03-25 Agfa HealthCare NV Vapor deposition apparatus.
JP2005029895A (en) * 2003-07-04 2005-02-03 Agfa Gevaert Nv Vapor deposition apparatus
EP2369035B9 (en) * 2003-08-04 2014-05-21 LG Display Co., Ltd. Evaporation source
EP1655790B1 (en) * 2004-10-21 2010-08-04 LG Display Co., Ltd. Organic electroluminescent device and method of manufacturing the same
US7166169B2 (en) * 2005-01-11 2007-01-23 Eastman Kodak Company Vaporization source with baffle
JP4440837B2 (en) * 2005-01-31 2010-03-24 三星モバイルディスプレイ株式會社 Evaporation source and vapor deposition apparatus employing the same
KR100645689B1 (en) * 2005-08-31 2006-11-14 삼성에스디아이 주식회사 Linear type deposition source
KR100711885B1 (en) * 2005-08-31 2007-04-25 삼성에스디아이 주식회사 Source for organic layer and the method for controlling heating source thereof
KR100711886B1 (en) * 2005-08-31 2007-04-25 삼성에스디아이 주식회사 Source for inorganic layer and the method for controlling heating source thereof
ATE509131T1 (en) * 2005-10-26 2011-05-15 Applied Materials Gmbh & Co Kg EVAPORATOR DEVICE WITH A CONTAINER FOR RECEIVING MATERIAL TO BE EVAPORATED
US20070178225A1 (en) * 2005-12-14 2007-08-02 Keiji Takanosu Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device
DE102007012370A1 (en) * 2007-03-14 2008-09-18 Createc Fischer & Co. Gmbh Vapor deposition device and vapor deposition method for molecular beam deposition and molecular beam epitaxy
WO2011065999A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
EP3559302A1 (en) 2016-12-22 2019-10-30 Flisom AG Linear source for vapor deposition with heat shields
WO2018114379A1 (en) 2016-12-22 2018-06-28 Flisom Ag Roll-to roll vapor deposition system
WO2018114376A1 (en) 2016-12-22 2018-06-28 Flisom Ag Linear evaporation source
EP3559306B1 (en) 2016-12-22 2022-10-05 Flisom AG Linear source for vapor deposition with at least three electrical heating elements
WO2018114377A1 (en) 2016-12-22 2018-06-28 Flisom Ag Linear vapor source

Family Cites Families (7)

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US1256599A (en) * 1916-07-03 1918-02-19 Max Ulrich Schoop Process and mechanism for the production of electric heaters.
US2074281A (en) * 1933-07-13 1937-03-16 Sommer Ludwig August Method and apparatus for the production of metallic coatings on electrically nonconducting substances by the thermal vaporization of metals in vacuo
BE417869A (en) * 1935-10-12
US2153786A (en) * 1936-07-17 1939-04-11 Alexander Process and apparatus for thermal deposition of metals
US2273941A (en) * 1937-08-11 1942-02-24 Bosch Gmbh Robert Process for the production of resistances
US2242101A (en) * 1940-11-25 1941-05-13 Gen Electric X Ray Corp Method of conditioning x-ray generators
GB551757A (en) * 1941-09-03 1943-03-09 Paul Alexander Improvements in or relating to the deposition of metals

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817513A1 (en) * 1988-05-24 1989-12-07 Leybold Ag DEVICE FOR EVAPORATING METALS
US4979468A (en) * 1988-05-24 1990-12-25 Leybold Aktiengesellschaft Installation for the evaporation of metals
DE4104415C1 (en) * 1991-02-14 1992-06-04 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De

Also Published As

Publication number Publication date
FR911585A (en) 1946-07-12
US2440135A (en) 1948-04-20

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