CA976353A - Structure and method for producing microform - Google Patents

Structure and method for producing microform

Info

Publication number
CA976353A
CA976353A CA157,779A CA157779A CA976353A CA 976353 A CA976353 A CA 976353A CA 157779 A CA157779 A CA 157779A CA 976353 A CA976353 A CA 976353A
Authority
CA
Canada
Prior art keywords
microform
producing
producing microform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA157,779A
Other languages
English (en)
Other versions
CA157779S (en
Inventor
Robert W. Hallman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Application granted granted Critical
Publication of CA976353A publication Critical patent/CA976353A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CA157,779A 1971-12-08 1972-11-29 Structure and method for producing microform Expired CA976353A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US20586071A 1971-12-08 1971-12-08

Publications (1)

Publication Number Publication Date
CA976353A true CA976353A (en) 1975-10-21

Family

ID=22763936

Family Applications (1)

Application Number Title Priority Date Filing Date
CA157,779A Expired CA976353A (en) 1971-12-08 1972-11-29 Structure and method for producing microform

Country Status (10)

Country Link
JP (1) JPS5729694B2 (it)
AU (1) AU4971172A (it)
BE (1) BE792434A (it)
CA (1) CA976353A (it)
DD (1) DD102824A5 (it)
DE (1) DE2259768C2 (it)
FR (1) FR2162565A1 (it)
IL (1) IL40940A0 (it)
IT (1) IT971665B (it)
NL (1) NL7216710A (it)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4411981A (en) * 1980-02-28 1983-10-25 Sharp Kabushiki Kaisha Method for forming a pattern in a thin-film transistor having tellurium semiconductor layer
US4544622A (en) * 1984-07-19 1985-10-01 Minnesota Mining And Manufacturing Company Negative-acting photoresist imaging system
US5070000A (en) * 1987-11-05 1991-12-03 Kansai Paint Co., Ltd. Electrodeposition coating composition for use in printed circuit board photo resist

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4379827A (en) * 1971-12-08 1983-04-12 Energy Conversion Devices, Inc. Imaging structure with tellurium metal film and energy sensitive material thereon
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
US4357616A (en) * 1979-03-26 1982-11-02 Hitachi, Ltd. Recording medium

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE679470C (de) * 1934-03-15 1939-08-07 Heidenhain Johannes Dr Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten
NL280795A (it) * 1958-11-26
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
DE1904789A1 (de) * 1969-01-31 1970-09-10 Licentia Gmbh Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
JPS5022877B1 (it) * 1969-07-28 1975-08-02
JPS5139121B2 (it) * 1971-10-11 1976-10-26
JPS5520186B2 (it) * 1972-05-18 1980-05-31

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4411981A (en) * 1980-02-28 1983-10-25 Sharp Kabushiki Kaisha Method for forming a pattern in a thin-film transistor having tellurium semiconductor layer
US4544622A (en) * 1984-07-19 1985-10-01 Minnesota Mining And Manufacturing Company Negative-acting photoresist imaging system
US5070000A (en) * 1987-11-05 1991-12-03 Kansai Paint Co., Ltd. Electrodeposition coating composition for use in printed circuit board photo resist

Also Published As

Publication number Publication date
FR2162565B1 (it) 1977-01-14
FR2162565A1 (en) 1973-07-20
DD102824A5 (it) 1973-12-20
JPS4865927A (it) 1973-09-10
BE792434A (fr) 1973-03-30
IT971665B (it) 1974-05-10
JPS5729694B2 (it) 1982-06-24
DE2259768A1 (de) 1973-06-14
DE2259768C2 (de) 1984-01-26
IL40940A0 (en) 1973-01-30
AU4971172A (en) 1974-06-06
NL7216710A (it) 1973-06-13

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