CA962875A - Method of making a mask for a sandblast - Google Patents

Method of making a mask for a sandblast

Info

Publication number
CA962875A
CA962875A CA135,040A CA135040A CA962875A CA 962875 A CA962875 A CA 962875A CA 135040 A CA135040 A CA 135040A CA 962875 A CA962875 A CA 962875A
Authority
CA
Canada
Prior art keywords
sandblast
mask
making
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA135,040A
Other languages
English (en)
Other versions
CA135040S (en
Inventor
Setsuo Usui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of CA962875A publication Critical patent/CA962875A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA135,040A 1971-02-20 1972-02-18 Method of making a mask for a sandblast Expired CA962875A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46008230A JPS511550B1 (he) 1971-02-20 1971-02-20

Publications (1)

Publication Number Publication Date
CA962875A true CA962875A (en) 1975-02-18

Family

ID=11687344

Family Applications (1)

Application Number Title Priority Date Filing Date
CA135,040A Expired CA962875A (en) 1971-02-20 1972-02-18 Method of making a mask for a sandblast

Country Status (4)

Country Link
US (1) US3808751A (he)
JP (1) JPS511550B1 (he)
CA (1) CA962875A (he)
GB (1) GB1381527A (he)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4430416A (en) 1980-06-27 1984-02-07 Asahi Kasei Kogyo Kabushiki Kaisha Transfer element for sandblast carving
US4587186A (en) * 1982-05-13 1986-05-06 Asahi Kasei Kogyo Kabushiki Kaisha Mask element for selective sandblasting and a method
GB2133326B (en) * 1983-01-18 1987-03-11 Container Graphics Corp Blasting mask and method of making and using the same
US4716096A (en) * 1983-01-18 1987-12-29 Container Graphics Corporation Method and apparatus for producing characters on a grit-erodible body
GB8823106D0 (en) * 1988-10-01 1988-11-09 James Hardie Engraving Ltd Resists
ES2149754T3 (es) * 1990-10-22 2000-11-16 Aicello Chemical Company Ltd Metodo de grabado con mascara portadora de imagen y pelicula estratificada fotosensible para dicha mascara portadora de imagen.
US5518857A (en) * 1991-03-28 1996-05-21 Aicello Chemical Co., Ltd. Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
US5629132B1 (en) * 1991-03-28 2000-02-08 Aicello Chemical Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
US5989689A (en) * 1991-12-11 1999-11-23 The Chromaline Corporation Sandblast mask laminate with blastable pressure sensitive adhesive
US5370762A (en) * 1992-02-11 1994-12-06 Rayzist Photomask, Inc. Use site production of sandblasting photomasks
EP0700752B1 (en) * 1994-09-06 1998-08-19 Koninklijke Philips Electronics N.V. Method of patterning a coating on a substrate
GB2295240B (en) * 1994-11-12 1999-05-05 Jeffrey Lee Ormandy A method of producing a permanent image
US5958628A (en) * 1995-06-06 1999-09-28 International Business Machines Corporation Formation of punch inspection masks and other devices using a laser
NL1000825C2 (nl) * 1995-07-17 1997-01-21 Stork Screens Bv Zeefprodukt met een verhoogd stralingabsorberend vermogen, in het bijzonder geschikt voor toepassing in vlak- of rotatiezeefdruk, en werkwijze voor de vervaardiging daarvan.
US5672225A (en) * 1995-07-27 1997-09-30 Cowan; John R. Method for engraving three dimensional images
TW344696B (en) * 1996-11-22 1998-11-11 Philips Electronics Nv Powder-blasting method
US6207330B1 (en) 1997-07-14 2001-03-27 International Business Machines Corporation Formation of punch inspection masks and other devices using a laser
FR2770434A1 (fr) * 1997-11-05 1999-05-07 Jean Michel Hostein Procede de gravure a l'aide d'un masque de sablage - masque obtenu selon le procede
US6140006A (en) * 1998-06-15 2000-10-31 The Chromaline Corporation Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate
JP2001338878A (ja) * 2000-03-21 2001-12-07 Sharp Corp サセプタおよび表面処理方法
JP2002120152A (ja) * 2000-07-31 2002-04-23 Fuji Photo Film Co Ltd 半導体チップ、半導体ウェハ、半導体デバイスおよびその製造方法
GB0021747D0 (en) * 2000-09-04 2000-10-18 Cambridge Consultants Coating removal
US20050108869A1 (en) * 2003-05-16 2005-05-26 Shuen-Shing Hsiao Method for manufacturing teeth of linear step motors
US20110067320A1 (en) * 2006-09-11 2011-03-24 Raymond Lee Call Wall-Mount Adjustment Systems And Methods
US20090163115A1 (en) * 2007-12-20 2009-06-25 Spirit Aerosystems, Inc. Method of making acoustic holes using uv curing masking material
US10543622B2 (en) 2008-07-03 2020-01-28 JPL Global, LLC Rotatable filter system and methodology
CN102686057A (zh) * 2011-03-18 2012-09-19 深圳富泰宏精密工业有限公司 电子装置壳体及其制作方法
WO2017155969A1 (en) * 2016-03-09 2017-09-14 Applied Materials, Inc. Pad structure and fabrication methods

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB573771A (en) * 1943-11-16 1945-12-05 Kodak Ltd Improvements in the production of photographic relief images
US2544905A (en) * 1948-10-23 1951-03-13 Eastman Kodak Co Method of making photographic relief images
US3079254A (en) * 1959-01-26 1963-02-26 George W Crowley Photographic fabrication of semiconductor devices
US3240601A (en) * 1962-03-07 1966-03-15 Corning Glass Works Electroconductive coating patterning
US3265542A (en) * 1962-03-15 1966-08-09 Philco Corp Semiconductor device and method for the fabrication thereof
NL295625A (he) * 1962-07-26
US3415648A (en) * 1964-08-07 1968-12-10 Philco Ford Corp Pva etch masking process

Also Published As

Publication number Publication date
US3808751A (en) 1974-05-07
JPS511550B1 (he) 1976-01-19
GB1381527A (en) 1975-01-22

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