JPS511550B1 - - Google Patents

Info

Publication number
JPS511550B1
JPS511550B1 JP46008230A JP823071A JPS511550B1 JP S511550 B1 JPS511550 B1 JP S511550B1 JP 46008230 A JP46008230 A JP 46008230A JP 823071 A JP823071 A JP 823071A JP S511550 B1 JPS511550 B1 JP S511550B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46008230A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46008230A priority Critical patent/JPS511550B1/ja
Priority to GB724472A priority patent/GB1381527A/en
Priority to US00227444A priority patent/US3808751A/en
Priority to CA135,040A priority patent/CA962875A/en
Publication of JPS511550B1 publication Critical patent/JPS511550B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
JP46008230A 1971-02-20 1971-02-20 Pending JPS511550B1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP46008230A JPS511550B1 (ja) 1971-02-20 1971-02-20
GB724472A GB1381527A (en) 1971-02-20 1972-02-16 Sandblasting processes
US00227444A US3808751A (en) 1971-02-20 1972-02-18 Method of making a sandblast mask
CA135,040A CA962875A (en) 1971-02-20 1972-02-18 Method of making a mask for a sandblast

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46008230A JPS511550B1 (ja) 1971-02-20 1971-02-20

Publications (1)

Publication Number Publication Date
JPS511550B1 true JPS511550B1 (ja) 1976-01-19

Family

ID=11687344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46008230A Pending JPS511550B1 (ja) 1971-02-20 1971-02-20

Country Status (4)

Country Link
US (1) US3808751A (ja)
JP (1) JPS511550B1 (ja)
CA (1) CA962875A (ja)
GB (1) GB1381527A (ja)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4430416A (en) 1980-06-27 1984-02-07 Asahi Kasei Kogyo Kabushiki Kaisha Transfer element for sandblast carving
US4587186A (en) * 1982-05-13 1986-05-06 Asahi Kasei Kogyo Kabushiki Kaisha Mask element for selective sandblasting and a method
GB2133326B (en) * 1983-01-18 1987-03-11 Container Graphics Corp Blasting mask and method of making and using the same
US4716096A (en) * 1983-01-18 1987-12-29 Container Graphics Corporation Method and apparatus for producing characters on a grit-erodible body
GB8823106D0 (en) * 1988-10-01 1988-11-09 James Hardie Engraving Ltd Resists
ATE196200T1 (de) * 1990-10-22 2000-09-15 Aicello Chemical Co Gravierverfahren mit bildmaske und lichtempfindlicher laminatfilm für besagte bildmaske
US5629132B1 (en) * 1991-03-28 2000-02-08 Aicello Chemical Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask
US5518857A (en) * 1991-03-28 1996-05-21 Aicello Chemical Co., Ltd. Image-carrying mask photo-sensitive laminate film for use in making an image carry mask
US5989689A (en) * 1991-12-11 1999-11-23 The Chromaline Corporation Sandblast mask laminate with blastable pressure sensitive adhesive
US5370762A (en) * 1992-02-11 1994-12-06 Rayzist Photomask, Inc. Use site production of sandblasting photomasks
DE69412609T2 (de) * 1994-09-06 1999-03-11 Koninkl Philips Electronics Nv Verfahren zur Herstellung eines Musters auf einem beschichteten Substrat
GB2295240B (en) * 1994-11-12 1999-05-05 Jeffrey Lee Ormandy A method of producing a permanent image
US5958628A (en) * 1995-06-06 1999-09-28 International Business Machines Corporation Formation of punch inspection masks and other devices using a laser
NL1000825C2 (nl) * 1995-07-17 1997-01-21 Stork Screens Bv Zeefprodukt met een verhoogd stralingabsorberend vermogen, in het bijzonder geschikt voor toepassing in vlak- of rotatiezeefdruk, en werkwijze voor de vervaardiging daarvan.
US5672225A (en) * 1995-07-27 1997-09-30 Cowan; John R. Method for engraving three dimensional images
TW344696B (en) * 1996-11-22 1998-11-11 Philips Electronics Nv Powder-blasting method
US6207330B1 (en) 1997-07-14 2001-03-27 International Business Machines Corporation Formation of punch inspection masks and other devices using a laser
FR2770434A1 (fr) * 1997-11-05 1999-05-07 Jean Michel Hostein Procede de gravure a l'aide d'un masque de sablage - masque obtenu selon le procede
US6140006A (en) * 1998-06-15 2000-10-31 The Chromaline Corporation Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate
JP2001338878A (ja) * 2000-03-21 2001-12-07 Sharp Corp サセプタおよび表面処理方法
JP2002120152A (ja) * 2000-07-31 2002-04-23 Fuji Photo Film Co Ltd 半導体チップ、半導体ウェハ、半導体デバイスおよびその製造方法
GB0021747D0 (en) * 2000-09-04 2000-10-18 Cambridge Consultants Coating removal
US20050108869A1 (en) * 2003-05-16 2005-05-26 Shuen-Shing Hsiao Method for manufacturing teeth of linear step motors
US20110067320A1 (en) * 2006-09-11 2011-03-24 Raymond Lee Call Wall-Mount Adjustment Systems And Methods
US20090163115A1 (en) * 2007-12-20 2009-06-25 Spirit Aerosystems, Inc. Method of making acoustic holes using uv curing masking material
US10543622B2 (en) 2008-07-03 2020-01-28 JPL Global, LLC Rotatable filter system and methodology
CN102686057A (zh) * 2011-03-18 2012-09-19 深圳富泰宏精密工业有限公司 电子装置壳体及其制作方法
US10773509B2 (en) * 2016-03-09 2020-09-15 Applied Materials, Inc. Pad structure and fabrication methods

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB573771A (en) * 1943-11-16 1945-12-05 Kodak Ltd Improvements in the production of photographic relief images
US2544905A (en) * 1948-10-23 1951-03-13 Eastman Kodak Co Method of making photographic relief images
US3079254A (en) * 1959-01-26 1963-02-26 George W Crowley Photographic fabrication of semiconductor devices
US3240601A (en) * 1962-03-07 1966-03-15 Corning Glass Works Electroconductive coating patterning
US3265542A (en) * 1962-03-15 1966-08-09 Philco Corp Semiconductor device and method for the fabrication thereof
BE635432A (ja) * 1962-07-26
US3415648A (en) * 1964-08-07 1968-12-10 Philco Ford Corp Pva etch masking process

Also Published As

Publication number Publication date
CA962875A (en) 1975-02-18
US3808751A (en) 1974-05-07
GB1381527A (en) 1975-01-22

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