CA942602A - Production of a protective layer of sio2 on the surface of semiconductor plates - Google Patents

Production of a protective layer of sio2 on the surface of semiconductor plates

Info

Publication number
CA942602A
CA942602A CA086,393A CA86393A CA942602A CA 942602 A CA942602 A CA 942602A CA 86393 A CA86393 A CA 86393A CA 942602 A CA942602 A CA 942602A
Authority
CA
Canada
Prior art keywords
sio2
production
protective layer
semiconductor plates
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA086,393A
Other languages
English (en)
Inventor
Erich Pammer
Peter Heidegger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19691933664 external-priority patent/DE1933664C3/de
Application filed by Siemens AG filed Critical Siemens AG
Application granted granted Critical
Publication of CA942602A publication Critical patent/CA942602A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P14/69215—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • H10P14/6334—
    • H10P14/6682—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/118—Oxide films
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/935—Gas flow control

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Compounds (AREA)
CA086,393A 1969-07-02 1970-06-24 Production of a protective layer of sio2 on the surface of semiconductor plates Expired CA942602A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691933664 DE1933664C3 (de) 1969-07-02 Verfahren zum Überziehen von Halbleiterscheiben mit einer Schicht aus Siliciumdioxyd

Publications (1)

Publication Number Publication Date
CA942602A true CA942602A (en) 1974-02-26

Family

ID=5738701

Family Applications (1)

Application Number Title Priority Date Filing Date
CA086,393A Expired CA942602A (en) 1969-07-02 1970-06-24 Production of a protective layer of sio2 on the surface of semiconductor plates

Country Status (8)

Country Link
US (1) US3681132A (enExample)
AT (1) AT324423B (enExample)
CA (1) CA942602A (enExample)
CH (1) CH542936A (enExample)
FR (1) FR2056427A5 (enExample)
GB (1) GB1281298A (enExample)
NL (1) NL7005770A (enExample)
SE (1) SE359195B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991234A (en) * 1974-09-30 1976-11-09 American Optical Corporation Process for coating a lens of synthetic polymer with a durable abrasion resistant vitreous composition
US4052520A (en) * 1974-09-30 1977-10-04 American Optical Corporation Process for coating a synthetic polymer sheet material with a durable abrasion-resistant vitreous composition
DE2447224A1 (de) * 1974-10-03 1976-04-15 Ibm Deutschland Verfahren zum aufwachsen von pyrolitischen siliciumdioxidschichten
JPS51144183A (en) * 1975-06-06 1976-12-10 Hitachi Ltd Semiconductor element containing surface protection film
AU3994785A (en) * 1984-02-13 1985-08-27 Schmitt, J.J. 111 Method and apparatus for the gas jet deposition of conductingand dielectric thin solid films and products produced there by
US4707313A (en) * 1986-07-02 1987-11-17 A. O. Smith Corporation Method of making a laminated structure for use in an electrical apparatus
KR0170391B1 (ko) * 1989-06-16 1999-03-30 다카시마 히로시 피처리체 처리장치 및 처리방법
DE3936654C1 (enExample) * 1989-11-03 1990-12-20 Schott Glaswerke, 6500 Mainz, De
US5262204A (en) * 1989-11-03 1993-11-16 Schott Glaswerke Glass-ceramic article decorated with ceramic color and process for its production
FR2679898B1 (fr) * 1991-07-31 1993-11-05 Air Liquide Procede de formation d'une couche de silice sur une surface d'un objet en verre.
WO2006114686A1 (en) * 2005-04-25 2006-11-02 CARL ZEISS VISION SOUTH AFRICA (Pty) LTD A method and apparatus for coating objects
US20060266793A1 (en) * 2005-05-24 2006-11-30 Caterpillar Inc. Purging system having workpiece movement device

Also Published As

Publication number Publication date
AT324423B (de) 1975-08-25
SE359195B (enExample) 1973-08-20
NL7005770A (enExample) 1971-01-05
GB1281298A (en) 1972-07-12
DE1933664B2 (de) 1976-01-22
FR2056427A5 (enExample) 1971-05-14
DE1933664A1 (de) 1971-01-14
CH542936A (de) 1973-10-15
US3681132A (en) 1972-08-01

Similar Documents

Publication Publication Date Title
CA918609A (en) Package for a layer cake
CA942602A (en) Production of a protective layer of sio2 on the surface of semiconductor plates
CA918986A (en) Technique for the deposition of a ceramic substrate glaze
CA960920A (en) Articles having a pressure-sensitive layer
AU463179B2 (en) Semiconductor laser
CA971865A (en) Protective coating
AU466551B2 (en) Hard surfaced plate
CA980012A (en) Protective circuits
AU424919B2 (en) Semiconductor transducer
CA970257A (en) Insulating layer on a semiconductor substrate
CA871084A (en) Production of a protective layer on the surface of a semiconductor body
CA858501A (en) Formation of layer on silicon
CA831198A (en) Method of manufacturing a layer of grains
CA893651A (en) Production of an insulating layer on the surface of a semiconductor crystal
CA820980A (en) Ceramic substrate glaze
CA934145A (en) Photo-conductive device comprising a photo-conductive layer on the basis of lead monoxide
AU465323B2 (en) Semi-conductor devices
AU437809B2 (en) Method of forming a silicon layer ona silicon substrate
CA822088A (en) Surface modified elastomers
AU420427B2 (en) Lenoweave substrate construction
CA858624A (en) Lightsensitive layer
CA818142A (en) Etch masks on semiconductor surfaces
CA879058A (en) Etching
AU1968270A (en) Method of forming a silicon layer ona silicon substrate
CA824015A (en) Boundary layer eliminator